DE502005001479D1 - Abformzusammensetzung zur Herstellung von Präzisionsoptik - Google Patents

Abformzusammensetzung zur Herstellung von Präzisionsoptik

Info

Publication number
DE502005001479D1
DE502005001479D1 DE200550001479 DE502005001479T DE502005001479D1 DE 502005001479 D1 DE502005001479 D1 DE 502005001479D1 DE 200550001479 DE200550001479 DE 200550001479 DE 502005001479 T DE502005001479 T DE 502005001479T DE 502005001479 D1 DE502005001479 D1 DE 502005001479D1
Authority
DE
Germany
Prior art keywords
molded article
substrate
negative mold
production
free
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE200550001479
Other languages
German (de)
English (en)
Inventor
Martin Klenke
Thomas Benthien
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nanogate Advanced Materials GmbH
Original Assignee
Nanogate Advanced Materials GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nanogate Advanced Materials GmbH filed Critical Nanogate Advanced Materials GmbH
Publication of DE502005001479D1 publication Critical patent/DE502005001479D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
    • C08L33/16—Homopolymers or copolymers of esters containing halogen atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/22—Esters containing halogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/22—Esters containing halogen
    • C08F220/24—Esters containing halogen containing perhaloalkyl radicals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/08—Homopolymers or copolymers of acrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2205/00—Polymer mixtures characterised by other features
    • C08L2205/02—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers
    • Y10T428/31544—Addition polymer is perhalogenated

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Polymerisation Methods In General (AREA)
  • Casting Or Compression Moulding Of Plastics Or The Like (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Paints Or Removers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Dental Preparations (AREA)
DE200550001479 2005-03-10 2005-03-10 Abformzusammensetzung zur Herstellung von Präzisionsoptik Expired - Lifetime DE502005001479D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP20050101887 EP1700871B1 (de) 2005-03-10 2005-03-10 Abformzusammensetzung zur Herstellung von Präzisionsoptik

Publications (1)

Publication Number Publication Date
DE502005001479D1 true DE502005001479D1 (de) 2007-10-25

Family

ID=34938945

Family Applications (1)

Application Number Title Priority Date Filing Date
DE200550001479 Expired - Lifetime DE502005001479D1 (de) 2005-03-10 2005-03-10 Abformzusammensetzung zur Herstellung von Präzisionsoptik

Country Status (11)

Country Link
US (1) US8246896B2 (https=)
EP (2) EP1700871B1 (https=)
JP (1) JP5406522B2 (https=)
KR (1) KR20070110438A (https=)
CN (1) CN101137683B (https=)
AT (2) ATE373026T1 (https=)
DE (1) DE502005001479D1 (https=)
DK (1) DK1700871T3 (https=)
ES (1) ES2290848T3 (https=)
PL (1) PL1700871T3 (https=)
WO (1) WO2006094997A1 (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE512172T1 (de) * 2009-04-07 2011-06-15 Nanogate Ind Solutions Gmbh Abformzusammensetzung
CN105384871B (zh) * 2009-05-29 2018-03-09 日产化学工业株式会社 含氟高支化聚合物和包含该聚合物的树脂组合物
EP2647673A4 (en) * 2010-12-01 2016-02-10 Nissan Chemical Ind Ltd CURABLE COMPOSITION FOR A COATING CONTAINING A HYPER-RAMIFIED POLYMER CONTAINING FLUORINE
CN102174143B (zh) * 2011-01-29 2013-01-09 锦州惠发天合化学有限公司 一种含氟丙烯酸酯乳液的制备方法
BR102014031426B1 (pt) 2014-12-15 2018-07-24 Jjgc Ind E Comercio De Materiais Dentarios S/A implante
USD816841S1 (en) 2014-12-15 2018-05-01 Jjgc Industria E Comercio De Materiais Dentarios S/A Bone implant
CN109627378B (zh) * 2017-10-09 2021-03-16 中国石油化工股份有限公司 疏水缔合物及其制备方法、非均质碳酸盐岩储层酸压用清洁转向酸及其制备方法

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1221795A (en) * 1982-02-24 1987-05-12 Bolesh J. Skutnik Optical fiber cladding
ATE63324T1 (de) * 1985-03-25 1991-05-15 Raychem Corp Klebemittelzusammensetzung fuer optische fasern.
JPS6296508A (ja) * 1985-10-23 1987-05-06 Sumitomo Chem Co Ltd 硬化性樹脂組成物
JPS63248807A (ja) * 1987-04-03 1988-10-17 Mitsubishi Rayon Co Ltd 光硬化性組成物
AU608420B2 (en) * 1988-03-15 1991-03-28 Minnesota Mining And Manufacturing Company Polymer claddings for optical fibre waveguides
EP0478261A3 (en) * 1990-09-27 1992-05-06 Ciba-Geigy Ag Process for producing oxygen-permeable polymer
JP3326796B2 (ja) * 1991-01-31 2002-09-24 大日本インキ化学工業株式会社 硬化性組成物及びその硬化方法
AU1927092A (en) * 1991-05-31 1993-01-08 Advanced Glass Treatment Systems Moisture resistant glass article
JP3167443B2 (ja) * 1991-08-23 2001-05-21 大日本インキ化学工業株式会社 光ファイバクラッド用硬化性組成物及びそれを用いた光ファイバ
EP0536743A1 (en) * 1991-10-08 1993-04-14 Sumitomo Electric Industries, Ltd Resin composition and plastic clad optical fiber comprising the same
JP3051241B2 (ja) * 1991-12-04 2000-06-12 日本化薬株式会社 紫外線硬化性透過型スクリーン用樹脂組成物及びその硬化物
JPH06136062A (ja) * 1992-10-21 1994-05-17 Nippon Oil & Fats Co Ltd 含フッ素硬化性組成物及び含フッ素硬化被膜
JP3372073B2 (ja) * 1992-12-01 2003-01-27 日本化薬株式会社 紫外線硬化性透過型スクリーン用樹脂組成物並びにその硬化物
US5343544A (en) * 1993-07-02 1994-08-30 Minnesota Mining And Manufacturing Company Integrated optical fiber coupler and method of making same
US5411209A (en) * 1993-10-18 1995-05-02 Ollivier; Gerald Anti-hail shock wave generator
JPH08231647A (ja) * 1994-12-28 1996-09-10 Sharp Corp 光重合性樹脂材料組成物
US5912061A (en) * 1995-08-03 1999-06-15 Matsushita Electric Industrial Co., Ltd. UV-ray setting resin and a method for manufacturing a magneto-optical disk by the use of the UV-ray setting resin
JP4029531B2 (ja) * 1999-10-19 2008-01-09 大日本インキ化学工業株式会社 微小立体成形用活性エネルギー線硬化性組成物
EP1635201A1 (de) * 2004-09-09 2006-03-15 Nanogate Advanced Materials GmbH Beleuchtungseinrichtung zur gleichmässigen Hinterleuchtung von Flachbildschirmen, umfassend einen Lichtleiter mit diffraktiven Oberflächenelementen
ES2287827T3 (es) * 2005-03-10 2007-12-16 Nanogate Advanced Materials Gmbh Pantalla plana.

Also Published As

Publication number Publication date
EP1856169A1 (de) 2007-11-21
EP1856169B1 (de) 2011-05-11
ES2290848T3 (es) 2008-02-16
US8246896B2 (en) 2012-08-21
ATE373026T1 (de) 2007-09-15
EP1700871A1 (de) 2006-09-13
KR20070110438A (ko) 2007-11-16
WO2006094997A1 (de) 2006-09-14
PL1700871T3 (pl) 2007-12-31
DK1700871T3 (da) 2008-01-21
US20080176064A1 (en) 2008-07-24
JP5406522B2 (ja) 2014-02-05
ATE509047T1 (de) 2011-05-15
JP2008533228A (ja) 2008-08-21
EP1700871B1 (de) 2007-09-12
CN101137683A (zh) 2008-03-05
CN101137683B (zh) 2012-06-27

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