DE4444669A1 - Strahlungsempfindliches Gemisch - Google Patents

Strahlungsempfindliches Gemisch

Info

Publication number
DE4444669A1
DE4444669A1 DE4444669A DE4444669A DE4444669A1 DE 4444669 A1 DE4444669 A1 DE 4444669A1 DE 4444669 A DE4444669 A DE 4444669A DE 4444669 A DE4444669 A DE 4444669A DE 4444669 A1 DE4444669 A1 DE 4444669A1
Authority
DE
Germany
Prior art keywords
acid
radiation
sensitive mixture
compound
mixture according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE4444669A
Other languages
German (de)
English (en)
Inventor
Mathias Dr Eichhorn
Gerhard Dr Buhr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Priority to DE4444669A priority Critical patent/DE4444669A1/de
Priority to US08/567,775 priority patent/US5705317A/en
Priority to AT95119337T priority patent/ATE189318T1/de
Priority to DE59507695T priority patent/DE59507695D1/de
Priority to EP95119337A priority patent/EP0717317B1/fr
Priority to BR9505897A priority patent/BR9505897A/pt
Priority to KR1019950049539A priority patent/KR100395701B1/ko
Priority to JP32721495A priority patent/JP3510027B2/ja
Publication of DE4444669A1 publication Critical patent/DE4444669A1/de
Priority to US08/932,964 priority patent/US5998567A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
DE4444669A 1994-12-15 1994-12-15 Strahlungsempfindliches Gemisch Withdrawn DE4444669A1 (de)

Priority Applications (9)

Application Number Priority Date Filing Date Title
DE4444669A DE4444669A1 (de) 1994-12-15 1994-12-15 Strahlungsempfindliches Gemisch
US08/567,775 US5705317A (en) 1994-12-15 1995-12-05 Radiation-sensitive mixture
AT95119337T ATE189318T1 (de) 1994-12-15 1995-12-07 Strahlungsempfindliches gemisch
DE59507695T DE59507695D1 (de) 1994-12-15 1995-12-07 Strahlungsempfindliches Gemisch
EP95119337A EP0717317B1 (fr) 1994-12-15 1995-12-07 Composition sensible aux rayonnements
BR9505897A BR9505897A (pt) 1994-12-15 1995-12-14 Mistura sensível à radiação
KR1019950049539A KR100395701B1 (ko) 1994-12-15 1995-12-14 방사선민감성혼합물
JP32721495A JP3510027B2 (ja) 1994-12-15 1995-12-15 放射線感応性混合物
US08/932,964 US5998567A (en) 1994-12-15 1997-09-18 Radiation-sensitive mixture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE4444669A DE4444669A1 (de) 1994-12-15 1994-12-15 Strahlungsempfindliches Gemisch

Publications (1)

Publication Number Publication Date
DE4444669A1 true DE4444669A1 (de) 1996-06-20

Family

ID=6535868

Family Applications (2)

Application Number Title Priority Date Filing Date
DE4444669A Withdrawn DE4444669A1 (de) 1994-12-15 1994-12-15 Strahlungsempfindliches Gemisch
DE59507695T Expired - Fee Related DE59507695D1 (de) 1994-12-15 1995-12-07 Strahlungsempfindliches Gemisch

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE59507695T Expired - Fee Related DE59507695D1 (de) 1994-12-15 1995-12-07 Strahlungsempfindliches Gemisch

Country Status (7)

Country Link
US (2) US5705317A (fr)
EP (1) EP0717317B1 (fr)
JP (1) JP3510027B2 (fr)
KR (1) KR100395701B1 (fr)
AT (1) ATE189318T1 (fr)
BR (1) BR9505897A (fr)
DE (2) DE4444669A1 (fr)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL129076A (en) * 1999-03-21 2002-02-10 Creoscitex Corp Ltd A printing plate with a socket method for short runs and a method for using it
KR20010009339A (ko) * 1999-07-09 2001-02-05 박찬구 카르복시산 유도체 및 그 제조방법
KR100384810B1 (ko) * 2000-02-16 2003-05-22 금호석유화학 주식회사 저분자 화합물 첨가제를 포함하는 화학증폭형 레지스트조성물
DE10063591A1 (de) 2000-12-20 2002-07-11 Agfa Gevaert Nv Strahlungsempfindliches Aufzeichnungsmaterial mit strukturierter Rückseite
DE10110728A1 (de) 2001-03-06 2002-10-02 Agfa Gevaert Nv Strahlungsempfindliches Aufzeichnungsmaterial mit elektrisch leitfähiger Rückseitenbeschichtung
US7105272B2 (en) * 2002-02-15 2006-09-12 Nippon Soda Co., Ltd. Acid-degradable resin compositions containing ketene-aldehyde copolymer
TWI242031B (en) * 2003-02-05 2005-10-21 Kansai Paint Co Ltd Printing ink resist composition, method of forming resist film thereof, and method of producing substrate using the same
US7358408B2 (en) * 2003-05-16 2008-04-15 Az Electronic Materials Usa Corp. Photoactive compounds
JP4406591B2 (ja) * 2004-09-17 2010-01-27 富士フイルム株式会社 レジスト組成物及び該レジスト組成物を用いたパターン形成方法
JP2009524524A (ja) * 2006-01-25 2009-07-02 フラウンホッファー−ゲゼルシャフト・ツァー・フォデラング・デル・アンゲワンテン・フォーシュング・エー．ファウ． 固体から物質を除去する方法及びその用途

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2956884A (en) * 1957-03-26 1960-10-18 Eastman Kodak Co Compositions of polyacrylates with gelatin and other proteins
DE1447963B2 (de) 1965-11-24 1972-09-07 KaIIe AG, 6202 Wiesbaden Biebnch Verfahren zur herstellung einer offsetdruckform aus einem vorsensibilisierten druckplattenmaterial
US3987037A (en) 1971-09-03 1976-10-19 Minnesota Mining And Manufacturing Company Chromophore-substituted vinyl-halomethyl-s-triazines
US3779778A (en) * 1972-02-09 1973-12-18 Minnesota Mining & Mfg Photosolubilizable compositions and elements
CH621416A5 (fr) * 1975-03-27 1981-01-30 Hoechst Ag
DE2718254C3 (de) * 1977-04-25 1980-04-10 Hoechst Ag, 6000 Frankfurt Strahlungsempfindliche Kopiermasse
DE2718259C2 (de) 1977-04-25 1982-11-25 Hoechst Ag, 6000 Frankfurt Strahlungsempfindliches Gemisch
DE2928636A1 (de) * 1979-07-16 1981-02-12 Hoechst Ag Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern
US4491628A (en) * 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
US4837124A (en) * 1986-02-24 1989-06-06 Hoechst Celanese Corporation High resolution photoresist of imide containing polymers
EP0249139B2 (fr) * 1986-06-13 1998-03-11 MicroSi, Inc. (a Delaware corporation) Composition formant réserve et utilisation
JPH0249011A (ja) * 1988-08-11 1990-02-19 Somar Corp 高エネルギー線加工用レジスト
EP0366590B2 (fr) * 1988-10-28 2001-03-21 International Business Machines Corporation Composition photoréserve positive à haute sensibilité
DE3837513A1 (de) * 1988-11-04 1990-05-10 Basf Ag Strahlungsempfindliches gemisch
DE3918525A1 (de) * 1989-06-07 1990-12-13 Hoechst Ag Polymerisate, verfahren zu deren herstellung und deren verwendung als bleichaktivatoren mit buildereigenschaften
DE3935451A1 (de) * 1989-10-25 1991-05-02 Basf Ag Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefmustern
DE4008856A1 (de) * 1990-03-20 1991-09-26 Hoechst Ag Verfahren zur herstellung von acylalen
US5248558A (en) * 1990-03-22 1993-09-28 Eastman Kodak Company Case-hardened gelatin-grafted polymer particles
US5066572A (en) * 1990-03-22 1991-11-19 Eastman Kodak Company Control of pressure-fog with gelatin-grafted and case-hardened gelatin-grafted soft polymer latex particles
US5120629A (en) * 1990-04-10 1992-06-09 E. I. Du Pont De Nemours And Company Positive-working photosensitive electrostatic master
US5225316A (en) * 1990-11-26 1993-07-06 Minnesota Mining And Manufacturing Company An imagable article comprising a photosensitive composition comprising a polymer having acid labile pendant groups
EP0508943B1 (fr) * 1991-03-11 1994-12-14 Säurefabrik Schweizerhall Procédé de préparation d'esters halogénés d'acides carboxyliques
DE4111283A1 (de) * 1991-04-08 1992-10-15 Basf Ag Strahlungsempfindliches gemisch, enthaltend saeurelabile gruppierungen und verfahren zur herstellung von reliefmustern und reliefbildern
DE4125258A1 (de) * 1991-07-31 1993-02-04 Hoechst Ag Verbindungen mit saeurelabilen schutzgruppen und damit hergestelltes positiv arbeitendes strahlungsempfindliches gemisch
DE4125260A1 (de) * 1991-07-31 1993-02-04 Hoechst Ag Oligomere verbindungen mit saeurelabilen schutzgruppen und damit hergestelltes positiv arbeitendes strahlungsempfindliches gemisch
US5374498A (en) * 1992-05-27 1994-12-20 Konica Corporation Silver halide photographic light-sensitive material
US5340676A (en) * 1993-03-18 1994-08-23 Eastman Kodak Company Imaging element comprising an electrically-conductive layer containing water-insoluble polymer particles
US5532106A (en) * 1994-08-31 1996-07-02 Cornell Research Foundation, Inc. Positive-tone photoresist containing diester dissolution inhibitors

Also Published As

Publication number Publication date
BR9505897A (pt) 1998-01-06
KR100395701B1 (ko) 2004-05-10
US5705317A (en) 1998-01-06
DE59507695D1 (de) 2000-03-02
EP0717317A3 (fr) 1996-07-10
JP3510027B2 (ja) 2004-03-22
JPH08220742A (ja) 1996-08-30
KR960024638A (ko) 1996-07-20
EP0717317B1 (fr) 2000-01-26
US5998567A (en) 1999-12-07
EP0717317A2 (fr) 1996-06-19
ATE189318T1 (de) 2000-02-15

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Legal Events

Date Code Title Description
8139 Disposal/non-payment of the annual fee