BR9505897A - Mistura sensível à radiação - Google Patents

Mistura sensível à radiação

Info

Publication number
BR9505897A
BR9505897A BR9505897A BR9505897A BR9505897A BR 9505897 A BR9505897 A BR 9505897A BR 9505897 A BR9505897 A BR 9505897A BR 9505897 A BR9505897 A BR 9505897A BR 9505897 A BR9505897 A BR 9505897A
Authority
BR
Brazil
Prior art keywords
radiation sensitive
sensitive mixture
opt
substd
hydrolysable
Prior art date
Application number
BR9505897A
Other languages
English (en)
Inventor
Mathias Eichhorn
Gerhard Buhr
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of BR9505897A publication Critical patent/BR9505897A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
BR9505897A 1994-12-15 1995-12-14 Mistura sensível à radiação BR9505897A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE4444669A DE4444669A1 (de) 1994-12-15 1994-12-15 Strahlungsempfindliches Gemisch

Publications (1)

Publication Number Publication Date
BR9505897A true BR9505897A (pt) 1998-01-06

Family

ID=6535868

Family Applications (1)

Application Number Title Priority Date Filing Date
BR9505897A BR9505897A (pt) 1994-12-15 1995-12-14 Mistura sensível à radiação

Country Status (7)

Country Link
US (2) US5705317A (pt)
EP (1) EP0717317B1 (pt)
JP (1) JP3510027B2 (pt)
KR (1) KR100395701B1 (pt)
AT (1) ATE189318T1 (pt)
BR (1) BR9505897A (pt)
DE (2) DE4444669A1 (pt)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL129076A (en) 1999-03-21 2002-02-10 Creoscitex Corp Ltd A printing plate with a socket method for short runs and a method for using it
KR20010009339A (ko) * 1999-07-09 2001-02-05 박찬구 카르복시산 유도체 및 그 제조방법
KR100384810B1 (ko) * 2000-02-16 2003-05-22 금호석유화학 주식회사 저분자 화합물 첨가제를 포함하는 화학증폭형 레지스트조성물
DE10063591A1 (de) 2000-12-20 2002-07-11 Agfa Gevaert Nv Strahlungsempfindliches Aufzeichnungsmaterial mit strukturierter Rückseite
DE10110728A1 (de) 2001-03-06 2002-10-02 Agfa Gevaert Nv Strahlungsempfindliches Aufzeichnungsmaterial mit elektrisch leitfähiger Rückseitenbeschichtung
DE60316669T2 (de) * 2002-02-15 2008-07-17 Nippon Soda Co. Ltd. Mit säure abbaubare harzzusammensetzungen mit ketenaldehyd-copolymer
TWI242031B (en) * 2003-02-05 2005-10-21 Kansai Paint Co Ltd Printing ink resist composition, method of forming resist film thereof, and method of producing substrate using the same
US7358408B2 (en) * 2003-05-16 2008-04-15 Az Electronic Materials Usa Corp. Photoactive compounds
JP4406591B2 (ja) * 2004-09-17 2010-01-27 富士フイルム株式会社 レジスト組成物及び該レジスト組成物を用いたパターン形成方法
US20090084760A1 (en) * 2006-01-25 2009-04-02 Fraunhofer-Sesellschaft Zur Forderung Der Angewandten Forschung E.V. Method for removing material from solids and use thereof

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2956884A (en) * 1957-03-26 1960-10-18 Eastman Kodak Co Compositions of polyacrylates with gelatin and other proteins
DE1447963B2 (de) 1965-11-24 1972-09-07 KaIIe AG, 6202 Wiesbaden Biebnch Verfahren zur herstellung einer offsetdruckform aus einem vorsensibilisierten druckplattenmaterial
US3987037A (en) 1971-09-03 1976-10-19 Minnesota Mining And Manufacturing Company Chromophore-substituted vinyl-halomethyl-s-triazines
US3779778A (en) * 1972-02-09 1973-12-18 Minnesota Mining & Mfg Photosolubilizable compositions and elements
CH621416A5 (pt) * 1975-03-27 1981-01-30 Hoechst Ag
DE2718259C2 (de) 1977-04-25 1982-11-25 Hoechst Ag, 6000 Frankfurt Strahlungsempfindliches Gemisch
DE2718254C3 (de) * 1977-04-25 1980-04-10 Hoechst Ag, 6000 Frankfurt Strahlungsempfindliche Kopiermasse
DE2928636A1 (de) * 1979-07-16 1981-02-12 Hoechst Ag Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern
US4491628A (en) * 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
US4837124A (en) * 1986-02-24 1989-06-06 Hoechst Celanese Corporation High resolution photoresist of imide containing polymers
DE3750275T3 (de) * 1986-06-13 1998-10-01 Microsi Inc Lackzusammensetzung und -anwendung.
JPH0249011A (ja) * 1988-08-11 1990-02-19 Somar Corp 高エネルギー線加工用レジスト
DE68926019T2 (de) * 1988-10-28 1996-10-02 Ibm Positiv arbeitende hochempfindliche Photolack-Zusammensetzung
DE3837513A1 (de) * 1988-11-04 1990-05-10 Basf Ag Strahlungsempfindliches gemisch
DE3918525A1 (de) * 1989-06-07 1990-12-13 Hoechst Ag Polymerisate, verfahren zu deren herstellung und deren verwendung als bleichaktivatoren mit buildereigenschaften
DE3935451A1 (de) * 1989-10-25 1991-05-02 Basf Ag Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefmustern
DE4008856A1 (de) * 1990-03-20 1991-09-26 Hoechst Ag Verfahren zur herstellung von acylalen
US5248558A (en) * 1990-03-22 1993-09-28 Eastman Kodak Company Case-hardened gelatin-grafted polymer particles
US5066572A (en) * 1990-03-22 1991-11-19 Eastman Kodak Company Control of pressure-fog with gelatin-grafted and case-hardened gelatin-grafted soft polymer latex particles
US5120629A (en) * 1990-04-10 1992-06-09 E. I. Du Pont De Nemours And Company Positive-working photosensitive electrostatic master
US5225316A (en) * 1990-11-26 1993-07-06 Minnesota Mining And Manufacturing Company An imagable article comprising a photosensitive composition comprising a polymer having acid labile pendant groups
ATE115538T1 (de) * 1991-03-11 1994-12-15 Schweizerhall Saeurefab Verfahren zur herstellung von halogenierten carbonsäureestern.
DE4111283A1 (de) * 1991-04-08 1992-10-15 Basf Ag Strahlungsempfindliches gemisch, enthaltend saeurelabile gruppierungen und verfahren zur herstellung von reliefmustern und reliefbildern
DE4125258A1 (de) * 1991-07-31 1993-02-04 Hoechst Ag Verbindungen mit saeurelabilen schutzgruppen und damit hergestelltes positiv arbeitendes strahlungsempfindliches gemisch
DE4125260A1 (de) * 1991-07-31 1993-02-04 Hoechst Ag Oligomere verbindungen mit saeurelabilen schutzgruppen und damit hergestelltes positiv arbeitendes strahlungsempfindliches gemisch
US5374498A (en) * 1992-05-27 1994-12-20 Konica Corporation Silver halide photographic light-sensitive material
US5340676A (en) * 1993-03-18 1994-08-23 Eastman Kodak Company Imaging element comprising an electrically-conductive layer containing water-insoluble polymer particles
US5532106A (en) * 1994-08-31 1996-07-02 Cornell Research Foundation, Inc. Positive-tone photoresist containing diester dissolution inhibitors

Also Published As

Publication number Publication date
EP0717317B1 (de) 2000-01-26
ATE189318T1 (de) 2000-02-15
US5705317A (en) 1998-01-06
JP3510027B2 (ja) 2004-03-22
EP0717317A2 (de) 1996-06-19
DE4444669A1 (de) 1996-06-20
KR100395701B1 (ko) 2004-05-10
JPH08220742A (ja) 1996-08-30
KR960024638A (ko) 1996-07-20
DE59507695D1 (de) 2000-03-02
US5998567A (en) 1999-12-07
EP0717317A3 (pt) 1996-07-10

Similar Documents

Publication Publication Date Title
DE68929111D1 (de) Verwendung von Halogenkohlenwasserstofflösungsmitteln
EP0562049A4 (en) Novel 4-arylpiperazines and 4-arylpiperidines
BR9505897A (pt) Mistura sensível à radiação
ATE171163T1 (de) Homobidentale, trifunktionelle maleinimid-linker, und ihre verwendung in immunologisch aktiven konjugaten
DE69015313D1 (de) Medizinisches Zubehör.
ES2107755T3 (es) Recuperacion seccion gama no acoplada.
AU3103693A (en) Therapeutically useful tridecenone compounds
PT97259A (pt) Processo para a estabilizacao de isotiazolonas com fenoxialcanois
DK0521408T3 (pt)
EG19084A (en) Butyric acid derivatives
ATE204545T1 (de) Winde mit drehmomentbegrenzer
GB8910035D0 (en) 3,5-dichloro-4-(1,1,2,3,3,3-hexafluoropropyloxy)aniline
ATE145789T1 (de) Fungizide mischungen
FI882444A0 (fi) Substituerade vinylkefalosporiner, foerfarande foer deras framstaellning och deras anvaendning som laekemedel.
NO302117B1 (no) Kloakkbrönn eller et lite kloakkrenseanlegg
IN172911B (pt)
EP0708080A3 (pt)
DE69209868D1 (de) Verwendung von Isomeren von Mono- und bis(methylbenzyle)xylen als Wärmeübertragungflüssigkeit
AU7443991A (en) Fastening devices and applicator
DE58909089D1 (de) Verwendung von Myricetin-3-0-beta-D-glucuronid als Arzneimittel.
IL80590A (en) N-benzoyl-n-phenoxy-phenyl-urea derivatives,their preparation and their use as pesticides
DE59208349D1 (de) 2-Arylpropensäuren und ihre Verwendung bei der Herstellung von S-Ketoprofen
CA2002169A1 (en) Specifically substituted cyclopropanecarboxamides and their use for controlling pests
ZA9410253B (en) Use of core discoloration preventing agents in the production of isocyanate-based foams.

Legal Events

Date Code Title Description
PC Transfer

Free format text: AGFA-GEVAERT AG (DE)

FB36 Technical and formal requirements: requirement - article 36 of industrial property law
FA8 Dismissal: dismissal - article 36, par. 1 of industrial property law