DE3889896D1 - Verfahren zur erzeugung von strukturen unter anwendung einer strahlungsinduzierten pfropfpolymerisationsreaktion. - Google Patents

Verfahren zur erzeugung von strukturen unter anwendung einer strahlungsinduzierten pfropfpolymerisationsreaktion.

Info

Publication number
DE3889896D1
DE3889896D1 DE3889896T DE3889896T DE3889896D1 DE 3889896 D1 DE3889896 D1 DE 3889896D1 DE 3889896 T DE3889896 T DE 3889896T DE 3889896 T DE3889896 T DE 3889896T DE 3889896 D1 DE3889896 D1 DE 3889896D1
Authority
DE
Germany
Prior art keywords
radiation
polymerization reaction
graft polymerization
generating structures
induced graft
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3889896T
Other languages
English (en)
Other versions
DE3889896T2 (de
Inventor
Kozo Mochiji
Hiroaki Oizumi
Yasunari Soda
Taro Ogawa
Takeshi Kimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Application granted granted Critical
Publication of DE3889896D1 publication Critical patent/DE3889896D1/de
Publication of DE3889896T2 publication Critical patent/DE3889896T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/167—X-ray
    • Y10S430/168—X-ray exposure process

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Drying Of Semiconductors (AREA)
DE3889896T 1987-07-27 1988-07-11 Verfahren zur erzeugung von strukturen unter anwendung einer strahlungsinduzierten pfropfpolymerisationsreaktion. Expired - Fee Related DE3889896T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP62185480A JP2641452B2 (ja) 1987-07-27 1987-07-27 パターン形成方法
PCT/JP1988/000691 WO1989001187A1 (en) 1987-07-27 1988-07-11 Pattern-forming process utilizing radiation-induced graft polymerization reaction

Publications (2)

Publication Number Publication Date
DE3889896D1 true DE3889896D1 (de) 1994-07-07
DE3889896T2 DE3889896T2 (de) 1994-09-22

Family

ID=16171501

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3889896T Expired - Fee Related DE3889896T2 (de) 1987-07-27 1988-07-11 Verfahren zur erzeugung von strukturen unter anwendung einer strahlungsinduzierten pfropfpolymerisationsreaktion.

Country Status (5)

Country Link
US (1) US4954424A (de)
EP (1) EP0328655B1 (de)
JP (1) JP2641452B2 (de)
DE (1) DE3889896T2 (de)
WO (1) WO1989001187A1 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7700659B2 (en) * 2005-03-24 2010-04-20 Advanced Cardiovascular Systems, Inc. Implantable devices formed of non-fouling methacrylate or acrylate polymers
US9381279B2 (en) 2005-03-24 2016-07-05 Abbott Cardiovascular Systems Inc. Implantable devices formed on non-fouling methacrylate or acrylate polymers

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE560986A (de) * 1956-09-21
US3847609A (en) * 1972-11-09 1974-11-12 Hercules Inc Photopolymer process forming graft polymers in exposed areas
FR2389922B1 (de) * 1977-05-03 1981-08-28 Thomson Csf
JPS59148335A (ja) * 1983-02-14 1984-08-25 Nippon Telegr & Teleph Corp <Ntt> 微細パタ−ン形成法
JPS58194336A (ja) * 1982-05-07 1983-11-12 Nippon Telegr & Teleph Corp <Ntt> 微細パタ−ン形成装置
JPS6010249A (ja) * 1983-06-30 1985-01-19 Fujitsu Ltd パタ−ン形成方法
US4596761A (en) * 1983-11-02 1986-06-24 Hughes Aircraft Company Graft polymerized SiO2 lithographic masks
JPS60501777A (ja) * 1983-11-02 1985-10-17 ヒユ−ズ・エアクラフト・カンパニ− 二酸化ケイ素系グラフト重合リソグラフマスク
JPS6147641A (ja) * 1984-08-15 1986-03-08 Toshiba Corp レジストパタ−ンの形成方法
JPS6148921A (ja) * 1984-08-15 1986-03-10 Toshiba Corp レジストパタ−ンの形成方法
JPS62168134A (ja) * 1985-12-16 1987-07-24 Mitsubishi Electric Corp グラフト重合膜パタ−ン形成方法
US4737425A (en) * 1986-06-10 1988-04-12 International Business Machines Corporation Patterned resist and process
EP0295457A3 (de) * 1987-05-29 1990-06-13 Hitachi, Ltd. Verfahren zur Herstellung eines Musters unter Benutzung einer aufgepfropften Copolymerisation
JP3088207B2 (ja) * 1992-11-05 2000-09-18 パロマ工業株式会社 湯水混合制御装置
JP2967659B2 (ja) * 1992-11-05 1999-10-25 昭和アルミニウム株式会社 感光ドラム用アルミニウム管の製造方法

Also Published As

Publication number Publication date
JP2641452B2 (ja) 1997-08-13
JPS6431156A (en) 1989-02-01
EP0328655A4 (de) 1989-11-27
US4954424A (en) 1990-09-04
DE3889896T2 (de) 1994-09-22
EP0328655B1 (de) 1994-06-01
WO1989001187A1 (en) 1989-02-09
EP0328655A1 (de) 1989-08-23

Similar Documents

Publication Publication Date Title
DE69001968D1 (de) Verfahren zur erzeugung von wasserstoffperoxyd.
DE3871095D1 (de) Verfahren zur herstellung einer wasser-in-oel-emulsion.
DE3867029D1 (de) Verfahren zur herstellung von aethylencopolymeren.
DE3581176D1 (de) Verfahren zur herstellung einer katalysatorkomponente zur polymerisation von olefinen.
DE3873146D1 (de) Verfahren zur herstellung einer koernigen reinigungsmittelzusammensetzung.
DE3873145D1 (de) Verfahren zur herstellung einer koernigen reinigungsmittelzusammensetzung.
DE68906310D1 (de) Verfahren zur herstellung einer stabilisierten waessrigen loesung von chlordioxid.
DE3876732D1 (de) Verfahren zur herstellung eines kohlenstoff-kohlenstoff-verbundkoerpers von hoher festigkeit.
DE68907258D1 (de) Verfahren zur herstellung von perfluorierten copolymeren.
DE69022056D1 (de) Verfahren zur herstellung einer mischung von sacchariden.
DE3870172D1 (de) Verfahren zur herstellung von bisphenol a.
ATE55920T1 (de) Verfahren zur herstellung einer komposit-membran.
DE3877278D1 (de) Verfahren zur herstellung von fliesen mit einer einzigen brennstufe.
DE3878153D1 (de) Verfahren zur herstellung eines alkylenamins unter verwendung eines katalysators von gemischten oxiden.
DE68908777D1 (de) Verfahren zur Herstellung einer Hohlfasermembran.
DE68905688D1 (de) Verfahren zur erzeugung von zusammengesetzten metallteilen.
DE59106231D1 (de) Verfahren zum durchführen einer gleichgewichtsreaktion unter anwendung von dämpfepermeation.
DE68904625D1 (de) Verfahren zur herstellung von wasserstoffperoxid.
DE68920783D1 (de) Verfahren zur Erzeugung einer Dickschicht.
DE3763837D1 (de) Verfahren zur erzeugung eines faservlieses.
DE68919707D1 (de) Verfahren zur erzeugung von unterchloriger säure.
DE3889896D1 (de) Verfahren zur erzeugung von strukturen unter anwendung einer strahlungsinduzierten pfropfpolymerisationsreaktion.
ATE120199T1 (de) Verfahren zur herstellung von n- phosphonomethylglycin.
DE3876917D1 (de) Verfahren zur erzeugung von dimethylnaphthalenen.
DE3883271D1 (de) Verfahren zur herstellung von aethylencopolymeren.

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee