DE3889448T2 - Photomusterbare Mehrschichtstruktur. - Google Patents

Photomusterbare Mehrschichtstruktur.

Info

Publication number
DE3889448T2
DE3889448T2 DE3889448T DE3889448T DE3889448T2 DE 3889448 T2 DE3889448 T2 DE 3889448T2 DE 3889448 T DE3889448 T DE 3889448T DE 3889448 T DE3889448 T DE 3889448T DE 3889448 T2 DE3889448 T2 DE 3889448T2
Authority
DE
Germany
Prior art keywords
multilayer structure
photo patternable
patternable
photo
multilayer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3889448T
Other languages
English (en)
Other versions
DE3889448D1 (de
Inventor
Paul Grandmont
Harold Lake
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Schneider Electric Systems USA Inc
Original Assignee
Foxboro Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Foxboro Co filed Critical Foxboro Co
Publication of DE3889448D1 publication Critical patent/DE3889448D1/de
Application granted granted Critical
Publication of DE3889448T2 publication Critical patent/DE3889448T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0952—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer comprising silver halide or silver salt based image forming systems, e.g. for camera speed exposure
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/01—Tools for processing; Objects used during processing
    • H05K2203/0195—Tool for a process not provided for in H05K3/00, e.g. tool for handling objects using suction, for deforming objects, for applying local pressure
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0502—Patterning and lithography
    • H05K2203/0505—Double exposure of the same photosensitive layer
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0548—Masks
    • H05K2203/0551—Exposure mask directly printed on the PCB
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/10—Using electric, magnetic and electromagnetic fields; Using laser light
    • H05K2203/107—Using laser light
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061—Etching masks
    • H05K3/064—Photoresists
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/108—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by semi-additive methods; masks therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE3889448T 1987-01-22 1988-01-19 Photomusterbare Mehrschichtstruktur. Expired - Fee Related DE3889448T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US662487A 1987-01-22 1987-01-22
PCT/US1988/000112 WO1988005559A1 (en) 1987-01-22 1988-01-19 Method of patterning resist

Publications (2)

Publication Number Publication Date
DE3889448D1 DE3889448D1 (de) 1994-06-09
DE3889448T2 true DE3889448T2 (de) 1994-09-29

Family

ID=21721799

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3889448T Expired - Fee Related DE3889448T2 (de) 1987-01-22 1988-01-19 Photomusterbare Mehrschichtstruktur.

Country Status (7)

Country Link
EP (1) EP0346355B1 (de)
JP (1) JPH02502675A (de)
KR (1) KR960007619B1 (de)
AU (1) AU615430B2 (de)
DE (1) DE3889448T2 (de)
DK (1) DK523988A (de)
WO (1) WO1988005559A1 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05257227A (ja) * 1991-03-22 1993-10-08 Canon Inc 熱現像性感光体

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB462286A (en) * 1934-11-23 1937-03-04 Paper Patents Co Improvement in methods of stripping and transferring photographic films
DE1298415B (de) * 1962-10-29 1969-06-26 Eastman Kodak Co Verfahren zur UEbertragung von Bildern
GB1187980A (en) * 1966-10-28 1970-04-15 Ilford Ltd Presensitised Lithographic Plates.
US3578451A (en) * 1967-03-29 1971-05-11 Scott Paper Co Integral negative type positive photolithographic plate
US3511657A (en) * 1967-05-10 1970-05-12 Eastman Kodak Co Method of stripping gelatin emulsions from polyester supports
US3607346A (en) * 1969-04-21 1971-09-21 Eastman Kodak Co Layers method of wet transferring unexposed photographic emulsion
AT326703B (de) * 1971-10-07 1975-12-29 Zimmer Peter Verfahren zur herstellung von druckformen
BE794090A (fr) * 1972-01-17 1973-07-16 Minnesota Mining & Mfg Feuille de reproduction a sec a l'argent activee par la chaleur
AT333795B (de) * 1972-10-04 1976-12-10 Zimmer Peter Verfahren zur herstellung von druckformen
US3867150A (en) * 1973-06-08 1975-02-18 Grace W R & Co Printing plate process and apparatus using a laser scanned silver negative
US4168980A (en) * 1977-08-19 1979-09-25 Eastman Kodak Company Heat developable photographic material and process
US4226927A (en) * 1978-05-10 1980-10-07 Minnesota Mining And Manufacturing Company Photographic speed transfer element with oxidized polyethylene stripping layer
JPS5550246A (en) * 1978-10-05 1980-04-11 Fuji Photo Film Co Ltd Photosensitive lithographic printing plate material
JPS5550241A (en) * 1978-10-05 1980-04-11 Fuji Photo Film Co Ltd Photosensitive lithographic printing plate material
JPS5625739A (en) * 1979-08-07 1981-03-12 Fuji Photo Film Co Ltd Preparation of printing plate
JPS5650330A (en) * 1979-10-02 1981-05-07 Fuji Photo Film Co Ltd Photosensitive lithographic plate and its plate making method
JPS5660442A (en) * 1979-10-23 1981-05-25 Fuji Photo Film Co Ltd Photosensitive lithographic plate and method for making lithographic plate
US4409316A (en) * 1982-02-26 1983-10-11 Minnesota Mining And Manufacturing Company Resistively heatable photothermographic element with strippable layer
JPS5965838A (ja) * 1982-10-07 1984-04-14 Dainippon Screen Mfg Co Ltd 多層構造を有する感材およびその製版方法
US4515877A (en) * 1982-11-27 1985-05-07 Basf Aktiengesellschaft Image-recording materials and image-recording carried out using these to produce an optical mask
DE3509747A1 (de) * 1985-03-18 1986-09-18 Heilig & Schwab GmbH, 6553 Sobernheim Verfahren und einrichtung zum exakten punkt- oder linienfoermigen veraendern der chemisch/physikalischen eigenschaften einer strahlungsempfindlichen schicht
US4666818A (en) * 1985-06-10 1987-05-19 The Foxboro Company Method of patterning resist for printed wiring board
AU612563B2 (en) * 1986-12-17 1991-07-18 Foxboro Company, The Method of patterning resist for printed wiring board

Also Published As

Publication number Publication date
KR960007619B1 (ko) 1996-06-07
AU1246188A (en) 1988-08-10
EP0346355B1 (de) 1994-05-04
DE3889448D1 (de) 1994-06-09
DK523988A (da) 1988-11-21
WO1988005559A1 (en) 1988-07-28
EP0346355A4 (en) 1991-04-24
DK523988D0 (da) 1988-09-21
AU615430B2 (en) 1991-10-03
KR890700854A (ko) 1989-04-27
EP0346355A1 (de) 1989-12-20
JPH02502675A (ja) 1990-08-23

Similar Documents

Publication Publication Date Title
DE3869349D1 (de) Gasundurchlaessige transparente mehrschichtstruktur.
DE3851836T2 (de) Reflektierender film.
DE3768027D1 (de) Mehrschichtige gegenstaende.
DE3781347D1 (de) Abziehbare mehrschichtfolie.
DE3881843D1 (de) Orientierte polyaethylenfolie.
DE3772880D1 (de) Mehrschichtiges dokument.
DE3850342D1 (de) Büchlein mit Lichtbild.
DE3884240D1 (de) Schrumpfbarer Mehrschichtfilm.
DE3787620T2 (de) Mehrschichtstrukturen.
DE3852924T2 (de) Büchlein mit Lichtbild.
DE3860349D1 (de) Aufgestaeubte titanoxynitrid-filme.
DE3885299D1 (de) Photographisches vergrösserungsgerät.
DE3888641T2 (de) Schichtkondensator.
ATE117874T1 (de) Molluskizide.
FI875122A (fi) Lyofiliserad eller utfaelld kefalosporinzwitterjon- och saltkomposition.
NO892816D0 (no) Flerlagstruktur.
DE3875211T2 (de) Hintergrundbezugnahme.
NO884924D0 (no) Alarmsentral.
DE3889448D1 (de) Photomusterbare Mehrschichtstruktur.
DE3886659D1 (de) Coextrudierte Strukturen.
FI874035A (fi) Pressvals foer pappersmaskin eller liknande.
FI870670A0 (fi) Propellerdrivararrangemang foer fartyg eller motsvarande.
FI871738A0 (fi) Anordning foer skydd mot straolning fraon tv- eller databildskaerm.
FI875434A0 (fi) Mot skaerskador skyddande handske foer koettstyckare.
FI873756A0 (fi) Anordning foer underlaettad biltvaett.

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee