DE3873892D1 - DEVICE FOR ELECTROLYTIC METAL DEPOSITION AND METHOD FOR USE THEREOF. - Google Patents

DEVICE FOR ELECTROLYTIC METAL DEPOSITION AND METHOD FOR USE THEREOF.

Info

Publication number
DE3873892D1
DE3873892D1 DE8888870180T DE3873892T DE3873892D1 DE 3873892 D1 DE3873892 D1 DE 3873892D1 DE 8888870180 T DE8888870180 T DE 8888870180T DE 3873892 T DE3873892 T DE 3873892T DE 3873892 D1 DE3873892 D1 DE 3873892D1
Authority
DE
Germany
Prior art keywords
proportion
metal deposition
electrically conductive
electrolytic metal
conductive members
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8888870180T
Other languages
German (de)
Inventor
Marios Economopoulos
Robert Pirlet
Roger Franssen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centre de Recherches Metallurgiques CRM ASBL
Original Assignee
Centre de Recherches Metallurgiques CRM ASBL
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre de Recherches Metallurgiques CRM ASBL filed Critical Centre de Recherches Metallurgiques CRM ASBL
Application granted granted Critical
Publication of DE3873892D1 publication Critical patent/DE3873892D1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
    • C25D5/611—Smooth layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/623—Porosity of the layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electrolytic Production Of Metals (AREA)

Abstract

The device comprises a wall consisting of a plurality of electrically conductive members (15) separated by electrically insulating members (16). A proportion of the slots (5) for feeding electrolyte are situated in the electrically conductive members, while a proportion of the slots (6) for removing the electrolyte are situated in the electrically insulating members. At least a proportion of the electrically conductive members are connected to a terminal of a source of direct current (14), the other terminal of the source of direct current being connected to the substrate (2). The height of the electrolysis gap (11) may vary periodically. <IMAGE>
DE8888870180T 1987-12-11 1988-12-06 DEVICE FOR ELECTROLYTIC METAL DEPOSITION AND METHOD FOR USE THEREOF. Expired - Lifetime DE3873892D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
BE8701421A BE1001295A6 (en) 1987-12-11 1987-12-11 Device for electrolytic deposit of metal and method of use.

Publications (1)

Publication Number Publication Date
DE3873892D1 true DE3873892D1 (en) 1992-09-24

Family

ID=3883012

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8888870180T Expired - Lifetime DE3873892D1 (en) 1987-12-11 1988-12-06 DEVICE FOR ELECTROLYTIC METAL DEPOSITION AND METHOD FOR USE THEREOF.

Country Status (4)

Country Link
EP (1) EP0320482B1 (en)
AT (1) ATE79655T1 (en)
BE (1) BE1001295A6 (en)
DE (1) DE3873892D1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4121032A1 (en) * 1991-06-26 1993-01-07 Schmid Gmbh & Co Geb DEVICE FOR TREATING PLATE-SHAPED OBJECTS, IN PARTICULAR BOARDS

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2619821A1 (en) * 1976-05-05 1977-11-17 Hoechst Ag METHOD AND DEVICE FOR CONTINUOUS ELECTROLYTIC TREATMENT OF A METAL STRIP
BE905588A (en) * 1986-10-09 1987-04-09 Centre Rech Metallurgique Enhancing electrolytic deposition of metallic materials on substrates - with promotion of turbulence to permit use of higher current densities, useful for products and very thin coatings

Also Published As

Publication number Publication date
EP0320482A1 (en) 1989-06-14
BE1001295A6 (en) 1989-09-19
ATE79655T1 (en) 1992-09-15
EP0320482B1 (en) 1992-08-19

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Legal Events

Date Code Title Description
8332 No legal effect for de