DE3855073D1 - Verfahren zur Herstellung von feinsten Metallfilmen und feinsten Metallbildern - Google Patents
Verfahren zur Herstellung von feinsten Metallfilmen und feinsten MetallbildernInfo
- Publication number
- DE3855073D1 DE3855073D1 DE3855073T DE3855073T DE3855073D1 DE 3855073 D1 DE3855073 D1 DE 3855073D1 DE 3855073 T DE3855073 T DE 3855073T DE 3855073 T DE3855073 T DE 3855073T DE 3855073 D1 DE3855073 D1 DE 3855073D1
- Authority
- DE
- Germany
- Prior art keywords
- finest metal
- production
- finest
- images
- films
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/265—Selective reaction with inorganic or organometallic reagents after image-wise exposure, e.g. silylation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Composite Materials (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Materials Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Formation Of Insulating Films (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Electrodes Of Semiconductors (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32310387A JPH0781189B2 (ja) | 1987-12-21 | 1987-12-21 | 金属超薄膜の製造方法およびパターン形成方法 |
JP63243008A JPH0756867B2 (ja) | 1988-09-28 | 1988-09-28 | 金属超薄膜およびその製造法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3855073D1 true DE3855073D1 (de) | 1996-04-11 |
DE3855073T2 DE3855073T2 (de) | 1996-10-02 |
Family
ID=26536034
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE3855073T Expired - Fee Related DE3855073T2 (de) | 1987-12-21 | 1988-12-21 | Verfahren zur Herstellung von feinsten Metallfilmen und feinsten Metallbildern |
Country Status (3)
Country | Link |
---|---|
US (1) | US4996075A (de) |
EP (1) | EP0322233B1 (de) |
DE (1) | DE3855073T2 (de) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5389496A (en) * | 1987-03-06 | 1995-02-14 | Rohm And Haas Company | Processes and compositions for electroless metallization |
US5057339A (en) * | 1988-12-29 | 1991-10-15 | Matsushita Electric Industrial Co., Ltd. | Metallized polyacetylene-type or polyacene-type ultralong conjugated polymers and process for producing the same |
EP0773477B1 (de) * | 1990-09-21 | 2001-05-30 | Dai Nippon Printing Co., Ltd. | Verfahren zur Herstellung einer Phasenschieber-Fotomaske |
JPH05226833A (ja) * | 1992-02-17 | 1993-09-03 | Toshiba Corp | 配線板の製造方法 |
TW280837B (de) | 1992-06-29 | 1996-07-11 | Philips Electronics Nv | |
US5273788A (en) * | 1992-07-20 | 1993-12-28 | The University Of Utah | Preparation of diamond and diamond-like thin films |
US5352485A (en) * | 1993-04-08 | 1994-10-04 | Case Western Reserve University | Synthesis of metal oxide thin films |
BE1007610A3 (nl) | 1993-10-11 | 1995-08-22 | Philips Electronics Nv | Werkwijze voor het stroomloos aanbrengen van een metaalpatroon op een elektrisch isolerend substraat. |
US20020079487A1 (en) * | 2000-10-12 | 2002-06-27 | G. Ramanath | Diffusion barriers comprising a self-assembled monolayer |
US7229847B2 (en) * | 2002-03-15 | 2007-06-12 | Lucent Technologies Inc. | Forming electrical contacts to a molecular layer |
US7026716B2 (en) * | 2003-06-06 | 2006-04-11 | Rensselaer Polytechnic Institute | Self-assembled sub-nanolayers as interfacial adhesion enhancers and diffusion barriers |
EP1693484A3 (de) * | 2005-02-15 | 2007-06-20 | Rohm and Haas Electronic Materials, L.L.C. | Plattierungsverfahren |
KR100942506B1 (ko) * | 2007-12-11 | 2010-02-12 | 한국식품연구원 | 광학적 특성을 이용한 분석용 센서를 위한 기판 제조 방법및 그 기판 |
KR20100091663A (ko) * | 2009-02-11 | 2010-08-19 | 삼성전자주식회사 | 표면개질제, 이를 사용하여 제조된 적층 구조, 그 구조의 제조방법 및 이를 포함하는 트랜지스터 |
US8536056B2 (en) * | 2011-08-22 | 2013-09-17 | Nanya Technology Corporation | Method of forming conductive pattern |
EP2644744A1 (de) | 2012-03-29 | 2013-10-02 | Atotech Deutschland GmbH | Verfahren zur Förderung der Haftung zwischen dielektrischen Substraten und Metallschichten |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1582860A (en) * | 1977-02-23 | 1981-01-14 | Ici Ltd | Device |
US4539061A (en) * | 1983-09-07 | 1985-09-03 | Yeda Research And Development Co., Ltd. | Process for the production of built-up films by the stepwise adsorption of individual monolayers |
-
1988
- 1988-12-21 EP EP88312156A patent/EP0322233B1/de not_active Expired - Lifetime
- 1988-12-21 US US07/287,090 patent/US4996075A/en not_active Expired - Lifetime
- 1988-12-21 DE DE3855073T patent/DE3855073T2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0322233A3 (en) | 1990-07-18 |
EP0322233B1 (de) | 1996-03-06 |
EP0322233A2 (de) | 1989-06-28 |
US4996075A (en) | 1991-02-26 |
DE3855073T2 (de) | 1996-10-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8320 | Willingness to grant licences declared (paragraph 23) | ||
8339 | Ceased/non-payment of the annual fee |