DE3822502C1 - - Google Patents

Info

Publication number
DE3822502C1
DE3822502C1 DE3822502A DE3822502A DE3822502C1 DE 3822502 C1 DE3822502 C1 DE 3822502C1 DE 3822502 A DE3822502 A DE 3822502A DE 3822502 A DE3822502 A DE 3822502A DE 3822502 C1 DE3822502 C1 DE 3822502C1
Authority
DE
Germany
Prior art keywords
layers
temperature
substrate
substrate surface
mbar
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE3822502A
Other languages
German (de)
English (en)
Inventor
Joachim Dipl.-Phys. Dr. 5068 Odental De Froehlingsdorf
Wilhelm-Mathias 5170 Juelich De Zander
Ulrich Dipl.-Phys. Dr. 5000 Koeln De Poppe
Bernd Prof. Dr. 5172 Linnich De Stritzker
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Forschungszentrum Juelich GmbH
Original Assignee
Kernforschungsanlage Juelich GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kernforschungsanlage Juelich GmbH filed Critical Kernforschungsanlage Juelich GmbH
Priority to DE3822502A priority Critical patent/DE3822502C1/de
Priority to EP19890111892 priority patent/EP0349910A3/de
Priority to JP1171759A priority patent/JPH0288409A/ja
Application granted granted Critical
Publication of DE3822502C1 publication Critical patent/DE3822502C1/de
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/087—Oxides of copper or solid solutions thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5806—Thermal treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5846—Reactive treatment
    • C23C14/5853—Oxidation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0521—Processes for depositing or forming copper oxide superconductor layers by pulsed laser deposition, e.g. laser sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Thermal Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Physical Vapour Deposition (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
DE3822502A 1988-07-03 1988-07-03 Expired DE3822502C1 (US07902200-20110308-C00004.png)

Priority Applications (3)

Application Number Priority Date Filing Date Title
DE3822502A DE3822502C1 (US07902200-20110308-C00004.png) 1988-07-03 1988-07-03
EP19890111892 EP0349910A3 (de) 1988-07-03 1989-06-30 Verfahren zur Herstellung dünner Schichten aus oxidischem Hochtemperatur-Supraleiter
JP1171759A JPH0288409A (ja) 1988-07-03 1989-07-03 酸化物系高温超電導体より成る薄い層の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE3822502A DE3822502C1 (US07902200-20110308-C00004.png) 1988-07-03 1988-07-03

Publications (1)

Publication Number Publication Date
DE3822502C1 true DE3822502C1 (US07902200-20110308-C00004.png) 1989-08-24

Family

ID=6357868

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3822502A Expired DE3822502C1 (US07902200-20110308-C00004.png) 1988-07-03 1988-07-03

Country Status (3)

Country Link
EP (1) EP0349910A3 (US07902200-20110308-C00004.png)
JP (1) JPH0288409A (US07902200-20110308-C00004.png)
DE (1) DE3822502C1 (US07902200-20110308-C00004.png)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3914476C1 (US07902200-20110308-C00004.png) * 1989-05-02 1990-06-21 Forschungszentrum Juelich Gmbh, 5170 Juelich, De
WO1993018200A1 (en) * 1992-03-13 1993-09-16 E.I. Du Pont De Nemours And Company Process for producing thin films of inorganic oxides of controlled stoichiometry
DE4210613A1 (de) * 1992-03-31 1993-10-07 Siemens Ag Einrichtung zur Beschichtung eines Substrates mit einem metalloxidischen Hoch-T¶c¶-Supraleitermaterial
DE4321817A1 (de) * 1993-07-01 1995-01-12 Forschungszentrum Juelich Gmbh Verfahren zur Herstellung eines Schichtsystems mit wenigstens einer Schicht aus einem metalloxidischen supraleitenden Material

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04104903A (ja) * 1990-08-21 1992-04-07 Kokusai Chodendo Sangyo Gijutsu Kenkyu Center 酸化物高温超電導薄膜の製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3816192A1 (de) * 1988-05-11 1989-11-23 Siemens Ag Verfahren zur herstellung einer schicht aus einem metalloxidischen supraleitermaterial mittels laser-verdampfens

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3816192A1 (de) * 1988-05-11 1989-11-23 Siemens Ag Verfahren zur herstellung einer schicht aus einem metalloxidischen supraleitermaterial mittels laser-verdampfens

Non-Patent Citations (5)

* Cited by examiner, † Cited by third party
Title
Appl. Physics Letters, 51, 1987, 8, S. 619-621 *
Solid State Comm. Vol. 66, 1988, Nr. 6, S.661-665 *
US-Z: Appl.Phys.Lett., 53, 17.10.88, S. 1557-1559, Abstr. auf S. 1557 *
US-Z: Appl.Phys.Lett., Vol. 51, Nr. 26, Dez. 1987, S. 2263-2265 *
US-Z: Appl.Phys.Lett., Vol. 52, Nr. 9, Febr. 1988, S. 754-756 *

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3914476C1 (US07902200-20110308-C00004.png) * 1989-05-02 1990-06-21 Forschungszentrum Juelich Gmbh, 5170 Juelich, De
WO1993018200A1 (en) * 1992-03-13 1993-09-16 E.I. Du Pont De Nemours And Company Process for producing thin films of inorganic oxides of controlled stoichiometry
DE4210613A1 (de) * 1992-03-31 1993-10-07 Siemens Ag Einrichtung zur Beschichtung eines Substrates mit einem metalloxidischen Hoch-T¶c¶-Supraleitermaterial
DE4321817A1 (de) * 1993-07-01 1995-01-12 Forschungszentrum Juelich Gmbh Verfahren zur Herstellung eines Schichtsystems mit wenigstens einer Schicht aus einem metalloxidischen supraleitenden Material

Also Published As

Publication number Publication date
EP0349910A3 (de) 1990-09-26
JPH0288409A (ja) 1990-03-28
EP0349910A2 (de) 1990-01-10

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Legal Events

Date Code Title Description
8100 Publication of patent without earlier publication of application
D1 Grant (no unexamined application published) patent law 81
8363 Opposition against the patent
8327 Change in the person/name/address of the patent owner

Owner name: FORSCHUNGSZENTRUM JUELICH GMBH, 5170 JUELICH, DE

8331 Complete revocation