DE3776980D1 - Verfahren zur herstellung von feinstrukturen. - Google Patents
Verfahren zur herstellung von feinstrukturen.Info
- Publication number
- DE3776980D1 DE3776980D1 DE8787108637T DE3776980T DE3776980D1 DE 3776980 D1 DE3776980 D1 DE 3776980D1 DE 8787108637 T DE8787108637 T DE 8787108637T DE 3776980 T DE3776980 T DE 3776980T DE 3776980 D1 DE3776980 D1 DE 3776980D1
- Authority
- DE
- Germany
- Prior art keywords
- producing fine
- fine structures
- structures
- producing
- fine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/34—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies not provided for in groups H01L21/0405, H01L21/0445, H01L21/06, H01L21/16 and H01L21/18 with or without impurities, e.g. doping materials
- H01L21/42—Bombardment with radiation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Toxicology (AREA)
- Structural Engineering (AREA)
- Health & Medical Sciences (AREA)
- Architecture (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14284086A JPS62299836A (ja) | 1986-06-20 | 1986-06-20 | 微細パタ−ン形成方法 |
JP14284186A JPS62299960A (ja) | 1986-06-20 | 1986-06-20 | パタ−ン形成方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3776980D1 true DE3776980D1 (de) | 1992-04-09 |
Family
ID=26474721
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8787108637T Expired - Lifetime DE3776980D1 (de) | 1986-06-20 | 1987-06-16 | Verfahren zur herstellung von feinstrukturen. |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0249941B1 (de) |
KR (1) | KR880001040A (de) |
DE (1) | DE3776980D1 (de) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0293704A3 (de) * | 1987-06-01 | 1989-02-15 | Hoechst Celanese Corporation | Aufzeichnungsmaterial mit einer wasserlöslichen Kontrastverstärkungsschicht |
EP0318324A3 (de) * | 1987-11-27 | 1990-05-23 | Tosoh Corporation | Lichtempfindliche Kunststoffzusammensetzung und Verfahren zur Herstellung von Feinstrukturen |
CA1320388C (en) * | 1988-05-18 | 1993-07-20 | Masanao Isono | Printing plate |
US5290666A (en) * | 1988-08-01 | 1994-03-01 | Hitachi, Ltd. | Method of forming a positive photoresist pattern utilizing contrast enhancement overlayer containing trifluoromethanesulfonic, methanesulfonic or trifluoromethaneacetic aromatic diazonium salt |
JP2768692B2 (ja) * | 1988-08-01 | 1998-06-25 | 株式会社日立製作所 | 感放射線組成物及びパターン形成方法 |
US5178989A (en) * | 1989-07-21 | 1993-01-12 | Board Of Regents, The University Of Texas System | Pattern forming and transferring processes |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB818911A (en) * | 1954-09-15 | 1959-08-26 | Ozalid Co Ltd | Improvements in or relating to diazotype materials |
JPS5810736A (ja) * | 1981-07-14 | 1983-01-21 | Ricoh Co Ltd | ジアゾ複写材料 |
-
1987
- 1987-06-16 DE DE8787108637T patent/DE3776980D1/de not_active Expired - Lifetime
- 1987-06-16 EP EP87108637A patent/EP0249941B1/de not_active Expired - Lifetime
- 1987-06-20 KR KR1019870006262A patent/KR880001040A/ko not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
EP0249941B1 (de) | 1992-03-04 |
EP0249941A3 (en) | 1988-05-04 |
EP0249941A2 (de) | 1987-12-23 |
KR880001040A (ko) | 1988-03-31 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8380 | Miscellaneous part iii |
Free format text: DER PATENTINHABER LAUTET RICHTIG: TOSOH CORP., SHINNANYO, YAMAGUCHI, JP |
|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |