DE3776730D1 - Feuchtwasser und anwendung bei druckverfahren. - Google Patents

Feuchtwasser und anwendung bei druckverfahren.

Info

Publication number
DE3776730D1
DE3776730D1 DE8787305517T DE3776730T DE3776730D1 DE 3776730 D1 DE3776730 D1 DE 3776730D1 DE 8787305517 T DE8787305517 T DE 8787305517T DE 3776730 T DE3776730 T DE 3776730T DE 3776730 D1 DE3776730 D1 DE 3776730D1
Authority
DE
Germany
Prior art keywords
application
printing processes
damping water
surfactant
fountain solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8787305517T
Other languages
German (de)
English (en)
Inventor
Robert Bassemir
Ramasamy Krishnan
Arthur Lowell
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sequa Corp
Sun Chemical Corp
Original Assignee
Sun Chemical Corp
Sun Chemical Corp New York
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=25377830&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE3776730(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Sun Chemical Corp, Sun Chemical Corp New York filed Critical Sun Chemical Corp
Application granted granted Critical
Publication of DE3776730D1 publication Critical patent/DE3776730D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N3/00Preparing for use and conserving printing surfaces
    • B41N3/08Damping; Neutralising or similar differentiation treatments for lithographic printing formes; Gumming or finishing solutions, fountain solutions, correction or deletion fluids, or on-press development

Landscapes

  • Printing Plates And Materials Therefor (AREA)
  • Table Devices Or Equipment (AREA)
  • Inorganic Insulating Materials (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Pens And Brushes (AREA)
DE8787305517T 1986-07-02 1987-06-22 Feuchtwasser und anwendung bei druckverfahren. Expired - Lifetime DE3776730D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US88112386A 1986-07-02 1986-07-02

Publications (1)

Publication Number Publication Date
DE3776730D1 true DE3776730D1 (de) 1992-03-26

Family

ID=25377830

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8787305517T Expired - Lifetime DE3776730D1 (de) 1986-07-02 1987-06-22 Feuchtwasser und anwendung bei druckverfahren.

Country Status (6)

Country Link
EP (1) EP0251621B2 (ja)
JP (1) JPS6325093A (ja)
AT (1) ATE72637T1 (ja)
CA (1) CA1305296C (ja)
DE (1) DE3776730D1 (ja)
FI (1) FI88901C (ja)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3830467A1 (de) * 1988-09-08 1990-03-15 Hoechst Ag Feuchtmittel fuer den offsetdruck
JP2761596B2 (ja) * 1989-09-05 1998-06-04 富士写真フイルム株式会社 平版印刷用湿し水組成物
JP2808133B2 (ja) * 1989-05-12 1998-10-08 富士写真フイルム株式会社 平版印刷版用版面保護剤
JP2673585B2 (ja) * 1989-08-01 1997-11-05 富士写真フイルム株式会社 平版印刷用濃縮湿し水
JP2673586B2 (ja) * 1989-08-02 1997-11-05 富士写真フイルム株式会社 平版印刷版用湿し水組成物,それに使用する濃縮液及びそれを使用する平版印刷方法
EP0516372B1 (en) * 1991-05-29 1996-04-24 Fuji Photo Film Co., Ltd. Concentrated dampening water composition for lithographic printing
DE4220550A1 (de) * 1991-07-04 1993-01-14 Hostmann Steinberg Gmbh Feuchtmittelkonzentrat und feuchtmittel und deren verwendung beim offset-druckverfahren
CA2071442C (en) * 1991-07-04 1994-09-06 Fritz Laufs Damping-solution concentrate and damping solution and use thereof in the offset printing process
US7097705B2 (en) * 2000-09-11 2006-08-29 Air Products And Chemicals, Inc. Cationic-anionic blends for dynamic surface tension reduction
US6488754B2 (en) 2000-11-29 2002-12-03 Grain Processing Corporation Lithographic dampening solution and method for dampening a lithographic plate
EP1696268B1 (en) * 2005-02-28 2016-11-09 FUJIFILM Corporation Lithographic printing plate precursor
JP5272385B2 (ja) * 2007-11-27 2013-08-28 Dic株式会社 平版印刷用湿し水濃縮組成物
JP5288268B2 (ja) * 2009-03-25 2013-09-11 富士フイルム株式会社 平版印刷用湿し水組成物及びヒートセットオフ輪印刷方法
EP3296367B1 (en) 2011-09-23 2020-10-14 Sun Chemical Corporation Additives to litho inks to eliminate ink feedback
EP3960480A1 (de) * 2020-09-01 2022-03-02 Heidelberger Druckmaschinen AG Verringerung des picture framings in offset-druckverfahren durch zusatz wenigstens eines anorganischen additivs zum feuchtmittel

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3669660A (en) * 1970-05-21 1972-06-13 Polychrome Corp Lithographic plate developing composition and process of use thereof
GB2036993B (en) * 1978-02-06 1983-03-09 Napp Systems Inc Desensitizing solution and process for treating a diazo photosensitive printing plate
US4213887A (en) * 1979-07-16 1980-07-22 American Hoechst Corporation Lithographic plate finisher
US4560410A (en) * 1981-05-18 1985-12-24 Union Carbide Corporation Fountain solutions suitable for use in lithographic offset printing
JPS60147395A (ja) * 1984-01-12 1985-08-03 Fuji Photo Film Co Ltd 平版印刷版用版面洗浄剤

Also Published As

Publication number Publication date
FI872905A0 (fi) 1987-07-01
EP0251621A2 (en) 1988-01-07
EP0251621B1 (en) 1992-02-19
ATE72637T1 (de) 1992-03-15
JPS6325093A (ja) 1988-02-02
EP0251621B2 (en) 1996-04-03
FI88901C (fi) 1993-07-26
CA1305296C (en) 1992-07-21
FI872905A (fi) 1988-01-03
EP0251621A3 (en) 1988-03-09
FI88901B (fi) 1993-04-15

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Legal Events

Date Code Title Description
8363 Opposition against the patent
8366 Restricted maintained after opposition proceedings
8339 Ceased/non-payment of the annual fee