DE3740381A1 - ETCHING PROCESS FOR NICKEL - Google Patents

ETCHING PROCESS FOR NICKEL

Info

Publication number
DE3740381A1
DE3740381A1 DE19873740381 DE3740381A DE3740381A1 DE 3740381 A1 DE3740381 A1 DE 3740381A1 DE 19873740381 DE19873740381 DE 19873740381 DE 3740381 A DE3740381 A DE 3740381A DE 3740381 A1 DE3740381 A1 DE 3740381A1
Authority
DE
Germany
Prior art keywords
nickel
etching
fecl
ink
addition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19873740381
Other languages
German (de)
Inventor
Eva Bauersachs
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Priority to DE19873740381 priority Critical patent/DE3740381A1/en
Priority to PCT/DE1988/000650 priority patent/WO1989004883A1/en
Publication of DE3740381A1 publication Critical patent/DE3740381A1/en
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C23F1/28—Acidic compositions for etching iron group metals

Abstract

The invention concerns a process for etching nickel structures or surfaces, in particular perforations in nickel sheet, which can be used for example to manufacture nickel etching molds for printing heads of an ink-jet printer. The etching material used is a highly concentrated iron (III) chloride etching solution without the addition of acids. The invention also concerns a printing head for ink-jet printers.

Description

Die Erfindung betrifft ein Verfahren zum Nickelätzen von Strukturen oder Oberflächen, insbesondere von Durchbrüchen in Nickelblechen, z. B. zur Herstellung von Nickelform­ ätzteilen für Druckköpfe eines Tintenstrahldruckers.The invention relates to a method for nickel etching Structures or surfaces, especially breakthroughs in nickel sheets, e.g. B. for the production of nickel form etched parts for printheads of an inkjet printer.

Für Tintenstrahldrucker ist ein Druckkopf bekannt, dessen Tintenkammern und -kanäle aus zusammengeschichteten Metall­ folien bestehen.A printhead is known for ink jet printers Laminated metal ink chambers and channels foils exist.

Bisher werden hierfür Bleche aus Neusilber oder Chromnickel­ stahl verwendet, die ätztechnisch hergestellt wurden. Wegen wesentlich besserer Korrosions- und Schweißeigenschaften sollen diese Bleche jetzt in Nickel geätzt werden. Die bis­ her bekannten Ätzmittel sind für Nickel nicht gut geeignet, da sie sehr rauhe Kanten mit Rauhtiefen <4 µm erzeugen.So far, sheets of nickel silver or chrome nickel have been used for this steel that has been manufactured using etching technology. Because of much better corrosion and welding properties these sheets are now to be etched in nickel. The up known etchants are not well suited for nickel, because they produce very rough edges with roughness depths <4 µm.

Der Erfindung liegt die Aufgabe zugrunde, das eingangs genannte Verfahren zu konzipieren, das Lochfraß und stark aufgerauhte Ätzflächen vermeidet, eine ausreichend hohe Ätzgeschwindigkeit gewährleistet und sehr glatte Kanten erzeugt.The invention is based on the problem, the beginning to design the procedure mentioned, the pitting and strong roughened etched surfaces avoids a sufficiently high Etching speed guaranteed and very smooth edges generated.

Diese Aufgabe wird nach dem Kennzeichen des Hauptanspruchs gelöst. Vorteilhafte Ausführungsformen und Weiterbildungen der Erfindung sind in den Unteransprüchen enthalten.This task is based on the hallmark of the main claim solved. Advantageous embodiments and further developments the invention are contained in the subclaims.

Der wesentliche Vorteil des erfindungsgemäßen Verfahrens besteht darin, daß die geätzten Kanten und Flächen glatt sind. Die mittlere erzielte Rauhigkeit liegt bei 0.56 µm. Bei der Verwendung von derartigen Blechen für Tintenstrahl­ drucker wirkt sich das sehr positiv auf den Tintenfluß aus. The main advantage of the method according to the invention is that the etched edges and surfaces are smooth are. The average roughness achieved is 0.56 µm. When using such sheets for inkjet printer has a very positive effect on the ink flow.  

Bei dem Ätzverfahren nach der Erfindung wird mit einer Ei­ sen-III-chloridätzlösung zwischen 1200 g/l FeCl3×6 H2O und 1450 g FeCl3×6 H2O/l gearbeitet. Die Grenzkonzentra­ tion nach oben ist Sättigung bei noch vertretbaren Lager­ temperaturen - in unserem Fall 28°C. Aus technischen Grün­ den ist es deshalb nicht empfehlenswert, mit noch höheren Konzentrationen zu ätzen. Die untere Grenzkonzentration ist erreicht, wenn ein Belag auf der Nickeloberfläche auftritt.In the etching process according to the invention, an iron III chloride etching solution between 1200 g / l FeCl 3 × 6 H 2 O and 1450 g FeCl 3 × 6 H 2 O / l is used. The upper limit concentration is saturation at acceptable storage temperatures - in our case 28 ° C. For technical reasons, it is therefore not advisable to etch with even higher concentrations. The lower limit concentration is reached when a deposit appears on the nickel surface.

AusführungsbeispielEmbodiment

Vorzugsweise wird mit einer Lösung, die ca. 1300 bis 1400 g FeCl3×6 H2O/l enthält, geätzt.Etching is preferably carried out with a solution which contains approx. 1300 to 1400 g FeCl 3 × 6 H 2 O / l.

Eine Temperaturerhöhung bewirkt Beschleunigung des Ätzpro­ zesses. Vorzugsweise wird bei 55°C gearbeitet. Diese Tempe­ ratur macht den Einsatz einer handelsüblichen Leiterplatten­ ätzmaschine (PVC) möglich.An increase in temperature accelerates the etching process zesses. It is preferred to work at 55 ° C. This tempe ratur makes use of commercially available printed circuit boards etching machine (PVC) possible.

Claims (3)

1. Verfahren zum Nickelätzen von Strukturen oder Ober­ flächen, insbesondere von Durchbrüchen in Nickelblechen, z. B. zur Herstellung von Nickelformätzteilen für Druck­ köpfe eines Tintenstrahldruckers, dadurch gekenn­ zeichnet, daß mit einer hochkonzentrierten Eisen-III-chloridätzlösung ohne Zusatz von Säuren geätzt wird.1. Method for nickel etching of structures or surfaces, in particular of openings in nickel sheets, for. B. for the production of nickel molded parts for print heads of an inkjet printer, characterized in that is etched with a highly concentrated iron III chloride etching solution without the addition of acids. 2. Verfahren nach Anspruch 1, dadurch gekenn­ zeichnet, daß eine Eisen-III-chloridätzlösung verwendet wird, die zwischen 1200 g/l FeCl3×6 H2O und 1450 g FeCl3×6 H2O/l ohne Zusatz von Säure arbeitet.2. The method according to claim 1, characterized in that an iron III chloride etching solution is used, the between 1200 g / l FeCl 3 × 6 H 2 O and 1450 g FeCl 3 × 6 H 2 O / l without the addition of acid is working. 3. Verfahren nach Anspruch 1 und 2, dadurch gekenn­ zeichnet, daß der Ätzvorgang zwischen 28 und 60°C vor sich geht.3. The method according to claim 1 and 2, characterized records that the etching between 28 and 60 ° C. is going on.
DE19873740381 1987-11-27 1987-11-27 ETCHING PROCESS FOR NICKEL Withdrawn DE3740381A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
DE19873740381 DE3740381A1 (en) 1987-11-27 1987-11-27 ETCHING PROCESS FOR NICKEL
PCT/DE1988/000650 WO1989004883A1 (en) 1987-11-27 1988-10-24 Process for etching nickel

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19873740381 DE3740381A1 (en) 1987-11-27 1987-11-27 ETCHING PROCESS FOR NICKEL

Publications (1)

Publication Number Publication Date
DE3740381A1 true DE3740381A1 (en) 1989-06-08

Family

ID=6341474

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19873740381 Withdrawn DE3740381A1 (en) 1987-11-27 1987-11-27 ETCHING PROCESS FOR NICKEL

Country Status (2)

Country Link
DE (1) DE3740381A1 (en)
WO (1) WO1989004883A1 (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2349555A1 (en) * 1973-04-25 1974-11-14 Original Odhner Ab PRINT HEAD FOR COLOR LIQUID SPRAY PRINTER AND THE LIKE
DE2918737A1 (en) * 1978-05-10 1979-11-15 Hitachi Ltd NOZZLE HEAD DEVICE FOR A COLOR JET PRINTING DEVICE
US4472236A (en) * 1982-03-29 1984-09-18 Tokyo Shibaura Denki Kabushiki Kaisha Method for etching Fe-Ni alloy
DE3409420A1 (en) * 1984-03-15 1985-09-26 SWF Auto-Electric GmbH, 7120 Bietigheim-Bissingen Method for producing an electro-optical display device

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3458371A (en) * 1965-11-12 1969-07-29 Photo Engravers Research Inst Composition and process for powderless etching
JPS60200985A (en) * 1984-03-26 1985-10-11 Toshiba Corp Production of shadow mask
US4482426A (en) * 1984-04-02 1984-11-13 Rca Corporation Method for etching apertures into a strip of nickel-iron alloy

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2349555A1 (en) * 1973-04-25 1974-11-14 Original Odhner Ab PRINT HEAD FOR COLOR LIQUID SPRAY PRINTER AND THE LIKE
DE2918737A1 (en) * 1978-05-10 1979-11-15 Hitachi Ltd NOZZLE HEAD DEVICE FOR A COLOR JET PRINTING DEVICE
US4472236A (en) * 1982-03-29 1984-09-18 Tokyo Shibaura Denki Kabushiki Kaisha Method for etching Fe-Ni alloy
DE3409420A1 (en) * 1984-03-15 1985-09-26 SWF Auto-Electric GmbH, 7120 Bietigheim-Bissingen Method for producing an electro-optical display device

Also Published As

Publication number Publication date
WO1989004883A1 (en) 1989-06-01

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Legal Events

Date Code Title Description
OM8 Search report available as to paragraph 43 lit. 1 sentence 1 patent law
8139 Disposal/non-payment of the annual fee