DE3689438T2 - Phasengitter des zusammengesetzten Muster-Refraktionstyps. - Google Patents

Phasengitter des zusammengesetzten Muster-Refraktionstyps.

Info

Publication number
DE3689438T2
DE3689438T2 DE86114526T DE3689438T DE3689438T2 DE 3689438 T2 DE3689438 T2 DE 3689438T2 DE 86114526 T DE86114526 T DE 86114526T DE 3689438 T DE3689438 T DE 3689438T DE 3689438 T2 DE3689438 T2 DE 3689438T2
Authority
DE
Germany
Prior art keywords
phase grating
composite pattern
refraction type
pattern refraction
type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE86114526T
Other languages
English (en)
Other versions
DE3689438D1 (de
Inventor
Nobuhiro Kawatsuki
Masao Uetsuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kuraray Co Ltd
Original Assignee
Toshiba Corp
Kuraray Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Kuraray Co Ltd filed Critical Toshiba Corp
Application granted granted Critical
Publication of DE3689438D1 publication Critical patent/DE3689438D1/de
Publication of DE3689438T2 publication Critical patent/DE3689438T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1866—Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
    • G02B5/1871—Transmissive phase gratings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
DE86114526T 1985-10-22 1986-10-20 Phasengitter des zusammengesetzten Muster-Refraktionstyps. Expired - Lifetime DE3689438T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60236751A JPH079483B2 (ja) 1985-10-22 1985-10-22 形態屈折率双変調型位相格子

Publications (2)

Publication Number Publication Date
DE3689438D1 DE3689438D1 (de) 1994-02-03
DE3689438T2 true DE3689438T2 (de) 1994-04-14

Family

ID=17005249

Family Applications (1)

Application Number Title Priority Date Filing Date
DE86114526T Expired - Lifetime DE3689438T2 (de) 1985-10-22 1986-10-20 Phasengitter des zusammengesetzten Muster-Refraktionstyps.

Country Status (5)

Country Link
US (1) US4759607A (de)
EP (1) EP0219845B1 (de)
JP (1) JPH079483B2 (de)
KR (1) KR900007555B1 (de)
DE (1) DE3689438T2 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07101246B2 (ja) * 1987-03-07 1995-11-01 株式会社クラレ 形態屈折率双変調型導波路レンズ
JPH0833527B2 (ja) * 1988-07-18 1996-03-29 キヤノン株式会社 光学的ローパスフィルターを有した撮影系
US5367588A (en) * 1992-10-29 1994-11-22 Her Majesty The Queen In Right Of Canada, As Represented By The Minister Of Communications Method of fabricating Bragg gratings using a silica glass phase grating mask and mask used by same
JPH07234309A (ja) * 1993-12-23 1995-09-05 Xerox Corp バイナリ回折光学素子ビーム分割器
KR20180031285A (ko) * 2016-09-19 2018-03-28 삼성전자주식회사 평면형 가변 초점 렌즈
CN112731577B (zh) * 2020-12-26 2022-05-10 华中光电技术研究所（中国船舶重工集团公司第七一七研究所） 用于振幅/相位双重调制的四区域光栅及其制作方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5222209B2 (de) * 1972-06-23 1977-06-16
JPS5139864B2 (de) * 1972-12-04 1976-10-30
JPS5741621A (en) * 1980-08-26 1982-03-08 Minolta Camera Co Ltd Bilevel phase grating type focal plane
US4568147A (en) * 1983-11-17 1986-02-04 Gte Laboratories Incorporated Flat profile grating coupler

Also Published As

Publication number Publication date
EP0219845A2 (de) 1987-04-29
EP0219845B1 (de) 1993-12-22
DE3689438D1 (de) 1994-02-03
JPH079483B2 (ja) 1995-02-01
JPS62111203A (ja) 1987-05-22
EP0219845A3 (en) 1989-03-01
US4759607A (en) 1988-07-26
KR870004318A (ko) 1987-05-08
KR900007555B1 (ko) 1990-10-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: KURARAY CO., LTD., KURASHIKI, OKAYAMA, JP

8330 Complete renunciation