DE3684852D1 - Photopolymerschicht mit in mikrokapseln eingeschlossenen sensitometrisch wirksamen zusaetzen. - Google Patents

Photopolymerschicht mit in mikrokapseln eingeschlossenen sensitometrisch wirksamen zusaetzen.

Info

Publication number
DE3684852D1
DE3684852D1 DE8686113336T DE3684852T DE3684852D1 DE 3684852 D1 DE3684852 D1 DE 3684852D1 DE 8686113336 T DE8686113336 T DE 8686113336T DE 3684852 T DE3684852 T DE 3684852T DE 3684852 D1 DE3684852 D1 DE 3684852D1
Authority
DE
Germany
Prior art keywords
sensitometrically
microcapsules
photopolymer layer
effective included
effective
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8686113336T
Other languages
English (en)
Inventor
Dalen E Keys
William J Nebe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Application granted granted Critical
Publication of DE3684852D1 publication Critical patent/DE3684852D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/002—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/136—Coating process making radiation sensitive element

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
DE8686113336T 1985-10-01 1986-09-27 Photopolymerschicht mit in mikrokapseln eingeschlossenen sensitometrisch wirksamen zusaetzen. Expired - Lifetime DE3684852D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/782,424 US4636453A (en) 1985-10-01 1985-10-01 Photopolymer films containing microencapsulated sensitometric adjuvants

Publications (1)

Publication Number Publication Date
DE3684852D1 true DE3684852D1 (de) 1992-05-21

Family

ID=25126006

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8686113336T Expired - Lifetime DE3684852D1 (de) 1985-10-01 1986-09-27 Photopolymerschicht mit in mikrokapseln eingeschlossenen sensitometrisch wirksamen zusaetzen.

Country Status (4)

Country Link
US (1) US4636453A (de)
EP (1) EP0217324B1 (de)
JP (1) JPS6298345A (de)
DE (1) DE3684852D1 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0205083B1 (de) * 1985-06-03 1993-09-01 Canon Kabushiki Kaisha Aufzeichnungsverfahren und Übertragungsaufzeichnungsmaterial dafür
DE3536957A1 (de) * 1985-10-17 1987-04-23 Basf Ag Durch photopolymerisation vernetzbare gemische
EP0224214B1 (de) * 1985-11-21 1993-01-27 Fuji Photo Film Co., Ltd. Lichtempfindliche Mikrokapsel, die Silberhalogenid und eine polymerisierbare Verbindung enthält und lichtempfindliches Material, das diese gebraucht
JPH0668623B2 (ja) * 1986-02-13 1994-08-31 富士写真フイルム株式会社 水なし感光性平版印刷版
JPH0619552B2 (ja) * 1986-02-26 1994-03-16 富士写真フイルム株式会社 熱現像用感光材料
US4874684A (en) * 1986-09-03 1989-10-17 Fuji Photo Film Co., Ltd. Light-sensitive material containing silver halide, reducing agent and polymerizable compound in microcapsules separately sensitized
US4755446A (en) * 1987-01-12 1988-07-05 E. I. Du Pont De Nemours And Company Photosensitive compositions containing microcapsules concentrated in surface layer
US4833061A (en) * 1987-04-06 1989-05-23 Minnesota Mining And Manufacturing Company Photosensitive phospholipid vesicles
JPH07101314B2 (ja) * 1987-09-03 1995-11-01 富士写真フイルム株式会社 画像記録方法
EP0383536A3 (de) * 1989-02-15 1991-10-23 Seiko Instruments Inc. Wärmeempfindliches Transferdruckmaterial
US4954415A (en) * 1989-03-09 1990-09-04 The Mead Corporation Photoinitiator compositions containing O-acylthiohydroxamate or an N-alkoxypyridinethione and photohardenable compositions containing the same
JP2639748B2 (ja) * 1990-10-31 1997-08-13 富士写真フイルム株式会社 感光性エレメントおよびその製造法
US5516620A (en) * 1993-11-01 1996-05-14 Polaroid Corporation Method of on-press developing lithographic plates utilizing microencapsulated developers
JPH11167203A (ja) * 1997-12-01 1999-06-22 Nichigoo Mooton Kk 感光性樹脂組成物及びそれを用いた感光性エレメント
US6045973A (en) * 1998-12-11 2000-04-04 Morton International, Inc. Photoimageable compositions having improved chemical resistance and stripping ability
JP4418714B2 (ja) * 2003-07-10 2010-02-24 富士フイルム株式会社 平版印刷版原版及び平版印刷方法
JP2005059446A (ja) * 2003-08-15 2005-03-10 Fuji Photo Film Co Ltd 平版印刷版原版及び平版印刷方法
EP1717024A1 (de) * 2004-01-23 2006-11-02 Fuji Photo Film Co., Ltd. Flachdruckplattenvorläufer und Flachdruckverfahren.
KR101125678B1 (ko) * 2004-02-06 2012-03-28 롬 앤드 하스 일렉트로닉 머트어리얼즈, 엘.엘.씨. 개선된 이미지화 조성물 및 방법

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH395152A (fr) * 1959-07-16 1965-07-15 Ncr Co Procédé d'impression
US3212896A (en) * 1961-06-07 1965-10-19 Eastman Kodak Co Dry processing of photographic emulsions
US3700439A (en) * 1970-11-05 1972-10-24 Ncr Co Photocopy process utilizing a transfer sheet coated with microcapsules containing photosensitive michler's ketone dye-precursors
US3892569A (en) * 1972-12-04 1975-07-01 Gen Film Dev Corp Photosensitive sheets comprising organic dyes and sensitizers
US4501809A (en) * 1981-07-17 1985-02-26 Mitsubishi Paper Mills, Ltd. Photosetting microcapsules and photo- and pressure-sensitive recording sheet
US4440846A (en) * 1981-11-12 1984-04-03 Mead Corporation Photocopy sheet employing encapsulated radiation sensitive composition and imaging process
US4399209A (en) * 1981-11-12 1983-08-16 The Mead Corporation Transfer imaging system
JPS5882785A (ja) * 1981-11-12 1983-05-18 Kureha Chem Ind Co Ltd 感圧記録紙用微小カプセル及びその製造方法
US4416966A (en) * 1982-08-25 1983-11-22 The Mead Corporation Capsular imaging system comprising decolorizing agent
US4482624A (en) * 1983-02-15 1984-11-13 The Mead Corporation Photosensitive material employing encapsulated radiation sensitive composition and process for improving sensitivity by sequestering oxygen
JPS59214693A (ja) * 1983-05-21 1984-12-04 Mitsubishi Paper Mills Ltd 感熱記録方法
JPS59214692A (ja) * 1983-05-21 1984-12-04 Mitsubishi Paper Mills Ltd 感熱記録紙の製造方法
JPS59214691A (ja) * 1983-05-21 1984-12-04 Mitsubishi Paper Mills Ltd 感熱記録紙
PT78129B (en) * 1983-08-18 1986-05-19 Moore Business Forms Inc Microcapsules with reduced permeability
AU561281B2 (en) * 1983-09-14 1987-05-07 Three Bond Co. Ltd. Acrylic photopolymerised micro-capsules
US4532200A (en) * 1983-11-16 1985-07-30 The Mead Corporation Photosensitive imaging material employing encapsulated radiation sensitive composition having improved toe speed

Also Published As

Publication number Publication date
EP0217324A2 (de) 1987-04-08
EP0217324B1 (de) 1992-04-15
US4636453A (en) 1987-01-13
JPS6298345A (ja) 1987-05-07
EP0217324A3 (en) 1989-11-02

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee