DE3671804D1 - Vorrichtungs-herstellungsverfahren. - Google Patents

Vorrichtungs-herstellungsverfahren.

Info

Publication number
DE3671804D1
DE3671804D1 DE8686200142T DE3671804T DE3671804D1 DE 3671804 D1 DE3671804 D1 DE 3671804D1 DE 8686200142 T DE8686200142 T DE 8686200142T DE 3671804 T DE3671804 T DE 3671804T DE 3671804 D1 DE3671804 D1 DE 3671804D1
Authority
DE
Germany
Prior art keywords
device manufacturing
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8686200142T
Other languages
English (en)
Inventor
Jacob Wijdenes
Marcellinus Joseph Hen Geomini
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Application granted granted Critical
Publication of DE3671804D1 publication Critical patent/DE3671804D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE8686200142T 1985-02-06 1986-02-03 Vorrichtungs-herstellungsverfahren. Expired - Lifetime DE3671804D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL8500320A NL8500320A (nl) 1985-02-06 1985-02-06 Werkwijze voor het vervaardigen van een inrichting en inrichting vervaardigd met de werkwijze.

Publications (1)

Publication Number Publication Date
DE3671804D1 true DE3671804D1 (de) 1990-07-12

Family

ID=19845478

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8686200142T Expired - Lifetime DE3671804D1 (de) 1985-02-06 1986-02-03 Vorrichtungs-herstellungsverfahren.

Country Status (4)

Country Link
EP (1) EP0190799B1 (de)
JP (1) JPS62269950A (de)
DE (1) DE3671804D1 (de)
NL (1) NL8500320A (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8730266D0 (en) * 1987-12-29 1988-02-03 Unilever Plc Process for synthesis of polyol fatty acid polyesters
US5455145A (en) * 1988-12-24 1995-10-03 Mitsubishi Denki Kabushiki Kaisha Method of manufacturing double layer resist pattern and double layer resist structure
JP3875280B2 (ja) * 1997-07-15 2007-01-31 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー ミクロリソグラフィーのための改良された溶解抑制レジスト

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3246106A1 (de) * 1982-12-13 1984-06-14 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung einer druckform aus dem kopiermaterial

Also Published As

Publication number Publication date
EP0190799A1 (de) 1986-08-13
NL8500320A (nl) 1986-09-01
EP0190799B1 (de) 1990-06-06
JPS62269950A (ja) 1987-11-24

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee