DE3644882A1 - Thermische detektormatrix - Google Patents
Thermische detektormatrixInfo
- Publication number
- DE3644882A1 DE3644882A1 DE19863644882 DE3644882A DE3644882A1 DE 3644882 A1 DE3644882 A1 DE 3644882A1 DE 19863644882 DE19863644882 DE 19863644882 DE 3644882 A DE3644882 A DE 3644882A DE 3644882 A1 DE3644882 A1 DE 3644882A1
- Authority
- DE
- Germany
- Prior art keywords
- detector
- thermal
- elements
- layer
- matrix
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 239000011159 matrix material Substances 0.000 title claims description 45
- 239000000463 material Substances 0.000 claims description 38
- 239000000758 substrate Substances 0.000 claims description 28
- 238000004519 manufacturing process Methods 0.000 claims description 12
- 239000004065 semiconductor Substances 0.000 claims description 6
- 239000006100 radiation absorber Substances 0.000 claims description 3
- 239000013013 elastic material Substances 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 62
- 238000000034 method Methods 0.000 description 28
- 229910000679 solder Inorganic materials 0.000 description 21
- 230000005855 radiation Effects 0.000 description 17
- 239000010408 film Substances 0.000 description 16
- 230000008569 process Effects 0.000 description 15
- 229910052751 metal Inorganic materials 0.000 description 14
- 239000002184 metal Substances 0.000 description 14
- 229920000642 polymer Polymers 0.000 description 13
- 239000006096 absorbing agent Substances 0.000 description 12
- 238000001514 detection method Methods 0.000 description 12
- 238000005530 etching Methods 0.000 description 10
- 238000010521 absorption reaction Methods 0.000 description 9
- 238000009413 insulation Methods 0.000 description 9
- 238000001465 metallisation Methods 0.000 description 7
- 229920001721 polyimide Polymers 0.000 description 7
- 239000002861 polymer material Substances 0.000 description 6
- 229920005597 polymer membrane Polymers 0.000 description 6
- 239000004642 Polyimide Substances 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 238000000354 decomposition reaction Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 230000004044 response Effects 0.000 description 4
- 239000011343 solid material Substances 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 238000010884 ion-beam technique Methods 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 238000000889 atomisation Methods 0.000 description 2
- 238000003486 chemical etching Methods 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 229910003480 inorganic solid Inorganic materials 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
- 230000000873 masking effect Effects 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 230000006641 stabilisation Effects 0.000 description 2
- 238000011105 stabilization Methods 0.000 description 2
- 239000012808 vapor phase Substances 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 241000872198 Serjania polyphylla Species 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 1
- 239000011358 absorbing material Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910000808 amorphous metal alloy Inorganic materials 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000011195 cermet Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000011365 complex material Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000010987 cubic zirconia Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000003113 dilution method Methods 0.000 description 1
- SSWAPIFTNSBXIS-UHFFFAOYSA-N dioxido(dioxo)tungsten;iron(2+) Chemical compound [Fe+2].[O-][W]([O-])(=O)=O SSWAPIFTNSBXIS-UHFFFAOYSA-N 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000003302 ferromagnetic material Substances 0.000 description 1
- 229920005570 flexible polymer Polymers 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000008098 formaldehyde solution Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- YLZGECKKLOSBPL-UHFFFAOYSA-N indium nickel Chemical compound [Ni].[In] YLZGECKKLOSBPL-UHFFFAOYSA-N 0.000 description 1
- 229910003471 inorganic composite material Inorganic materials 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 230000035987 intoxication Effects 0.000 description 1
- 231100000566 intoxication Toxicity 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- ZBSCCQXBYNSKPV-UHFFFAOYSA-N oxolead;oxomagnesium;2,4,5-trioxa-1$l^{5},3$l^{5}-diniobabicyclo[1.1.1]pentane 1,3-dioxide Chemical compound [Mg]=O.[Pb]=O.[Pb]=O.[Pb]=O.O1[Nb]2(=O)O[Nb]1(=O)O2 ZBSCCQXBYNSKPV-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229920000052 poly(p-xylylene) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 230000036316 preload Effects 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000009966 trimming Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/148—Charge coupled imagers
- H01L27/14875—Infrared CCD or CID imagers
- H01L27/14881—Infrared CCD or CID imagers of the hybrid type
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
- G01J5/20—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors using resistors, thermistors or semiconductors sensitive to radiation, e.g. photoconductive devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
- G01J5/34—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors using capacitors, e.g. pyroelectric capacitors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N19/00—Integrated devices, or assemblies of multiple devices, comprising at least one thermoelectric or thermomagnetic element covered by groups H10N10/00 - H10N15/00
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
- G01J5/20—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors using resistors, thermistors or semiconductors sensitive to radiation, e.g. photoconductive devices
- G01J2005/202—Arrays
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
- G01J5/20—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors using resistors, thermistors or semiconductors sensitive to radiation, e.g. photoconductive devices
- G01J2005/206—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors using resistors, thermistors or semiconductors sensitive to radiation, e.g. photoconductive devices on foils
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Radiation Pyrometers (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
- Solid State Image Pick-Up Elements (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB8522638A GB2200246B (en) | 1985-09-12 | 1985-09-12 | Thermal detector array |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE3644882A1 true DE3644882A1 (de) | 1988-11-17 |
Family
ID=10585093
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19863644882 Ceased DE3644882A1 (de) | 1985-09-12 | 1986-09-12 | Thermische detektormatrix |
Country Status (7)
| Country | Link |
|---|---|
| BE (1) | BE102T1 (nl) |
| DE (1) | DE3644882A1 (nl) |
| FR (2) | FR2620531B1 (nl) |
| GB (1) | GB2200246B (nl) |
| IT (1) | IT1235675B (nl) |
| NL (1) | NL8615006A (nl) |
| SE (1) | SE466571B (nl) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102005001966A1 (de) * | 2005-01-15 | 2006-07-27 | Infratec Gmbh Infrarotsensorik Und Messtechnik | Mikrophoniereduzierter pyroelektrischer Detektor |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB8621688D0 (en) * | 1986-09-09 | 1986-10-15 | Graviner Ltd | Radiation detection arrangements |
| GB2206997A (en) * | 1987-07-10 | 1989-01-18 | Philips Electronic Associated | Arrays of pyroelectric or ferroelectric infrared detector elements |
| US5047644A (en) * | 1989-07-31 | 1991-09-10 | Texas Instruments Incorporated | Polyimide thermal isolation mesa for a thermal imaging system |
| US5306912A (en) * | 1989-10-21 | 1994-04-26 | Thorn Emi Plc | Optically addressed thermal imaging device |
| FR2670325B1 (fr) * | 1990-12-11 | 1993-01-22 | Thomson Composants Militaires | Detecteur infrarouge monolithique a materiau pyroelectrique. |
| US5288649A (en) * | 1991-09-30 | 1994-02-22 | Texas Instruments Incorporated | Method for forming uncooled infrared detector |
| JPH07500913A (ja) * | 1991-11-04 | 1995-01-26 | ハネウエル・インコーポレーテッド | 薄膜ピロ電気画像アレイ |
| GB2274543A (en) * | 1993-01-21 | 1994-07-27 | Central Research Lab Ltd | Infrared detector |
| GB9604786D0 (en) * | 1996-03-06 | 1996-09-25 | Marconi Gec Ltd | Micromachined devices |
| US5942791A (en) * | 1996-03-06 | 1999-08-24 | Gec-Marconi Limited | Micromachined devices having microbridge structure |
| DE69702331T2 (de) | 1997-01-14 | 2000-12-14 | Infrared Integrated Syst Ltd | Sensor mit einem Detektorfeld |
| GB2335077B (en) | 1998-03-04 | 2003-05-28 | Marconi Gec Ltd | Radiation detectors |
| FR2788885B1 (fr) * | 1999-01-21 | 2003-07-18 | Commissariat Energie Atomique | Dispositif de detection thermique de rayonnements electromagnetiques et procede de fabrication de celui-ci |
| EP1178294A1 (fr) * | 2000-08-04 | 2002-02-06 | Ecole Polytechnique Federale De Lausanne | Capteur pyroélectrique ayant entre ses pixels un couplage thermique parasite réduit |
| US20040155188A1 (en) * | 2001-06-08 | 2004-08-12 | Markus Kohli | Infrared sensor and method for making same |
| FR2862160B1 (fr) * | 2003-11-10 | 2006-05-12 | Ulis | Dispositif de detection de rayonnements infrarouges a detecteurs bolometriques |
| FR2875606B1 (fr) | 2004-09-22 | 2006-11-10 | Commissariat Energie Atomique | Detecteur de rayonnement electromagnetique et de particules a nombre de connexions reduit |
| JP5644121B2 (ja) * | 2010-01-26 | 2014-12-24 | セイコーエプソン株式会社 | 熱型光検出器、熱型光検出装置、電子機器および熱型光検出器の製造方法 |
| WO2011111309A1 (ja) * | 2010-03-11 | 2011-09-15 | パナソニック株式会社 | 焦電型温度センサを用いて温度を測定する方法 |
| CN102437166B (zh) * | 2011-10-09 | 2013-05-01 | 中国科学院苏州纳米技术与纳米仿生研究所 | 一种非制冷红外探测系统像素阵列的制作方法 |
| FR3006438B1 (fr) * | 2013-06-04 | 2015-06-26 | Commissariat Energie Atomique | Capteur de temperature |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3045118A1 (de) * | 1980-11-29 | 1982-06-03 | Georg Dipl.-Ing. 7500 Karlsruhe Richter | Infrarotdetektor |
| US4354109A (en) * | 1979-12-31 | 1982-10-12 | Honeywell Inc. | Mounting for pyroelectric detecctor arrays |
| GB2100058A (en) * | 1981-06-05 | 1982-12-15 | Philips Electronic Associated | Pyroelectric detector |
| US4532434A (en) * | 1978-10-30 | 1985-07-30 | Phillips Petroleum Company | Waveform generator |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3801949A (en) * | 1973-03-08 | 1974-04-02 | Rca Corp | Thermal detector and method of making the same |
| US4039833A (en) * | 1976-08-17 | 1977-08-02 | The United States Of America As Represented By The Secretary Of The Navy | High density infrared detector array |
| GB1523347A (en) * | 1976-11-16 | 1978-08-31 | Secr Defence | Pyroelectric tragets |
| GB1532293A (en) * | 1977-06-14 | 1978-11-15 | Secr Defence | Pyroelectric vidicon targets and a method and machine for reticulating them |
| GB1592500A (en) * | 1977-12-01 | 1981-07-08 | Roundy C B | Pyroelectric infrared detection system |
| GB2030023B (en) * | 1977-12-19 | 1982-08-04 | Texas Instruments Inc | Ferroelectric imaging system |
| GB2028579B (en) * | 1978-08-22 | 1982-12-22 | English Electric Valve Co Ltd | Target for a pyroelectric camera |
| GB2035685B (en) * | 1978-10-28 | 1983-05-05 | Plessey Co Ltd | Pyroelectric detectors |
| US4317063A (en) * | 1978-10-28 | 1982-02-23 | Plessey Handel Und Investments Ag | Pyroelectric detectors |
| GB2095905B (en) * | 1981-03-27 | 1985-01-16 | Philips Electronic Associated | Infra-red radiation imaging devices and methods for their manufacture |
| US4532424A (en) * | 1983-04-25 | 1985-07-30 | Rockwell International Corporation | Pyroelectric thermal detector array |
| GB2163596B (en) * | 1984-08-24 | 1988-02-03 | Philips Electronic Associated | A thermal imaging device and a method of manufacturing a thermal imaging device |
-
1985
- 1985-09-12 GB GB8522638A patent/GB2200246B/en not_active Expired
-
1986
- 1986-09-12 DE DE19863644882 patent/DE3644882A1/de not_active Ceased
- 1986-09-12 NL NL8615006A patent/NL8615006A/nl not_active Application Discontinuation
-
1987
- 1987-04-07 FR FR8704869A patent/FR2620531B1/fr not_active Expired - Fee Related
- 1987-04-07 FR FR878704868A patent/FR2624603B1/fr not_active Expired - Fee Related
- 1987-06-17 SE SE8702531A patent/SE466571B/sv not_active IP Right Cessation
- 1987-07-16 IT IT8721315A patent/IT1235675B/it active
-
1988
- 1988-08-10 BE BEBTR0000102T patent/BE102T1/xx not_active IP Right Cessation
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4532434A (en) * | 1978-10-30 | 1985-07-30 | Phillips Petroleum Company | Waveform generator |
| US4354109A (en) * | 1979-12-31 | 1982-10-12 | Honeywell Inc. | Mounting for pyroelectric detecctor arrays |
| DE3045118A1 (de) * | 1980-11-29 | 1982-06-03 | Georg Dipl.-Ing. 7500 Karlsruhe Richter | Infrarotdetektor |
| GB2100058A (en) * | 1981-06-05 | 1982-12-15 | Philips Electronic Associated | Pyroelectric detector |
Non-Patent Citations (1)
| Title |
|---|
| JP 56-6128 (A) in Patents Abstracts of Japan, Vol. 5/No. 52, 11. April 1981, P-56 * |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102005001966A1 (de) * | 2005-01-15 | 2006-07-27 | Infratec Gmbh Infrarotsensorik Und Messtechnik | Mikrophoniereduzierter pyroelektrischer Detektor |
| DE102005001966B4 (de) * | 2005-01-15 | 2009-08-20 | Infratec Gmbh Infrarotsensorik Und Messtechnik | Mikrophoniereduzierter pyroelektrischer Detektor |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2624603A1 (fr) | 1989-06-16 |
| SE8702531D0 (sv) | 1987-06-17 |
| SE466571B (sv) | 1992-03-02 |
| BE102T1 (fr) | 1988-08-10 |
| FR2624603B1 (fr) | 1993-04-30 |
| SE8702531L (sv) | 1988-08-06 |
| GB2200246A (en) | 1988-07-27 |
| FR2620531B1 (fr) | 1993-11-05 |
| NL8615006A (nl) | 1988-08-01 |
| GB2200246B (en) | 1989-11-01 |
| GB8522638D0 (en) | 1988-05-25 |
| FR2620531A1 (fr) | 1989-03-17 |
| IT1235675B (it) | 1992-09-21 |
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