DE3618596A1 - Fluessigkeitsstrahl-aufzeichnungskopf und diesen fluessigkeitsstrahl-aufzeichnungskopf enthaltendes aufzeichnungssystem - Google Patents
Fluessigkeitsstrahl-aufzeichnungskopf und diesen fluessigkeitsstrahl-aufzeichnungskopf enthaltendes aufzeichnungssystemInfo
- Publication number
- DE3618596A1 DE3618596A1 DE19863618596 DE3618596A DE3618596A1 DE 3618596 A1 DE3618596 A1 DE 3618596A1 DE 19863618596 DE19863618596 DE 19863618596 DE 3618596 A DE3618596 A DE 3618596A DE 3618596 A1 DE3618596 A1 DE 3618596A1
- Authority
- DE
- Germany
- Prior art keywords
- atoms
- recording head
- jet recording
- liquid jet
- head according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 claims abstract description 131
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 97
- 125000005843 halogen group Chemical group 0.000 claims abstract description 92
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical group [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims abstract description 51
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 48
- 238000006243 chemical reaction Methods 0.000 claims abstract description 35
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 34
- 230000005611 electricity Effects 0.000 claims abstract description 23
- 239000011159 matrix material Substances 0.000 claims abstract description 17
- 239000012530 fluid Substances 0.000 claims abstract description 12
- 239000007788 liquid Substances 0.000 claims description 188
- 239000000758 substrate Substances 0.000 claims description 100
- 125000004429 atom Chemical group 0.000 claims description 91
- 238000009826 distribution Methods 0.000 claims description 54
- 239000000126 substance Substances 0.000 claims description 51
- 230000015572 biosynthetic process Effects 0.000 claims description 35
- 239000011241 protective layer Substances 0.000 claims description 19
- 238000010438 heat treatment Methods 0.000 claims description 13
- 239000000460 chlorine Substances 0.000 claims description 11
- 229910052731 fluorine Inorganic materials 0.000 claims description 6
- 229910052801 chlorine Inorganic materials 0.000 claims description 4
- 238000004891 communication Methods 0.000 claims description 4
- 230000000737 periodic effect Effects 0.000 claims description 4
- 229910052794 bromium Inorganic materials 0.000 claims description 3
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims 2
- 239000011737 fluorine Substances 0.000 claims 2
- 229910052740 iodine Inorganic materials 0.000 claims 2
- 239000011630 iodine Substances 0.000 claims 2
- 230000000284 resting effect Effects 0.000 claims 2
- 238000007599 discharging Methods 0.000 claims 1
- 239000007789 gas Substances 0.000 description 201
- 238000000034 method Methods 0.000 description 72
- 238000000151 deposition Methods 0.000 description 60
- 230000008021 deposition Effects 0.000 description 60
- 239000010410 layer Substances 0.000 description 32
- 238000004544 sputter deposition Methods 0.000 description 26
- 230000008859 change Effects 0.000 description 24
- 239000000203 mixture Substances 0.000 description 23
- 230000001276 controlling effect Effects 0.000 description 18
- 239000012495 reaction gas Substances 0.000 description 13
- 238000000889 atomisation Methods 0.000 description 12
- -1 SiH Chemical class 0.000 description 11
- 125000001153 fluoro group Chemical group F* 0.000 description 10
- 229910052736 halogen Inorganic materials 0.000 description 10
- 150000002367 halogens Chemical class 0.000 description 10
- 230000008569 process Effects 0.000 description 9
- 229910052710 silicon Inorganic materials 0.000 description 9
- 229910052732 germanium Inorganic materials 0.000 description 8
- 229930195733 hydrocarbon Natural products 0.000 description 8
- 150000002430 hydrocarbons Chemical class 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- 239000000470 constituent Substances 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- 229910002804 graphite Inorganic materials 0.000 description 6
- 239000010439 graphite Substances 0.000 description 6
- 230000004044 response Effects 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- 239000002344 surface layer Substances 0.000 description 6
- 238000010276 construction Methods 0.000 description 5
- 239000012535 impurity Substances 0.000 description 5
- 239000011261 inert gas Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 238000009828 non-uniform distribution Methods 0.000 description 5
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 5
- 230000001105 regulatory effect Effects 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 238000001771 vacuum deposition Methods 0.000 description 5
- 229910018540 Si C Inorganic materials 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 229920001721 polyimide Polymers 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
- 230000035939 shock Effects 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 3
- 238000009825 accumulation Methods 0.000 description 3
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 3
- 229910052796 boron Inorganic materials 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 230000004043 responsiveness Effects 0.000 description 3
- 229930195734 saturated hydrocarbon Natural products 0.000 description 3
- MWRNXFLKMVJUFL-UHFFFAOYSA-N $l^{2}-germane Chemical class [GeH2] MWRNXFLKMVJUFL-UHFFFAOYSA-N 0.000 description 2
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- 229910003691 SiBr Inorganic materials 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical class [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 229910052785 arsenic Inorganic materials 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- KDKYADYSIPSCCQ-UHFFFAOYSA-N but-1-yne Chemical compound CCC#C KDKYADYSIPSCCQ-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- 238000005868 electrolysis reaction Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 229910052733 gallium Inorganic materials 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 230000020169 heat generation Effects 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 238000003801 milling Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000013077 target material Substances 0.000 description 2
- 230000001960 triggered effect Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical group [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910021617 Indium monochloride Inorganic materials 0.000 description 1
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical class P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910018287 SbF 5 Inorganic materials 0.000 description 1
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XMIJDTGORVPYLW-UHFFFAOYSA-N [SiH2] Chemical compound [SiH2] XMIJDTGORVPYLW-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical class B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 description 1
- IAQRGUVFOMOMEM-UHFFFAOYSA-N butene Natural products CC=CC IAQRGUVFOMOMEM-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- XOYLJNJLGBYDTH-UHFFFAOYSA-M chlorogallium Chemical compound [Ga]Cl XOYLJNJLGBYDTH-UHFFFAOYSA-M 0.000 description 1
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000110 cooling liquid Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000003487 electrochemical reaction Methods 0.000 description 1
- 238000005323 electroforming Methods 0.000 description 1
- 238000006056 electrooxidation reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 125000001590 germanediyl group Chemical group [H][Ge]([H])(*)* 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APHGZSBLRQFRCA-UHFFFAOYSA-M indium(1+);chloride Chemical compound [In]Cl APHGZSBLRQFRCA-UHFFFAOYSA-M 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000003701 mechanical milling Methods 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910001120 nichrome Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- NAHBVNMACPIHAH-HLICZWCASA-N p-ii Chemical compound C([C@H]1C(=O)N[C@@H](CCCNC(N)=N)C(=O)N[C@H](C(N[C@H]2CSSC[C@H](NC(=O)[C@H](CC=3C=CC=CC=3)NC(=O)CNC(=O)[C@H](CCCCN)NC(=O)[C@H](CC=3C=CC(O)=CC=3)NC2=O)C(=O)N[C@@H](CC=2C=CC(O)=CC=2)C(=O)N[C@@H](CCCNC(N)=N)C(=O)N[C@@H](CCCCN)C(=O)N[C@@H](CSSC[C@@H](C(=O)N1)NC(=O)[C@H](CC=1C2=CC=CC=C2NC=1)NC(=O)[C@H](CCCNC(N)=N)NC(=O)[C@@H](N)CCCNC(N)=N)C(=O)N[C@@H](CCCNC(N)=N)C(N)=O)=O)C(C)C)C1=CC=CC=C1 NAHBVNMACPIHAH-HLICZWCASA-N 0.000 description 1
- YWAKXRMUMFPDSH-UHFFFAOYSA-N pentene Chemical compound CCCC=C YWAKXRMUMFPDSH-UHFFFAOYSA-N 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- MWWATHDPGQKSAR-UHFFFAOYSA-N propyne Chemical group CC#C MWWATHDPGQKSAR-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N sec-butylidene Natural products CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- GBECUEIQVRDUKB-UHFFFAOYSA-M thallium monochloride Chemical compound [Tl]Cl GBECUEIQVRDUKB-UHFFFAOYSA-M 0.000 description 1
- IAQRGUVFOMOMEM-ONEGZZNKSA-N trans-but-2-ene Chemical compound C\C=C\C IAQRGUVFOMOMEM-ONEGZZNKSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14016—Structure of bubble jet print heads
- B41J2/14088—Structure of heating means
- B41J2/14112—Resistive element
- B41J2/14129—Layer structure
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2202/00—Embodiments of or processes related to ink-jet or thermal heads
- B41J2202/01—Embodiments of or processes related to ink-jet heads
- B41J2202/03—Specific materials used
Landscapes
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
- Non-Adjustable Resistors (AREA)
Applications Claiming Priority (10)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60125154A JPH0624857B2 (ja) | 1985-06-11 | 1985-06-11 | 液体噴射記録ヘッドを搭載した液体噴射記録装置 |
| JP60126288A JPH0624859B2 (ja) | 1985-06-12 | 1985-06-12 | 液体噴射記録ヘッドを搭載した液体噴射記録装置 |
| JP60126289A JPH0624860B2 (ja) | 1985-06-12 | 1985-06-12 | 液体噴射記録ヘッドを搭載した液体噴射記録装置 |
| JP60126290A JPH0624861B2 (ja) | 1985-06-12 | 1985-06-12 | 液体噴射記録ヘッドを搭載した液体噴射記録装置 |
| JP60127218A JPH0655506B2 (ja) | 1985-06-13 | 1985-06-13 | 液体噴射記録ヘッドを搭載した液体噴射記録装置 |
| JP60128356A JPH0655510B2 (ja) | 1985-06-14 | 1985-06-14 | 液体噴射記録ヘッドを搭載した液体噴射記録装置 |
| JP60128355A JPH0624862B2 (ja) | 1985-06-14 | 1985-06-14 | 液体噴射記録ヘッドを搭載した液体噴射記録装置 |
| JP60128353A JPH0655508B2 (ja) | 1985-06-14 | 1985-06-14 | 液体噴射記録ヘッドを搭載した液体噴射記録装置 |
| JP60128354A JPH0655509B2 (ja) | 1985-06-14 | 1985-06-14 | 液体噴射記録ヘッドを搭載した液体噴射記録装置 |
| JP60130511A JPH0655511B2 (ja) | 1985-06-15 | 1985-06-15 | 液体噴射記録ヘッドを搭載した液体噴射記録装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE3618596A1 true DE3618596A1 (de) | 1986-12-11 |
| DE3618596C2 DE3618596C2 (enExample) | 1992-05-07 |
Family
ID=27580279
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19863618596 Granted DE3618596A1 (de) | 1985-06-11 | 1986-06-03 | Fluessigkeitsstrahl-aufzeichnungskopf und diesen fluessigkeitsstrahl-aufzeichnungskopf enthaltendes aufzeichnungssystem |
Country Status (1)
| Country | Link |
|---|---|
| DE (1) | DE3618596A1 (enExample) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0318981A3 (en) * | 1987-12-01 | 1990-01-10 | Canon Kabushiki Kaisha | Liquid jet head, substrate for said head and liquid jet apparatus equipped with said head |
| EP0318982A3 (en) * | 1987-12-01 | 1990-01-10 | Canon Kabushiki Kaisha | Liquid jet head, substrate for said head and liquid jet apparatus having said head |
| DE3918472A1 (de) * | 1989-06-06 | 1990-12-13 | Siemens Ag | Hydrophobierungsmittel und anwendungsverfahren, insbesondere bei tintenstrahldruckkoepfen |
| DE4141203A1 (de) * | 1990-12-14 | 1992-06-17 | Ricoh Kk | Tintenstrahl-schreibkopf und verfahren zu dessen herstellung sowie verfahren zum ausstossen eines tintentroepfchens durch einen tintenstrahl-schreibkopf |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2843064A1 (de) * | 1977-10-03 | 1979-04-12 | Canon Kk | Verfahren und vorrichtung zur fluessigkeitsstrahl-aufzeichnung |
| DE3609975A1 (de) * | 1985-03-25 | 1986-10-02 | Canon K.K., Tokio/Tokyo | Thermoaufzeichnungskopf |
-
1986
- 1986-06-03 DE DE19863618596 patent/DE3618596A1/de active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2843064A1 (de) * | 1977-10-03 | 1979-04-12 | Canon Kk | Verfahren und vorrichtung zur fluessigkeitsstrahl-aufzeichnung |
| DE3609975A1 (de) * | 1985-03-25 | 1986-10-02 | Canon K.K., Tokio/Tokyo | Thermoaufzeichnungskopf |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0318981A3 (en) * | 1987-12-01 | 1990-01-10 | Canon Kabushiki Kaisha | Liquid jet head, substrate for said head and liquid jet apparatus equipped with said head |
| EP0318982A3 (en) * | 1987-12-01 | 1990-01-10 | Canon Kabushiki Kaisha | Liquid jet head, substrate for said head and liquid jet apparatus having said head |
| US5113203A (en) * | 1987-12-01 | 1992-05-12 | Canon Kabushiki Kaisha | Liquid jet head, substrate for said head and liquid jet apparatus having said head |
| DE3918472A1 (de) * | 1989-06-06 | 1990-12-13 | Siemens Ag | Hydrophobierungsmittel und anwendungsverfahren, insbesondere bei tintenstrahldruckkoepfen |
| DE4141203A1 (de) * | 1990-12-14 | 1992-06-17 | Ricoh Kk | Tintenstrahl-schreibkopf und verfahren zu dessen herstellung sowie verfahren zum ausstossen eines tintentroepfchens durch einen tintenstrahl-schreibkopf |
| US5389962A (en) * | 1990-12-14 | 1995-02-14 | Ricoh Company, Ltd. | Ink jet recording head assembly |
Also Published As
| Publication number | Publication date |
|---|---|
| DE3618596C2 (enExample) | 1992-05-07 |
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