DE3578019D1 - Einrichtung mit veraenderlicher spalte und verfahren zu ihrer herstellung. - Google Patents
Einrichtung mit veraenderlicher spalte und verfahren zu ihrer herstellung.Info
- Publication number
- DE3578019D1 DE3578019D1 DE8585906110T DE3578019T DE3578019D1 DE 3578019 D1 DE3578019 D1 DE 3578019D1 DE 8585906110 T DE8585906110 T DE 8585906110T DE 3578019 T DE3578019 T DE 3578019T DE 3578019 D1 DE3578019 D1 DE 3578019D1
- Authority
- DE
- Germany
- Prior art keywords
- production
- variable gap
- variable
- gap
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/35—Optical coupling means having switching means
- G02B6/351—Optical coupling means having switching means involving stationary waveguides with moving interposed optical elements
- G02B6/3512—Optical coupling means having switching means involving stationary waveguides with moving interposed optical elements the optical element being reflective, e.g. mirror
- G02B6/352—Optical coupling means having switching means involving stationary waveguides with moving interposed optical elements the optical element being reflective, e.g. mirror the reflective optical element having a shaped reflective surface, e.g. a reflective element comprising several reflective surfaces or facets that function together
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0072—Transmitting or indicating the displacement of flexible diaphragms using variations in capacitance
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/264—Optical coupling means with optical elements between opposed fibre ends which perform a function other than beam splitting
- G02B6/266—Optical coupling means with optical elements between opposed fibre ends which perform a function other than beam splitting the optical element being an attenuator
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
- G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
- G09F9/37—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements being movable elements
- G09F9/372—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements being movable elements the positions of the elements being controlled by the application of an electric field
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G5/00—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture
- H01G5/16—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture using variation of distance between electrodes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/35—Optical coupling means having switching means
- G02B6/354—Switching arrangements, i.e. number of input/output ports and interconnection types
- G02B6/3544—2D constellations, i.e. with switching elements and switched beams located in a plane
- G02B6/3548—1xN switch, i.e. one input and a selectable single output of N possible outputs
- G02B6/355—1x2 switch, i.e. one input and a selectable single output of two possible outputs
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/35—Optical coupling means having switching means
- G02B6/354—Switching arrangements, i.e. number of input/output ports and interconnection types
- G02B6/3544—2D constellations, i.e. with switching elements and switched beams located in a plane
- G02B6/3548—1xN switch, i.e. one input and a selectable single output of N possible outputs
- G02B6/3552—1x1 switch, e.g. on/off switch
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/43—Electric condenser making
- Y10T29/435—Solid dielectric type
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Power Engineering (AREA)
- Theoretical Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Measuring Fluid Pressure (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US68719284A | 1984-12-28 | 1984-12-28 | |
US06/744,382 US4617608A (en) | 1984-12-28 | 1985-06-13 | Variable gap device and method of manufacture |
PCT/US1985/002264 WO1986004182A1 (en) | 1984-12-28 | 1985-11-15 | Variable gap device and method of manufacture |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3578019D1 true DE3578019D1 (de) | 1990-07-05 |
Family
ID=27103957
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8585906110T Expired - Fee Related DE3578019D1 (de) | 1984-12-28 | 1985-11-15 | Einrichtung mit veraenderlicher spalte und verfahren zu ihrer herstellung. |
Country Status (4)
Country | Link |
---|---|
US (1) | US4617608A (de) |
EP (1) | EP0205488B1 (de) |
DE (1) | DE3578019D1 (de) |
WO (1) | WO1986004182A1 (de) |
Families Citing this family (62)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4945230A (en) * | 1984-07-06 | 1990-07-31 | Metricor, Inc. | Optical measuring device using a spectral modulation sensor having an optically resonant structure |
US4689246A (en) * | 1984-10-26 | 1987-08-25 | Itek Corporation | Method of fabricating a PbS-PbSe IR detector array |
US5039491A (en) * | 1989-01-27 | 1991-08-13 | Metricor, Inc. | Optical oxygen sensor |
US5039492A (en) * | 1989-01-27 | 1991-08-13 | Metricor, Inc. | Optical pH and gas concentration sensor |
US5021731A (en) * | 1989-02-21 | 1991-06-04 | Metricor, Inc. | Thermo-optical current sensor and thermo-optical current sensing systems |
US4983824A (en) * | 1989-07-06 | 1991-01-08 | Metricor Inc. | Optically resonant sensor with increased monotonic range |
EP0436454A1 (de) * | 1990-01-05 | 1991-07-10 | Agrotique Sarl | Detektor für zu säendes Korn |
US5280173A (en) * | 1992-01-31 | 1994-01-18 | Brown University Research Foundation | Electric and electromagnetic field sensing system including an optical transducer |
US5526172A (en) * | 1993-07-27 | 1996-06-11 | Texas Instruments Incorporated | Microminiature, monolithic, variable electrical signal processor and apparatus including same |
US7297471B1 (en) | 2003-04-15 | 2007-11-20 | Idc, Llc | Method for manufacturing an array of interferometric modulators |
US7550794B2 (en) | 2002-09-20 | 2009-06-23 | Idc, Llc | Micromechanical systems device comprising a displaceable electrode and a charge-trapping layer |
US5636052A (en) * | 1994-07-29 | 1997-06-03 | Lucent Technologies Inc. | Direct view display based on a micromechanical modulation |
US6377383B1 (en) | 1997-09-04 | 2002-04-23 | The University Of British Columbia | Optical switching by controllable frustration of total internal reflection |
FR2824643B1 (fr) * | 2001-05-10 | 2003-10-31 | Jean Pierre Lazzari | Dispositif de modulation de lumiere |
US20080061114A1 (en) * | 2001-09-02 | 2008-03-13 | Zara Taliashvili | Method for the fabrication of low temperature vacuum sealed bonds using diffusion welding |
WO2003021663A1 (en) * | 2001-09-02 | 2003-03-13 | Borealis Technical Limited | Electrode sandwich separation |
US6452734B1 (en) | 2001-11-30 | 2002-09-17 | The University Of British Columbia | Composite electrophoretically-switchable retro-reflective image display |
CN1630707A (zh) * | 2002-02-12 | 2005-06-22 | 色雷特康公司 | 用于快速改变传感器周围溶液环境的系统与方法 |
US6794119B2 (en) | 2002-02-12 | 2004-09-21 | Iridigm Display Corporation | Method for fabricating a structure for a microelectromechanical systems (MEMS) device |
US6891658B2 (en) * | 2002-03-04 | 2005-05-10 | The University Of British Columbia | Wide viewing angle reflective display |
US6865011B2 (en) * | 2002-07-30 | 2005-03-08 | The University Of British Columbia | Self-stabilized electrophoretically frustrated total internal reflection display |
US7781850B2 (en) | 2002-09-20 | 2010-08-24 | Qualcomm Mems Technologies, Inc. | Controlling electromechanical behavior of structures within a microelectromechanical systems device |
US8232074B2 (en) | 2002-10-16 | 2012-07-31 | Cellectricon Ab | Nanoelectrodes and nanotips for recording transmembrane currents in a plurality of cells |
TW567355B (en) * | 2003-04-21 | 2003-12-21 | Prime View Int Co Ltd | An interference display cell and fabrication method thereof |
DE10321099A1 (de) * | 2003-05-09 | 2004-11-25 | Cgs Sensortechnik Gmbh | Vorrichtung zur Druckmessung |
TW570896B (en) * | 2003-05-26 | 2004-01-11 | Prime View Int Co Ltd | A method for fabricating an interference display cell |
US7221495B2 (en) * | 2003-06-24 | 2007-05-22 | Idc Llc | Thin film precursor stack for MEMS manufacturing |
TWI231865B (en) | 2003-08-26 | 2005-05-01 | Prime View Int Co Ltd | An interference display cell and fabrication method thereof |
TW593126B (en) * | 2003-09-30 | 2004-06-21 | Prime View Int Co Ltd | A structure of a micro electro mechanical system and manufacturing the same |
US7369296B2 (en) | 2004-09-27 | 2008-05-06 | Idc, Llc | Device and method for modifying actuation voltage thresholds of a deformable membrane in an interferometric modulator |
US7405861B2 (en) | 2004-09-27 | 2008-07-29 | Idc, Llc | Method and device for protecting interferometric modulators from electrostatic discharge |
US7161730B2 (en) * | 2004-09-27 | 2007-01-09 | Idc, Llc | System and method for providing thermal compensation for an interferometric modulator display |
US7373026B2 (en) | 2004-09-27 | 2008-05-13 | Idc, Llc | MEMS device fabricated on a pre-patterned substrate |
US7417783B2 (en) | 2004-09-27 | 2008-08-26 | Idc, Llc | Mirror and mirror layer for optical modulator and method |
US7553684B2 (en) | 2004-09-27 | 2009-06-30 | Idc, Llc | Method of fabricating interferometric devices using lift-off processing techniques |
US7684104B2 (en) | 2004-09-27 | 2010-03-23 | Idc, Llc | MEMS using filler material and method |
US7420728B2 (en) | 2004-09-27 | 2008-09-02 | Idc, Llc | Methods of fabricating interferometric modulators by selectively removing a material |
US7492502B2 (en) | 2004-09-27 | 2009-02-17 | Idc, Llc | Method of fabricating a free-standing microstructure |
US7349136B2 (en) | 2004-09-27 | 2008-03-25 | Idc, Llc | Method and device for a display having transparent components integrated therein |
TW200628877A (en) | 2005-02-04 | 2006-08-16 | Prime View Int Co Ltd | Method of manufacturing optical interference type color display |
US7164536B2 (en) * | 2005-03-16 | 2007-01-16 | The University Of British Columbia | Optically coupled toroidal lens:hemi-bead brightness enhancer for total internal reflection modulated image displays |
JP4863993B2 (ja) | 2005-05-31 | 2012-01-25 | 日本碍子株式会社 | 物体の通過検出装置 |
EP1910216A1 (de) | 2005-07-22 | 2008-04-16 | QUALCOMM Incorporated | Stützstruktur für eine mikroelektromechanische vorrichtung und verfahren dazu |
US7630114B2 (en) | 2005-10-28 | 2009-12-08 | Idc, Llc | Diffusion barrier layer for MEMS devices |
US7795061B2 (en) | 2005-12-29 | 2010-09-14 | Qualcomm Mems Technologies, Inc. | Method of creating MEMS device cavities by a non-etching process |
US7382515B2 (en) | 2006-01-18 | 2008-06-03 | Qualcomm Mems Technologies, Inc. | Silicon-rich silicon nitrides as etch stops in MEMS manufacture |
US7547568B2 (en) | 2006-02-22 | 2009-06-16 | Qualcomm Mems Technologies, Inc. | Electrical conditioning of MEMS device and insulating layer thereof |
US7450295B2 (en) | 2006-03-02 | 2008-11-11 | Qualcomm Mems Technologies, Inc. | Methods for producing MEMS with protective coatings using multi-component sacrificial layers |
US7643203B2 (en) * | 2006-04-10 | 2010-01-05 | Qualcomm Mems Technologies, Inc. | Interferometric optical display system with broadband characteristics |
US7623287B2 (en) | 2006-04-19 | 2009-11-24 | Qualcomm Mems Technologies, Inc. | Non-planar surface structures and process for microelectromechanical systems |
US7711239B2 (en) | 2006-04-19 | 2010-05-04 | Qualcomm Mems Technologies, Inc. | Microelectromechanical device and method utilizing nanoparticles |
US7417784B2 (en) | 2006-04-19 | 2008-08-26 | Qualcomm Mems Technologies, Inc. | Microelectromechanical device and method utilizing a porous surface |
US7527996B2 (en) | 2006-04-19 | 2009-05-05 | Qualcomm Mems Technologies, Inc. | Non-planar surface structures and process for microelectromechanical systems |
US7369292B2 (en) | 2006-05-03 | 2008-05-06 | Qualcomm Mems Technologies, Inc. | Electrode and interconnect materials for MEMS devices |
US7405863B2 (en) | 2006-06-01 | 2008-07-29 | Qualcomm Mems Technologies, Inc. | Patterning of mechanical layer in MEMS to reduce stresses at supports |
US7321457B2 (en) * | 2006-06-01 | 2008-01-22 | Qualcomm Incorporated | Process and structure for fabrication of MEMS device having isolated edge posts |
US7763546B2 (en) | 2006-08-02 | 2010-07-27 | Qualcomm Mems Technologies, Inc. | Methods for reducing surface charges during the manufacture of microelectromechanical systems devices |
US7566664B2 (en) | 2006-08-02 | 2009-07-28 | Qualcomm Mems Technologies, Inc. | Selective etching of MEMS using gaseous halides and reactive co-etchants |
WO2008103632A2 (en) | 2007-02-20 | 2008-08-28 | Qualcomm Mems Technologies, Inc. | Equipment and methods for etching of mems |
US7719752B2 (en) | 2007-05-11 | 2010-05-18 | Qualcomm Mems Technologies, Inc. | MEMS structures, methods of fabricating MEMS components on separate substrates and assembly of same |
KR20100061731A (ko) * | 2007-09-14 | 2010-06-08 | 퀄컴 엠이엠스 테크놀로지스, 인크. | Mems 제조에 이용되는 에칭 방법 |
JP6850686B2 (ja) * | 2017-06-12 | 2021-03-31 | 日本電信電話株式会社 | 圧力センサおよび中空光導波路の製造方法 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2576489A (en) * | 1950-01-20 | 1951-11-27 | Tinius Olsen Testing Mach Co | Capacitance strain gauge |
US2868894A (en) * | 1955-09-14 | 1959-01-13 | Theodore J Schultz | Miniature condenser microphone |
US3426209A (en) * | 1967-09-11 | 1969-02-04 | Texas Instruments Inc | Light responsive variable capacitor |
DE6929694U (de) * | 1968-08-01 | 1971-03-18 | South African Inv S Dev Corp | Vorrichtung zur bestimmung von lasten |
GB1450709A (en) * | 1973-12-31 | 1976-09-29 | Birchall D J | Pressure transducers |
US4065649A (en) * | 1975-06-30 | 1977-12-27 | Lake Center Industries | Pressure sensitive matrix switch having apertured spacer with flexible double sided adhesive intermediate and channels optionally interposed between apertures |
US4017495A (en) * | 1975-10-23 | 1977-04-12 | Bell Telephone Laboratories, Incorporated | Encapsulation of integrated circuits |
US4203128A (en) * | 1976-11-08 | 1980-05-13 | Wisconsin Alumni Research Foundation | Electrostatically deformable thin silicon membranes |
AU501488B1 (en) * | 1977-06-06 | 1979-06-21 | Matsushita Electric Industrial Co., Ltd. | Humidity sensor |
US4151578A (en) * | 1977-08-01 | 1979-04-24 | Kavlico Corporation | Capacitive pressure transducer |
JPS54101176A (en) * | 1978-01-26 | 1979-08-09 | Shinetsu Polymer Co | Contact member for push switch |
US4158310A (en) * | 1978-01-30 | 1979-06-19 | University Of Southern California | Optical pressure transducer of randomly distributed fiber optics |
GB2064873B (en) * | 1979-11-26 | 1984-09-05 | Eventoff Franklin Neal | Pressure sensitive electric switch |
NL8001281A (nl) * | 1980-03-04 | 1981-10-01 | Philips Nv | Weergeefinrichting. |
US4368645A (en) * | 1980-09-26 | 1983-01-18 | United Technologies Corporation | Optical pressure sensor |
US4530029A (en) * | 1984-03-12 | 1985-07-16 | United Technologies Corporation | Capacitive pressure sensor with low parasitic capacitance |
-
1985
- 1985-06-13 US US06/744,382 patent/US4617608A/en not_active Ceased
- 1985-11-15 DE DE8585906110T patent/DE3578019D1/de not_active Expired - Fee Related
- 1985-11-15 EP EP85906110A patent/EP0205488B1/de not_active Expired - Lifetime
- 1985-11-15 WO PCT/US1985/002264 patent/WO1986004182A1/en active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
EP0205488A1 (de) | 1986-12-30 |
WO1986004182A1 (en) | 1986-07-17 |
US4617608A (en) | 1986-10-14 |
EP0205488B1 (de) | 1990-05-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8328 | Change in the person/name/address of the agent |
Free format text: BLUMBACH, KRAMER & PARTNER, 65193 WIESBADEN |
|
8339 | Ceased/non-payment of the annual fee |