DE3571567D1 - Apparatus for manufacturing surface structures in the nanometer range - Google Patents

Apparatus for manufacturing surface structures in the nanometer range

Info

Publication number
DE3571567D1
DE3571567D1 DE8585103926T DE3571567T DE3571567D1 DE 3571567 D1 DE3571567 D1 DE 3571567D1 DE 8585103926 T DE8585103926 T DE 8585103926T DE 3571567 T DE3571567 T DE 3571567T DE 3571567 D1 DE3571567 D1 DE 3571567D1
Authority
DE
Germany
Prior art keywords
surface structures
nanometer range
manufacturing surface
manufacturing
nanometer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8585103926T
Other languages
English (en)
Inventor
James Kazimierz Dr Gimzewski
Wolfgang Dieter Dr Pohl
Urs Theodor Dr Duerig
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of DE3571567D1 publication Critical patent/DE3571567D1/de
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26—Bombardment with radiation
    • H01L21/263—Bombardment with radiation with high-energy radiation
    • H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/035—Aligning the laser beam
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/066—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/12—Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure
    • B23K26/1224—Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure in vacuum
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/12—Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure
    • B23K26/127—Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure in an enclosure
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/483—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using coherent light, UV to IR, e.g. lasers

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electromagnetism (AREA)
  • General Chemical & Material Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Laser Beam Processing (AREA)
DE8585103926T 1985-04-02 1985-04-02 Apparatus for manufacturing surface structures in the nanometer range Expired DE3571567D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP85103926A EP0196346B1 (de) 1985-04-02 1985-04-02 Verfahren zur Herstellung von Oberflächenstrukturen im Nanometerbereich

Publications (1)

Publication Number Publication Date
DE3571567D1 true DE3571567D1 (en) 1989-08-24

Family

ID=8193417

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8585103926T Expired DE3571567D1 (en) 1985-04-02 1985-04-02 Apparatus for manufacturing surface structures in the nanometer range

Country Status (3)

Country Link
EP (1) EP0196346B1 (de)
JP (1) JPS61232088A (de)
DE (1) DE3571567D1 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3845013B4 (de) * 1987-06-30 2006-09-07 Aaron Lewis Vorrichtung und Verfahren zum Durchführen von Manipulationen an Zellen oder Molekülen
DE3822099C2 (de) * 1987-06-30 2000-12-07 Aaron Lewis Vorrichtung zum Erzeugen eines Musters und Verwendung derselben
JP2803106B2 (ja) * 1988-10-28 1998-09-24 日本電気株式会社 レーザ加工用光学装置
FR2685127B1 (fr) * 1991-12-13 1994-02-04 Christian Licoppe Photonanographe a gaz pour la fabrication et l'analyse optique de motifs a l'echelle nanometrique.
EP0568753A1 (de) 1992-05-07 1993-11-10 International Business Machines Corporation Optische Speichereinheit mit hoher Datendichte und Informations-, Schreib- und Leseverfahren
US5730924A (en) * 1994-12-28 1998-03-24 Sumitomo Heavy Industries, Ltd. Micromachining of polytetrafluoroethylene using radiation
GB2335286B (en) * 1998-03-12 2002-09-11 Alvis Logistics Ltd Mechanical coupling assembly
JP2002210581A (ja) * 2001-01-12 2002-07-30 Seiko Instruments Inc ガス導入機能付きビーム走査装置
DE10153073B3 (de) * 2001-10-30 2004-04-29 Teamtechnik Maschinen Und Anlagen Gmbh Zentralkammer-Vorrichtung und Bearbeitungsstation
US20090026173A1 (en) * 2007-07-26 2009-01-29 General Electric Company Method and apparatus for welding an article
DE102011087181B4 (de) * 2011-11-28 2017-08-17 3D-Micromac Ag Laserbearbeitungssystem
CN106944646A (zh) * 2017-05-13 2017-07-14 合肥鼎鑫模具有限公司 一种模具加工用钻床
DE102021116036A1 (de) 2021-06-21 2022-12-22 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein Verfahren und System zum Herstellen einer metallischen Struktur

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5918182Y2 (ja) * 1979-02-02 1984-05-26 「国」華工業株式会社 磁石の反発力を利用した磁気スプリング
US4448797A (en) * 1981-02-04 1984-05-15 Xerox Corporation Masking techniques in chemical vapor deposition
US4331504A (en) * 1981-06-25 1982-05-25 International Business Machines Corporation Etching process with vibrationally excited SF6
DE3276917D1 (en) * 1982-12-27 1987-09-10 Ibm Light waveguide with a submicron aperture, method for manufacturing the waveguide and application of the waveguide in an optical memory
DE3276138D1 (en) * 1982-12-27 1987-05-27 Ibm Optical near-field scanning microscope

Also Published As

Publication number Publication date
EP0196346A1 (de) 1986-10-08
JPH0244632B2 (de) 1990-10-04
JPS61232088A (ja) 1986-10-16
EP0196346B1 (de) 1989-07-19

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee