DE3514768C1 - Lichtempfindliches Gemisch und daraus hergestelltes Aufzeichnungsmaterial - Google Patents

Lichtempfindliches Gemisch und daraus hergestelltes Aufzeichnungsmaterial

Info

Publication number
DE3514768C1
DE3514768C1 DE3514768A DE3514768A DE3514768C1 DE 3514768 C1 DE3514768 C1 DE 3514768C1 DE 3514768 A DE3514768 A DE 3514768A DE 3514768 A DE3514768 A DE 3514768A DE 3514768 C1 DE3514768 C1 DE 3514768C1
Authority
DE
Germany
Prior art keywords
photosensitive
viscosity
mixture
mixture according
compounds
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE3514768A
Other languages
German (de)
English (en)
Inventor
D. Dipl.-Chem. Dr. 6370 Oberursel Dudek
K. 6054 Rodgau Hoßner
M. Dipl.-Chem. Dr. 6052 Mühlheim Sondergeld
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DuPont de Nemours Deutschland GmbH
Original Assignee
Du Pont De Nemours Deutschland 4000 Duesseldorf GmbH
DuPont de Nemours Deutschland GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont De Nemours Deutschland 4000 Duesseldorf GmbH, DuPont de Nemours Deutschland GmbH filed Critical Du Pont De Nemours Deutschland 4000 Duesseldorf GmbH
Priority to DE3514768A priority Critical patent/DE3514768C1/de
Priority to US06/810,364 priority patent/US4683190A/en
Priority to BR8601426A priority patent/BR8601426A/pt
Priority to CA000507227A priority patent/CA1264021A/en
Priority to EP86303038A priority patent/EP0200463B1/en
Priority to JP61092471A priority patent/JPS61248038A/ja
Application granted granted Critical
Publication of DE3514768C1 publication Critical patent/DE3514768C1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
DE3514768A 1984-11-24 1985-04-24 Lichtempfindliches Gemisch und daraus hergestelltes Aufzeichnungsmaterial Expired DE3514768C1 (de)

Priority Applications (6)

Application Number Priority Date Filing Date Title
DE3514768A DE3514768C1 (de) 1985-04-24 1985-04-24 Lichtempfindliches Gemisch und daraus hergestelltes Aufzeichnungsmaterial
US06/810,364 US4683190A (en) 1984-11-24 1985-12-18 Process to lower the viscosity of coating solutions for the production of light-sensitive reproduction materials
BR8601426A BR8601426A (pt) 1985-04-24 1986-03-31 Processo para diminuir a viscosidade de solucoes de revestimento para a producao de materiais de reproducao sensiveis a luz
CA000507227A CA1264021A (en) 1985-04-24 1986-04-22 Process to lower the viscosity of coating solutions for the production of light-sensitive reproduction materials
EP86303038A EP0200463B1 (en) 1985-04-24 1986-04-22 Coating compositions for use in the production of light-sensitive reproduction materials
JP61092471A JPS61248038A (ja) 1985-04-24 1986-04-23 感光性複写材料製造用コーティング溶液

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE3514768A DE3514768C1 (de) 1985-04-24 1985-04-24 Lichtempfindliches Gemisch und daraus hergestelltes Aufzeichnungsmaterial

Publications (1)

Publication Number Publication Date
DE3514768C1 true DE3514768C1 (de) 1986-07-24

Family

ID=6268975

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3514768A Expired DE3514768C1 (de) 1984-11-24 1985-04-24 Lichtempfindliches Gemisch und daraus hergestelltes Aufzeichnungsmaterial

Country Status (6)

Country Link
US (1) US4683190A (enExample)
EP (1) EP0200463B1 (enExample)
JP (1) JPS61248038A (enExample)
BR (1) BR8601426A (enExample)
CA (1) CA1264021A (enExample)
DE (1) DE3514768C1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0863435A1 (de) * 1997-03-06 1998-09-09 Du Pont De Nemours (Deutschland) Gmbh Material und Verfahren zum Kantenabdecken von photopolymerisierbaren Druckplatten für den Flexodruck

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5004869A (en) * 1984-06-14 1991-04-02 Amp Incorporated Electrical connector containing adipic acid polyester sealant composition
US4686171A (en) * 1986-02-14 1987-08-11 Hercules Incorporated Photopolymerizable films containing plasticizer silica combinations
DE3718447A1 (de) * 1987-06-02 1988-12-15 Basf Ag Polymerisat-ammoniumsalze
US5286595A (en) * 1990-08-08 1994-02-15 E. I. Du Pont De Nemours And Company Process for creating a tacky tonable image surface through exposure of a substrate coated with a polymer blend, including a photo-acid generator, to actinic radiation
US5229244A (en) * 1990-08-08 1993-07-20 E. I. Du Pont De Nemours And Company Dry processible photosensitive composition including photo-acid generator and optically clear polymer (co-polymer) blend that becomes tacky upon exposure to actinic radiation
ES2152258T3 (es) * 1992-07-31 2001-02-01 Du Pont Metodo y producto para montaje de particulas.
JP4282783B2 (ja) * 1997-12-16 2009-06-24 Ｊｓｒ株式会社 カラーフィルタ用感放射線性組成物
US20040131970A1 (en) * 2003-01-07 2004-07-08 Meagley Robert P. Photodefinable polymers for semiconductor applications

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2038200A1 (de) * 1969-08-01 1971-02-25 Fuji Photo Film Co Ltd Lichtempfindliches Schablonen- oder Matrizendruckmaterial
DE3327523A1 (de) * 1983-07-30 1985-02-07 Basf Ag, 6700 Ludwigshafen Lichtempfindliches mehrschichtenmaterial

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL218803A (enExample) * 1956-07-09
CA1110899A (en) * 1976-11-08 1981-10-20 David A. Simpson Process for making photographic images using a photosensitive composition which forms peroxides on irradiation with u.v. light
SU900244A1 (ru) * 1980-01-07 1982-01-23 Институт химии высокомолекулярных соединений АН УССР Фотополимеризующа с композици дл изготовлени печатных форм
DE3047126A1 (de) * 1980-12-13 1982-07-29 Basf Ag, 6700 Ludwigshafen Photopolymerisierbares aufzeichnungsmaterial und verfahren zur herstellung von reliefformen mittels dieses aufzeichnungsmaterials
GB2108986B (en) * 1981-11-03 1985-06-26 Sericol Group Ltd Photopolymerisable composition for producing screen printing stencils

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2038200A1 (de) * 1969-08-01 1971-02-25 Fuji Photo Film Co Ltd Lichtempfindliches Schablonen- oder Matrizendruckmaterial
DE3327523A1 (de) * 1983-07-30 1985-02-07 Basf Ag, 6700 Ludwigshafen Lichtempfindliches mehrschichtenmaterial

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
DE-Buch: W. Hofmann, Kautschuk- Technologie, Gentner-Verlag, Stuttgart, 1980, S. 344 - 345 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0863435A1 (de) * 1997-03-06 1998-09-09 Du Pont De Nemours (Deutschland) Gmbh Material und Verfahren zum Kantenabdecken von photopolymerisierbaren Druckplatten für den Flexodruck

Also Published As

Publication number Publication date
JPS61248038A (ja) 1986-11-05
EP0200463B1 (en) 1989-08-02
EP0200463A2 (en) 1986-11-05
CA1264021A (en) 1989-12-27
US4683190A (en) 1987-07-28
BR8601426A (pt) 1986-12-09
EP0200463A3 (en) 1987-11-04
JPH0350260B2 (enExample) 1991-08-01

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Legal Events

Date Code Title Description
8100 Publication of the examined application without publication of unexamined application
D1 Grant (no unexamined application published) patent law 81
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: DU PONT DE NEMOURS (DEUTSCHLAND) GMBH, 61352 BAD H

8339 Ceased/non-payment of the annual fee