DE3469100D1 - Method and apparatus for controlling alignment and brightness of an electron beam - Google Patents

Method and apparatus for controlling alignment and brightness of an electron beam

Info

Publication number
DE3469100D1
DE3469100D1 DE8484104924T DE3469100T DE3469100D1 DE 3469100 D1 DE3469100 D1 DE 3469100D1 DE 8484104924 T DE8484104924 T DE 8484104924T DE 3469100 T DE3469100 T DE 3469100T DE 3469100 D1 DE3469100 D1 DE 3469100D1
Authority
DE
Germany
Prior art keywords
brightness
electron beam
controlling alignment
alignment
controlling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8484104924T
Other languages
German (de)
English (en)
Inventor
Samuel K Doran
Donald F Haire
Ralph R Trotter
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of DE3469100D1 publication Critical patent/DE3469100D1/de
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
DE8484104924T 1983-06-27 1984-05-03 Method and apparatus for controlling alignment and brightness of an electron beam Expired DE3469100D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/507,638 US4568861A (en) 1983-06-27 1983-06-27 Method and apparatus for controlling alignment and brightness of an electron beam

Publications (1)

Publication Number Publication Date
DE3469100D1 true DE3469100D1 (en) 1988-03-03

Family

ID=24019506

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8484104924T Expired DE3469100D1 (en) 1983-06-27 1984-05-03 Method and apparatus for controlling alignment and brightness of an electron beam

Country Status (4)

Country Link
US (1) US4568861A (enExample)
EP (1) EP0131699B1 (enExample)
JP (1) JPS6010720A (enExample)
DE (1) DE3469100D1 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8428198D0 (en) * 1984-11-08 1984-12-19 Adwel Ltd Motor monitor synchronisation system
US4821196A (en) * 1987-02-20 1989-04-11 International Business Machines Corporation High resolution automatic focus correction electronic subsystem for E-beam lithography
EP0330763A1 (en) * 1988-03-03 1989-09-06 Koninklijke Philips Electronics N.V. Charged particle apparatus with automatic beam set-up
DE58907191D1 (de) * 1989-02-09 1994-04-14 Balzers Hochvakuum Verfahren zum Zentrieren eines Elektronenstrahles.
CA1308203C (en) * 1989-06-01 1992-09-29 Nanoquest (Canada) Inc. Magnification compensation apparatus
RU2019881C1 (ru) * 1991-12-26 1994-09-15 Физический институт им.П.Н.Лебедева РАН Электронно-лучевая трубка
JP3272820B2 (ja) * 1993-06-24 2002-04-08 富士通株式会社 電子ビーム露光装置及び方法
KR0147862B1 (ko) * 1994-08-25 1998-09-15 김광호 다중모드 모니터의 자동 빔전류 조성회로 및 그 방법
US6145438A (en) * 1998-03-20 2000-11-14 Berglund; C. Neil Method and apparatus for direct writing of semiconductor die using microcolumn array
US6262425B1 (en) * 1999-03-11 2001-07-17 International Business Machines Corporation Curvilinear axis set-up for charged particle lithography
US6456019B1 (en) 2001-02-03 2002-09-24 Nikon Corporation Real time measurement of leakage current in high voltage electron guns
JP7411521B2 (ja) * 2020-09-03 2024-01-11 株式会社ニューフレアテクノロジー 荷電粒子ビーム調整方法、荷電粒子ビーム描画方法、および荷電粒子ビーム照射装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3699304A (en) * 1969-12-15 1972-10-17 Ibm Electron beam deflection control method and apparatus
DE2117193A1 (de) * 1971-04-08 1972-10-12 Licentia Gmbh Anordnung zur Feinpositionierung eines Elektronenstrahles
US3894271A (en) * 1973-08-31 1975-07-08 Ibm Method and apparatus for aligning electron beams
US4000440A (en) * 1974-07-26 1976-12-28 International Business Machines Corporation Method and apparatus for controlling brightness and alignment of a beam of charged particles
JPS5472980A (en) * 1977-11-24 1979-06-11 Hitachi Ltd Electron-beam drawing unit
JPS5840820B2 (ja) * 1978-04-28 1983-09-08 株式会社日立製作所 電子ビ−ム自動軸調整装置
JPS5572807A (en) * 1978-11-27 1980-06-02 Hitachi Ltd Electron-beam mask check unit

Also Published As

Publication number Publication date
JPH0348649B2 (enExample) 1991-07-25
EP0131699A1 (en) 1985-01-23
EP0131699B1 (en) 1988-01-27
US4568861A (en) 1986-02-04
JPS6010720A (ja) 1985-01-19

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee