DE3465976D1 - Gas supplying apparatus - Google Patents

Gas supplying apparatus

Info

Publication number
DE3465976D1
DE3465976D1 DE8484114525T DE3465976T DE3465976D1 DE 3465976 D1 DE3465976 D1 DE 3465976D1 DE 8484114525 T DE8484114525 T DE 8484114525T DE 3465976 T DE3465976 T DE 3465976T DE 3465976 D1 DE3465976 D1 DE 3465976D1
Authority
DE
Germany
Prior art keywords
supplying apparatus
gas supplying
gas
supplying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8484114525T
Other languages
German (de)
English (en)
Inventor
Hiroaki C O Yokohama Takimoto
Tetsuo C O Yokohama W Miyajiri
Kiminobu C O Yokohama Yoshida
Tamio C O Yokohama Work Turita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Application granted granted Critical
Publication of DE3465976D1 publication Critical patent/DE3465976D1/de
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/08—Bushings, e.g. construction, bushing reinforcement means; Spinnerettes; Nozzles; Nozzle plates
    • C03B37/085—Feeding devices therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00—Feed or outlet devices; Feed or outlet control devices
    • B01J4/008—Feed or outlet control devices
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/02—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C23C16/4482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material by bubbling of carrier gas through liquid source material
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/80—Feeding the burner or the burner-heated deposition site
    • C03B2207/81—Constructional details of the feed line, e.g. heating, insulation, material, manifolds, filters
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/80—Feeding the burner or the burner-heated deposition site
    • C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
    • C03B2207/86—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid by bubbling a gas through the liquid
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/4238—With cleaner, lubrication added to fluid or liquid sealing at valve interface
    • Y10T137/4245—Cleaning or steam sterilizing
    • Y10T137/4252—Reverse fluid flow

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Loading And Unloading Of Fuel Tanks Or Ships (AREA)
DE8484114525T 1983-12-02 1984-11-30 Gas supplying apparatus Expired DE3465976D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58226750A JPS60122735A (ja) 1983-12-02 1983-12-02 原料ガス供給装置

Publications (1)

Publication Number Publication Date
DE3465976D1 true DE3465976D1 (en) 1987-10-15

Family

ID=16850019

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8484114525T Expired DE3465976D1 (en) 1983-12-02 1984-11-30 Gas supplying apparatus

Country Status (6)

Country Link
US (1) US4563312A (enExample)
EP (1) EP0147663B1 (enExample)
JP (1) JPS60122735A (enExample)
KR (1) KR870001278B1 (enExample)
CA (1) CA1237047A (enExample)
DE (1) DE3465976D1 (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60244333A (ja) * 1984-05-21 1985-12-04 Sumitomo Electric Ind Ltd 原料液補給装置
US4859375A (en) * 1986-12-29 1989-08-22 Air Products And Chemicals, Inc. Chemical refill system
JPH0824836B2 (ja) * 1986-10-09 1996-03-13 東洋紡績株式会社 液体の連続供給装置
DE3708967A1 (de) * 1987-03-19 1988-10-06 Merck Patent Gmbh Vorrichtung zur erzeugung eines gasgemisches nach dem saettigungsverfahren
JP2554356B2 (ja) * 1988-05-17 1996-11-13 住友電気工業株式会社 ガラス原料供給方法及びガラス原料供給装置
JP2846891B2 (ja) * 1988-06-03 1999-01-13 東京エレクトロン株式会社 処理装置
US4904419A (en) * 1989-03-14 1990-02-27 Reynolds Warren D Process and apparatus for vapor transfer of very high purity liquids at high dilution
GB9206552D0 (en) * 1992-03-26 1992-05-06 Epichem Ltd Bubblers
JPH0781965A (ja) * 1993-07-22 1995-03-28 Sumitomo Electric Ind Ltd ガス生成装置並びに光導波路及び光ファイバ母材を製造する方法及び装置
TW338174B (en) * 1995-01-06 1998-08-11 Tokyo Electron Co Ltd Apparatus for supplying a treatment material
KR100524204B1 (ko) * 1998-01-07 2006-01-27 동경 엘렉트론 주식회사 가스 처리장치
DE502004012396D1 (de) 2004-02-20 2011-05-26 Cs Clean Systems Ag Vorrichtung und Verfahren zum Nachfüllen eines Blasenverdampfers
US9914632B2 (en) * 2014-08-22 2018-03-13 Applied Materials, Inc. Methods and apparatus for liquid chemical delivery
CN111153590B (zh) * 2019-12-31 2022-03-25 江苏通鼎光棒有限公司 一种高精度的四氯化锗鼓泡装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2371188A (en) * 1945-03-13 Means fob clearing pipe systems
US2178559A (en) * 1937-06-12 1939-11-07 Beer Control Systems Inc Fluid dispensing system
US2882539A (en) * 1954-11-18 1959-04-21 Walz Bruno Tube cleaning mechanism
US3044466A (en) * 1960-12-23 1962-07-17 Gomco Surgical Mfg Corp Valve and pump assembly for closing and irrigating fluid drainage tube in suction apparatus
US4276243A (en) * 1978-12-08 1981-06-30 Western Electric Company, Inc. Vapor delivery control system and method
US4235829A (en) * 1979-05-07 1980-11-25 Western Electric Company, Inc. Vapor delivery system and method of maintaining a constant level of liquid therein
US4313897A (en) * 1980-01-30 1982-02-02 Bruce Garrard Gas and liquid admixing system

Also Published As

Publication number Publication date
EP0147663B1 (en) 1987-09-09
US4563312A (en) 1986-01-07
KR870001278B1 (ko) 1987-06-30
JPS6144824B2 (enExample) 1986-10-04
JPS60122735A (ja) 1985-07-01
CA1237047A (en) 1988-05-24
EP0147663A1 (en) 1985-07-10
KR850004449A (ko) 1985-07-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee