DE3415794C2 - Magnetischer Aufzeichnungsträger und Verfahren zu seiner Herstellung - Google Patents
Magnetischer Aufzeichnungsträger und Verfahren zu seiner HerstellungInfo
- Publication number
- DE3415794C2 DE3415794C2 DE3415794A DE3415794A DE3415794C2 DE 3415794 C2 DE3415794 C2 DE 3415794C2 DE 3415794 A DE3415794 A DE 3415794A DE 3415794 A DE3415794 A DE 3415794A DE 3415794 C2 DE3415794 C2 DE 3415794C2
- Authority
- DE
- Germany
- Prior art keywords
- oxygen
- magnetic layer
- substrate
- recording medium
- magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 title claims description 13
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 92
- 239000001301 oxygen Substances 0.000 claims abstract description 89
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 88
- 239000000758 substrate Substances 0.000 claims abstract description 59
- 239000002245 particle Substances 0.000 claims abstract description 33
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 26
- 229910017052 cobalt Inorganic materials 0.000 claims abstract description 24
- 239000010941 cobalt Substances 0.000 claims abstract description 24
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims abstract description 24
- 239000010409 thin film Substances 0.000 claims abstract description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 32
- 239000010408 film Substances 0.000 claims description 16
- 229910052759 nickel Inorganic materials 0.000 claims description 15
- 238000011282 treatment Methods 0.000 claims description 14
- 230000007935 neutral effect Effects 0.000 claims description 12
- 239000011651 chromium Substances 0.000 claims description 11
- 229910052804 chromium Inorganic materials 0.000 claims description 10
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 9
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 4
- 238000000151 deposition Methods 0.000 claims description 4
- 230000001590 oxidative effect Effects 0.000 claims description 4
- 230000008569 process Effects 0.000 claims description 4
- 229910001882 dioxygen Inorganic materials 0.000 claims description 3
- 238000001771 vacuum deposition Methods 0.000 claims description 3
- 239000007858 starting material Substances 0.000 claims 1
- ZGDWHDKHJKZZIQ-UHFFFAOYSA-N cobalt nickel Chemical compound [Co].[Ni].[Ni].[Ni] ZGDWHDKHJKZZIQ-UHFFFAOYSA-N 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 79
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 18
- 238000001704 evaporation Methods 0.000 description 16
- 230000008020 evaporation Effects 0.000 description 15
- 239000007789 gas Substances 0.000 description 10
- 229910052786 argon Inorganic materials 0.000 description 9
- 230000003647 oxidation Effects 0.000 description 9
- 238000007254 oxidation reaction Methods 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 150000002500 ions Chemical class 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- -1 polypropylene Polymers 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- NVIVJPRCKQTWLY-UHFFFAOYSA-N cobalt nickel Chemical compound [Co][Ni][Co] NVIVJPRCKQTWLY-UHFFFAOYSA-N 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 238000007733 ion plating Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000007800 oxidant agent Substances 0.000 description 2
- 229910020598 Co Fe Inorganic materials 0.000 description 1
- 229910020632 Co Mn Inorganic materials 0.000 description 1
- 229910020630 Co Ni Inorganic materials 0.000 description 1
- 229910002519 Co-Fe Inorganic materials 0.000 description 1
- 229910002440 Co–Ni Inorganic materials 0.000 description 1
- 229910020678 Co—Mn Inorganic materials 0.000 description 1
- 229910020706 Co—Re Inorganic materials 0.000 description 1
- 229910020517 Co—Ti Inorganic materials 0.000 description 1
- 229910020516 Co—V Inorganic materials 0.000 description 1
- 229910020515 Co—W Inorganic materials 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 1
- 238000004581 coalescence Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- FPVKHBSQESCIEP-JQCXWYLXSA-N pentostatin Chemical compound C1[C@H](O)[C@@H](CO)O[C@H]1N1C(N=CNC[C@H]2O)=C2N=C1 FPVKHBSQESCIEP-JQCXWYLXSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000011573 trace mineral Substances 0.000 description 1
- 235000013619 trace mineral Nutrition 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
- G11B5/66—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers
- G11B5/672—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers having different compositions in a plurality of magnetic layers, e.g. layer compositions having differing elemental components or differing proportions of elements
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/739—Magnetic recording media substrates
- G11B5/73923—Organic polymer substrates
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/739—Magnetic recording media substrates
- G11B5/73923—Organic polymer substrates
- G11B5/73927—Polyester substrates, e.g. polyethylene terephthalate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/90—Magnetic feature
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
- Y10T428/2495—Thickness [relative or absolute]
- Y10T428/24967—Absolute thicknesses specified
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
- Y10T428/2495—Thickness [relative or absolute]
- Y10T428/24967—Absolute thicknesses specified
- Y10T428/24975—No layer or component greater than 5 mils thick
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
- Magnetic Record Carriers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58076640A JPS59203238A (ja) | 1983-04-30 | 1983-04-30 | 磁気記録媒体の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE3415794A1 DE3415794A1 (de) | 1984-10-31 |
| DE3415794C2 true DE3415794C2 (de) | 1987-01-29 |
Family
ID=13610974
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE3415794A Expired DE3415794C2 (de) | 1983-04-30 | 1984-04-27 | Magnetischer Aufzeichnungsträger und Verfahren zu seiner Herstellung |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US4596735A (US06258443-20010710-M00008.png) |
| JP (1) | JPS59203238A (US06258443-20010710-M00008.png) |
| DE (1) | DE3415794C2 (US06258443-20010710-M00008.png) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19535142B4 (de) * | 1994-09-22 | 2010-09-09 | Sony Corp. | Magnetisches Aufzeichnungsmedium |
Families Citing this family (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3573672D1 (en) * | 1984-01-26 | 1989-11-16 | Hitachi Maxell | Magnetic recording medium and production thereof |
| US5013583A (en) * | 1984-02-11 | 1991-05-07 | Teijin Limited | Method of producing a magnetic recording medium |
| JPH0766507B2 (ja) * | 1984-02-16 | 1995-07-19 | コニカ株式会社 | 磁気記録媒体 |
| CA1235808A (en) * | 1984-03-22 | 1988-04-26 | Tetsuo Oka | Vertical magnetic recording medium and process for preparation thereof |
| KR890004257B1 (ko) * | 1984-10-29 | 1989-10-28 | 니뽕 빅터 가부시끼가이샤 | 자기 기록매체 및 그 제조법 |
| US4729924A (en) * | 1984-12-21 | 1988-03-08 | Minnesota Mining And Manufacturing Company | Metallic thin film magnetic recording medium having a hard protective layer |
| US4803130A (en) * | 1984-12-21 | 1989-02-07 | Minnesota Mining And Manufacturing Company | Reactive sputtering process for recording media |
| JPH0610871B2 (ja) * | 1984-12-25 | 1994-02-09 | ティーディーケイ株式会社 | 磁気記録媒体 |
| JP2662777B2 (ja) * | 1985-04-15 | 1997-10-15 | 日立マクセル株式会社 | 磁気記録媒体およびその製造方法 |
| CA1307173C (en) * | 1985-05-25 | 1992-09-08 | Morimi Hashimoto | Magnetic recording medium |
| US4755426A (en) * | 1986-01-18 | 1988-07-05 | Hitachi Maxell, Ltd. | Magnetic recording medium and production of the same |
| DE3710024A1 (de) * | 1986-03-28 | 1987-10-22 | Hitachi Ltd | Magnetisches speichermedium |
| US4861662A (en) * | 1987-02-03 | 1989-08-29 | Akashic Memories Corporation | Protective layer for magnetic disk |
| DE3803000A1 (de) * | 1988-02-02 | 1989-08-10 | Basf Ag | Flaechenfoermiges, mehrschichtiges magneto-optisches aufzeichnungsmaterial |
| JP2714698B2 (ja) * | 1989-05-12 | 1998-02-16 | 富士写真フイルム株式会社 | 磁気記録媒体 |
| DE4021970C2 (de) * | 1989-07-10 | 1993-12-16 | Toshiba Kawasaki Kk | Magnetischer Aufzeichnungsträger und Verfahren zu seiner Herstellung |
| JPH0363920A (ja) * | 1989-08-01 | 1991-03-19 | Hitachi Ltd | 磁気記録媒体及びその製造方法 |
| JP2623160B2 (ja) * | 1990-09-07 | 1997-06-25 | 富士写真フイルム株式会社 | 磁気記録媒体 |
| JPH05101365A (ja) * | 1991-03-22 | 1993-04-23 | Tdk Corp | 垂直磁気記録媒体およびその製造方法 |
| US5492774A (en) * | 1991-07-23 | 1996-02-20 | Sony Corporation | Perpendicular magnetic recording medium and process for production of the same |
| US5674637A (en) * | 1993-12-28 | 1997-10-07 | Tdk Corporation | Magnetic recording medium |
| AT405382B (de) * | 1995-10-04 | 1999-07-26 | Isosport Verbundbauteile | Verfahren zur herstellung einer sandwichplatte sowie deren verwendung |
| TW490714B (en) | 1999-12-27 | 2002-06-11 | Semiconductor Energy Lab | Film formation apparatus and method for forming a film |
| US20020011205A1 (en) | 2000-05-02 | 2002-01-31 | Shunpei Yamazaki | Film-forming apparatus, method of cleaning the same, and method of manufacturing a light-emitting device |
| US7517551B2 (en) * | 2000-05-12 | 2009-04-14 | Semiconductor Energy Laboratory Co., Ltd. | Method of manufacturing a light-emitting device |
| US7134244B2 (en) * | 2001-08-03 | 2006-11-14 | Aranar, Inc. | Stabilized window structures and methods of stabilizing and removing shattered glass from window structures |
| JP4042103B2 (ja) * | 2002-02-06 | 2008-02-06 | 日本ビクター株式会社 | 磁気記録媒体 |
| SG113448A1 (en) * | 2002-02-25 | 2005-08-29 | Semiconductor Energy Lab | Fabrication system and a fabrication method of a light emitting device |
| US7309269B2 (en) * | 2002-04-15 | 2007-12-18 | Semiconductor Energy Laboratory Co., Ltd. | Method of fabricating light-emitting device and apparatus for manufacturing light-emitting device |
| US20030221620A1 (en) * | 2002-06-03 | 2003-12-04 | Semiconductor Energy Laboratory Co., Ltd. | Vapor deposition device |
| US6937448B2 (en) * | 2002-11-13 | 2005-08-30 | Hitachi Global Storage Technologies Netherlands, B.V. | Spin valve having copper oxide spacer layer with specified coupling field strength between multi-layer free and pinned layer structures |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3795542A (en) * | 1971-06-09 | 1974-03-05 | Corning Glass Works | Method of making a magnetic recording and storage device |
| US3829372A (en) * | 1972-05-25 | 1974-08-13 | Ibm | Multilayer magnetic structure and methods of making same |
| JPS5155995A (en) * | 1974-11-12 | 1976-05-17 | Nippon Telegraph & Telephone | Sankabutsujiseihakumakuno seizohoho |
| GB1504293A (en) * | 1975-02-12 | 1978-03-15 | Emi Ltd | Method of forming magnetic media |
| GB1596385A (en) * | 1976-12-29 | 1981-08-26 | Matsushita Electric Ind Co Ltd | Methods and apparatus for manufacturing magnetic recording media |
| JPS6033289B2 (ja) * | 1979-07-18 | 1985-08-02 | 松下電器産業株式会社 | 金属薄膜型磁気記録媒体 |
| JPS56143519A (en) * | 1980-04-08 | 1981-11-09 | Tdk Corp | Magnetic recording medium and manufacturing device |
| JPS5814324A (ja) * | 1981-07-17 | 1983-01-27 | Fuji Photo Film Co Ltd | 磁気記録媒体 |
| US4450186A (en) * | 1981-08-20 | 1984-05-22 | Matsushita Electric Industrial Co., Ltd. | Method and device for manufacturing magnetic recording medium |
| DE3232520A1 (de) * | 1981-09-03 | 1983-03-17 | Fuji Photo Film Co., Ltd., Minami-Ashigara, Kanagawa | Verfahren zur herstellung eines magnetischen aufzeichnungstraegers |
| JPS5883328A (ja) * | 1981-11-12 | 1983-05-19 | Fuji Photo Film Co Ltd | 磁気記録媒体 |
| JPS59185024A (ja) * | 1983-04-04 | 1984-10-20 | Matsushita Electric Ind Co Ltd | 磁気記録媒体 |
-
1983
- 1983-04-30 JP JP58076640A patent/JPS59203238A/ja active Granted
-
1984
- 1984-04-25 US US06/603,894 patent/US4596735A/en not_active Expired - Lifetime
- 1984-04-27 DE DE3415794A patent/DE3415794C2/de not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19535142B4 (de) * | 1994-09-22 | 2010-09-09 | Sony Corp. | Magnetisches Aufzeichnungsmedium |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59203238A (ja) | 1984-11-17 |
| DE3415794A1 (de) | 1984-10-31 |
| JPH054728B2 (US06258443-20010710-M00008.png) | 1993-01-20 |
| US4596735A (en) | 1986-06-24 |
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