DE3380719D1 - Electron beam exposure apparatus - Google Patents

Electron beam exposure apparatus

Info

Publication number
DE3380719D1
DE3380719D1 DE8383303277T DE3380719T DE3380719D1 DE 3380719 D1 DE3380719 D1 DE 3380719D1 DE 8383303277 T DE8383303277 T DE 8383303277T DE 3380719 T DE3380719 T DE 3380719T DE 3380719 D1 DE3380719 D1 DE 3380719D1
Authority
DE
Germany
Prior art keywords
electron beam
exposure apparatus
beam exposure
electron
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8383303277T
Other languages
English (en)
Inventor
Hiroshi Yasuda
Haruo Tsuchikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Application granted granted Critical
Publication of DE3380719D1 publication Critical patent/DE3380719D1/de
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/0203—Protection arrangements
    • H01J2237/0209—Avoiding or diminishing effects of eddy currents
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H01J2237/30433—System calibration
    • H01J2237/3045—Deflection calibration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H01J2237/30455—Correction during exposure

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electron Beam Exposure (AREA)
DE8383303277T 1982-06-11 1983-06-07 Electron beam exposure apparatus Expired DE3380719D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57100422A JPS58218117A (ja) 1982-06-11 1982-06-11 電子ビ−ム制御装置

Publications (1)

Publication Number Publication Date
DE3380719D1 true DE3380719D1 (en) 1989-11-16

Family

ID=14273531

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8383303277T Expired DE3380719D1 (en) 1982-06-11 1983-06-07 Electron beam exposure apparatus

Country Status (4)

Country Link
US (1) US4585943A (de)
EP (1) EP0097016B1 (de)
JP (1) JPS58218117A (de)
DE (1) DE3380719D1 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59124719A (ja) * 1982-12-29 1984-07-18 Fujitsu Ltd 電子ビ−ム露光装置
US4560854A (en) * 1983-12-27 1985-12-24 The Babcock & Wilcox Company Electron beam welder control
JPS60147117A (ja) * 1984-01-10 1985-08-03 Fujitsu Ltd 電子ビ−ム装置の調整方法
JPS6229135A (ja) * 1985-07-29 1987-02-07 Advantest Corp 荷電粒子ビ−ム露光方法及びこの方法を用いた荷電粒子ビ−ム露光装置
US4907287A (en) * 1985-10-16 1990-03-06 Hitachi, Ltd. Image correction system for scanning electron microscope
JPS62277724A (ja) * 1986-05-27 1987-12-02 Fujitsu Ltd 電子ビ−ム露光装置
DE68920281T2 (de) * 1988-10-31 1995-05-11 Fujitsu Ltd Vorrichtung und Verfahren zur Lithographie mittels eines Strahls geladener Teilchen.
JPH03119717A (ja) * 1989-09-30 1991-05-22 Fujitsu Ltd 荷電粒子露光装置および露光方法
JP3212360B2 (ja) * 1992-06-16 2001-09-25 株式会社日立製作所 マスクの製造方法、および半導体集積回路装置の製造方法
US6110318A (en) * 1997-11-26 2000-08-29 Science Research Laboratory System for selective electron beam irradiation
DE19911372A1 (de) * 1999-03-15 2000-09-28 Pms Gmbh Vorrichtung zum Steuern eines Strahls aus elektrisch geladenen Teilchen
JP2007329293A (ja) * 2006-06-08 2007-12-20 Jeol Ltd 荷電粒子ビーム装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3911321A (en) * 1971-11-26 1975-10-07 Ibm Error compensating deflection coils in a conducting magnetic tube
US3801792A (en) * 1973-05-23 1974-04-02 Bell Telephone Labor Inc Electron beam apparatus
US4125772A (en) * 1977-10-13 1978-11-14 American Optical Corporation Scanning electron microscope with eddy-current compensation
DE2936911A1 (de) * 1979-09-12 1981-04-02 Siemens AG, 1000 Berlin und 8000 München Verfahren und vorrichtung zur regelung eines magnetischen ablenksystems
JPS5693318A (en) * 1979-12-10 1981-07-28 Fujitsu Ltd Electron beam exposure device

Also Published As

Publication number Publication date
US4585943A (en) 1986-04-29
EP0097016B1 (de) 1989-10-11
EP0097016A2 (de) 1983-12-28
JPH047087B2 (de) 1992-02-07
JPS58218117A (ja) 1983-12-19
EP0097016A3 (en) 1985-09-11

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee