DE3379442D1 - Double heterostructure semiconductor laser with periodic structure formed in guide layer - Google Patents
Double heterostructure semiconductor laser with periodic structure formed in guide layerInfo
- Publication number
- DE3379442D1 DE3379442D1 DE8383110135T DE3379442T DE3379442D1 DE 3379442 D1 DE3379442 D1 DE 3379442D1 DE 8383110135 T DE8383110135 T DE 8383110135T DE 3379442 T DE3379442 T DE 3379442T DE 3379442 D1 DE3379442 D1 DE 3379442D1
- Authority
- DE
- Germany
- Prior art keywords
- semiconductor laser
- structure formed
- periodic structure
- guide layer
- double heterostructure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/11—Comprising a photonic bandgap structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/026—Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/1028—Coupling to elements in the cavity, e.g. coupling to waveguides adjacent the active region, e.g. forward coupled [DFC] structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
- H01S5/2238—Buried stripe structure with a terraced structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
- H01S5/2275—Buried mesa structure ; Striped active layer mesa created by etching
- H01S5/2277—Buried mesa structure ; Striped active layer mesa created by etching double channel planar buried heterostructure [DCPBH] laser
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Geometry (AREA)
- Semiconductor Lasers (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57178824A JPH0632322B2 (ja) | 1982-10-12 | 1982-10-12 | 単一軸モード半導体レーザ |
JP4347783A JPS59169191A (ja) | 1983-03-16 | 1983-03-16 | 単一軸モ−ド半導体レ−ザ |
JP5950583A JPS59184585A (ja) | 1983-04-05 | 1983-04-05 | 単一軸モ−ド半導体レ−ザ |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3379442D1 true DE3379442D1 (en) | 1989-04-20 |
Family
ID=27291561
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8383110135T Expired DE3379442D1 (en) | 1982-10-12 | 1983-10-11 | Double heterostructure semiconductor laser with periodic structure formed in guide layer |
Country Status (4)
Country | Link |
---|---|
US (1) | US4618959A (de) |
EP (1) | EP0106305B1 (de) |
CA (1) | CA1197308A (de) |
DE (1) | DE3379442D1 (de) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59205787A (ja) * | 1983-05-09 | 1984-11-21 | Nec Corp | 単一軸モ−ド半導体レ−ザ |
US4751710A (en) * | 1984-07-26 | 1988-06-14 | Nec Corporation | Semiconductor laser device |
JPS61160987A (ja) * | 1985-01-09 | 1986-07-21 | Nec Corp | 集積型半導体光素子とその製造方法 |
US4716570A (en) * | 1985-01-10 | 1987-12-29 | Sharp Kabushiki Kaisha | Distributed feedback semiconductor laser device |
JPS62194691A (ja) * | 1986-02-21 | 1987-08-27 | Kokusai Denshin Denwa Co Ltd <Kdd> | 光導波路領域を有する半導体光集積装置の製造方法 |
US4908833A (en) * | 1989-01-27 | 1990-03-13 | American Telephone And Telegraph Company | Distributed feedback laser for frequency modulated communication systems |
US4905253A (en) * | 1989-01-27 | 1990-02-27 | American Telephone And Telegraph Company | Distributed Bragg reflector laser for frequency modulated communication systems |
US5023944A (en) * | 1989-09-05 | 1991-06-11 | General Dynamics Corp./Electronics Division | Optical resonator structures |
US6026106A (en) * | 1997-03-26 | 2000-02-15 | Mitsubishi Denki Kabushiki Kaisha | Composite optical device |
JP2000323789A (ja) * | 1999-05-11 | 2000-11-24 | Nec Corp | 窓型半導体レーザおよびその製造方法 |
JP2002169022A (ja) * | 2000-12-04 | 2002-06-14 | Nippon Sheet Glass Co Ltd | 光学素子およびそれを用いた分光装置および集積光学装置 |
CN112821199A (zh) * | 2021-02-05 | 2021-05-18 | 中国工程物理研究院应用电子学研究所 | 一种阶梯波导厚度的半导体激光器 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4190813A (en) * | 1977-12-28 | 1980-02-26 | Bell Telephone Laboratories, Incorporated | Strip buried heterostructure laser |
US4464762A (en) * | 1982-02-22 | 1984-08-07 | Bell Telephone Laboratories, Incorporated | Monolithically integrated distributed Bragg reflector laser |
-
1983
- 1983-10-11 DE DE8383110135T patent/DE3379442D1/de not_active Expired
- 1983-10-11 EP EP83110135A patent/EP0106305B1/de not_active Expired
- 1983-10-12 CA CA000438801A patent/CA1197308A/en not_active Expired
- 1983-10-12 US US06/541,211 patent/US4618959A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US4618959A (en) | 1986-10-21 |
CA1197308A (en) | 1985-11-26 |
EP0106305A3 (en) | 1986-03-12 |
EP0106305B1 (de) | 1989-03-15 |
EP0106305A2 (de) | 1984-04-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |