DE3377154D1 - Infrared furnace with controlled environment - Google Patents
Infrared furnace with controlled environmentInfo
- Publication number
- DE3377154D1 DE3377154D1 DE8383113216T DE3377154T DE3377154D1 DE 3377154 D1 DE3377154 D1 DE 3377154D1 DE 8383113216 T DE8383113216 T DE 8383113216T DE 3377154 T DE3377154 T DE 3377154T DE 3377154 D1 DE3377154 D1 DE 3377154D1
- Authority
- DE
- Germany
- Prior art keywords
- controlled environment
- infrared furnace
- furnace
- infrared
- environment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D99/00—Subject matter not provided for in other groups of this subclass
- F27D99/0073—Seals
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/04—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity adapted for treating the charge in vacuum or special atmosphere
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/06—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity heated without contact between combustion gases and charge; electrically heated
- F27B9/062—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity heated without contact between combustion gases and charge; electrically heated electrically heated
- F27B9/066—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity heated without contact between combustion gases and charge; electrically heated electrically heated heated by lamps
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/12—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity with special arrangements for preheating or cooling the charge
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/30—Details, accessories, or equipment peculiar to furnaces of these types
- F27B9/3077—Arrangements for treating electronic components, e.g. semiconductors
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/30—Details, accessories, or equipment peculiar to furnaces of these types
- F27B9/36—Arrangements of heating devices
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/14—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment
- F27B9/20—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment the charge moving in a substantially straight path tunnel furnace
- F27B9/24—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment the charge moving in a substantially straight path tunnel furnace being carried by a conveyor
- F27B9/243—Endless-strand conveyor
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D99/00—Subject matter not provided for in other groups of this subclass
- F27D99/0073—Seals
- F27D2099/0078—Means to minimize the leakage of the furnace atmosphere during charging or discharging
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- Tunnel Furnaces (AREA)
- Furnace Details (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/456,564 US4477718A (en) | 1983-01-10 | 1983-01-10 | Infrared furnace with controlled environment |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3377154D1 true DE3377154D1 (en) | 1988-07-28 |
Family
ID=23813264
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8383113216T Expired DE3377154D1 (en) | 1983-01-10 | 1983-12-29 | Infrared furnace with controlled environment |
Country Status (4)
Country | Link |
---|---|
US (1) | US4477718A (de) |
EP (1) | EP0113919B1 (de) |
JP (1) | JPS59129378A (de) |
DE (1) | DE3377154D1 (de) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6144196U (ja) * | 1984-08-27 | 1986-03-24 | 日本碍子株式会社 | 赤外線焼成炉 |
FR2627849B1 (fr) * | 1988-02-26 | 1991-07-12 | Vieillard Guy | Dispositif d'obturation permettant la mise en place d'un appareil de mesure ou d'intervention dans une enceinte a atmosphere chaude et sous pression |
US5551670A (en) * | 1990-10-16 | 1996-09-03 | Bgk Finishing Systems, Inc. | High intensity infrared heat treating apparatus |
US5960158A (en) * | 1997-07-11 | 1999-09-28 | Ag Associates | Apparatus and method for filtering light in a thermal processing chamber |
US5970214A (en) * | 1998-05-14 | 1999-10-19 | Ag Associates | Heating device for semiconductor wafers |
US5930456A (en) * | 1998-05-14 | 1999-07-27 | Ag Associates | Heating device for semiconductor wafers |
US6210484B1 (en) | 1998-09-09 | 2001-04-03 | Steag Rtp Systems, Inc. | Heating device containing a multi-lamp cone for heating semiconductor wafers |
US20010031229A1 (en) * | 1998-10-20 | 2001-10-18 | Spjut Reed E. | UV-enhanced, in-line, infrared phosphorous diffusion furnace |
US6771895B2 (en) | 1999-01-06 | 2004-08-03 | Mattson Technology, Inc. | Heating device for heating semiconductor wafers in thermal processing chambers |
WO2001014811A1 (en) | 1999-08-23 | 2001-03-01 | Radiant Technology Corporation | Continuous-conduction wafer bump reflow system |
US6495800B2 (en) | 1999-08-23 | 2002-12-17 | Carson T. Richert | Continuous-conduction wafer bump reflow system |
US8328551B2 (en) * | 2002-09-26 | 2012-12-11 | Btu International, Inc. | Convection furnace thermal profile enhancement |
US20050166844A1 (en) * | 2004-02-03 | 2005-08-04 | Nicholas Gralenski | High reflectivity atmospheric pressure furnace for preventing contamination of a work piece |
US20080041836A1 (en) * | 2004-02-03 | 2008-02-21 | Nicholas Gralenski | High temperature heating element for preventing contamination of a work piece |
US7514650B2 (en) * | 2005-12-08 | 2009-04-07 | Despatch Industries Limited Partnership | Continuous infrared furnace |
PL213246B1 (pl) * | 2009-02-12 | 2013-02-28 | Seco Warwick Spolka Akcyjna | Piec retortowy do obróbki cieplnej i cieplno-chemicznej |
US8965185B2 (en) * | 2009-03-02 | 2015-02-24 | Btu International, Inc. | Infrared furnace system |
US8865058B2 (en) | 2010-04-14 | 2014-10-21 | Consolidated Nuclear Security, LLC | Heat treatment furnace |
WO2012009636A1 (en) * | 2010-07-15 | 2012-01-19 | Despatch Industries Limited Partnership | Firing furnace configuration for thermal processing system |
US9589817B2 (en) | 2011-04-15 | 2017-03-07 | Illinois Tool Works Inc. | Dryer |
CN102306621A (zh) * | 2011-08-25 | 2012-01-04 | 上海煦康电子科技有限公司 | 半导体元件烧结的工艺方法 |
JP5931769B2 (ja) * | 2013-02-01 | 2016-06-08 | アイシン高丘株式会社 | 赤外炉及び赤外線加熱方法 |
CN103499209A (zh) * | 2013-09-06 | 2014-01-08 | 北京吉阳技术股份有限公司 | 一种应用于晶硅光伏电池生产的链式烧结炉炉膛结构及方法 |
WO2017163624A1 (ja) * | 2016-03-24 | 2017-09-28 | 日本碍子株式会社 | 工業炉及びその熱利用方法 |
CN113446846B (zh) * | 2021-07-22 | 2024-08-06 | 深圳市鸿富诚新材料股份有限公司 | 一种高效隧道炉 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2549619A (en) * | 1945-11-30 | 1951-04-17 | William J Miskella | Infrared oven |
US2521232A (en) * | 1946-03-27 | 1950-09-05 | Ralph W Lashells | Infrared ray equipment |
DE925785C (de) * | 1952-08-28 | 1955-03-31 | Siemens Ag | Bestrahlungseinrichtung |
US3242314A (en) * | 1962-07-05 | 1966-03-22 | Aerojet General Co | Portable brazing and welding device |
US3188459A (en) * | 1962-11-02 | 1965-06-08 | Northrop Corp | Lamp holder |
US3239651A (en) * | 1963-08-21 | 1966-03-08 | Ekco Products Company | Heating unit |
US3305680A (en) * | 1965-01-11 | 1967-02-21 | Hi Shear Corp | Lamp terminal assembly |
US3441454A (en) * | 1965-10-29 | 1969-04-29 | Westinghouse Electric Corp | Method of fabricating a semiconductor by diffusion |
US3473510A (en) * | 1966-02-23 | 1969-10-21 | Corning Glass Works | Method and apparatus for the continuous doping of semiconductor materials |
US3415503A (en) * | 1967-08-18 | 1968-12-10 | Btu Eng Corp | Conditioned atmosphere furnace muffle |
ES378214A1 (es) * | 1969-05-19 | 1973-01-01 | Ibm | Un sistema para tratar material, especialmente semiconduc- tor. |
US3688685A (en) * | 1971-03-12 | 1972-09-05 | R F Wrench | Electric broiler for simultaneously broiling a plurality of large viands |
US3792230A (en) * | 1972-03-30 | 1974-02-12 | Industrial Innovations Inc | Gas-cooled torch lamp |
US4101759A (en) * | 1976-10-26 | 1978-07-18 | General Electric Company | Semiconductor body heater |
EP0061158B1 (de) * | 1981-03-23 | 1987-09-09 | Radiant Technology Corporation | Verfahren zum Einbrennen von elektronischen Dickschichtschaltungen |
-
1983
- 1983-01-10 US US06/456,564 patent/US4477718A/en not_active Expired - Lifetime
- 1983-04-18 JP JP58067151A patent/JPS59129378A/ja active Granted
- 1983-12-29 DE DE8383113216T patent/DE3377154D1/de not_active Expired
- 1983-12-29 EP EP83113216A patent/EP0113919B1/de not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS59129378A (ja) | 1984-07-25 |
EP0113919B1 (de) | 1988-06-22 |
JPS618355B2 (de) | 1986-03-13 |
EP0113919A1 (de) | 1984-07-25 |
US4477718A (en) | 1984-10-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |