DE3374611D1 - Stripper for radiosensitive resist - Google Patents

Stripper for radiosensitive resist

Info

Publication number
DE3374611D1
DE3374611D1 DE8383101200T DE3374611T DE3374611D1 DE 3374611 D1 DE3374611 D1 DE 3374611D1 DE 8383101200 T DE8383101200 T DE 8383101200T DE 3374611 T DE3374611 T DE 3374611T DE 3374611 D1 DE3374611 D1 DE 3374611D1
Authority
DE
Germany
Prior art keywords
stripper
radiosensitive
resist
radiosensitive resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8383101200T
Other languages
English (en)
Inventor
Mutsuo Kataoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Application granted granted Critical
Publication of DE3374611D1 publication Critical patent/DE3374611D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE8383101200T 1982-02-15 1983-02-08 Stripper for radiosensitive resist Expired DE3374611D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57021288A JPS58139430A (ja) 1982-02-15 1982-02-15 レジストの剥離法

Publications (1)

Publication Number Publication Date
DE3374611D1 true DE3374611D1 (en) 1987-12-23

Family

ID=12050940

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8383101200T Expired DE3374611D1 (en) 1982-02-15 1983-02-08 Stripper for radiosensitive resist

Country Status (4)

Country Link
US (1) US4518675A (de)
EP (1) EP0086446B1 (de)
JP (1) JPS58139430A (de)
DE (1) DE3374611D1 (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3530282A1 (de) * 1985-08-24 1987-03-05 Hoechst Ag Verfahren zum entschichten von lichtgehaerteten photoresistschichten
JPS62223750A (ja) * 1986-03-26 1987-10-01 Toray Ind Inc 放射線感応ポジ型レジストおよび該レジスト組成物
US4729797A (en) * 1986-12-31 1988-03-08 International Business Machines Corporation Process for removal of cured epoxy
US4964919A (en) * 1988-12-27 1990-10-23 Nalco Chemical Company Cleaning of silicon wafers with an aqueous solution of KOH and a nitrogen-containing compound
US5073287A (en) * 1990-07-16 1991-12-17 Fremont Industries, Inc. Coating remover and paint stripper containing N-methyl-2-pyrrolidone, methanol, and sodium methoxide
US5407788A (en) * 1993-06-24 1995-04-18 At&T Corp. Photoresist stripping method
US6248704B1 (en) 1999-05-03 2001-06-19 Ekc Technology, Inc. Compositions for cleaning organic and plasma etched residues for semiconductors devices
US6531436B1 (en) 2000-02-25 2003-03-11 Shipley Company, L.L.C. Polymer removal
US6319835B1 (en) 2000-02-25 2001-11-20 Shipley Company, L.L.C. Stripping method
US6753130B1 (en) * 2001-09-18 2004-06-22 Seagate Technology Llc Resist removal from patterned recording media
EP1466950A1 (de) * 2003-04-10 2004-10-13 Kansai Paint Co., Ltd. Beschichtungsfilm, Entschichtungslösung und Entschichtungsverfahren
JP2004323841A (ja) * 2003-04-10 2004-11-18 Kansai Paint Co Ltd 被膜の剥離液及び被膜の剥離方法
US7632796B2 (en) 2005-10-28 2009-12-15 Dynaloy, Llc Dynamic multi-purpose composition for the removal of photoresists and method for its use
US8263539B2 (en) * 2005-10-28 2012-09-11 Dynaloy, Llc Dynamic multi-purpose composition for the removal of photoresists and methods for its use
US9329486B2 (en) 2005-10-28 2016-05-03 Dynaloy, Llc Dynamic multi-purpose composition for the removal of photoresists and method for its use
TWI450052B (zh) * 2008-06-24 2014-08-21 Dynaloy Llc 用於後段製程操作有效之剝離溶液
US8987181B2 (en) 2011-11-08 2015-03-24 Dynaloy, Llc Photoresist and post etch residue cleaning solution
CN102626699A (zh) * 2012-04-25 2012-08-08 华灿光电股份有限公司 一种提高芯片亮度的方法
CN102854761A (zh) * 2012-08-08 2013-01-02 华灿光电股份有限公司 一种刻蚀后去胶的溶液和方法
US9158202B2 (en) 2012-11-21 2015-10-13 Dynaloy, Llc Process and composition for removing substances from substrates
US9029268B2 (en) 2012-11-21 2015-05-12 Dynaloy, Llc Process for etching metals
US11262654B2 (en) * 2019-12-27 2022-03-01 Intel Corporation Chain scission resist compositions for EUV lithography applications

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2694658A (en) * 1953-09-03 1954-11-16 Stepan Chemical Co Metal stripping process
US2850411A (en) * 1956-01-23 1958-09-02 Paul O Tobeler Method for removing coatings from film base
US3679593A (en) * 1969-01-24 1972-07-25 Wasatch Chem Co Stripping of condensation polymers with an alkoxide
US3784477A (en) * 1971-08-13 1974-01-08 R Esposito Paint removal compositions
US3980587A (en) * 1974-08-16 1976-09-14 G. T. Schjeldahl Company Stripper composition
US4078102A (en) * 1976-10-29 1978-03-07 International Business Machines Corporation Process for stripping resist layers from substrates
US4202703A (en) * 1977-11-07 1980-05-13 Rca Corporation Method of stripping photoresist
JPS5518638A (en) * 1978-07-27 1980-02-08 Chiyou Lsi Gijutsu Kenkyu Kumiai Ionized radiation sensitive positive type resist
DE2942249C2 (de) * 1979-10-19 1985-06-27 Robert Bosch Gmbh, 7000 Stuttgart Verfahren zur Entfernung von Fotofolien von Leiterplatten
US4304681A (en) * 1980-09-15 1981-12-08 Shipley Company, Inc. Novel stripping composition for positive photoresists and method of using same
GB2090608B (en) * 1981-01-02 1985-05-09 Brailsford Michael Ivor Dormon Stripper system for surfaces

Also Published As

Publication number Publication date
US4518675A (en) 1985-05-21
EP0086446A3 (en) 1984-03-07
EP0086446B1 (de) 1987-11-19
JPS58139430A (ja) 1983-08-18
JPH0259452B2 (de) 1990-12-12
EP0086446A2 (de) 1983-08-24

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee