DE3370697D1 - Methods of inspecting pattern masks - Google Patents
Methods of inspecting pattern masksInfo
- Publication number
- DE3370697D1 DE3370697D1 DE8383103295T DE3370697T DE3370697D1 DE 3370697 D1 DE3370697 D1 DE 3370697D1 DE 8383103295 T DE8383103295 T DE 8383103295T DE 3370697 T DE3370697 T DE 3370697T DE 3370697 D1 DE3370697 D1 DE 3370697D1
- Authority
- DE
- Germany
- Prior art keywords
- methods
- pattern masks
- inspecting pattern
- inspecting
- masks
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/377,102 US4475037A (en) | 1982-05-11 | 1982-05-11 | Method of inspecting a mask using an electron beam vector scan system |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3370697D1 true DE3370697D1 (en) | 1987-05-07 |
Family
ID=23487778
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8383103295T Expired DE3370697D1 (en) | 1982-05-11 | 1983-04-05 | Methods of inspecting pattern masks |
Country Status (4)
Country | Link |
---|---|
US (1) | US4475037A (de) |
EP (1) | EP0094501B1 (de) |
JP (1) | JPS58196445A (de) |
DE (1) | DE3370697D1 (de) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5963725A (ja) * | 1982-10-05 | 1984-04-11 | Toshiba Corp | パタ−ン検査装置 |
US4581537A (en) * | 1984-03-23 | 1986-04-08 | International Business Machines Corporation | Method for generating inspection patterns |
EP0203215B1 (de) * | 1985-05-29 | 1990-02-21 | Ibm Deutschland Gmbh | Verfahren zur Reparatur von Transmissionsmasken |
US7055127B2 (en) * | 2003-10-27 | 2006-05-30 | Takumi Technology Corp. | Mask data preparation |
US9281164B2 (en) | 2010-12-13 | 2016-03-08 | Kla-Tencor Corporation | Method and apparatus for inspection of scattered hot spot areas on a manufactured substrate |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1330502A (en) * | 1970-09-21 | 1973-09-19 | Texas Instruments Ltd | Manufacture of masks |
US3909602A (en) * | 1973-09-27 | 1975-09-30 | California Inst Of Techn | Automatic visual inspection system for microelectronics |
US3876879A (en) * | 1973-11-09 | 1975-04-08 | Calspan Corp | Method and apparatus for determining surface characteristics incorporating a scanning electron microscope |
US4218142A (en) * | 1978-03-08 | 1980-08-19 | Aerodyne Research, Inc. | Mask analysis |
US4247203A (en) * | 1978-04-03 | 1981-01-27 | Kla Instrument Corporation | Automatic photomask inspection system and apparatus |
JPS55121137A (en) * | 1979-03-12 | 1980-09-18 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Pattern check unit |
JPS5757245A (en) * | 1980-09-24 | 1982-04-06 | Hitachi Ltd | Inspecting method and device for appearance of semiconductor wafer |
JPS5758151A (en) * | 1980-09-25 | 1982-04-07 | Nec Corp | Manufacturing and inspecting method for photomask |
JPS57129439A (en) * | 1981-02-04 | 1982-08-11 | Hitachi Ltd | Method for inspecting shape of photomask |
-
1982
- 1982-05-11 US US06/377,102 patent/US4475037A/en not_active Expired - Fee Related
-
1983
- 1983-03-16 JP JP58042512A patent/JPS58196445A/ja active Granted
- 1983-04-05 DE DE8383103295T patent/DE3370697D1/de not_active Expired
- 1983-04-05 EP EP83103295A patent/EP0094501B1/de not_active Expired
Also Published As
Publication number | Publication date |
---|---|
EP0094501B1 (de) | 1987-04-01 |
US4475037A (en) | 1984-10-02 |
JPS58196445A (ja) | 1983-11-15 |
EP0094501A2 (de) | 1983-11-23 |
JPH0157724B2 (de) | 1989-12-07 |
EP0094501A3 (en) | 1985-01-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |