DE3275250D1 - Apparatus for exposing a microcircuit wafer to electromagnetic radiation - Google Patents
Apparatus for exposing a microcircuit wafer to electromagnetic radiationInfo
- Publication number
- DE3275250D1 DE3275250D1 DE8282109880T DE3275250T DE3275250D1 DE 3275250 D1 DE3275250 D1 DE 3275250D1 DE 8282109880 T DE8282109880 T DE 8282109880T DE 3275250 T DE3275250 T DE 3275250T DE 3275250 D1 DE3275250 D1 DE 3275250D1
- Authority
- DE
- Germany
- Prior art keywords
- exposing
- electromagnetic radiation
- microcircuit
- wafer
- microcircuit wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
- G21K1/04—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators using variable diaphragms, shutters, choppers
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
- G21K1/04—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators using variable diaphragms, shutters, choppers
- G21K1/043—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators using variable diaphragms, shutters, choppers changing time structure of beams by mechanical means, e.g. choppers, spinning filter wheels
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/336,468 US4408338A (en) | 1981-12-31 | 1981-12-31 | Pulsed electromagnetic radiation source having a barrier for discharged debris |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3275250D1 true DE3275250D1 (en) | 1987-02-26 |
Family
ID=23316221
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8282109880T Expired DE3275250D1 (en) | 1981-12-31 | 1982-10-26 | Apparatus for exposing a microcircuit wafer to electromagnetic radiation |
Country Status (4)
Country | Link |
---|---|
US (1) | US4408338A (de) |
EP (1) | EP0083399B1 (de) |
JP (1) | JPS58119000A (de) |
DE (1) | DE3275250D1 (de) |
Families Citing this family (50)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2122806B (en) * | 1982-06-17 | 1986-01-22 | Thor Cryogenics Ltd | X-ray source apparatus |
DE3432775A1 (de) * | 1984-09-06 | 1986-03-20 | Kernforschungsanlage Jülich GmbH, 5170 Jülich | Antrieb fuer Neutronenchopper |
US4837794A (en) * | 1984-10-12 | 1989-06-06 | Maxwell Laboratories Inc. | Filter apparatus for use with an x-ray source |
US4644576A (en) * | 1985-04-26 | 1987-02-17 | At&T Technologies, Inc. | Method and apparatus for producing x-ray pulses |
FR2594621A1 (fr) * | 1986-02-17 | 1987-08-21 | Commissariat Energie Atomique | Dispositif et procede de production d'un rayonnement gamma dans un betatron |
US4866517A (en) * | 1986-09-11 | 1989-09-12 | Hoya Corp. | Laser plasma X-ray generator capable of continuously generating X-rays |
AT393925B (de) * | 1987-06-02 | 1992-01-10 | Ims Ionen Mikrofab Syst | Anordnung zur durchfuehrung eines verfahrens zum positionieren der abbildung der auf einer maske befindlichen struktur auf ein substrat, und verfahren zum ausrichten von auf einer maske angeordneten markierungen auf markierungen, die auf einem traeger angeordnet sind |
JP2770960B2 (ja) * | 1988-10-06 | 1998-07-02 | キヤノン株式会社 | Sor−x線露光装置 |
DE4117639A1 (de) * | 1990-05-31 | 1991-12-05 | Toshiba Kawasaki Kk | Synchrotronstrahlungsgeraet |
US5329569A (en) * | 1993-02-18 | 1994-07-12 | Sandia Corporation | X-ray transmissive debris shield |
US6133577A (en) * | 1997-02-04 | 2000-10-17 | Advanced Energy Systems, Inc. | Method and apparatus for producing extreme ultra-violet light for use in photolithography |
US6008144A (en) * | 1998-02-02 | 1999-12-28 | Industrial Technology Research | Window shutter for laser annealing |
NL1008352C2 (nl) | 1998-02-19 | 1999-08-20 | Stichting Tech Wetenschapp | Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden. |
US6194733B1 (en) | 1998-04-03 | 2001-02-27 | Advanced Energy Systems, Inc. | Method and apparatus for adjustably supporting a light source for use in photolithography |
US6180952B1 (en) | 1998-04-03 | 2001-01-30 | Advanced Energy Systems, Inc. | Holder assembly system and method in an emitted energy system for photolithography |
US6105885A (en) * | 1998-04-03 | 2000-08-22 | Advanced Energy Systems, Inc. | Fluid nozzle system and method in an emitted energy system for photolithography |
US6065203A (en) * | 1998-04-03 | 2000-05-23 | Advanced Energy Systems, Inc. | Method of manufacturing very small diameter deep passages |
US6369874B1 (en) * | 2000-04-18 | 2002-04-09 | Silicon Valley Group, Inc. | Photoresist outgassing mitigation system method and apparatus for in-vacuum lithography |
IT1316249B1 (it) * | 2000-12-01 | 2003-04-03 | Enea Ente Nuove Tec | Procedimento di abbattimento del flusso di ioni e di piccoli detritiin sorgenti di raggi-x molli da plasma, tramite l'uso di kripton. |
JP2002299221A (ja) * | 2001-04-02 | 2002-10-11 | Canon Inc | X線露光装置 |
JP2003022950A (ja) * | 2001-07-05 | 2003-01-24 | Canon Inc | X線光源用デブリ除去装置及び、デブリ除去装置を用いた露光装置 |
JP3782736B2 (ja) * | 2002-01-29 | 2006-06-07 | キヤノン株式会社 | 露光装置及びその制御方法 |
EP1349010B1 (de) * | 2002-03-28 | 2014-12-10 | ASML Netherlands B.V. | Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung |
EP1349008A1 (de) * | 2002-03-28 | 2003-10-01 | ASML Netherlands B.V. | Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung |
DE10233567B4 (de) * | 2002-07-22 | 2004-10-28 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Vorrichtung zur Erzeugung eines gepulsten Plasmas innerhalb einer Vakuumkammer mit mindestens einer Debris-Blende |
TWI229242B (en) * | 2002-08-23 | 2005-03-11 | Asml Netherlands Bv | Lithographic projection apparatus and particle barrier for use in said apparatus |
JP4235480B2 (ja) | 2002-09-03 | 2009-03-11 | キヤノン株式会社 | 差動排気システム及び露光装置 |
US6850351B1 (en) | 2003-02-20 | 2005-02-01 | Team Specialty Products Corp. | Method and apparatus for ultra-fast aperture exposure |
US6826255B2 (en) * | 2003-03-26 | 2004-11-30 | General Electric Company | X-ray inspection system and method of operating |
US7217940B2 (en) * | 2003-04-08 | 2007-05-15 | Cymer, Inc. | Collector for EUV light source |
US7109503B1 (en) * | 2005-02-25 | 2006-09-19 | Cymer, Inc. | Systems for protecting internal components of an EUV light source from plasma-generated debris |
US7145631B2 (en) * | 2004-12-27 | 2006-12-05 | Asml Netherlands B.V. | Lithographic apparatus, illumination system and method for mitigating debris particles |
SG123770A1 (en) * | 2004-12-28 | 2006-07-26 | Asml Netherlands Bv | Lithographic apparatus, radiation system and filt er system |
SG123767A1 (en) * | 2004-12-28 | 2006-07-26 | Asml Netherlands Bv | Lithographic apparatus, illumination system and filter system |
US7485881B2 (en) * | 2004-12-29 | 2009-02-03 | Asml Netherlands B.V. | Lithographic apparatus, illumination system, filter system and method for cooling a support of such a filter system |
DE102005045568A1 (de) * | 2005-05-31 | 2006-12-07 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Vorrichtung und Verfahren zum Schutz einer optischen Komponente, insbesondere in einer EUV-Quelle |
US7397056B2 (en) * | 2005-07-06 | 2008-07-08 | Asml Netherlands B.V. | Lithographic apparatus, contaminant trap, and device manufacturing method |
US7262423B2 (en) | 2005-12-02 | 2007-08-28 | Asml Netherlands B.V. | Radiation system and lithographic apparatus |
US7332731B2 (en) * | 2005-12-06 | 2008-02-19 | Asml Netherlands, B.V. | Radiation system and lithographic apparatus |
US7468521B2 (en) * | 2005-12-28 | 2008-12-23 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7697060B2 (en) | 2006-01-30 | 2010-04-13 | Radiant Imaging, Inc. | Rotary shutter assemblies for imaging photometers and methods for using such shutter assemblies |
TW200737267A (en) * | 2006-03-20 | 2007-10-01 | Alis Corp | Systems and methods for a helium ion pump |
US7453071B2 (en) * | 2006-03-29 | 2008-11-18 | Asml Netherlands B.V. | Contamination barrier and lithographic apparatus comprising same |
US7442948B2 (en) * | 2006-05-15 | 2008-10-28 | Asml Netherlands B.V. | Contamination barrier and lithographic apparatus |
JP5086664B2 (ja) * | 2007-03-02 | 2012-11-28 | ギガフォトン株式会社 | 極端紫外光源装置 |
WO2009066242A2 (en) * | 2007-11-22 | 2009-05-28 | Philips Intellectual Property & Standards Gmbh | Method of increasing the operation lifetime of a collector optics arranged in an irradiation device and corresponding irradiation device |
JP5683902B2 (ja) | 2010-10-29 | 2015-03-11 | 株式会社東芝 | レーザ・イオン源 |
US9268031B2 (en) * | 2012-04-09 | 2016-02-23 | Kla-Tencor Corporation | Advanced debris mitigation of EUV light source |
WO2016058746A1 (en) * | 2014-10-13 | 2016-04-21 | Asml Netherlands B.V. | A radiation source |
CN109683309B (zh) * | 2018-12-06 | 2021-08-24 | 中国工程物理研究院激光聚变研究中心 | 一种用于改善真空窗口元件激光诱发损伤的系统和方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3991309A (en) * | 1975-07-09 | 1976-11-09 | University Of Rochester | Methods and apparatus for the control and analysis of X-rays |
US4184078A (en) * | 1978-08-15 | 1980-01-15 | The United States Of America As Represented By The Secretary Of The Navy | Pulsed X-ray lithography |
US4296330A (en) * | 1980-04-16 | 1981-10-20 | The United States Of America As Represented By The Secretary Of The Army | Flowing gas discharge source of vacuum ultra-violet line radiation system |
-
1981
- 1981-12-31 US US06/336,468 patent/US4408338A/en not_active Expired - Fee Related
-
1982
- 1982-10-26 EP EP82109880A patent/EP0083399B1/de not_active Expired
- 1982-10-26 DE DE8282109880T patent/DE3275250D1/de not_active Expired
- 1982-10-27 JP JP57187671A patent/JPS58119000A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
EP0083399B1 (de) | 1987-01-21 |
JPS58119000A (ja) | 1983-07-15 |
EP0083399A2 (de) | 1983-07-13 |
JPH0157760B2 (de) | 1989-12-07 |
US4408338A (en) | 1983-10-04 |
EP0083399A3 (en) | 1985-01-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |