DE3273852D1 - Lithographic printing plate and its preparation - Google Patents

Lithographic printing plate and its preparation

Info

Publication number
DE3273852D1
DE3273852D1 DE8282106054T DE3273852T DE3273852D1 DE 3273852 D1 DE3273852 D1 DE 3273852D1 DE 8282106054 T DE8282106054 T DE 8282106054T DE 3273852 T DE3273852 T DE 3273852T DE 3273852 D1 DE3273852 D1 DE 3273852D1
Authority
DE
Germany
Prior art keywords
preparation
printing plate
lithographic printing
lithographic
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8282106054T
Other languages
English (en)
Inventor
Kiyomi Sakurai
Seiji Arimatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Paint Co Ltd
Original Assignee
Nippon Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Paint Co Ltd filed Critical Nippon Paint Co Ltd
Application granted granted Critical
Publication of DE3273852D1 publication Critical patent/DE3273852D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE8282106054T 1981-07-09 1982-07-07 Lithographic printing plate and its preparation Expired DE3273852D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56107833A JPS589146A (ja) 1981-07-09 1981-07-09 水不要平版用版材

Publications (1)

Publication Number Publication Date
DE3273852D1 true DE3273852D1 (en) 1986-11-20

Family

ID=14469189

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8282106054T Expired DE3273852D1 (en) 1981-07-09 1982-07-07 Lithographic printing plate and its preparation

Country Status (6)

Country Link
US (1) US4508814A (de)
EP (1) EP0069978B1 (de)
JP (1) JPS589146A (de)
AU (1) AU547804B2 (de)
CA (1) CA1179180A (de)
DE (1) DE3273852D1 (de)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE451610B (sv) * 1983-04-14 1987-10-19 Kontekla Oy Skrepsil
DE3421526A1 (de) * 1984-06-08 1985-12-12 Hoechst Ag, 6230 Frankfurt Perfluoralkylgruppen aufweisende copolymere, sie enthaltende reproduktionsschichten und deren verwendung fuer den wasserlosen offsetdruck
JPS61162501A (ja) * 1985-01-10 1986-07-23 Nippon Paint Co Ltd 高エネルギ−線硬化樹脂組成物
JPH083630B2 (ja) * 1986-01-23 1996-01-17 富士写真フイルム株式会社 感光性組成物
US4897336A (en) * 1986-04-11 1990-01-30 Chien James C W Self-developing radiation sensitive resist with amorphous polymer having haloalkyl substitution derived from cycic ether
DE3901003A1 (de) * 1989-01-14 1990-07-19 Hoechst Ag Strahlenempfindlicher film aus mindestens einer monomolekularen schicht von fluorhaltigen amphiphilen
JPH02235064A (ja) * 1989-03-09 1990-09-18 Fuji Photo Film Co Ltd 湿し水不要感光性平版印刷版
JPH02282257A (ja) * 1989-04-24 1990-11-19 Mitsubishi Kasei Corp 湿し水不要感光性平版印刷版
EP0471483A1 (de) * 1990-08-03 1992-02-19 Canon Kabushiki Kaisha Verfahren zur Oberflächenverbesserung, Verfahren zur Herstellung einer Druckplatte, Druckplatte und Druckverfahren
JP2739387B2 (ja) * 1991-04-25 1998-04-15 富士写真フイルム株式会社 水無し平版印刷版及びその製版方法
JPH05142762A (ja) * 1991-11-20 1993-06-11 Fuji Photo Film Co Ltd 湿し水不要感光性平版印刷版および製版方法
US5866294A (en) * 1993-10-26 1999-02-02 Toray Industries, Inc. Water-less quinonediazide lithographic raw plate
CA2152167C (en) * 1993-10-26 2000-11-28 Masahiro Oguni Dry lithographic forme
GB9416204D0 (en) * 1994-08-11 1994-10-05 Horsell Plc Water-less lithographic plate
GB9516694D0 (en) * 1995-08-15 1995-10-18 Horsell Plc Water-less lithographic plates
GB9516723D0 (en) * 1995-08-15 1995-10-18 Horsell Plc Water-less lithographic plates
EP0791857B1 (de) * 1996-02-26 2000-11-15 Agfa-Gevaert N.V. Bildaufzeichnungselement, das eine Zweiphasenbeschichtung mit einer dispergierten hydrophoben photopolymerisierbaren Phase enthält
US5922512A (en) * 1998-01-29 1999-07-13 Kodak Polychrome Graphics Llc Processless direct write printing plate having heat sensitive polymer and methods of imaging and printing
US6014929A (en) * 1998-03-09 2000-01-18 Teng; Gary Ganghui Lithographic printing plates having a thin releasable interlayer overlying a rough substrate
AU6056099A (en) * 1998-09-23 2000-04-10 E.I. Du Pont De Nemours And Company Photoresists, polymers and processes for microlithography
US6849377B2 (en) 1998-09-23 2005-02-01 E. I. Du Pont De Nemours And Company Photoresists, polymers and processes for microlithography
US6242156B1 (en) 2000-06-28 2001-06-05 Gary Ganghui Teng Lithographic plate having a conformal radiation-sensitive layer on a rough substrate
US7300743B2 (en) * 2003-03-06 2007-11-27 E. I. Du Pont De Nemours And Company Radiation durable organic compounds with high transparency in the vacuum ultraviolet, and method for preparing
US20090084279A1 (en) * 2007-09-28 2009-04-02 Toppan Printing Co., Ltd. Relief printing plate and printed matter
EP2381031A4 (de) * 2009-01-19 2014-08-27 Unitika Trading Co Ltd Feuchtigkeitsdurchlässige und wasserfeste faser sowie herstellungsverfahren dafür

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3790382A (en) * 1971-04-16 1974-02-05 Minnesota Mining & Mfg Fluorinated polyamide-diazo resin coating composition
US3910187A (en) * 1971-08-30 1975-10-07 Du Pont Dry planographic printing plate
JPS4968803A (de) * 1972-11-02 1974-07-03
US3901700A (en) * 1973-05-17 1975-08-26 Eastman Kodak Co Repellent compositions of fluorinated polymers and oils in electrophotographic processes
US3997349A (en) * 1974-06-17 1976-12-14 Minnesota Mining And Manufacturing Company Light-sensitive development-free driographic printing plate
JPS5921542B2 (ja) * 1974-11-15 1984-05-21 住友化学工業株式会社 印刷版の製法
JPS5178224A (ja) * 1974-12-27 1976-07-07 Canon Kk Zokeiseiho
GB1501128A (en) * 1975-05-06 1978-02-15 Minnesota Mining & Mfg Development-free driographic printing plate
JPS54135004A (en) * 1978-04-10 1979-10-19 Fuji Photo Film Co Ltd Photosensitive flat printing plate
JPS55527A (en) * 1978-06-16 1980-01-05 Fuji Photo Film Co Ltd Photosensitive planographic plate
US4224398A (en) * 1979-05-29 1980-09-23 Richardson Graphics Company Photopolymerizable latex systems
JPS56139515A (en) * 1980-03-31 1981-10-31 Daikin Ind Ltd Polyfluoroalkyl acrylate copolymer
JPS56167139A (en) * 1980-05-27 1981-12-22 Daikin Ind Ltd Sensitive material
JPS5734558A (en) * 1980-08-11 1982-02-24 Fuji Photo Film Co Ltd Photosensitive printing plate

Also Published As

Publication number Publication date
AU8564582A (en) 1983-01-13
AU547804B2 (en) 1985-11-07
CA1179180A (en) 1984-12-11
EP0069978A3 (en) 1983-06-22
EP0069978B1 (de) 1986-10-15
JPS589146A (ja) 1983-01-19
US4508814A (en) 1985-04-02
EP0069978A2 (de) 1983-01-19
JPH0145608B2 (de) 1989-10-04

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee