DE3264117D1 - Resist and process for forming resist pattern - Google Patents

Resist and process for forming resist pattern

Info

Publication number
DE3264117D1
DE3264117D1 DE8282105737T DE3264117T DE3264117D1 DE 3264117 D1 DE3264117 D1 DE 3264117D1 DE 8282105737 T DE8282105737 T DE 8282105737T DE 3264117 T DE3264117 T DE 3264117T DE 3264117 D1 DE3264117 D1 DE 3264117D1
Authority
DE
Germany
Prior art keywords
resist
forming
pattern
resist pattern
forming resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8282105737T
Other languages
German (de)
English (en)
Inventor
Takaomi Satokawa
Tsuneo Fujii
Takayuki Deguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daikin Industries Ltd
Original Assignee
Daikin Industries Ltd
Daikin Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daikin Industries Ltd, Daikin Kogyo Co Ltd filed Critical Daikin Industries Ltd
Application granted granted Critical
Publication of DE3264117D1 publication Critical patent/DE3264117D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
    • Y10T428/24298—Noncircular aperture [e.g., slit, diamond, rectangular, etc.]
    • Y10T428/24306—Diamond or hexagonal

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
DE8282105737T 1981-06-30 1982-06-28 Resist and process for forming resist pattern Expired DE3264117D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56102726A JPS584137A (ja) 1981-06-30 1981-06-30 レジストおよび微細レジストパタ−ンの形成方法

Publications (1)

Publication Number Publication Date
DE3264117D1 true DE3264117D1 (en) 1985-07-18

Family

ID=14335260

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8282105737T Expired DE3264117D1 (en) 1981-06-30 1982-06-28 Resist and process for forming resist pattern

Country Status (4)

Country Link
US (1) US4656108A (enExample)
EP (1) EP0068488B1 (enExample)
JP (1) JPS584137A (enExample)
DE (1) DE3264117D1 (enExample)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2980695A (en) * 1957-06-12 1961-04-18 Du Pont Polyfluoro-1, 3-dithietanes and their preparation
US3240765A (en) * 1961-05-01 1966-03-15 Du Pont Thiocarbonyl fluorides and their polymers
JPS5290269A (en) * 1976-01-23 1977-07-29 Nippon Telegr & Teleph Corp <Ntt> Forming method for fine resist patterns
US4125671A (en) * 1977-05-06 1978-11-14 Thiokol Corporation Acrylated dithiocarbamyl esters

Also Published As

Publication number Publication date
EP0068488B1 (en) 1985-06-12
EP0068488A1 (en) 1983-01-05
JPS584137A (ja) 1983-01-11
JPS6410059B2 (enExample) 1989-02-21
US4656108A (en) 1987-04-07

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Legal Events

Date Code Title Description
8328 Change in the person/name/address of the agent

Free format text: TUERK, D., DIPL.-CHEM. DR.RER.NAT. GILLE, C., DIPL.-ING., PAT.-ANW., 4000 DUESSELDORF

8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee