DE3068078D1 - Optical aligning system for two patterns provided with grid-type aligning marks, especially for direct photorepeating on silicon - Google Patents

Optical aligning system for two patterns provided with grid-type aligning marks, especially for direct photorepeating on silicon

Info

Publication number
DE3068078D1
DE3068078D1 DE8080401808T DE3068078T DE3068078D1 DE 3068078 D1 DE3068078 D1 DE 3068078D1 DE 8080401808 T DE8080401808 T DE 8080401808T DE 3068078 T DE3068078 T DE 3068078T DE 3068078 D1 DE3068078 D1 DE 3068078D1
Authority
DE
Germany
Prior art keywords
aligning
photorepeating
grid
silicon
direct
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8080401808T
Other languages
English (en)
Inventor
Michel Lacombat
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Application granted granted Critical
Publication of DE3068078D1 publication Critical patent/DE3068078D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
DE8080401808T 1979-12-18 1980-12-17 Optical aligning system for two patterns provided with grid-type aligning marks, especially for direct photorepeating on silicon Expired DE3068078D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7930936A FR2472209A1 (fr) 1979-12-18 1979-12-18 Systeme optique d'alignement automatique de deux motifs comportant des reperes s'alignement du type reseaux, notamment en photo-repetition directe sur silicium

Publications (1)

Publication Number Publication Date
DE3068078D1 true DE3068078D1 (en) 1984-07-05

Family

ID=9232872

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8080401808T Expired DE3068078D1 (en) 1979-12-18 1980-12-17 Optical aligning system for two patterns provided with grid-type aligning marks, especially for direct photorepeating on silicon

Country Status (5)

Country Link
US (1) US4402610A (de)
EP (1) EP0030899B1 (de)
JP (1) JPS5694744A (de)
DE (1) DE3068078D1 (de)
FR (1) FR2472209A1 (de)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58108745A (ja) * 1981-12-23 1983-06-28 Canon Inc 転写装置
JPS5994419A (ja) * 1982-11-19 1984-05-31 Canon Inc 分割焼付け装置におけるアライメント方法
JPS59104128A (ja) * 1982-12-06 1984-06-15 Nippon Telegr & Teleph Corp <Ntt> ２重回折格子による位置合せ法および位置合せ装置
SE454439B (sv) * 1983-07-06 1988-05-02 Tetra Pak Ab Sett och anordning att med fotoelektriska medel detektera och behorighetskontrollera gjorda styrmarkeringar pa en med tryck dekorerad lopande materialbana
US4631416A (en) * 1983-12-19 1986-12-23 Hewlett-Packard Company Wafer/mask alignment system using diffraction gratings
US4663534A (en) * 1984-03-08 1987-05-05 Canon Kabushiki Kaisha Position detecting device utilizing selective outputs of the photodetector for accurate alignment
US4596467A (en) * 1984-03-16 1986-06-24 Hughes Aircraft Company Dissimilar superimposed grating precision alignment and gap measurement systems
NL8401710A (nl) * 1984-05-29 1985-12-16 Philips Nv Inrichting voor het afbeelden van een maskerpatroon op een substraat.
JPS6165251A (ja) * 1984-09-07 1986-04-03 Matsushita Electric Ind Co Ltd 露光装置
US4769523A (en) * 1985-03-08 1988-09-06 Nippon Kogaku K.K. Laser processing apparatus
DE3682675D1 (de) * 1986-04-29 1992-01-09 Ibm Deutschland Interferometrische maskensubstratausrichtung.
JPH0787175B2 (ja) * 1986-09-19 1995-09-20 キヤノン株式会社 露光方法
JPH0746680B2 (ja) * 1986-09-24 1995-05-17 キヤノン株式会社 露光装置
US4768883A (en) * 1986-11-07 1988-09-06 Motorola Inc. Alignment reticle for a semiconductor wafer stepper system and method of use
US4923301A (en) * 1988-05-26 1990-05-08 American Telephone And Telegraph Company Alignment of lithographic system
US5329354A (en) * 1991-04-24 1994-07-12 Matsushita Electric Industrial Co., Ltd. Alignment apparatus for use in exposure system for optically transferring pattern onto object
JP2715937B2 (ja) * 1994-11-07 1998-02-18 株式会社ニコン 露光方法
US6739509B2 (en) 2001-10-03 2004-05-25 Kimberly-Clark Worldwide, Inc. Registration mark detection using matched filtering
US6694205B2 (en) 2001-12-21 2004-02-17 Kimberly-Clark Worldwide, Inc. Binary registration mark detection using 3-state sensing and matched filtering
KR20050026088A (ko) * 2002-08-01 2005-03-14 몰레큘러 임프린츠 인코퍼레이티드 임프린트 리소그래피용 산란측정 정렬
US7565219B2 (en) * 2003-12-09 2009-07-21 Asml Netherlands B.V. Lithographic apparatus, method of determining a model parameter, device manufacturing method, and device manufactured thereby
US8976450B2 (en) * 2010-01-25 2015-03-10 Toyota Motor Engineering & Manufacturing North America, Inc. Optical light switch having two internally located diffraction gratings separated by liquid medium
US8072684B2 (en) 2010-01-25 2011-12-06 Toyota Motor Engineering & Manufacturing North America, Inc. Optical device using laterally-shiftable diffraction gratings
US10592080B2 (en) 2014-07-31 2020-03-17 Microsoft Technology Licensing, Llc Assisted presentation of application windows
US10678412B2 (en) 2014-07-31 2020-06-09 Microsoft Technology Licensing, Llc Dynamic joint dividers for application windows
US10254942B2 (en) 2014-07-31 2019-04-09 Microsoft Technology Licensing, Llc Adaptive sizing and positioning of application windows
US9423360B1 (en) * 2015-02-09 2016-08-23 Microsoft Technology Licensing, Llc Optical components
US9372347B1 (en) 2015-02-09 2016-06-21 Microsoft Technology Licensing, Llc Display system
US10018844B2 (en) 2015-02-09 2018-07-10 Microsoft Technology Licensing, Llc Wearable image display system
US9535253B2 (en) 2015-02-09 2017-01-03 Microsoft Technology Licensing, Llc Display system
US9513480B2 (en) 2015-02-09 2016-12-06 Microsoft Technology Licensing, Llc Waveguide
US9429692B1 (en) 2015-02-09 2016-08-30 Microsoft Technology Licensing, Llc Optical components
US9827209B2 (en) 2015-02-09 2017-11-28 Microsoft Technology Licensing, Llc Display system
US10317677B2 (en) 2015-02-09 2019-06-11 Microsoft Technology Licensing, Llc Display system
US11086216B2 (en) 2015-02-09 2021-08-10 Microsoft Technology Licensing, Llc Generating electronic components
TWI606530B (zh) * 2017-03-29 2017-11-21 台灣愛司帝科技股份有限公司 位置偵測與晶片分離裝置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3541338A (en) * 1967-01-12 1970-11-17 Ibm Positioning system
US3861798A (en) * 1972-05-22 1975-01-21 Hitachi Ltd Mask for aligning patterns
JPS52109875A (en) * 1976-02-25 1977-09-14 Hitachi Ltd Position matching system for mask and wafer and its unit
US4200395A (en) * 1977-05-03 1980-04-29 Massachusetts Institute Of Technology Alignment of diffraction gratings
US4172664A (en) * 1977-12-30 1979-10-30 International Business Machines Corporation High precision pattern registration and overlay measurement system and process

Also Published As

Publication number Publication date
EP0030899A1 (de) 1981-06-24
FR2472209B1 (de) 1984-05-04
US4402610A (en) 1983-09-06
EP0030899B1 (de) 1984-05-30
JPS5694744A (en) 1981-07-31
JPH0145215B2 (de) 1989-10-03
FR2472209A1 (fr) 1981-06-26

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Legal Events

Date Code Title Description
8339 Ceased/non-payment of the annual fee