DE3060510D1 - Photomasking substances, process for preparing them and mask obtained - Google Patents

Photomasking substances, process for preparing them and mask obtained

Info

Publication number
DE3060510D1
DE3060510D1 DE8080400300T DE3060510T DE3060510D1 DE 3060510 D1 DE3060510 D1 DE 3060510D1 DE 8080400300 T DE8080400300 T DE 8080400300T DE 3060510 T DE3060510 T DE 3060510T DE 3060510 D1 DE3060510 D1 DE 3060510D1
Authority
DE
Germany
Prior art keywords
photomasking
substances
preparing
mask obtained
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8080400300T
Other languages
English (en)
Inventor
Armand Eranian
Jean-Claude Dubois
Andre Couttet
Evelyne Datamanti
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from FR7906136A external-priority patent/FR2451050A1/fr
Priority claimed from FR7918467A external-priority patent/FR2461967A2/fr
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Application granted granted Critical
Publication of DE3060510D1 publication Critical patent/DE3060510D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE8080400300T 1979-03-09 1980-03-04 Photomasking substances, process for preparing them and mask obtained Expired DE3060510D1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR7906136A FR2451050A1 (fr) 1979-03-09 1979-03-09 Composition de photomasquage, son procede de preparation, et masque obtenu
FR7918467A FR2461967A2 (fr) 1979-07-17 1979-07-17 Composition de photomasquage, son procede de preparation, et masque obtenu

Publications (1)

Publication Number Publication Date
DE3060510D1 true DE3060510D1 (en) 1982-07-29

Family

ID=26221054

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8080400300T Expired DE3060510D1 (en) 1979-03-09 1980-03-04 Photomasking substances, process for preparing them and mask obtained

Country Status (3)

Country Link
US (1) US4268590A (de)
EP (1) EP0016679B1 (de)
DE (1) DE3060510D1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3279090D1 (en) * 1981-12-19 1988-11-10 Daikin Ind Ltd Resist material and process for forming fine resist pattern
DE3246825A1 (de) * 1982-02-24 1983-09-01 Max Planck Gesellschaft zur Förderung der Wissenschaften e.V., 3400 Göttingen Positives resistmaterial
JPS60199007A (ja) * 1984-03-22 1985-10-08 Daikin Ind Ltd 光学材料
JPS62223750A (ja) * 1986-03-26 1987-10-01 Toray Ind Inc 放射線感応ポジ型レジストおよび該レジスト組成物
JP2707785B2 (ja) * 1990-03-13 1998-02-04 富士通株式会社 レジスト組成物およびパターン形成方法
JPH11289103A (ja) * 1998-02-05 1999-10-19 Canon Inc 半導体装置および太陽電池モジュ―ル及びその解体方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2892712A (en) * 1954-04-23 1959-06-30 Du Pont Process for preparing relief images
US3779806A (en) * 1972-03-24 1973-12-18 Ibm Electron beam sensitive polymer t-butyl methacrylate resist
US3934057A (en) * 1973-12-19 1976-01-20 International Business Machines Corporation High sensitivity positive resist layers and mask formation process
US3931435A (en) * 1974-12-20 1976-01-06 International Business Machines Corporation Electron beam positive resists containing acetate polymers
US4011351A (en) * 1975-01-29 1977-03-08 International Business Machines Corporation Preparation of resist image with methacrylate polymers
GB1500541A (en) * 1975-03-20 1978-02-08 Mullard Ltd Method of producing positive-working electron resist coatings
JPS524834A (en) * 1975-06-30 1977-01-14 Agency Of Ind Science & Technol Image formation method through electron beam and resisting agent compo sitions which are used for the methoi
JPS5290269A (en) * 1976-01-23 1977-07-29 Nippon Telegr & Teleph Corp <Ntt> Forming method for fine resist patterns
US4061829A (en) * 1976-04-26 1977-12-06 Bell Telephone Laboratories, Incorporated Negative resist for X-ray and electron beam lithography and method of using same
US4096290A (en) * 1976-10-04 1978-06-20 International Business Machines Corporation Resist mask formation process with haloalkyl methacrylate copolymers
US4087569A (en) * 1976-12-20 1978-05-02 International Business Machines Corporation Prebaking treatment for resist mask composition and mask making process using same
GB1602724A (en) * 1977-04-26 1981-11-18 Standard Telephones Cables Ltd Resist material for x-ray lithography
US4156745A (en) * 1978-04-03 1979-05-29 International Business Machines Corporation Electron sensitive resist and a method preparing the same

Also Published As

Publication number Publication date
EP0016679A1 (de) 1980-10-01
EP0016679B1 (de) 1982-06-09
US4268590A (en) 1981-05-19

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Legal Events

Date Code Title Description
8339 Ceased/non-payment of the annual fee