DE3041358A1 - LIGHT REFLECTIVE OHMSCHER CONTACT FOR COMPONENTS - Google Patents
LIGHT REFLECTIVE OHMSCHER CONTACT FOR COMPONENTSInfo
- Publication number
- DE3041358A1 DE3041358A1 DE19803041358 DE3041358A DE3041358A1 DE 3041358 A1 DE3041358 A1 DE 3041358A1 DE 19803041358 DE19803041358 DE 19803041358 DE 3041358 A DE3041358 A DE 3041358A DE 3041358 A1 DE3041358 A1 DE 3041358A1
- Authority
- DE
- Germany
- Prior art keywords
- layer
- contact
- substrate
- light
- components
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000000758 substrate Substances 0.000 claims description 18
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 8
- 229910052737 gold Inorganic materials 0.000 claims description 8
- 239000010931 gold Substances 0.000 claims description 8
- 229910052732 germanium Inorganic materials 0.000 claims description 3
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000004332 silver Substances 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000004020 luminiscence type Methods 0.000 description 2
- 210000003608 fece Anatomy 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/40—Materials therefor
- H01L33/405—Reflective materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73265—Layer and wire connectors
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Led Devices (AREA)
- Electrodes Of Semiconductors (AREA)
Description
Lichtreflektierender ohmscher Kontakt für BauelementeLight-reflecting ohmic contact for components
Die Erfindung "betrifft einen lichtreflektierenden ohmschen Kontakt für Bauelemente, insbesondere Halbleiterbauelemente, bestehend aus einer Schichtenfolge einschließlich Gold auf einem Substrat.The invention "relates to a light reflective ohmic Contact for components, in particular semiconductor components, consisting of a sequence of layers including Gold on a substrate.
Für den Wirkungsgrad von Lumineszenzdioden mit transparenten Substraten ist die Lichtreflexion an der Rückseite des Substrats von großer Bedeutung. Auf dieser Rückseite befindet sich gewöhnlich ein elektrischer Kontakt für die Stromzuführung zu einer Zone des einen Leitfähigkeitstyps des Substrats. Dieser Kontakt ist aber stark lichtabsorbierend, wenn er die gewünschten elektrischen Eigenschaften, nämlich einen niedrigen ohmschen Widerstand, hat. Um diese Lichtabsorption zu vermeiden, wird bisher die Rückseite des Substrats daher nur teilweise mit einen ohmschen Kontakt versehen. Durch die geringere Kontaktfläche werden aber insbesondere die elektrischen Eigenschaften beeinträchtigt, das heißt, am Übergang zwischen dem Kontakt und dem Substrat liegt ein Widerstand mit einer oft unerwünschten Höhe vor. Außerdem verringert sich durch die kleinere Kontaktfläche die Haltbarkeit des Kontakts am Substrat.For the efficiency of luminescence diodes with transparent substrates, the light reflection is on the back of the substrate is of great importance. There is usually an electrical contact on this back for supplying power to a zone of one conductivity type of the substrate. But this contact is highly light-absorbing if it has the desired electrical properties, namely a low ohmic Resistance, has. To avoid this light absorption, So far, the back of the substrate has therefore only been partially provided with an ohmic contact. Due to the lower However, the electrical properties in particular are impaired on the contact surface, that is, on The transition between the contact and the substrate is a resistance with an often undesirable level. aside from that the smaller contact area reduces the durability of the contact on the substrate.
Es ist daher Aufgabe der Erfindung, einen lichtreflektierenden ohmschen Kontakt anzugeben, der bei hoher Lichtreflexion die gewünschten elektrischen Eigenschaften, also einen niedrigen ohmschen Widerstand, aufweisen soll.It is therefore the object of the invention to provide a light-reflecting specify ohmic contact which, with high light reflection, has the desired electrical properties, so should have a low ohmic resistance.
Diese Aufgabe wird bei einem lichtreflektierenden ohmschen Kontakt der eingangs genannten Art erfindungsgemäßThis object is achieved according to the invention in the case of a light-reflecting ohmic contact of the type mentioned at the beginning
Kot 1 Dx / 31.10.1980 ·Feces 1 Dx / 10/31/1980
VPA 8OP 1 17 dadurch gelöst, daß die Schichtenfolge eine erste Schicht aus Gold und Germanium im Gewichtsverhältnis etwa 99 : 1, eine zweite Schicht aus reinstem Silber und eine dritte Schicht aus reinstem Gold aufweist. VPA 8OP 1 17 in that the layer sequence has a first layer of gold and germanium in a weight ratio of about 99: 1, a second layer of purest silver and a third layer of purest gold.
..
In vorteilhafter Weise ist die erste Schicht etwa 0,02 /um (200 Ä), die zweite Schicht 0,8 /um und die dritte Schicht 0,5 /um dick. Ein derartiger Kontakt ist insbesondere für Lumineszenzdioden vorteilhaft. Er ist aber auch dann anwendbar, wenn ein Substrat mit einer lichtreflektierenden Schicht kontaktiert werden soll.Advantageously, the first layer is about 0.02 / µm (200 Å), the second layer 0.8 / µm and the third layer 0.5 µm thick. Such a contact is particularly advantageous for luminescence diodes. He is but can also be used when a substrate is to be contacted with a light-reflecting layer.
In vorteilhafter Weise wird dieser Kontakt so hergestellt, daß die einzelnen Schichten auf die Rückseite des Substrats aufgedampft und anschließend dort angesintert werden. Der so hergestellte ohmsche Kontakt weist bei einem niedrigen ohmschen Widerstand eine hervorragende Lichtreflexion auf.Advantageously, this contact is made so that the individual layers on the back of the substrate are vapor-deposited and then sintered there. The ohmic contact produced in this way shows with a low ohmic resistance an excellent light reflection.
Nachfolgend wird die Erfindung an Hand der Zeichnung näher erläutert. Es zeigen:The invention is explained in more detail below with reference to the drawing. Show it:
Fig. 1 eine Leuchtdiode im Schnitt, und Fig. 2 die Schichtenfolge des erfindungsgemäßen Kontakts.1 shows a light-emitting diode in section, and FIG. 2 shows the sequence of layers of the contact according to the invention.
In der Fig. 1 besteht ein Halbleitersubstrat 1 aus einer η-leitenden Zone 2 und einer p-leitenden Zone 3» die durch einen pn-übergang 4 voneinander getrennt sind. Auf der Zone 3 ist ein Kontakt 5 angebracht, der mit einem Draht 6 als Zuleitung verbunden ist. Von der Oberfläche 7 dieser Zone 3 wird Licht abgestrahlt, wie dies durch Pfeile 8 angedeutet ist. Das Substrat 1 ist lichtdurchlässig. Um einen hohen Wirkungsgrad zu erzielen, sollte das im Substrat 1 und vorzugsweise am pn-übergang erzeugte Licht von der Rückseite des Substrats 1 beziehungsweise der Zone 2 reflektiert werden und so über dieIn FIG. 1, a semiconductor substrate 1 consists of an η-conductive zone 2 and a p-conductive zone 3 »die are separated from each other by a pn junction 4. On the zone 3, a contact 5 is attached, which with a Wire 6 is connected as a lead. From the surface 7 of this zone 3, light is emitted, as is done by Arrows 8 is indicated. The substrate 1 is translucent. In order to achieve a high level of efficiency, the light generated in the substrate 1 and preferably at the pn junction from the back of the substrate 1, respectively of zone 2 are reflected and so about the
ORIGINAL INSPECTEDORIGINAL INSPECTED
20413582041358
-J- VPA 80 P 1 1 7 8 DE -J- VPA 80 P 1 1 7 8 DE
Oberfläche 7 das Substrat 1 verlassen. Hierzu ist der auf der Rückseite des Substrats 1 vorgesehene Kontakt 10 lichtreflektierend ausgestaltet, so daß dort das im Inneren des Substrats 1 erzeugte Licht reflektiert wird, wie dies durch einen Pfeil 11 angedeutet ist.Surface 7 leave the substrate 1. The contact 10 provided on the rear side of the substrate 1 is used for this purpose designed light-reflecting, so that there the light generated inside the substrate 1 is reflected, as indicated by an arrow 11.
Erfindungsgemäß besteht dieser Kontakt 10 aus einer Schichtenfolge (vergleiche Fig. 2) mit einer ersten, 0,02 /um dicken Schicht 12 aus Gold und Germanium im Ge-Wichtsverhältnis etwa 99 : 1 $ einer zweiten, 0,8 /um dicken Schicht 13 aus reinstem Silber und einer dritten, 0,5 /um dicken Schicht 14 aus reinstem Gold. Die Schicht 12 befindet sich dabei auf der Oberfläche der Zone 2.According to the invention, this contact 10 consists of a layer sequence (see FIG. 2) with a first, 0.02 / μm thick layer 12 made of gold and germanium in a Ge weight ratio of about 99: 1 $ and a second, 0.8 / μm thick layer 13 made of the purest silver and a third, 0.5 / µm thick layer 14 made of the purest gold. The layer 12 is located on the surface of zone 2.
Die einzelnen Schichten werden ganzflächig auf die Oberfläche der Zone 2 nacheinander aufgedampft. Anschließend werden diese Schichten gesintert. Der so hergestellte Kontakt hat die gewünschten Eigenschaften einer hohen Lichtreflexion und eines niedrigen ohmschen Widerstands.The individual layers are vapor-deposited one after the other over the entire surface of zone 2. Afterward these layers are sintered. The contact produced in this way has the desired properties of high Light reflection and a low ohmic resistance.
2 Figuren2 figures
4 Patentansprüche4 claims
ORJGiMAL INSPECTEDORJGiMAL INSPECTED
Claims (4)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19803041358 DE3041358A1 (en) | 1980-11-03 | 1980-11-03 | LIGHT REFLECTIVE OHMSCHER CONTACT FOR COMPONENTS |
EP81108239A EP0051172B1 (en) | 1980-11-03 | 1981-10-12 | Ohmic contact on a transparent substrate of a device |
DE8181108239T DE3164751D1 (en) | 1980-11-03 | 1981-10-12 | Ohmic contact on a transparent substrate of a device |
JP17439381A JPS57106087A (en) | 1980-11-03 | 1981-10-30 | Light reflective ohmic contact and method of producing same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19803041358 DE3041358A1 (en) | 1980-11-03 | 1980-11-03 | LIGHT REFLECTIVE OHMSCHER CONTACT FOR COMPONENTS |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3041358A1 true DE3041358A1 (en) | 1982-06-09 |
Family
ID=6115839
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19803041358 Withdrawn DE3041358A1 (en) | 1980-11-03 | 1980-11-03 | LIGHT REFLECTIVE OHMSCHER CONTACT FOR COMPONENTS |
DE8181108239T Expired DE3164751D1 (en) | 1980-11-03 | 1981-10-12 | Ohmic contact on a transparent substrate of a device |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8181108239T Expired DE3164751D1 (en) | 1980-11-03 | 1981-10-12 | Ohmic contact on a transparent substrate of a device |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0051172B1 (en) |
JP (1) | JPS57106087A (en) |
DE (2) | DE3041358A1 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3310349A1 (en) * | 1983-03-22 | 1984-09-27 | Siemens AG, 1000 Berlin und 8000 München | Method of producing highly reflective ohmic contact |
DE19648309A1 (en) * | 1995-12-21 | 1997-07-03 | Hewlett Packard Co | Reflecting contact device for semiconductor light emitting diode |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60102733A (en) * | 1983-11-10 | 1985-06-06 | Oki Electric Ind Co Ltd | Forming method of ohmic electrode |
JPH02116750U (en) * | 1990-03-15 | 1990-09-19 | ||
US6936859B1 (en) | 1998-05-13 | 2005-08-30 | Toyoda Gosei Co., Ltd. | Light-emitting semiconductor device using group III nitride compound |
DE19921987B4 (en) * | 1998-05-13 | 2007-05-16 | Toyoda Gosei Kk | Light-emitting semiconductor device with group III element-nitride compounds |
US20010042866A1 (en) | 1999-02-05 | 2001-11-22 | Carrie Carter Coman | Inxalygazn optical emitters fabricated via substrate removal |
US6992334B1 (en) | 1999-12-22 | 2006-01-31 | Lumileds Lighting U.S., Llc | Multi-layer highly reflective ohmic contacts for semiconductor devices |
WO2001082384A1 (en) | 2000-04-26 | 2001-11-01 | Osram Opto Semiconductors Gmbh | Radiation-emitting semiconductor element and method for producing the same |
EP1277241B1 (en) | 2000-04-26 | 2017-12-13 | OSRAM Opto Semiconductors GmbH | Gan-based light-emitting-diode chip |
DE10051465A1 (en) | 2000-10-17 | 2002-05-02 | Osram Opto Semiconductors Gmbh | Method for producing a GaN-based semiconductor component |
TWI292227B (en) | 2000-05-26 | 2008-01-01 | Osram Opto Semiconductors Gmbh | Light-emitting-dioed-chip with a light-emitting-epitaxy-layer-series based on gan |
US6794684B2 (en) | 2001-02-01 | 2004-09-21 | Cree, Inc. | Reflective ohmic contacts for silicon carbide including a layer consisting essentially of nickel, methods of fabricating same, and light emitting devices including the same |
US6791119B2 (en) | 2001-02-01 | 2004-09-14 | Cree, Inc. | Light emitting diodes including modifications for light extraction |
US7211833B2 (en) | 2001-07-23 | 2007-05-01 | Cree, Inc. | Light emitting diodes including barrier layers/sublayers |
US6740906B2 (en) | 2001-07-23 | 2004-05-25 | Cree, Inc. | Light emitting diodes including modifications for submount bonding |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2045106C3 (en) * | 1970-09-11 | 1981-01-15 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Method for producing a light-emitting diode |
US3931631A (en) * | 1973-07-23 | 1976-01-06 | Monsanto Company | Gallium phosphide light-emitting diodes |
JPS5237783A (en) * | 1975-09-20 | 1977-03-23 | Oki Electric Ind Co Ltd | Light emission diode |
JPS52104091A (en) * | 1976-02-27 | 1977-09-01 | Hitachi Ltd | Light-emitting semiconductor |
JPS54148374A (en) * | 1978-05-15 | 1979-11-20 | Toshiba Corp | Manufacture of compound semiconductor device |
-
1980
- 1980-11-03 DE DE19803041358 patent/DE3041358A1/en not_active Withdrawn
-
1981
- 1981-10-12 EP EP81108239A patent/EP0051172B1/en not_active Expired
- 1981-10-12 DE DE8181108239T patent/DE3164751D1/en not_active Expired
- 1981-10-30 JP JP17439381A patent/JPS57106087A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3310349A1 (en) * | 1983-03-22 | 1984-09-27 | Siemens AG, 1000 Berlin und 8000 München | Method of producing highly reflective ohmic contact |
DE19648309A1 (en) * | 1995-12-21 | 1997-07-03 | Hewlett Packard Co | Reflecting contact device for semiconductor light emitting diode |
DE19648309B4 (en) * | 1995-12-21 | 2007-10-18 | LumiLeds Lighting, U.S., LLC, San Jose | Highly reflective contacts for light-emitting semiconductor devices |
Also Published As
Publication number | Publication date |
---|---|
EP0051172B1 (en) | 1984-07-11 |
JPS57106087A (en) | 1982-07-01 |
DE3164751D1 (en) | 1984-08-16 |
EP0051172A1 (en) | 1982-05-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8139 | Disposal/non-payment of the annual fee |