DE3041358A1 - LIGHT REFLECTIVE OHMSCHER CONTACT FOR COMPONENTS - Google Patents

LIGHT REFLECTIVE OHMSCHER CONTACT FOR COMPONENTS

Info

Publication number
DE3041358A1
DE3041358A1 DE19803041358 DE3041358A DE3041358A1 DE 3041358 A1 DE3041358 A1 DE 3041358A1 DE 19803041358 DE19803041358 DE 19803041358 DE 3041358 A DE3041358 A DE 3041358A DE 3041358 A1 DE3041358 A1 DE 3041358A1
Authority
DE
Germany
Prior art keywords
layer
contact
substrate
light
components
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19803041358
Other languages
German (de)
Inventor
Jörg Dipl.-Phys. 8000 München Aengenheister
Laszlo 8021 Neuried Bacs
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Priority to DE19803041358 priority Critical patent/DE3041358A1/en
Priority to EP81108239A priority patent/EP0051172B1/en
Priority to DE8181108239T priority patent/DE3164751D1/en
Priority to JP17439381A priority patent/JPS57106087A/en
Publication of DE3041358A1 publication Critical patent/DE3041358A1/en
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/36Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
    • H01L33/40Materials therefor
    • H01L33/405Reflective materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Led Devices (AREA)
  • Electrodes Of Semiconductors (AREA)

Description

Lichtreflektierender ohmscher Kontakt für BauelementeLight-reflecting ohmic contact for components

Die Erfindung "betrifft einen lichtreflektierenden ohmschen Kontakt für Bauelemente, insbesondere Halbleiterbauelemente, bestehend aus einer Schichtenfolge einschließlich Gold auf einem Substrat.The invention "relates to a light reflective ohmic Contact for components, in particular semiconductor components, consisting of a sequence of layers including Gold on a substrate.

Für den Wirkungsgrad von Lumineszenzdioden mit transparenten Substraten ist die Lichtreflexion an der Rückseite des Substrats von großer Bedeutung. Auf dieser Rückseite befindet sich gewöhnlich ein elektrischer Kontakt für die Stromzuführung zu einer Zone des einen Leitfähigkeitstyps des Substrats. Dieser Kontakt ist aber stark lichtabsorbierend, wenn er die gewünschten elektrischen Eigenschaften, nämlich einen niedrigen ohmschen Widerstand, hat. Um diese Lichtabsorption zu vermeiden, wird bisher die Rückseite des Substrats daher nur teilweise mit einen ohmschen Kontakt versehen. Durch die geringere Kontaktfläche werden aber insbesondere die elektrischen Eigenschaften beeinträchtigt, das heißt, am Übergang zwischen dem Kontakt und dem Substrat liegt ein Widerstand mit einer oft unerwünschten Höhe vor. Außerdem verringert sich durch die kleinere Kontaktfläche die Haltbarkeit des Kontakts am Substrat.For the efficiency of luminescence diodes with transparent substrates, the light reflection is on the back of the substrate is of great importance. There is usually an electrical contact on this back for supplying power to a zone of one conductivity type of the substrate. But this contact is highly light-absorbing if it has the desired electrical properties, namely a low ohmic Resistance, has. To avoid this light absorption, So far, the back of the substrate has therefore only been partially provided with an ohmic contact. Due to the lower However, the electrical properties in particular are impaired on the contact surface, that is, on The transition between the contact and the substrate is a resistance with an often undesirable level. aside from that the smaller contact area reduces the durability of the contact on the substrate.

Es ist daher Aufgabe der Erfindung, einen lichtreflektierenden ohmschen Kontakt anzugeben, der bei hoher Lichtreflexion die gewünschten elektrischen Eigenschaften, also einen niedrigen ohmschen Widerstand, aufweisen soll.It is therefore the object of the invention to provide a light-reflecting specify ohmic contact which, with high light reflection, has the desired electrical properties, so should have a low ohmic resistance.

Diese Aufgabe wird bei einem lichtreflektierenden ohmschen Kontakt der eingangs genannten Art erfindungsgemäßThis object is achieved according to the invention in the case of a light-reflecting ohmic contact of the type mentioned at the beginning

Kot 1 Dx / 31.10.1980 ·Feces 1 Dx / 10/31/1980

VPA 8OP 1 17 dadurch gelöst, daß die Schichtenfolge eine erste Schicht aus Gold und Germanium im Gewichtsverhältnis etwa 99 : 1, eine zweite Schicht aus reinstem Silber und eine dritte Schicht aus reinstem Gold aufweist. VPA 8OP 1 17 in that the layer sequence has a first layer of gold and germanium in a weight ratio of about 99: 1, a second layer of purest silver and a third layer of purest gold.

..

In vorteilhafter Weise ist die erste Schicht etwa 0,02 /um (200 Ä), die zweite Schicht 0,8 /um und die dritte Schicht 0,5 /um dick. Ein derartiger Kontakt ist insbesondere für Lumineszenzdioden vorteilhaft. Er ist aber auch dann anwendbar, wenn ein Substrat mit einer lichtreflektierenden Schicht kontaktiert werden soll.Advantageously, the first layer is about 0.02 / µm (200 Å), the second layer 0.8 / µm and the third layer 0.5 µm thick. Such a contact is particularly advantageous for luminescence diodes. He is but can also be used when a substrate is to be contacted with a light-reflecting layer.

In vorteilhafter Weise wird dieser Kontakt so hergestellt, daß die einzelnen Schichten auf die Rückseite des Substrats aufgedampft und anschließend dort angesintert werden. Der so hergestellte ohmsche Kontakt weist bei einem niedrigen ohmschen Widerstand eine hervorragende Lichtreflexion auf.Advantageously, this contact is made so that the individual layers on the back of the substrate are vapor-deposited and then sintered there. The ohmic contact produced in this way shows with a low ohmic resistance an excellent light reflection.

Nachfolgend wird die Erfindung an Hand der Zeichnung näher erläutert. Es zeigen:The invention is explained in more detail below with reference to the drawing. Show it:

Fig. 1 eine Leuchtdiode im Schnitt, und Fig. 2 die Schichtenfolge des erfindungsgemäßen Kontakts.1 shows a light-emitting diode in section, and FIG. 2 shows the sequence of layers of the contact according to the invention.

In der Fig. 1 besteht ein Halbleitersubstrat 1 aus einer η-leitenden Zone 2 und einer p-leitenden Zone 3» die durch einen pn-übergang 4 voneinander getrennt sind. Auf der Zone 3 ist ein Kontakt 5 angebracht, der mit einem Draht 6 als Zuleitung verbunden ist. Von der Oberfläche 7 dieser Zone 3 wird Licht abgestrahlt, wie dies durch Pfeile 8 angedeutet ist. Das Substrat 1 ist lichtdurchlässig. Um einen hohen Wirkungsgrad zu erzielen, sollte das im Substrat 1 und vorzugsweise am pn-übergang erzeugte Licht von der Rückseite des Substrats 1 beziehungsweise der Zone 2 reflektiert werden und so über dieIn FIG. 1, a semiconductor substrate 1 consists of an η-conductive zone 2 and a p-conductive zone 3 »die are separated from each other by a pn junction 4. On the zone 3, a contact 5 is attached, which with a Wire 6 is connected as a lead. From the surface 7 of this zone 3, light is emitted, as is done by Arrows 8 is indicated. The substrate 1 is translucent. In order to achieve a high level of efficiency, the light generated in the substrate 1 and preferably at the pn junction from the back of the substrate 1, respectively of zone 2 are reflected and so about the

ORIGINAL INSPECTEDORIGINAL INSPECTED

20413582041358

-J- VPA 80 P 1 1 7 8 DE -J- VPA 80 P 1 1 7 8 DE

Oberfläche 7 das Substrat 1 verlassen. Hierzu ist der auf der Rückseite des Substrats 1 vorgesehene Kontakt 10 lichtreflektierend ausgestaltet, so daß dort das im Inneren des Substrats 1 erzeugte Licht reflektiert wird, wie dies durch einen Pfeil 11 angedeutet ist.Surface 7 leave the substrate 1. The contact 10 provided on the rear side of the substrate 1 is used for this purpose designed light-reflecting, so that there the light generated inside the substrate 1 is reflected, as indicated by an arrow 11.

Erfindungsgemäß besteht dieser Kontakt 10 aus einer Schichtenfolge (vergleiche Fig. 2) mit einer ersten, 0,02 /um dicken Schicht 12 aus Gold und Germanium im Ge-Wichtsverhältnis etwa 99 : 1 $ einer zweiten, 0,8 /um dicken Schicht 13 aus reinstem Silber und einer dritten, 0,5 /um dicken Schicht 14 aus reinstem Gold. Die Schicht 12 befindet sich dabei auf der Oberfläche der Zone 2.According to the invention, this contact 10 consists of a layer sequence (see FIG. 2) with a first, 0.02 / μm thick layer 12 made of gold and germanium in a Ge weight ratio of about 99: 1 $ and a second, 0.8 / μm thick layer 13 made of the purest silver and a third, 0.5 / µm thick layer 14 made of the purest gold. The layer 12 is located on the surface of zone 2.

Die einzelnen Schichten werden ganzflächig auf die Oberfläche der Zone 2 nacheinander aufgedampft. Anschließend werden diese Schichten gesintert. Der so hergestellte Kontakt hat die gewünschten Eigenschaften einer hohen Lichtreflexion und eines niedrigen ohmschen Widerstands.The individual layers are vapor-deposited one after the other over the entire surface of zone 2. Afterward these layers are sintered. The contact produced in this way has the desired properties of high Light reflection and a low ohmic resistance.

2 Figuren2 figures

4 Patentansprüche4 claims

ORJGiMAL INSPECTEDORJGiMAL INSPECTED

Claims (4)

VPA 80 P 1 1 7 8 DE VPA 80 P 1 1 7 8 DE PatentansprücheClaims Lichtreflektierender ohmscher Kontakt für Bauelemente, insbesondere Halbleiterbauelemente, bestehend aus einer Schichtenfolge einschließlich Gold auf einem Substrat, dadurch gekennzeichnet, daß die Schichtenfolge eine erste Schicht (12) aus Gold und Germanium im Gewichtsverhältnis etwa 99 : 1, eine zweite Schicht (13) aus reinstem Silber und eine dritte Schicht (14) aus reinstem Gold aufweist.Light-reflecting ohmic contact for components, in particular semiconductor components, consisting of a sequence of layers including gold on a substrate, characterized in that that the layer sequence is a first layer (12) made of gold and germanium in a weight ratio of about 99: 1, a has a second layer (13) made of the purest silver and a third layer (14) made of the purest gold. 2. Kontakt nach Anspruch 1, dadurch gekennzeichnet , daß die erste Schicht (12) etwa 0,02 /um (200 ft), die zweite Schicht (13) 0,8 /um und die dritte Schicht (14) 0,5 /um dick ist.2. Contact according to claim 1, characterized in that the first layer (12) about 0.02 / µm (200 ft), the second layer (13) 0.8 / µm and the third layer (14) 0.5 / µm thick. 3. Verwendung des Kontakts nach Anspruch 1 oder 2 für Lumineszenzdioden (1).3. Use of the contact according to claim 1 or 2 for light emitting diodes (1). 4. Verfahren zur Herstellung des Kontakts nach Anspruch 1 oder 2, dadurch gekennzeichnet, daß die einzelnen Schichten (12, 13, 14) auf die Rückseite des Substrats (1) aufgedampft und anschließend angesintert werden.4. A method for producing the contact according to claim 1 or 2, characterized in that the individual layers (12, 13, 14) the back of the substrate (1) are vapor-deposited and then sintered on.
DE19803041358 1980-11-03 1980-11-03 LIGHT REFLECTIVE OHMSCHER CONTACT FOR COMPONENTS Withdrawn DE3041358A1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DE19803041358 DE3041358A1 (en) 1980-11-03 1980-11-03 LIGHT REFLECTIVE OHMSCHER CONTACT FOR COMPONENTS
EP81108239A EP0051172B1 (en) 1980-11-03 1981-10-12 Ohmic contact on a transparent substrate of a device
DE8181108239T DE3164751D1 (en) 1980-11-03 1981-10-12 Ohmic contact on a transparent substrate of a device
JP17439381A JPS57106087A (en) 1980-11-03 1981-10-30 Light reflective ohmic contact and method of producing same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19803041358 DE3041358A1 (en) 1980-11-03 1980-11-03 LIGHT REFLECTIVE OHMSCHER CONTACT FOR COMPONENTS

Publications (1)

Publication Number Publication Date
DE3041358A1 true DE3041358A1 (en) 1982-06-09

Family

ID=6115839

Family Applications (2)

Application Number Title Priority Date Filing Date
DE19803041358 Withdrawn DE3041358A1 (en) 1980-11-03 1980-11-03 LIGHT REFLECTIVE OHMSCHER CONTACT FOR COMPONENTS
DE8181108239T Expired DE3164751D1 (en) 1980-11-03 1981-10-12 Ohmic contact on a transparent substrate of a device

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE8181108239T Expired DE3164751D1 (en) 1980-11-03 1981-10-12 Ohmic contact on a transparent substrate of a device

Country Status (3)

Country Link
EP (1) EP0051172B1 (en)
JP (1) JPS57106087A (en)
DE (2) DE3041358A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3310349A1 (en) * 1983-03-22 1984-09-27 Siemens AG, 1000 Berlin und 8000 München Method of producing highly reflective ohmic contact
DE19648309A1 (en) * 1995-12-21 1997-07-03 Hewlett Packard Co Reflecting contact device for semiconductor light emitting diode

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60102733A (en) * 1983-11-10 1985-06-06 Oki Electric Ind Co Ltd Forming method of ohmic electrode
JPH02116750U (en) * 1990-03-15 1990-09-19
US6936859B1 (en) 1998-05-13 2005-08-30 Toyoda Gosei Co., Ltd. Light-emitting semiconductor device using group III nitride compound
DE19921987B4 (en) * 1998-05-13 2007-05-16 Toyoda Gosei Kk Light-emitting semiconductor device with group III element-nitride compounds
US20010042866A1 (en) 1999-02-05 2001-11-22 Carrie Carter Coman Inxalygazn optical emitters fabricated via substrate removal
US6992334B1 (en) 1999-12-22 2006-01-31 Lumileds Lighting U.S., Llc Multi-layer highly reflective ohmic contacts for semiconductor devices
WO2001082384A1 (en) 2000-04-26 2001-11-01 Osram Opto Semiconductors Gmbh Radiation-emitting semiconductor element and method for producing the same
EP1277241B1 (en) 2000-04-26 2017-12-13 OSRAM Opto Semiconductors GmbH Gan-based light-emitting-diode chip
DE10051465A1 (en) 2000-10-17 2002-05-02 Osram Opto Semiconductors Gmbh Method for producing a GaN-based semiconductor component
TWI292227B (en) 2000-05-26 2008-01-01 Osram Opto Semiconductors Gmbh Light-emitting-dioed-chip with a light-emitting-epitaxy-layer-series based on gan
US6794684B2 (en) 2001-02-01 2004-09-21 Cree, Inc. Reflective ohmic contacts for silicon carbide including a layer consisting essentially of nickel, methods of fabricating same, and light emitting devices including the same
US6791119B2 (en) 2001-02-01 2004-09-14 Cree, Inc. Light emitting diodes including modifications for light extraction
US7211833B2 (en) 2001-07-23 2007-05-01 Cree, Inc. Light emitting diodes including barrier layers/sublayers
US6740906B2 (en) 2001-07-23 2004-05-25 Cree, Inc. Light emitting diodes including modifications for submount bonding

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2045106C3 (en) * 1970-09-11 1981-01-15 Siemens Ag, 1000 Berlin Und 8000 Muenchen Method for producing a light-emitting diode
US3931631A (en) * 1973-07-23 1976-01-06 Monsanto Company Gallium phosphide light-emitting diodes
JPS5237783A (en) * 1975-09-20 1977-03-23 Oki Electric Ind Co Ltd Light emission diode
JPS52104091A (en) * 1976-02-27 1977-09-01 Hitachi Ltd Light-emitting semiconductor
JPS54148374A (en) * 1978-05-15 1979-11-20 Toshiba Corp Manufacture of compound semiconductor device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3310349A1 (en) * 1983-03-22 1984-09-27 Siemens AG, 1000 Berlin und 8000 München Method of producing highly reflective ohmic contact
DE19648309A1 (en) * 1995-12-21 1997-07-03 Hewlett Packard Co Reflecting contact device for semiconductor light emitting diode
DE19648309B4 (en) * 1995-12-21 2007-10-18 LumiLeds Lighting, U.S., LLC, San Jose Highly reflective contacts for light-emitting semiconductor devices

Also Published As

Publication number Publication date
EP0051172B1 (en) 1984-07-11
JPS57106087A (en) 1982-07-01
DE3164751D1 (en) 1984-08-16
EP0051172A1 (en) 1982-05-12

Similar Documents

Publication Publication Date Title
DE3041358A1 (en) LIGHT REFLECTIVE OHMSCHER CONTACT FOR COMPONENTS
DE3431603C2 (en) Photoelectric converter
EP0905797B1 (en) Semiconductor light source and method of fabrication
EP0944924B1 (en) Process for producing a light-emitting and/or light-receiving semiconductor body
EP2583319B1 (en) Optoelectronic component
DE19632626A1 (en) Method for manufacturing semiconductor bodies with MOVPE layer sequence
DE202008018180U1 (en) Housing for a light-emitting device
DE2324553A1 (en) ELECTRIC LIGHT EMISSION DEVICE
DE112007000773T5 (en) Light emitting device
DE10357783B4 (en) Nitride light emitting component
DE19947030A1 (en) Surface-structured light emission diode with improved current coupling
DE102005013894A1 (en) Electromagnetic radiation generating semiconductor chip and method for its production
DE3044780A1 (en) PHOTOELECTRICAL DEVICE
DE102007008524A1 (en) Radiation emitting chip with at least one semiconductor body
DE102017111706A1 (en) Light emitting device
DE202007019397U1 (en) Light-emitting semiconductor device
DE102005006821A1 (en) Light emission permanent component with organic adhesive
DE102009015963A1 (en) Optoelectronic component
DE19603444A1 (en) LED device
DE19831607A1 (en) Linear lighting element for image reading device
DE102013101524A1 (en) light emitting diode device
DE2721250A1 (en) OPTOELECTRONICALLY COUPLED SEMICONDUCTOR ARRANGEMENT
DE2601956A1 (en) PHOTOCOUPLER
DE4141083A1 (en) Sawtooth tandem solar cell - has different parts of saw-tooth metallic substrate coated with solar cells for different wavelength ranges
DE2322197C2 (en) Process for the production of a monolithically integrated semiconductor arrangement of a plurality of light-emitting diodes

Legal Events

Date Code Title Description
8139 Disposal/non-payment of the annual fee