DE29505960U1 - Anordnung zum Beschichten von Substraten - Google Patents

Anordnung zum Beschichten von Substraten

Info

Publication number
DE29505960U1
DE29505960U1 DE29505960U DE29505960U DE29505960U1 DE 29505960 U1 DE29505960 U1 DE 29505960U1 DE 29505960 U DE29505960 U DE 29505960U DE 29505960 U DE29505960 U DE 29505960U DE 29505960 U1 DE29505960 U1 DE 29505960U1
Authority
DE
Germany
Prior art keywords
arrangement
coating substrates
substrates
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE29505960U
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Steag Hamatech AG
Original Assignee
Steag Microtech GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Steag Microtech GmbH filed Critical Steag Microtech GmbH
Priority to DE29505960U priority Critical patent/DE29505960U1/de
Publication of DE29505960U1 publication Critical patent/DE29505960U1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
    • B05C11/08—Spreading liquid or other fluent material by manipulating the work, e.g. tilting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
DE29505960U 1995-04-06 1995-04-06 Anordnung zum Beschichten von Substraten Expired - Lifetime DE29505960U1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE29505960U DE29505960U1 (de) 1995-04-06 1995-04-06 Anordnung zum Beschichten von Substraten

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE29505960U DE29505960U1 (de) 1995-04-06 1995-04-06 Anordnung zum Beschichten von Substraten

Publications (1)

Publication Number Publication Date
DE29505960U1 true DE29505960U1 (de) 1996-08-08

Family

ID=8006541

Family Applications (1)

Application Number Title Priority Date Filing Date
DE29505960U Expired - Lifetime DE29505960U1 (de) 1995-04-06 1995-04-06 Anordnung zum Beschichten von Substraten

Country Status (1)

Country Link
DE (1) DE29505960U1 (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004011850B4 (de) * 2003-03-10 2008-12-04 Tokyo Electron Ltd. Schleuderbeschichtungsvorrichtung und -verfahren
DE19753596B4 (de) * 1997-12-03 2009-02-19 Süss Microtec Lithography Gmbh Vorrichtung zum Aufbringen einer dünnen Schicht auf ein Substrat

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2865324A (en) * 1954-06-23 1958-12-23 Smith Corp A O Apparatus for applying coating material to articles
US5013586A (en) * 1988-09-15 1991-05-07 Societe Anonyme Dite: Sulzer Electro-Technique "S.E.T." Method and device for the uniformly even application of a resin coating on a substrate
DE4202194A1 (de) * 1992-01-28 1993-07-29 Convac Gmbh Verfahren und vorrichtung zum partiellen entfernen von duennen schichten von einem substrat

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2865324A (en) * 1954-06-23 1958-12-23 Smith Corp A O Apparatus for applying coating material to articles
US5013586A (en) * 1988-09-15 1991-05-07 Societe Anonyme Dite: Sulzer Electro-Technique "S.E.T." Method and device for the uniformly even application of a resin coating on a substrate
DE4202194A1 (de) * 1992-01-28 1993-07-29 Convac Gmbh Verfahren und vorrichtung zum partiellen entfernen von duennen schichten von einem substrat

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19753596B4 (de) * 1997-12-03 2009-02-19 Süss Microtec Lithography Gmbh Vorrichtung zum Aufbringen einer dünnen Schicht auf ein Substrat
DE102004011850B4 (de) * 2003-03-10 2008-12-04 Tokyo Electron Ltd. Schleuderbeschichtungsvorrichtung und -verfahren
US7615117B2 (en) 2003-03-10 2009-11-10 Tokyo Electron Limited Coating and processing apparatus and method
US8277884B2 (en) 2003-03-10 2012-10-02 Tokyo Electron Limited Coating and processing apparatus and method

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Legal Events

Date Code Title Description
R163 Identified publications notified
R207 Utility model specification

Effective date: 19960919

R081 Change of applicant/patentee

Owner name: STEAG HAMATECH AG, DE

Free format text: FORMER OWNER: STEAG MICRO-TECH GMBH STERNENFELS, 75447 STERNENFELS, DE

Effective date: 19961205

R150 Term of protection extended to 6 years

Effective date: 19980408

R081 Change of applicant/patentee

Owner name: STEAG HAMATECH AG, DE

Free format text: FORMER OWNER: STEAG MICROTECH GMBH, 72124 PLIEZHAUSEN, DE

Effective date: 20001108

R151 Term of protection extended to 8 years

Effective date: 20010702

R152 Term of protection extended to 10 years

Effective date: 20030404

R071 Expiry of right