DE2900899C2 - Lasereinrichtung zum Erzeugen von ultrakurzen Laserstrahlungsimpulsen - Google Patents
Lasereinrichtung zum Erzeugen von ultrakurzen LaserstrahlungsimpulsenInfo
- Publication number
- DE2900899C2 DE2900899C2 DE19792900899 DE2900899A DE2900899C2 DE 2900899 C2 DE2900899 C2 DE 2900899C2 DE 19792900899 DE19792900899 DE 19792900899 DE 2900899 A DE2900899 A DE 2900899A DE 2900899 C2 DE2900899 C2 DE 2900899C2
- Authority
- DE
- Germany
- Prior art keywords
- laser
- interferometer
- wavelength
- laser device
- beam path
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000005855 radiation Effects 0.000 title claims description 11
- 239000006096 absorbing agent Substances 0.000 claims description 10
- 230000003287 optical effect Effects 0.000 claims description 6
- 230000000638 stimulation Effects 0.000 claims description 3
- 230000000712 assembly Effects 0.000 claims 1
- 238000000429 assembly Methods 0.000 claims 1
- 230000004936 stimulating effect Effects 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 24
- 239000010453 quartz Substances 0.000 description 20
- 230000008878 coupling Effects 0.000 description 8
- 238000010168 coupling process Methods 0.000 description 8
- 238000005859 coupling reaction Methods 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- 230000005540 biological transmission Effects 0.000 description 4
- 230000003595 spectral effect Effects 0.000 description 4
- 230000003321 amplification Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000003199 nucleic acid amplification method Methods 0.000 description 3
- 230000005284 excitation Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000012886 linear function Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- -1 argon ion Chemical class 0.000 description 1
- VYXSBFYARXAAKO-WTKGSRSZSA-N chembl402140 Chemical compound Cl.C1=2C=C(C)C(NCC)=CC=2OC2=C\C(=N/CC)C(C)=CC2=C1C1=CC=CC=C1C(=O)OCC VYXSBFYARXAAKO-WTKGSRSZSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/11—Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
- H01S3/1123—Q-switching
- H01S3/121—Q-switching using intracavity mechanical devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
- H01S3/083—Ring lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
- H01S3/0813—Configuration of resonator
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/20—Liquids
- H01S3/213—Liquids including an organic dye
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19792900899 DE2900899C2 (de) | 1979-01-11 | 1979-01-11 | Lasereinrichtung zum Erzeugen von ultrakurzen Laserstrahlungsimpulsen |
| GB8000124A GB2040550B (en) | 1979-01-11 | 1980-01-03 | Generating ultra short laser pulses |
| FR8000595A FR2446548A1 (fr) | 1979-01-11 | 1980-01-11 | Laser pour la production d'impulsions ultra-courtes |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19792900899 DE2900899C2 (de) | 1979-01-11 | 1979-01-11 | Lasereinrichtung zum Erzeugen von ultrakurzen Laserstrahlungsimpulsen |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE2900899A1 DE2900899A1 (de) | 1980-07-17 |
| DE2900899C2 true DE2900899C2 (de) | 1983-04-14 |
Family
ID=6060363
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19792900899 Expired DE2900899C2 (de) | 1979-01-11 | 1979-01-11 | Lasereinrichtung zum Erzeugen von ultrakurzen Laserstrahlungsimpulsen |
Country Status (3)
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5150172A (en) * | 1988-01-11 | 1992-09-22 | Nicolet Instrument Corporation | Interferometer spectrometer having tiltable reflector assembly and reflector assembly therefor |
| US4915502A (en) * | 1988-01-11 | 1990-04-10 | Nicolet Instrument Corporation | Interferometer spectrometer having tiltable reflector assembly and reflector assembly therefor |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2059069B2 (de) * | 1970-12-01 | 1973-05-03 | Siemens AG, 1000 Berlin u 8000 München | Hochbelastbarer resonanzreflektor fuer optische resonatoren in laseranordnungen |
| SU1152533A3 (ru) * | 1978-02-17 | 1985-04-23 | Польска Акадэмия Наук Институт Хэмии Физычнэй (Инопредприятие) | Сканирующий интерферометр (его варианты) |
-
1979
- 1979-01-11 DE DE19792900899 patent/DE2900899C2/de not_active Expired
-
1980
- 1980-01-03 GB GB8000124A patent/GB2040550B/en not_active Expired
- 1980-01-11 FR FR8000595A patent/FR2446548A1/fr active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| FR2446548A1 (fr) | 1980-08-08 |
| DE2900899A1 (de) | 1980-07-17 |
| FR2446548B3 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1981-11-20 |
| GB2040550A (en) | 1980-08-28 |
| GB2040550B (en) | 1983-01-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OAP | Request for examination filed | ||
| OD | Request for examination | ||
| 8181 | Inventor (new situation) |
Free format text: SCHAEFER, FRITZ PETER, PROF. DIPL.-PHYS. DR., 3400 GOETTINGEN, DE JASNY, JAN, DIPL.-PHYS. DR., WARSZAWA, PL SCHAEFER, FRITZ PETER, PROF. DIPL.-PHYS., 3400 GOETTINGEN, DE JASNY, JAN, DIPL.-PHYS. DR., WARSZAWA, PL |
|
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition | ||
| 8339 | Ceased/non-payment of the annual fee |