DE2537970A1 - Verfahren zur herstellung von zirkoniumdioxid - Google Patents
Verfahren zur herstellung von zirkoniumdioxidInfo
- Publication number
- DE2537970A1 DE2537970A1 DE19752537970 DE2537970A DE2537970A1 DE 2537970 A1 DE2537970 A1 DE 2537970A1 DE 19752537970 DE19752537970 DE 19752537970 DE 2537970 A DE2537970 A DE 2537970A DE 2537970 A1 DE2537970 A1 DE 2537970A1
- Authority
- DE
- Germany
- Prior art keywords
- zirconium
- temperature
- plasma discharge
- plasma
- zirconium dioxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 title claims abstract description 39
- DUNKXUFBGCUVQW-UHFFFAOYSA-J zirconium tetrachloride Chemical compound Cl[Zr](Cl)(Cl)Cl DUNKXUFBGCUVQW-UHFFFAOYSA-J 0.000 title claims description 19
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 title claims description 18
- 238000001816 cooling Methods 0.000 claims abstract description 8
- 239000011261 inert gas Substances 0.000 claims abstract description 6
- 238000000034 method Methods 0.000 claims description 16
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 230000003647 oxidation Effects 0.000 claims description 5
- 238000007254 oxidation reaction Methods 0.000 claims description 5
- 238000000926 separation method Methods 0.000 claims description 2
- 239000002245 particle Substances 0.000 abstract description 12
- 238000005516 engineering process Methods 0.000 abstract description 2
- 238000004377 microelectronic Methods 0.000 abstract description 2
- 238000005498 polishing Methods 0.000 abstract description 2
- 239000003054 catalyst Substances 0.000 abstract 1
- 239000005304 optical glass Substances 0.000 abstract 1
- 239000011819 refractory material Substances 0.000 abstract 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 30
- 229910052786 argon Inorganic materials 0.000 description 15
- 239000007789 gas Substances 0.000 description 13
- 239000000203 mixture Substances 0.000 description 12
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 11
- 239000001301 oxygen Substances 0.000 description 11
- 229910052760 oxygen Inorganic materials 0.000 description 11
- 239000000843 powder Substances 0.000 description 10
- 239000000047 product Substances 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 239000003153 chemical reaction reagent Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 238000010790 dilution Methods 0.000 description 3
- 239000012895 dilution Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000001307 helium Substances 0.000 description 3
- 229910052734 helium Inorganic materials 0.000 description 3
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- 239000000443 aerosol Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000010987 cubic zirconia Substances 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 238000004157 plasmatron Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 150000003754 zirconium Chemical class 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
- C01B13/14—Methods for preparing oxides or hydroxides in general
- C01B13/20—Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state
- C01B13/22—Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state of halides or oxyhalides
- C01B13/28—Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state of halides or oxyhalides using a plasma or an electric discharge
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G25/00—Compounds of zirconium
- C01G25/02—Oxides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/60—Optical properties, e.g. expressed in CIELAB-values
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Composite Materials (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Plasma & Fusion (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19752537970 DE2537970A1 (de) | 1975-08-26 | 1975-08-26 | Verfahren zur herstellung von zirkoniumdioxid |
| CH1160375A CH595286A5 (enExample) | 1975-08-26 | 1975-09-08 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19752537970 DE2537970A1 (de) | 1975-08-26 | 1975-08-26 | Verfahren zur herstellung von zirkoniumdioxid |
| CH1160375A CH595286A5 (enExample) | 1975-08-26 | 1975-09-08 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2537970A1 true DE2537970A1 (de) | 1977-03-10 |
Family
ID=25708626
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19752537970 Pending DE2537970A1 (de) | 1975-08-26 | 1975-08-26 | Verfahren zur herstellung von zirkoniumdioxid |
Country Status (2)
| Country | Link |
|---|---|
| CH (1) | CH595286A5 (enExample) |
| DE (1) | DE2537970A1 (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115041699A (zh) * | 2022-07-22 | 2022-09-13 | 华材(山东)新材料有限公司 | 一种3d打印用球形锆粉的生产方法 |
-
1975
- 1975-08-26 DE DE19752537970 patent/DE2537970A1/de active Pending
- 1975-09-08 CH CH1160375A patent/CH595286A5/xx not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| CH595286A5 (enExample) | 1978-02-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE69426886T2 (de) | Verfahren und einrichtung zur herstellung von nanostrukturierte materialien | |
| EP0595078B1 (de) | Flammenhydrolytisch hergestelltes Titandioxid-Mischoxid, Verfahren zu seiner Herstellung und Verwendung | |
| EP0568862B1 (de) | Feinteiliges Metallpulver | |
| DE3872274T2 (de) | Herstellungsverfahren von ultrafeinen partikeln aus metall, metallverbindungen und keramiken, und dafuer zu verwendender apparat. | |
| DE69509396T2 (de) | Verfahren zur herstellung von keramischen pulvern, insbesondere titandioxid zur verwendung als photokatalysator | |
| DE69608809T2 (de) | Verfahren zur herstellung eines übergangsmetallcarbids ausgehend von einer partiell reduzierten übergangsmetallverbindung | |
| DE69803661T2 (de) | Verfahren zur herstellung eines übergangsmetallcarbids ausgehend von einer partiell reduzierten übergangsmetallverbindung | |
| DE102005061897A1 (de) | Verfahren zur Herstellung von pulverförmigen Feststoffen | |
| EP0650791B1 (de) | Feinteilige Metall-, Legierungs- und Metallverbindungspulver | |
| DE4214724C2 (de) | Feinteiliges Oxid-Keramikpulver | |
| DE60037138T2 (de) | Feine titanoxidpartikel und verfahren zur herstellung derselben | |
| EP0085121B1 (de) | Verfahren zum Herstellen geblähter Graphitpartikel | |
| US3273962A (en) | Process for producing oxides in the form of hollow shells | |
| EP0377132B1 (de) | Verfahren zur Herstellung von Siliziumnitrid | |
| EP0568861A1 (de) | Feinteilige Nichtoxid-Keramikpulver | |
| DE1533058C3 (de) | Verfahren zur Herstellung von feinteiligen, nicht pyrophoren Metallen der IV., V. und VI. Gruppe und der Actiniumreihe des periodischen Systems durch Reduktion deren Halogenide im Wasserstoff-Plasmastrahl | |
| DE2537970A1 (de) | Verfahren zur herstellung von zirkoniumdioxid | |
| AT389693B (de) | Verfahren zur herstellung von aluminium-titanat | |
| EP0606306A1 (de) | Verfahren zur herstellung von kohlenstoffmolekularsieben. | |
| EP0214489B1 (de) | Verfahren zur Herstellung von Silicium und dessen Verbindungen in feinstteiliger Form | |
| EP3019448B1 (de) | Verfahren zur herstellung von metalloxiden | |
| AT404912B (de) | Verfahren zur herstellung von pulver-pressansätzen für feinkörniges hartmetall | |
| US7449166B2 (en) | Particulate titanium oxide and production process therefor | |
| DE3536933A1 (de) | Verbessertes siliciumnitrid und verfahren zu dessen herstellung | |
| DE69825304T2 (de) | Verfahren zur herstellung von 1,1,1,2,2-pentafluoroethan |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OHJ | Non-payment of the annual fee |