DE2249297A1 - - Google Patents
Info
- Publication number
- DE2249297A1 DE2249297A1 DE19722249297 DE2249297A DE2249297A1 DE 2249297 A1 DE2249297 A1 DE 2249297A1 DE 19722249297 DE19722249297 DE 19722249297 DE 2249297 A DE2249297 A DE 2249297A DE 2249297 A1 DE2249297 A1 DE 2249297A1
- Authority
- DE
- Germany
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2116190A DE2116190C3 (de) | 1971-04-02 | 1971-04-02 | Vorrichtung zum Beschichten großflächiger Platten wie Glasscheiben, Keramik- oder Kunststoffplatten und dergleichen mittels Kathodenzerstäubung |
| DE2249297A DE2249297C2 (de) | 1971-04-02 | 1972-10-07 | Vorrichtung zum Beschichten großflächiger Platten wie Glasscheiben, Keramik- oder Kunststoffplatten und dergleichen mittels Kathodenzerstäubung |
| BE2053075A BE805124R (en) | 1972-10-07 | 1973-09-21 | Cathode sputtering chamber for large plates - with trolley supported cathodes |
| FR7335159A FR2202169B2 (https=) | 1972-10-07 | 1973-10-02 | |
| GB4590573A GB1381835A (en) | 1972-10-07 | 1973-10-02 | Coating of large plates of glass ceramics plstics and the like by cathodic sputtering |
| US404677A US3891536A (en) | 1972-10-07 | 1973-10-09 | Sputter-coating apparatus |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2116190A DE2116190C3 (de) | 1971-04-02 | 1971-04-02 | Vorrichtung zum Beschichten großflächiger Platten wie Glasscheiben, Keramik- oder Kunststoffplatten und dergleichen mittels Kathodenzerstäubung |
| DE2249297A DE2249297C2 (de) | 1971-04-02 | 1972-10-07 | Vorrichtung zum Beschichten großflächiger Platten wie Glasscheiben, Keramik- oder Kunststoffplatten und dergleichen mittels Kathodenzerstäubung |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| DE2249297B1 DE2249297B1 (de) | 1973-11-15 |
| DE2249297A1 true DE2249297A1 (https=) | 1973-11-15 |
| DE2249297C2 DE2249297C2 (de) | 1980-07-10 |
Family
ID=33453366
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2116190A Expired DE2116190C3 (de) | 1971-04-02 | 1971-04-02 | Vorrichtung zum Beschichten großflächiger Platten wie Glasscheiben, Keramik- oder Kunststoffplatten und dergleichen mittels Kathodenzerstäubung |
| DE2249297A Expired DE2249297C2 (de) | 1971-04-02 | 1972-10-07 | Vorrichtung zum Beschichten großflächiger Platten wie Glasscheiben, Keramik- oder Kunststoffplatten und dergleichen mittels Kathodenzerstäubung |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2116190A Expired DE2116190C3 (de) | 1971-04-02 | 1971-04-02 | Vorrichtung zum Beschichten großflächiger Platten wie Glasscheiben, Keramik- oder Kunststoffplatten und dergleichen mittels Kathodenzerstäubung |
Country Status (1)
| Country | Link |
|---|---|
| DE (2) | DE2116190C3 (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2653736A1 (de) * | 1976-11-26 | 1978-06-01 | Bosch Gmbh Robert | Verfahren und vorrichtung zur kontinuierlichen beschichtung von glas- oder keramiksubstraten mittels kathodenzerstaeubung |
| DE2844491C2 (de) * | 1978-10-12 | 1983-04-14 | Leybold-Heraeus GmbH, 5000 Köln | Vakuum-Beschichtungsanlage mit einer Einrichtung zum kontinuierlichen Substrattransport |
| US4399014A (en) * | 1980-05-03 | 1983-08-16 | Engle Frank W | Plasma reactor and method therefor |
| US4289598A (en) * | 1980-05-03 | 1981-09-15 | Technics, Inc. | Plasma reactor and method therefor |
| DE3041551A1 (de) * | 1980-11-04 | 1982-06-09 | Siemens AG, 1000 Berlin und 8000 München | Elektroden fuer plasma-aetzanlage |
-
1971
- 1971-04-02 DE DE2116190A patent/DE2116190C3/de not_active Expired
-
1972
- 1972-10-07 DE DE2249297A patent/DE2249297C2/de not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE2249297B1 (de) | 1973-11-15 |
| DE2116190C3 (de) | 1979-08-30 |
| DE2249297C2 (de) | 1980-07-10 |
| DE2116190B2 (de) | 1973-05-17 |
| DE2116190A1 (de) | 1972-10-19 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| B1 | Publication of the examined application without previous publication of unexamined application | ||
| C2 | Grant after previous publication (2nd publication) |