DE2102608A1 - Elektrostatisches Mikrohnsenraster - Google Patents
Elektrostatisches MikrohnsenrasterInfo
- Publication number
- DE2102608A1 DE2102608A1 DE19712102608 DE2102608A DE2102608A1 DE 2102608 A1 DE2102608 A1 DE 2102608A1 DE 19712102608 DE19712102608 DE 19712102608 DE 2102608 A DE2102608 A DE 2102608A DE 2102608 A1 DE2102608 A1 DE 2102608A1
- Authority
- DE
- Germany
- Prior art keywords
- electrodes
- grid according
- holes
- plates
- grid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002245 particle Substances 0.000 claims description 17
- 239000012799 electrically-conductive coating Substances 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 2
- 239000011810 insulating material Substances 0.000 claims 3
- 238000002955 isolation Methods 0.000 claims 1
- 150000002500 ions Chemical class 0.000 description 7
- 239000012777 electrically insulating material Substances 0.000 description 5
- 238000009826 distribution Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229920003002 synthetic resin Polymers 0.000 description 2
- 239000000057 synthetic resin Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000002800 charge carrier Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000010985 leather Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
- H01J29/80—Arrangements for controlling the ray or beam after passing the main deflection system, e.g. for post-acceleration or post-concentration, for colour switching
- H01J29/803—Arrangements for controlling the ray or beam after passing the main deflection system, e.g. for post-acceleration or post-concentration, for colour switching for post-acceleration or post-deflection, e.g. for colour switching
- H01J29/806—Electron lens mosaics, e.g. fly's eye lenses, colour selection lenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/10—Lenses
- H01J37/12—Lenses electrostatic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Tubes For Measurement (AREA)
- Electron Beam Exposure (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7001862A FR2076567A5 (enrdf_load_stackoverflow) | 1970-01-20 | 1970-01-20 | |
| FR7101748A FR2122684A6 (enrdf_load_stackoverflow) | 1970-01-20 | 1971-01-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2102608A1 true DE2102608A1 (de) | 1971-07-29 |
Family
ID=26215496
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19712102608 Pending DE2102608A1 (de) | 1970-01-20 | 1971-01-20 | Elektrostatisches Mikrohnsenraster |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3717785A (enrdf_load_stackoverflow) |
| DE (1) | DE2102608A1 (enrdf_load_stackoverflow) |
| FR (2) | FR2076567A5 (enrdf_load_stackoverflow) |
| GB (1) | GB1305523A (enrdf_load_stackoverflow) |
| NL (1) | NL7100748A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10237297A1 (de) * | 2002-08-14 | 2004-03-11 | Leo Elektronenmikroskopie Gmbh | Teilchenoptische Vorrichtung, Elektronenmikroskopiesystem und Lithogrphiesystem |
| US6914249B2 (en) | 2002-08-13 | 2005-07-05 | Carl Zeiss Nts Gmbh | Particle-optical apparatus, electron microscopy system and electron lithography system |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2326279A1 (de) * | 1973-05-23 | 1974-12-19 | Siemens Ag | Ionenstrahlschnellschaltung zur erzielung definierter festkoerperdotierungen durch ionenimplantation |
| GB1443215A (en) * | 1973-11-07 | 1976-07-21 | Mullard Ltd | Electrostatically clamping a semiconductor wafer during device manufacture |
| JPS52119178A (en) * | 1976-03-31 | 1977-10-06 | Toshiba Corp | Electron beam exposure device |
| US4194123A (en) * | 1978-05-12 | 1980-03-18 | Rockwell International Corporation | Lithographic apparatus |
| US4338548A (en) * | 1980-01-30 | 1982-07-06 | Control Data Corporation | Unipotential lens assembly for charged particle beam tubes and method for applying correction potentials thereto |
| WO1982002623A1 (en) * | 1981-01-23 | 1982-08-05 | Veeco Instr Inc | Parallel charged particle beam exposure system |
| US4465934A (en) * | 1981-01-23 | 1984-08-14 | Veeco Instruments Inc. | Parallel charged particle beam exposure system |
| JPS57163955A (en) * | 1981-02-25 | 1982-10-08 | Toshiba Corp | Mask focusing type color picture tube |
| US4354111A (en) * | 1981-03-10 | 1982-10-12 | Veeco Instruments Incorporated | Screen lens array system |
| DE3138744A1 (de) * | 1981-09-29 | 1983-04-07 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum herstellen von halbleitervorrichtungen |
| US4667108A (en) * | 1985-06-28 | 1987-05-19 | Control Data Corporation | Impedance matched and thermally cooled deflection amplifiers for charged particle beam apparatus employing deflectors |
| US5023458A (en) * | 1989-01-04 | 1991-06-11 | Eaton Corporation | Ion beam control system |
| JPH05205695A (ja) * | 1992-01-28 | 1993-08-13 | Hitachi Ltd | 多段多重電極及び質量分析装置 |
| EP1171901B1 (en) * | 2000-02-09 | 2008-10-08 | Fei Company | Multi-column fib for nanofabrication applications |
| RU2249241C1 (ru) * | 2003-11-04 | 2005-03-27 | Гурович Борис Аронович | Устройство для создания изображений |
| DE102004048892A1 (de) * | 2004-10-06 | 2006-04-20 | Leica Microsystems Lithography Gmbh | Beleuchtungssystem für eine Korpuskularstrahleinrichtung und Verfahren zur Beleuchtung mit einem Korpuskularstrahl |
| JP2007287365A (ja) * | 2006-04-13 | 2007-11-01 | Jeol Ltd | 多極子レンズ及び多極子レンズの製造方法 |
| GB0700754D0 (en) * | 2007-01-15 | 2007-02-21 | Oxford Instr Analytical Ltd | Charged particle analyser and method |
| GB2446184B (en) * | 2007-01-31 | 2011-07-27 | Microsaic Systems Ltd | High performance micro-fabricated quadrupole lens |
| US8389950B2 (en) * | 2007-01-31 | 2013-03-05 | Microsaic Systems Plc | High performance micro-fabricated quadrupole lens |
| JP7100152B2 (ja) | 2018-05-01 | 2022-07-12 | エーエスエムエル ネザーランズ ビー．ブイ． | マルチビーム検査装置 |
| CN110534385A (zh) * | 2019-09-09 | 2019-12-03 | 中国科学院合肥物质科学研究院 | 一种具有整体膜电极棒的电四极透镜组 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2919381A (en) * | 1956-07-25 | 1959-12-29 | Farrand Optical Co Inc | Electron lens |
| US2941114A (en) * | 1958-01-09 | 1960-06-14 | Bell Telephone Labor Inc | Slalom focusing structures |
| NL155980B (nl) * | 1966-08-11 | 1978-02-15 | Philips Nv | Kathodestraalbuis met een vierpoollens voor de correctie van orthogonaliteitsfouten. |
| US3612946A (en) * | 1967-08-01 | 1971-10-12 | Murata Manufacturing Co | Electron multiplier device using semiconductor ceramic |
-
1970
- 1970-01-20 FR FR7001862A patent/FR2076567A5/fr not_active Expired
-
1971
- 1971-01-19 GB GB251771A patent/GB1305523A/en not_active Expired
- 1971-01-19 US US00107720A patent/US3717785A/en not_active Expired - Lifetime
- 1971-01-20 DE DE19712102608 patent/DE2102608A1/de active Pending
- 1971-01-20 FR FR7101748A patent/FR2122684A6/fr not_active Expired
- 1971-01-20 NL NL7100748A patent/NL7100748A/xx unknown
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6914249B2 (en) | 2002-08-13 | 2005-07-05 | Carl Zeiss Nts Gmbh | Particle-optical apparatus, electron microscopy system and electron lithography system |
| DE10237297A1 (de) * | 2002-08-14 | 2004-03-11 | Leo Elektronenmikroskopie Gmbh | Teilchenoptische Vorrichtung, Elektronenmikroskopiesystem und Lithogrphiesystem |
Also Published As
| Publication number | Publication date |
|---|---|
| GB1305523A (enrdf_load_stackoverflow) | 1973-02-07 |
| US3717785A (en) | 1973-02-20 |
| NL7100748A (enrdf_load_stackoverflow) | 1971-07-22 |
| FR2122684A6 (enrdf_load_stackoverflow) | 1972-09-01 |
| FR2076567A5 (enrdf_load_stackoverflow) | 1971-10-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE2102608A1 (de) | Elektrostatisches Mikrohnsenraster | |
| DE883938C (de) | Elektronen-Entladungseinrichtung | |
| DE3025764C2 (de) | Laufzeit-Massenspektrometer | |
| DE3504714A1 (de) | Lithografiegeraet zur erzeugung von mikrostrukturen | |
| DE3852276T2 (de) | Bildwiedergabevorrichtung. | |
| DE2223367B2 (de) | Mikrostrahlsonde zur quantitativen Erfassung von geladenen Sekundärteilchen | |
| DE3914838A1 (de) | Ionen-zyklotron-resonanz-spektrometer | |
| DE2555744B2 (de) | Magnetische linse | |
| DE1948396A1 (de) | Vorrichtung zur Beschleunigung und Ablenkung eines Ionenstrahles | |
| DE3231036C2 (enrdf_load_stackoverflow) | ||
| DD145819A5 (de) | Farbbildroehre | |
| DE2146941A1 (de) | Strahlenformungs- und Abbildungssystem | |
| DE102021114934B4 (de) | Verfahren zum analytischen Vermessen von Probenmaterial auf einem Probenträger | |
| EP0378648B1 (de) | Icr-ionenfalle | |
| DE102008062924B4 (de) | Ionenmobilitätsspektrometer | |
| DE2431415B2 (de) | Elektrodenanordnung fuer elektrische felder und verfahren zu ihrer herstellung | |
| DE3636506A1 (de) | Spiralabtastverfahren | |
| DE2700141A1 (de) | Farbbildroehre und verfahren zu deren herstellung | |
| DE2438234C3 (de) | Elektrodenbaugruppe für Mehrstrahlerzeugersysteme und Verfahren zum Betrieb dieser Baugruppe | |
| DE69219926T2 (de) | Kathodenstrahlröhre mit Elektronenstrahlerzeugersystem mit planparalleler Optik | |
| DE1953411A1 (de) | Vorrichtung mit einer Kathodenstrahlroehre und Kathodenstrahlroehre zur Anwendung in einer solchen Vorrichtung | |
| DE2720514B2 (enrdf_load_stackoverflow) | ||
| DE69019829T2 (de) | Erzeugung eines genauen dreidimensionalen elektrischen quadrupolfeldes. | |
| DE3328884C2 (enrdf_load_stackoverflow) | ||
| DE1256032B (de) | Verfahren zur Herstellung kaltemittierender Kathoden auf elektrolytischem Wege und Vorrichtung zur Durchfuehrung des Verfahrens |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OHA | Expiration of time for request for examination |