DE19845064A1 - Semiconductor circuit with integrated self-test circuit - Google Patents

Semiconductor circuit with integrated self-test circuit

Info

Publication number
DE19845064A1
DE19845064A1 DE1998145064 DE19845064A DE19845064A1 DE 19845064 A1 DE19845064 A1 DE 19845064A1 DE 1998145064 DE1998145064 DE 1998145064 DE 19845064 A DE19845064 A DE 19845064A DE 19845064 A1 DE19845064 A1 DE 19845064A1
Authority
DE
Germany
Prior art keywords
circuit
self
semiconductor
test
test circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE1998145064
Other languages
German (de)
Inventor
Helmut Schneider
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Priority to DE1998145064 priority Critical patent/DE19845064A1/en
Priority to PCT/DE1999/003117 priority patent/WO2000019222A2/en
Priority to TW88116721A priority patent/TW432572B/en
Publication of DE19845064A1 publication Critical patent/DE19845064A1/en
Ceased legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/30Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
    • H01L22/32Additional lead-in metallisation on a device or substrate, e.g. additional pads or pad portions, lines in the scribe line, sacrificed conductors
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2851Testing of integrated circuits [IC]
    • G01R31/2884Testing of integrated circuits [IC] using dedicated test connectors, test elements or test circuits on the IC under test
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/30Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
    • H01L22/34Circuits for electrically characterising or monitoring manufacturing processes, e. g. whole test die, wafers filled with test structures, on-board-devices incorporated on each die, process control monitors or pad structures thereof, devices in scribe line

Abstract

The invention relates to a semiconductor switching circuit with a self-testing circuit. Said self-testing circuit (BIST) is located under a connection pad (P), which is provided for operating the self-testing circuit (BIST).

Description

Die vorliegende Erfindung betrifft einen Halbleiterschalt­ kreis mit einer integrierten Selbsttestschaltung.The present invention relates to a semiconductor switch circuit with an integrated self-test circuit.

Häufig werden Halbleiterschaltkreise nach deren Herstellung auf einen Wafer, noch vor Umhüllen mit einem Gehäuse, einen sogenannten Burn-In unterzogen. Dabei werden die Halbleiter­ schaltkreise für eine gegebene Zeit einer Temperatur ausge­ setzt, die in der Regel höher ist als die vom Hersteller vor­ gegebene maximale Lagertemperatur. Sinn dieser Prozedur ist es, daß der Halbleiterschaltkreis vorzeitig altert, und daß dadurch alterungsbedingte Ausfälle nicht erst beim Kunden auftreten, sondern bereits beim Hersteller und daß gegebenen­ falls vorhandene Zulässigkeitsprobleme möglichst frühzeitig erkannt werden. Deshalb werden die Halbleiterschaltkreise während der Burn-In-Phase auch ständig auf Funktionsfähigkeit getestet. Während früher dazu notwendige Testschaltungen schaltkreisextern angeordnet waren (z. B. auf sogenannten Burn-In-Boards, auf denen die Halbleiterschaltkreise während der Burn-In-Prozedur aufgebracht sind), werden diese Test­ schaltungen heutzutage als sogenannte Selbsttestschaltungen in den Halbleiterschaltkreis mit integriert, weshalb die Flä­ che eines solchen Halbleiterschaltkreises naturgemäß größer ist als die Fläche eines funktionidentischen Halbleiter­ schaltkreises ohne Selbsttestschaltung.Semiconductor circuits are often used after their manufacture on a wafer, before encasing it with a package, one so-called burn-in. The semiconductors circuits for a given time of a temperature sets, which is usually higher than that of the manufacturer given maximum storage temperature. The purpose of this procedure is it that the semiconductor circuit ages prematurely, and that therefore age-related failures not only at the customer occur, but already given by the manufacturer and that if existing admissibility problems as early as possible be recognized. That is why the semiconductor circuits functionality during the burn-in phase tested. While test circuits previously required for this were arranged outside the circuit (e.g. on so-called Burn-in boards on which the semiconductor circuits during the burn-in procedure), these will be test circuits nowadays as so-called self-test circuits integrated in the semiconductor circuit, which is why the Flä surface of such a semiconductor circuit is naturally larger is the area of a functionally identical semiconductor circuit without self-test circuit.

Ziel aller Halbleiterschaltkreishersteller ist es seit jeher, mit einer möglichst geringen Fläche für einen Halbleiter­ schaltkreis auszukommen, denn je geringer die benötigte Flä­ che ist, desto billiger ist der Schaltkreis herstellbar (die absoluten Herstellungskosten sind lediglich abhängig von der Größe eines Wafers, auf dem die Schaltkreise herzustellen sind, nicht jedoch von der Anzahl der herzustellenden Schalt­ kreise pro Wafer, so daß die Herstellungskosten je Halblei­ terschaltkreis umso niedriger ausfallen, je mehr Halbleiter­ schaltkreise auf einem Wafer gegebener Größe Platz finden, oder, anders ausgedrückt: je geringer die Fläche des Halblei­ terschaltkreises ist).The goal of all semiconductor circuit manufacturers has always been with the smallest possible area for a semiconductor circuit, because the smaller the required area che, the cheaper it is to manufacture the circuit (the absolute manufacturing costs are only dependent on the Size of a wafer on which to manufacture the circuits are, but not on the number of switching to be produced circles per wafer, so that the manufacturing costs per half lead  circuit, the lower the number of semiconductors circuits on a given size wafer, or in other words: the smaller the area of the semi-lead circuit is).

Aufgabe der vorliegenden Erfindung ist es, einen gattungsge­ mäßen Halbleiterschaltkreis mit einer möglichst geringen Flä­ che zu schaffen.The object of the present invention is a genus semiconductor circuit with the smallest possible area to create.

Erfindungsgemäß ist dazu vorgesehen, eine Selbsttestschaltung so anzuordnen, daß sie unterhalb eines Anschlußpads des Halb­ leiterschaltkreises liegt, welches zum Betrieb der Selbttest­ schaltung vorgesehen ist (das Anschlußpad wird während des Burn-In-Vorganges mittels einer Prüfspitze elektrisch kontak­ tiert).According to the invention there is provided a self-test circuit to be arranged so that it is below a connecting pad of the half circuit, which is used to operate the self-test circuit is provided (the connection pad is during the Burn-in process electrically by means of a test probe animals).

Ein erfindungsgemäßer Halbleiterschaltkreis ist in der Zeich­ nung, stark schematisiert und ausschnittsweise, dargestellt:A semiconductor circuit according to the invention is in the drawing tion, highly schematic and excerpted, shown:

Ein Halbleiterkörper S enthält die für die Funktion des Halb­ leiterschaltkreises typischen elektrischen Schaltungen (nicht dargestellt) sowie eine Selbsttestschaltung BIST. Diese ist unterhalb eines der Selbsttestschaltung BIST zugeordneten An­ schlußpads P angeordnet (es können gegebenenfalls auch mehre­ re Anschlußpads P sein) und mit diesem elektrisch verbunden, beispielsweise mittels eines sogenannten Kontaktloches (nicht dargestellt). Die Selbsttestschaltung BIST ist weiterhin, wie allgemein üblich, mit wenigstens einem Teil der für die Funk­ tion des Halbleiterschaltkreises typischen elektronischen Schaltungen elektrisch verbunden (ebenfalls nicht darge­ stellt). Dadurch, daß die Selbsttestschaltung BIST unterhalb des Anschlußpads P angeordnet ist, wird dieser (bislang nicht genutzte) Platz des Chips des Halbleiterschaltkreises sinn­ voll ausgenutzt und die notwendige Gesamtfläche des Chips läßt sich entsprechend verringern. A semiconductor body S contains the half function conductor circuit typical electrical circuits (not shown) and a self-test circuit BIST. This is below an assigned to the self-test circuit BIST final pads P arranged (if necessary, several re connecting pads P) and electrically connected to it, for example by means of a so-called contact hole (not shown). The BIST self-test circuit is still like common practice, with at least part of that for radio tion of the semiconductor circuit typical electronic Circuits electrically connected (also not shown represents). Because the BIST self-test circuit is below the connection pad P is arranged, this (so far not used) space of the chip of the semiconductor circuit sense fully utilized and the necessary total area of the chip can be reduced accordingly.  

Sollte Gefahr bestehen, daß beim nachfolgenden Bonden von weiteren Anschlußflächen des Halbleiterschaltkreises die Selbsttestschaltung BIST (die dann ja nicht mehr benötigt wird, da das Bonden erst nach dem Burn-IN-Vorgang erfolgt) beschädigt wird (was als solches ohne Belang ist, denn die Selbsttestschaltung wird nach dem Burn-IN-Vorgang ja nicht mehr benötigt) mit der Folge, daß durch diese Beschädigung die weiteren elektronischen Schaltungen des Halbleiterschalt­ kreises, die dessen elektronische Funktion bestimmen, ungün­ stig beeinflußt werden könnten, so können an der Schnittstel­ le Selbsttestschaltung BIST - weitere elektronische Schaltun­ gen als Schalter fungierende Elemente vorgesehen werden, die während der Burn-In-Prozedur die Selbsttestschaltung BIST mit den weiteren elektronischen Schaltungen verbinden und die an­ sonsten die Selbsttestschaltung BIST von den weiteren elek­ tronischen Schaltungen abkoppeln.If there is a risk that the subsequent bonding of further pads of the semiconductor circuit BIST self-test circuit (which is then no longer required because the bonding takes place after the burn-in process) is damaged (which as such is irrelevant, because the Self-test switching is not after the Burn-IN process more needed) with the result that this damage the other electronic circuits of the semiconductor switch circle, which determine its electronic function, unun could be influenced, so at the interface BIST self-test circuit - further electronic circuit elements acting as switches are provided, which during the burn-in procedure the BIST self-test circuit connect the other electronic circuits and the on otherwise the self-test circuit BIST of the other elec Disconnect tronic circuits.

Claims (1)

Halbleiterschaltkreis mit integrierter Selbsttestschal­ tung, dadurch gekennzeichnet, daß die Selbsttestschaltung (BIST) unterhalb eines Anschluß­ pads (P) angeordnet ist, welches zum Betrieb der Selbsttest­ schaltung (BIST) vorgesehen ist.Semiconductor circuit with integrated self-test circuit, characterized in that the self-test circuit (BIST) is arranged below a connection pad (P) which is provided for operating the self-test circuit (BIST).
DE1998145064 1998-09-30 1998-09-30 Semiconductor circuit with integrated self-test circuit Ceased DE19845064A1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
DE1998145064 DE19845064A1 (en) 1998-09-30 1998-09-30 Semiconductor circuit with integrated self-test circuit
PCT/DE1999/003117 WO2000019222A2 (en) 1998-09-30 1999-09-28 Semiconductor switching circuit with an integrated self-testing circuit
TW88116721A TW432572B (en) 1998-09-30 1999-09-29 Semiconductor-circuit with integrated self-test circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE1998145064 DE19845064A1 (en) 1998-09-30 1998-09-30 Semiconductor circuit with integrated self-test circuit

Publications (1)

Publication Number Publication Date
DE19845064A1 true DE19845064A1 (en) 2000-04-13

Family

ID=7882943

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1998145064 Ceased DE19845064A1 (en) 1998-09-30 1998-09-30 Semiconductor circuit with integrated self-test circuit

Country Status (3)

Country Link
DE (1) DE19845064A1 (en)
TW (1) TW432572B (en)
WO (1) WO2000019222A2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10345470A1 (en) * 2003-09-30 2004-12-30 Infineon Technologies Ag Semiconductor chip wafer contact structure has cup shaped test contact surfaces and active connection multiplexer circuit in sawing grid areas

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0645639A1 (en) * 1993-09-27 1995-03-29 Nec Corporation Semiconductor integrated circuit apparatus having self testing function

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60246668A (en) * 1984-05-22 1985-12-06 Mitsubishi Electric Corp Semiconductor integrated circuit
JPH04365347A (en) * 1991-06-13 1992-12-17 Mitsubishi Electric Corp Element structure for monitor apparatus in semiconductor chip
EP0637840A1 (en) * 1993-08-05 1995-02-08 AT&T Corp. Integrated circuit with active devices under bond pads
US5965903A (en) * 1995-10-30 1999-10-12 Lucent Technologies Inc. Device and method of manufacture for an integrated circuit having a BIST circuit and bond pads incorporated therein
JP3157715B2 (en) * 1996-05-30 2001-04-16 山形日本電気株式会社 Semiconductor integrated circuit

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0645639A1 (en) * 1993-09-27 1995-03-29 Nec Corporation Semiconductor integrated circuit apparatus having self testing function

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10345470A1 (en) * 2003-09-30 2004-12-30 Infineon Technologies Ag Semiconductor chip wafer contact structure has cup shaped test contact surfaces and active connection multiplexer circuit in sawing grid areas

Also Published As

Publication number Publication date
WO2000019222A2 (en) 2000-04-06
TW432572B (en) 2001-05-01
WO2000019222A3 (en) 2000-06-08

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