DE1765790A1 - Verfahren zur Herstellung eines integrierten Widerstands - Google Patents
Verfahren zur Herstellung eines integrierten WiderstandsInfo
- Publication number
- DE1765790A1 DE1765790A1 DE19681765790 DE1765790A DE1765790A1 DE 1765790 A1 DE1765790 A1 DE 1765790A1 DE 19681765790 DE19681765790 DE 19681765790 DE 1765790 A DE1765790 A DE 1765790A DE 1765790 A1 DE1765790 A1 DE 1765790A1
- Authority
- DE
- Germany
- Prior art keywords
- layer
- metal
- tantalum
- substrate
- deposited
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 11
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 20
- 239000002184 metal Substances 0.000 claims description 20
- 239000000758 substrate Substances 0.000 claims description 17
- 229910052715 tantalum Inorganic materials 0.000 claims description 13
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 13
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 12
- 229910052737 gold Inorganic materials 0.000 claims description 12
- 239000010931 gold Substances 0.000 claims description 12
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 7
- 229920003023 plastic Polymers 0.000 claims description 7
- 229910052802 copper Inorganic materials 0.000 claims description 6
- 239000010949 copper Substances 0.000 claims description 6
- 239000002966 varnish Substances 0.000 claims description 6
- 239000002904 solvent Substances 0.000 claims description 3
- 238000004544 sputter deposition Methods 0.000 claims description 3
- 239000003973 paint Substances 0.000 claims description 2
- 230000006911 nucleation Effects 0.000 description 7
- 238000010899 nucleation Methods 0.000 description 7
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 7
- 230000000873 masking effect Effects 0.000 description 5
- 239000002253 acid Substances 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000005336 cracking Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000011065 in-situ storage Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910000599 Cr alloy Inorganic materials 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000000788 chromium alloy Substances 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/28—Apparatus or processes specially adapted for manufacturing resistors adapted for applying terminals
- H01C17/288—Apparatus or processes specially adapted for manufacturing resistors adapted for applying terminals by thin film techniques
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
- H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques
- H01C17/12—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques by sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/4913—Assembling to base an electrical component, e.g., capacitor, etc.
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
- Non-Adjustable Resistors (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR114759A FR1537897A (fr) | 1967-07-19 | 1967-07-19 | Procédé de fabrication de circuits électriques en couches minces |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE1765790A1 true DE1765790A1 (de) | 1971-08-26 |
Family
ID=8635338
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19681765790 Pending DE1765790A1 (de) | 1967-07-19 | 1968-07-18 | Verfahren zur Herstellung eines integrierten Widerstands |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US3607476A (enExample) |
| JP (1) | JPS5421538B1 (enExample) |
| DE (1) | DE1765790A1 (enExample) |
| FR (1) | FR1537897A (enExample) |
| GB (1) | GB1238504A (enExample) |
| NL (1) | NL6810247A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1286048B (de) * | 1964-09-28 | 1969-01-02 | Buckau Wolf Maschf R | Zwanglaufdampferzeuger |
| DE2847356A1 (de) * | 1977-11-14 | 1979-05-17 | Nitto Electric Ind Co | Substrat fuer eine gedruckte schaltung mit widerstandselementen |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1424980A (en) * | 1973-06-20 | 1976-02-11 | Siemens Ag | Thin-film electrical circuits |
| US4019168A (en) * | 1975-08-21 | 1977-04-19 | Airco, Inc. | Bilayer thin film resistor and method for manufacture |
| US4396900A (en) * | 1982-03-08 | 1983-08-02 | The United States Of America As Represented By The Secretary Of The Navy | Thin film microstrip circuits |
| US6846991B2 (en) * | 1999-01-13 | 2005-01-25 | Applied Kinetics, Inc. | Electrical component and a shuntable/shunted electrical component and method for shunting and deshunting |
-
1967
- 1967-07-19 FR FR114759A patent/FR1537897A/fr not_active Expired
-
1968
- 1968-07-09 US US743410A patent/US3607476A/en not_active Expired - Lifetime
- 1968-07-18 DE DE19681765790 patent/DE1765790A1/de active Pending
- 1968-07-18 GB GB1238504D patent/GB1238504A/en not_active Expired
- 1968-07-19 NL NL6810247A patent/NL6810247A/xx unknown
- 1968-07-19 JP JP5059668A patent/JPS5421538B1/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1286048B (de) * | 1964-09-28 | 1969-01-02 | Buckau Wolf Maschf R | Zwanglaufdampferzeuger |
| DE2847356A1 (de) * | 1977-11-14 | 1979-05-17 | Nitto Electric Ind Co | Substrat fuer eine gedruckte schaltung mit widerstandselementen |
Also Published As
| Publication number | Publication date |
|---|---|
| FR1537897A (fr) | 1968-08-30 |
| NL6810247A (enExample) | 1969-01-21 |
| US3607476A (en) | 1971-09-21 |
| GB1238504A (enExample) | 1971-07-07 |
| JPS5421538B1 (enExample) | 1979-07-31 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE2624832C3 (de) | Verfahren zum Herstellen von Lackmustern | |
| DE3872859T2 (de) | Verfahren zur metallisierung eines kieselsaeure-, quartz-, glas- oder saphirsubstrates und so erhaltenes substrat. | |
| DE4447897B4 (de) | Verfahren zur Herstellung von Leiterplatten | |
| DE2448535C2 (de) | Verfahren zum Niederschlagen dünner leitfähiger Filme auf einem anorganischen Substrat | |
| DE3538652C2 (enExample) | ||
| EP0002669B1 (de) | Verfahren zum Entfernen von Material von einem Substrat durch selektive Trockemätzung und Anwendung dieses Verfahrens bei der Herstellung von Leitungsmustern | |
| EP0466202A1 (de) | Verfahren zur Herstellung von Leiterplatten | |
| DE2460988A1 (de) | Verfahren zum herstellen duenner filme unter verwendung einer abziehbaren maske | |
| DE2036139A1 (de) | Dunnfümmetallisierungsverfahren fur Mikroschaltungen | |
| DE2658133A1 (de) | Selbsttragende bestrahlungsmaske mit durchgehenden oeffnungen und verfahren zu ihrer herstellung | |
| DE3325832C2 (enExample) | ||
| DE2901697C3 (de) | Verfahren zur Ausbildung von Leitungsverbindungen auf einem Substrat | |
| DE2145647C3 (de) | Verfahren zum Herstellen von Mustern auf einem Substrat | |
| DE2249878A1 (de) | Verfahren zur herstellung feiner leiterbahnstrukturen auf einem keramiksubstrat | |
| DE2709928B2 (de) | Verfahren zum Aufbringen von Metall auf einer Oberflache | |
| DE102013107947A1 (de) | Verfahren zur Herstellung einer medizinischen Vorrichtung, Verfahren zum Modifizieren der Oberfläche einer medizinischen Vorrichtung, medizinische Vorrichtung und Schichtverbund mit einem Substrat | |
| DE1765790A1 (de) | Verfahren zur Herstellung eines integrierten Widerstands | |
| DE2059987A1 (de) | Verfahren zur Herstellung eines filmartigen Leitungsmusters aus Metall | |
| DE1764758A1 (de) | Verfahren zum Bilden von Anschlussleitungen an einen Koerper aus Halbleitermaterial | |
| DE2261337A1 (de) | Verfahren zur herstellung eines halbleiterbauelements | |
| DE3152307A1 (de) | Use of metallic glasses for fabrication of structures with submicron dimensions | |
| DE2363516A1 (de) | Verfahren zum herstellen eines musters mit teilplattierten bereichen | |
| DE3114181A1 (de) | Beruehrungsfreie technik fuer galvanische roentgenstrahllithographie | |
| DE2903428C2 (de) | Verfahren zur Herstellung von Schaltungen in Dünnschichttechnik mit Dickschichtkomponenten | |
| DE2310736A1 (de) | Verfahren zum ausbessern defekter metallmuster |