DE150482C - - Google Patents
Info
- Publication number
- DE150482C DE150482C DENDAT150482D DE150482DC DE150482C DE 150482 C DE150482 C DE 150482C DE NDAT150482 D DENDAT150482 D DE NDAT150482D DE 150482D C DE150482D C DE 150482DC DE 150482 C DE150482 C DE 150482C
- Authority
- DE
- Germany
- Prior art keywords
- oil
- container
- filter
- cleaned
- filters
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 claims description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 8
- 238000004140 cleaning Methods 0.000 claims description 3
- 230000007423 decrease Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 230000001050 lubricating effect Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
- B01D29/11—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with bag, cage, hose, tube, sleeve or like filtering elements
- B01D29/13—Supported filter elements
- B01D29/23—Supported filter elements arranged for outward flow filtration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D24/00—Filters comprising loose filtering material, i.e. filtering material without any binder between the individual particles or fibres thereof
- B01D24/02—Filters comprising loose filtering material, i.e. filtering material without any binder between the individual particles or fibres thereof with the filter bed stationary during the filtration
- B01D24/04—Filters comprising loose filtering material, i.e. filtering material without any binder between the individual particles or fibres thereof with the filter bed stationary during the filtration the filtering material being clamped between pervious fixed walls
- B01D24/045—Filters comprising loose filtering material, i.e. filtering material without any binder between the individual particles or fibres thereof with the filter bed stationary during the filtration the filtering material being clamped between pervious fixed walls with at least one flat vertical wall
- B01D24/047—Filters comprising loose filtering material, i.e. filtering material without any binder between the individual particles or fibres thereof with the filter bed stationary during the filtration the filtering material being clamped between pervious fixed walls with at least one flat vertical wall with vertical tubes distributing the liquid to be filtered or for collecting filtrate
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Production Of Liquid Hydrocarbon Mixture For Refining Petroleum (AREA)
Publications (1)
Publication Number | Publication Date |
---|---|
DE150482C true DE150482C (fr) |
Family
ID=417390
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DENDAT150482D Active DE150482C (fr) |
Country Status (1)
Country | Link |
---|---|
DE (1) | DE150482C (fr) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5538603A (en) * | 1993-05-19 | 1996-07-23 | Applied Materials, Inc. | Apparatus and process for increasing uniformity of sputtering rate in sputtering apparatus |
US5753090A (en) * | 1995-07-14 | 1998-05-19 | Nihon Shinku Gijutsu Kabushiki Kaisha | Small size sputtering target and high vacuum sputtering apparatus using the same |
US5914018A (en) * | 1996-08-23 | 1999-06-22 | Applied Materials, Inc. | Sputter target for eliminating redeposition on the target sidewall |
US5919345A (en) * | 1994-09-27 | 1999-07-06 | Applied Materials, Inc. | Uniform film thickness deposition of sputtered materials |
US6042706A (en) * | 1997-01-14 | 2000-03-28 | Applied Materials, Inc. | Ionized PVD source to produce uniform low-particle deposition |
US6086735A (en) * | 1998-06-01 | 2000-07-11 | Praxair S.T. Technology, Inc. | Contoured sputtering target |
US6277250B1 (en) * | 2000-10-19 | 2001-08-21 | Tokyo Electron Limited | Dual cathode arrangement for physical vapor deposition of materials onto a round substrate with high aspect ratio features |
-
0
- DE DENDAT150482D patent/DE150482C/de active Active
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5538603A (en) * | 1993-05-19 | 1996-07-23 | Applied Materials, Inc. | Apparatus and process for increasing uniformity of sputtering rate in sputtering apparatus |
US5919345A (en) * | 1994-09-27 | 1999-07-06 | Applied Materials, Inc. | Uniform film thickness deposition of sputtered materials |
US5753090A (en) * | 1995-07-14 | 1998-05-19 | Nihon Shinku Gijutsu Kabushiki Kaisha | Small size sputtering target and high vacuum sputtering apparatus using the same |
US5914018A (en) * | 1996-08-23 | 1999-06-22 | Applied Materials, Inc. | Sputter target for eliminating redeposition on the target sidewall |
US6059945A (en) * | 1996-08-23 | 2000-05-09 | Applied Materials, Inc. | Sputter target for eliminating redeposition on the target sidewall |
US6042706A (en) * | 1997-01-14 | 2000-03-28 | Applied Materials, Inc. | Ionized PVD source to produce uniform low-particle deposition |
US6086735A (en) * | 1998-06-01 | 2000-07-11 | Praxair S.T. Technology, Inc. | Contoured sputtering target |
US6277250B1 (en) * | 2000-10-19 | 2001-08-21 | Tokyo Electron Limited | Dual cathode arrangement for physical vapor deposition of materials onto a round substrate with high aspect ratio features |
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