DE1160106B - Halbleiterverstaerker mit flaechenhaften pn-UEbergaengen mit Tunnelcharakteristik und Verfahren zum Herstellen - Google Patents
Halbleiterverstaerker mit flaechenhaften pn-UEbergaengen mit Tunnelcharakteristik und Verfahren zum HerstellenInfo
- Publication number
- DE1160106B DE1160106B DEJ19004A DEJ0019004A DE1160106B DE 1160106 B DE1160106 B DE 1160106B DE J19004 A DEJ19004 A DE J19004A DE J0019004 A DEJ0019004 A DE J0019004A DE 1160106 B DE1160106 B DE 1160106B
- Authority
- DE
- Germany
- Prior art keywords
- semiconductor
- conductivity type
- doped
- amplifier according
- waveguide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims description 77
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 239000010410 layer Substances 0.000 claims description 27
- 239000000463 material Substances 0.000 claims description 19
- 239000002184 metal Substances 0.000 claims description 14
- 229910052751 metal Inorganic materials 0.000 claims description 14
- 230000005684 electric field Effects 0.000 claims description 12
- 238000009792 diffusion process Methods 0.000 claims description 8
- 239000002344 surface layer Substances 0.000 claims description 7
- 229910052732 germanium Inorganic materials 0.000 claims description 3
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 3
- 230000001590 oxidative effect Effects 0.000 claims description 3
- 239000000956 alloy Substances 0.000 claims description 2
- 229910045601 alloy Inorganic materials 0.000 claims description 2
- 229910052733 gallium Inorganic materials 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 claims description 2
- 229910052738 indium Inorganic materials 0.000 claims description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 2
- 239000000203 mixture Substances 0.000 claims description 2
- 230000000903 blocking effect Effects 0.000 claims 1
- 239000002019 doping agent Substances 0.000 claims 1
- 230000000694 effects Effects 0.000 description 8
- 230000004888 barrier function Effects 0.000 description 5
- 230000008859 change Effects 0.000 description 5
- 230000003321 amplification Effects 0.000 description 4
- 238000003199 nucleic acid amplification method Methods 0.000 description 4
- 230000002787 reinforcement Effects 0.000 description 4
- 239000013598 vector Substances 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000010355 oscillation Effects 0.000 description 3
- 239000002800 charge carrier Substances 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000005669 field effect Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000004870 electrical engineering Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F3/00—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
- H03F3/04—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements with semiconductor devices only
- H03F3/10—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements with semiconductor devices only with diodes
- H03F3/12—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements with semiconductor devices only with diodes with Esaki diodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Bipolar Transistors (AREA)
- Inductance-Capacitance Distribution Constants And Capacitance-Resistance Oscillators (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEJ19004A DE1160106B (de) | 1960-11-11 | 1960-11-11 | Halbleiterverstaerker mit flaechenhaften pn-UEbergaengen mit Tunnelcharakteristik und Verfahren zum Herstellen |
| US150275A US3309586A (en) | 1960-11-11 | 1961-11-06 | Tunnel-effect semiconductor system with capacitative gate across edge of pn-junction |
| GB40590/61A GB999273A (en) | 1960-11-11 | 1961-11-13 | Semiconductor amplifiers |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEJ19004A DE1160106B (de) | 1960-11-11 | 1960-11-11 | Halbleiterverstaerker mit flaechenhaften pn-UEbergaengen mit Tunnelcharakteristik und Verfahren zum Herstellen |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE1160106B true DE1160106B (de) | 1963-12-27 |
| DE1160106C2 DE1160106C2 (US06342305-20020129-C00040.png) | 1964-07-02 |
Family
ID=7199921
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DEJ19004A Granted DE1160106B (de) | 1960-11-11 | 1960-11-11 | Halbleiterverstaerker mit flaechenhaften pn-UEbergaengen mit Tunnelcharakteristik und Verfahren zum Herstellen |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US3309586A (US06342305-20020129-C00040.png) |
| DE (1) | DE1160106B (US06342305-20020129-C00040.png) |
| GB (1) | GB999273A (US06342305-20020129-C00040.png) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1293902B (de) * | 1964-05-26 | 1969-04-30 | Telefunken Patent | Schottky-Diode und Verfahren zu ihrer Herstellung |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3384829A (en) * | 1963-02-08 | 1968-05-21 | Nippon Electric Co | Semiconductor variable capacitance element |
| DE1514431C3 (de) * | 1965-04-07 | 1974-08-22 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Halbleiteranordnung mit pn-Übergang zur Verwendung als spannungsabhängige Kapazität |
| US3462700A (en) * | 1966-08-10 | 1969-08-19 | Bell Telephone Labor Inc | Semiconductor amplifier using field effect modulation of tunneling |
| GB1176410A (en) * | 1966-12-14 | 1970-01-01 | Hitachi Ltd | A Solid State Generator-Detector of Electromagnetic Waves |
| US3634786A (en) * | 1967-04-24 | 1972-01-11 | Nippon Electric Co | Microwave circuit utilizing a semiconductor impedance element |
| US3829743A (en) * | 1969-09-18 | 1974-08-13 | Matsushita Electric Ind Co Ltd | Variable capacitance device |
| JPS5775464A (en) * | 1980-10-28 | 1982-05-12 | Semiconductor Res Found | Semiconductor device controlled by tunnel injection |
| US4969019A (en) * | 1987-08-27 | 1990-11-06 | Texas Instruments Incorporated | Three-terminal tunnel device |
| US5973363A (en) * | 1993-07-12 | 1999-10-26 | Peregrine Semiconductor Corp. | CMOS circuitry with shortened P-channel length on ultrathin silicon on insulator |
| US5864162A (en) * | 1993-07-12 | 1999-01-26 | Peregrine Seimconductor Corporation | Apparatus and method of making a self-aligned integrated resistor load on ultrathin silicon on sapphire |
| US5973382A (en) * | 1993-07-12 | 1999-10-26 | Peregrine Semiconductor Corporation | Capacitor on ultrathin semiconductor on insulator |
| US5930638A (en) * | 1993-07-12 | 1999-07-27 | Peregrine Semiconductor Corp. | Method of making a low parasitic resistor on ultrathin silicon on insulator |
| US6617643B1 (en) | 2002-06-28 | 2003-09-09 | Mcnc | Low power tunneling metal-oxide-semiconductor (MOS) device |
| DE102015110490A1 (de) * | 2015-06-30 | 2017-01-05 | Infineon Technologies Austria Ag | Halbleiterbauelemente und ein Verfahren zum Bilden eines Halbleiterbauelements |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AT197435B (de) * | 1954-11-30 | 1958-04-25 | Philips Nv | Halbleitervorrichtung |
| US2857527A (en) * | 1955-04-28 | 1958-10-21 | Rca Corp | Semiconductor devices including biased p+p or n+n rectifying barriers |
| US2918628A (en) * | 1957-01-23 | 1959-12-22 | Otmar M Stuetzer | Semiconductor amplifier |
| FR1245720A (fr) * | 1959-09-30 | 1960-11-10 | Nouvelles structures pour transistor à effet de champ |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE489418A (US06342305-20020129-C00040.png) * | 1948-06-26 | |||
| US2795742A (en) * | 1952-12-12 | 1957-06-11 | Bell Telephone Labor Inc | Semiconductive translating devices utilizing selected natural grain boundaries |
| US2804405A (en) * | 1954-12-24 | 1957-08-27 | Bell Telephone Labor Inc | Manufacture of silicon devices |
| US2995713A (en) * | 1958-03-25 | 1961-08-08 | Singer Inc H R B | Uhf tuner |
| US2956913A (en) * | 1958-11-20 | 1960-10-18 | Texas Instruments Inc | Transistor and method of making same |
| US3089794A (en) * | 1959-06-30 | 1963-05-14 | Ibm | Fabrication of pn junctions by deposition followed by diffusion |
| US3025438A (en) * | 1959-09-18 | 1962-03-13 | Tungsol Electric Inc | Field effect transistor |
| NL265382A (US06342305-20020129-C00040.png) * | 1960-03-08 | |||
| NL267831A (US06342305-20020129-C00040.png) * | 1960-08-17 | |||
| US3045129A (en) * | 1960-12-08 | 1962-07-17 | Bell Telephone Labor Inc | Semiconductor tunnel device |
-
1960
- 1960-11-11 DE DEJ19004A patent/DE1160106B/de active Granted
-
1961
- 1961-11-06 US US150275A patent/US3309586A/en not_active Expired - Lifetime
- 1961-11-13 GB GB40590/61A patent/GB999273A/en not_active Expired
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AT197435B (de) * | 1954-11-30 | 1958-04-25 | Philips Nv | Halbleitervorrichtung |
| US2857527A (en) * | 1955-04-28 | 1958-10-21 | Rca Corp | Semiconductor devices including biased p+p or n+n rectifying barriers |
| US2918628A (en) * | 1957-01-23 | 1959-12-22 | Otmar M Stuetzer | Semiconductor amplifier |
| FR1245720A (fr) * | 1959-09-30 | 1960-11-10 | Nouvelles structures pour transistor à effet de champ |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1293902B (de) * | 1964-05-26 | 1969-04-30 | Telefunken Patent | Schottky-Diode und Verfahren zu ihrer Herstellung |
Also Published As
| Publication number | Publication date |
|---|---|
| GB999273A (en) | 1965-07-21 |
| DE1160106C2 (US06342305-20020129-C00040.png) | 1964-07-02 |
| US3309586A (en) | 1967-03-14 |
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