DE112013003804T8 - Shirasu-Struktur und Herstellungsverfahren hierfür - Google Patents
Shirasu-Struktur und Herstellungsverfahren hierfür Download PDFInfo
- Publication number
- DE112013003804T8 DE112013003804T8 DE112013003804.8T DE112013003804T DE112013003804T8 DE 112013003804 T8 DE112013003804 T8 DE 112013003804T8 DE 112013003804 T DE112013003804 T DE 112013003804T DE 112013003804 T8 DE112013003804 T8 DE 112013003804T8
- Authority
- DE
- Germany
- Prior art keywords
- manufacturing process
- shirasu structure
- shirasu
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
- C03C17/2456—Coating containing TiO2
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/212—TiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/213—SiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/214—Al2O3
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/217—FeOx, CoOx, NiOx
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/228—Other specific oxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Laminated Bodies (AREA)
- Physical Vapour Deposition (AREA)
- Silicates, Zeolites, And Molecular Sieves (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012171060 | 2012-08-01 | ||
JP2012-171060 | 2012-08-01 | ||
JP2013-156590 | 2013-07-29 | ||
JP2013156590A JP6103642B2 (ja) | 2012-08-01 | 2013-07-29 | シラス構造体およびシラス構造体の製造方法 |
PCT/JP2013/070718 WO2014021371A1 (ja) | 2012-08-01 | 2013-07-31 | シラス構造体およびシラス構造体の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE112013003804T5 DE112013003804T5 (de) | 2015-04-23 |
DE112013003804T8 true DE112013003804T8 (de) | 2015-05-28 |
Family
ID=50028041
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE112013003804.8T Active DE112013003804T8 (de) | 2012-08-01 | 2013-07-31 | Shirasu-Struktur und Herstellungsverfahren hierfür |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6103642B2 (de) |
CN (2) | CN107056082B (de) |
DE (1) | DE112013003804T8 (de) |
WO (1) | WO2014021371A1 (de) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6707740B2 (ja) * | 2017-03-31 | 2020-06-10 | 鹿児島県 | ターゲットの製造方法および薄膜の製造方法 |
JP6991477B2 (ja) * | 2017-06-13 | 2022-02-03 | 高千穂シラス株式会社 | 酸化物被膜及びその製造方法、並びにその酸化物被膜を備える構造体 |
CO2017013094A1 (es) * | 2017-09-30 | 2018-03-28 | Agp America Sa | Artículo de vidrio con frita de vidrio y método de formación de fritas de vidrio |
JP7375772B2 (ja) * | 2018-12-21 | 2023-11-08 | コニカミノルタ株式会社 | 誘電体多層膜、その製造方法及びそれを用いた光学部材 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2900759B2 (ja) * | 1993-07-20 | 1999-06-02 | 信越化学工業株式会社 | 珪素酸化物蒸着用材料及び蒸着フィルム |
EP0941824A3 (de) * | 1998-03-12 | 2002-01-16 | Cca Inc. | Verfahren zur Herstellung eines gemusterten Formkörpers |
JP4303839B2 (ja) * | 1999-07-13 | 2009-07-29 | 大日本印刷株式会社 | オ−バ−ラップ用フィルム |
JP2004182495A (ja) * | 2002-11-29 | 2004-07-02 | 邦明 ▲高▼松 | 負帯電シラス及びその製造方法 |
JP4689718B2 (ja) * | 2007-02-09 | 2011-05-25 | 三菱レイヨン株式会社 | 透明成形体およびこれを用いた反射防止物品 |
US20090186237A1 (en) * | 2008-01-18 | 2009-07-23 | Rolls-Royce Corp. | CMAS-Resistant Thermal Barrier Coatings |
KR101435604B1 (ko) * | 2008-06-25 | 2014-08-29 | 코오롱인더스트리 주식회사 | 단분산 폴리알킬실세스퀴옥산 미립자 및 그 제조방법 |
-
2013
- 2013-07-29 JP JP2013156590A patent/JP6103642B2/ja active Active
- 2013-07-31 DE DE112013003804.8T patent/DE112013003804T8/de active Active
- 2013-07-31 WO PCT/JP2013/070718 patent/WO2014021371A1/ja active Application Filing
- 2013-07-31 CN CN201710063387.9A patent/CN107056082B/zh active Active
- 2013-07-31 CN CN201380051021.XA patent/CN104684847B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
DE112013003804T5 (de) | 2015-04-23 |
WO2014021371A1 (ja) | 2014-02-06 |
CN107056082B (zh) | 2019-12-06 |
JP2014043644A (ja) | 2014-03-13 |
JP6103642B2 (ja) | 2017-03-29 |
CN104684847A (zh) | 2015-06-03 |
CN107056082A (zh) | 2017-08-18 |
CN104684847B (zh) | 2017-05-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
R012 | Request for examination validly filed | ||
R016 | Response to examination communication | ||
R081 | Change of applicant/patentee |
Owner name: TAKACHIHO SHIRASU CORP., MIYAKONOJYOSHI, JP Free format text: FORMER OWNER: TAKACHIHO CORP., YOKOHAMA-SHI, KANAGAWA, JP |
|
R082 | Change of representative |
Representative=s name: HOFFMANN - EITLE PATENT- UND RECHTSANWAELTE PA, DE |
|
R016 | Response to examination communication | ||
R016 | Response to examination communication |