DE10347464A1 - Vorrichtung und Verfahren zum Reinigen von bei der Herstellung von Halbleitern verwendeten Gegenständen - Google Patents

Vorrichtung und Verfahren zum Reinigen von bei der Herstellung von Halbleitern verwendeten Gegenständen Download PDF

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Publication number
DE10347464A1
DE10347464A1 DE10347464A DE10347464A DE10347464A1 DE 10347464 A1 DE10347464 A1 DE 10347464A1 DE 10347464 A DE10347464 A DE 10347464A DE 10347464 A DE10347464 A DE 10347464A DE 10347464 A1 DE10347464 A1 DE 10347464A1
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DE
Germany
Prior art keywords
treatment chamber
transport
cleaning
photomasks
liquid crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE10347464A
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English (en)
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DE10347464B4 (de
Inventor
Lutz Rebstock
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Brooks CCS GmbH
Original Assignee
Dynamic Micro Systems Semiconductor Equipment GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dynamic Micro Systems Semiconductor Equipment GmbH filed Critical Dynamic Micro Systems Semiconductor Equipment GmbH
Priority to DE10347464A priority Critical patent/DE10347464B4/de
Priority to EP04762977A priority patent/EP1614150B1/de
Priority to PCT/EP2004/003764 priority patent/WO2005001888A2/de
Priority to DE502004004812T priority patent/DE502004004812D1/de
Publication of DE10347464A1 publication Critical patent/DE10347464A1/de
Priority to US11/247,622 priority patent/US8161985B2/en
Application granted granted Critical
Publication of DE10347464B4 publication Critical patent/DE10347464B4/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B11/00—Machines or apparatus for drying solid materials or objects with movement which is non-progressive
    • F26B11/18—Machines or apparatus for drying solid materials or objects with movement which is non-progressive on or in moving dishes, trays, pans, or other mainly-open receptacles
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
    • F26B21/14—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects using gases or vapours other than air or steam, e.g. inert gases
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Drying Of Solid Materials (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

Eine Vorrichtung und ein Verfahren dienen zum Reinigen von bei der Herstellung von Halbleitern verwendeten Gegenständen. Die Gegenstände werden in der Vorrichtung in einer Behandlungskammer (40) mittels einer Flüssigkeit gereinigt und anschließend getrocknet. In der Behandlungskammer (40) sind erste Mittel zum Bewegen eines Gases innerhalb der Behandlungskammer (40) vorgesehen. Die Gegenstände sind in der Behandlungskammer (40) auf einem um eine Achse (17) drehbaren Rotor (42) angeordnet. Die Behandlungskammer (40) ist abschließbar. Die ersten Mittel wälzen das Gas in der geschlossenen Behandlungskammer (40) um. In der Behandlungskammer (40) ist ferner ein Kondensationstrockner (64) für das Gas angeordnet. Es sind ferner zweite Mittel (104) zum Kühlen des Kondensationstrockners (64) vorgesehen (Fig. 5).
DE10347464A 2003-04-11 2003-10-02 Vorrichtung und Verfahren zum Reinigen und Trocknen von Halbleitererzeugnissen oder von bei der Herstellung von Halbleitererzeugnissen verwendeten Handhabungskörben Expired - Lifetime DE10347464B4 (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
DE10347464A DE10347464B4 (de) 2003-10-02 2003-10-02 Vorrichtung und Verfahren zum Reinigen und Trocknen von Halbleitererzeugnissen oder von bei der Herstellung von Halbleitererzeugnissen verwendeten Handhabungskörben
EP04762977A EP1614150B1 (de) 2003-04-11 2004-04-08 Vorrichtung und verfahren zum reinigen und trocknen von bei der herstellung von halbleitern verwendeten gegenständen, insbesondere von transport- und reinigungsbehältern für wafer
PCT/EP2004/003764 WO2005001888A2 (de) 2003-04-11 2004-04-08 Vorrichtung und verfahren zum reinigen von bei der herstellung von halbleitern verwendeten gegenständen, insbesondere von transport- und reinigungsbehältern für wafer
DE502004004812T DE502004004812D1 (de) 2003-04-11 2004-04-08 Vorrichtung und verfahren zum reinigen und trocknen von bei der herstellung von halbleitern verwendeten gegenständen, insbesondere von transport- und reinigungsbehältern für wafer
US11/247,622 US8161985B2 (en) 2003-04-11 2005-10-10 Method and apparatus for cleaning articles used in the production of semiconductors

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE10347464A DE10347464B4 (de) 2003-10-02 2003-10-02 Vorrichtung und Verfahren zum Reinigen und Trocknen von Halbleitererzeugnissen oder von bei der Herstellung von Halbleitererzeugnissen verwendeten Handhabungskörben

Publications (2)

Publication Number Publication Date
DE10347464A1 true DE10347464A1 (de) 2005-05-04
DE10347464B4 DE10347464B4 (de) 2010-05-12

Family

ID=34399475

Family Applications (1)

Application Number Title Priority Date Filing Date
DE10347464A Expired - Lifetime DE10347464B4 (de) 2003-04-11 2003-10-02 Vorrichtung und Verfahren zum Reinigen und Trocknen von Halbleitererzeugnissen oder von bei der Herstellung von Halbleitererzeugnissen verwendeten Handhabungskörben

Country Status (1)

Country Link
DE (1) DE10347464B4 (de)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0454873A1 (de) * 1989-11-21 1991-11-06 Interface Technical Laboratories Co., Ltd. Trocknungsverfahren und vorrichtung dazu
WO1995029276A1 (en) * 1994-04-23 1995-11-02 Yule Catto & Co. Plc Article cleaning
US5499642A (en) * 1992-01-22 1996-03-19 Japan Field Co., Ltd. Washing apparatus
US5562113A (en) * 1992-06-15 1996-10-08 Semitool, Inc. Centrifugal wafer carrier cleaning apparatus

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5539995A (en) * 1994-03-16 1996-07-30 Verteq, Inc. Continuous flow vapor dryer system
DE10317275A1 (de) * 2003-04-11 2004-11-11 Dynamic Microsystems Semiconductor Equipment Gmbh Vorrichtung und Verfahren zum Reinigen von bei der Herstellung von Halbleitern verwendeten Gegenständen

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0454873A1 (de) * 1989-11-21 1991-11-06 Interface Technical Laboratories Co., Ltd. Trocknungsverfahren und vorrichtung dazu
US5499642A (en) * 1992-01-22 1996-03-19 Japan Field Co., Ltd. Washing apparatus
US5562113A (en) * 1992-06-15 1996-10-08 Semitool, Inc. Centrifugal wafer carrier cleaning apparatus
WO1995029276A1 (en) * 1994-04-23 1995-11-02 Yule Catto & Co. Plc Article cleaning

Also Published As

Publication number Publication date
DE10347464B4 (de) 2010-05-12

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