DE10314067A1 - Device for vacuum coating substrates, e.g. plastic bottles, comprises a transport unit, coating stations having coating sites, an evacuating unit, and a unit for rotating the coating sites - Google Patents

Abstract

Device for vacuum coating substrates comprises a transport unit, coating stations (71, 72, 73, 74) having coating sites (91-94), an evacuating unit, and a unit for rotating the coating sites. An independent claim is also included for a process for vacuum coating substrates using the above device.

Description

The The invention relates generally to the coating of substrates, in particular an apparatus and a method for depositing functional layers by means of a device with a transport device for the coating substrates.

Around the barrier effects, in particular of plastic containers such as To improve plastic bottles, for example, they can be made with barrier layers be provided. Plastic containers such as plastic bottles often have one for their intended use insufficient barrier effect for gases. For example can Gases like carbon dioxide out of or into plastic bottles diffuse. This effect is particularly important when it comes to storage mostly undesirable of food, because this effect leads to a shortening the shelf life of food stored in these containers to lead can. With barrier coatings, the diffusion through the container walls can by orders of magnitude be reduced.

As particularly suitable for the application of barrier coatings and other functional layers are different vapor phase deposition techniques, such as physical or chemical vapor deposition. With these techniques among other things it is possible very dense and with the surface of the workpiece firmly bonded inorganic layers to produce a good Have a barrier effect.

Indeed these processes are comparatively complex because the ones to be coated For this purpose, substrates are placed in a vacuum and after coating has taken place have to be removed again. In particular for coatings on an industrial scale a machine with a correspondingly high output is required for this. For this purpose, for example, rotary or cross-country devices suitable, in which substrates are continuously fed, coated and be removed again. One problem here is if the layers to be deposited require long coating times. For example certain coatings pure coating times longer than Need 20 seconds. In these cases is no longer a continuously running rotary device operate economically since they are either slow accordingly run or its size to the process times customized must become, which is very big and requires correspondingly expensive machines.

The The invention is therefore based on the object of vacuum coating of substrates more economically.

This Task is already surprisingly easy Way through a device for coating substrates according to claim 1, and a method for coating substrates according to claim 22 solved. Advantageous further developments are the subject of the respective subclaims.

• – eine Transporteinrichtung,
• – zumindest eine Beschichtungsstation mit mehreren Beschichtungsplätzen, die auf der Transporteinrichtung transportiert wird, und
• – eine Einrichtung zum Evakuieren umfaßt. Außerdem weist die Vorrichtung eine Einrichtung zur Rotation der Beschichtungsplätze der Beschichtungsstation auf der Transporteinrichtung auf.

Accordingly, the invention provides a device for vacuum coating substrates, which

• - a transport device,
• - At least one coating station with several coating stations, which is transported on the transport device, and
• - Includes an evacuation device. In addition, the device has a device for rotating the coating stations of the coating station on the transport device.

• – Beladen einer Beschichtungsstation mit mehreren zu beschichtenden Substraten,
• – Evakuieren der Beschichtungsstation,
• – Transportieren der Beschichtungsstation auf einer Transporteinrichtung,
• – Vakuumbeschichten der Substrate,
• – Belüften der Beschichtungsstation und
• – Entnehmen der beschichteten Substrate, wobei die Beschichtungsplätze der Beschichtungsstation auf der Transporteinrichtung rotiert werden.

The method according to the invention for vacuum coating of substrates, which can be carried out in particular by means of a device according to the invention, comprises the steps

• Loading a coating station with several substrates to be coated,
• - evacuating the coating station,
• Transporting the coating station on a transport device,
• Vacuum coating of the substrates,
• - ventilation of the coating station and
• - Removing the coated substrates, the coating stations of the coating station being rotated on the transport device.

As Transport device is for the device according to the invention, and the process for vacuum coating, for example a transport carousel or a linear transport device, or a straight runner. In the embodiment the invention with transport carousel lies the axis of rotation of the coating places preferably parallel to the axis of rotation of the transport carousel.

The coating process for several substrates is carried out simultaneously using a coating station with several coating stations. As a result, for a given process duration, the throughput can be increased by a factor which corresponds to the number of coating locations compared to a device with individual coating locations. However, there is the problem of accessibility to all coating locations. This is achieved according to the invention in that the Coating locations are rotated so that each coating location can be made accessible from one position.

at the inventive method become the coating stations not necessarily during of the entire process flow rotates. Rather, this can be preferred while a process step happen at which the coating stations are to be made accessible. According to one preferred embodiment According to the invention, rotation is carried out in particular during the loading process. According to one preferred embodiment According to the invention, the coating stations are suitable for this purpose Furnished device for rotating the coating stations for Loading with substrates rotates so that the coating locations one after the other be brought into a loading position. This can be for everyone Coating place can be done individually or in groups.

In the removal of the coated substrates can also be carried out in the same way be made easier if the coating stations during the removal process be rotated. The coating station can be used for removal of substrates from the coating stations by means of a suitable set up device for rotating the coating stations rotates so that the coating places be brought into a removal position one after the other.

It is not absolutely necessary to rotate the coating stations on to rotate the entire coating station in the transport device. Rather, the coating station can advantageously also be equipped with a rotatable substrate carrier be equipped. So the coating station can be fixed be attached to the transport device, then for rotation the coating stations the substrate carrier is rotated.

A Further development of this embodiment sees Moreover before that substrate carrier Through channels which has a side of the carrier facing the coating locations an opposite Side of the carrier combines. The coating station can also have a base plate supply channels comprise which for establishing a connection to the evacuation device and / or for feeding of process gas with the substrate carrier be brought together can. You can for example, the supply channels of the base plate with the Through channels of the substrate carrier to be connected in. The supply channels are preferably used for evacuation and supply of process gas or as a recess, for example, to be able to insert a gas lance.

In An advantageous further development of the device according to the invention comprises this Moreover a suitable loading device and / or removal device for Loading and removing the substrates. Both loading the coating station with the loading device, as well as the removal with the removal device can easily do this over at least one allocation wheel.

According to one particularly preferred embodiment of the invention vacuum coating, plasma coating or plasma-assisted chemical Vapor phase deposition of the substrates, also known as PECVD (PECVD = "Plasma Enhanced Chemical Vapor Deposition ") referred to as. Accordingly, in this embodiment the invention, the device for vacuum coating of substrates a device for plasma coating the substrates. Advantageous the device for plasma coating can also be a device for the introduction of process gas include.

The Plasma coating of substrates is well suited, for example, to also coat non-planar or strongly curved surfaces of substrates, without it shading or incidence angle effects occur. For a plasma coating is placed in a gas that envelops the surface to be coated Plasma ignited. Separates from the reaction products that form in the plasma then a layer on the surface. Using this procedure a wide variety of layer compositions can be selected by suitable Generate choice of the composition of the process gas.

Prefers the plasma is affected by electromagnetic waves, generated in particular by microwaves on the process gas. The facility includes for plasma coating a device for generating electromagnetic Waves, in particular for generating microwaves. These will the coating stations fed where it in cooperation with existing process gas of suitable density Formation of a plasma is coming.

A preferred variant of this embodiment of the invention also provides for pulsing the electromagnetic waves. This form of CVD coating is also referred to as plasma pulse-induced chemical vapor deposition or PICVD ("Plasma Impulse Chemical Vapor Deposition"). Coating by means of a pulsed plasma is advantageous, inter alia, because the thermal load on the substrates is reduced in accordance with the pulse duty factor. In this way, even very temperature-sensitive substrates, such as plastic bottles, can be plasma-coated. Another advantage of this variant The plasma coating lies in the fact that a good exchange of the process gas is made possible in the pulse pauses. This avoids an accumulation of undesired reaction products that form in the plasma.

Around to achieve a high throughput through the device according to the invention and the process times in the device, it is also advantageous to keep the coating station preferably evacuate quickly. For this it has proven to be advantageous perform the evacuation in several stages. The device for evacuation can therefore advantageously include several pump stages.

Farther it is advantageous if the evacuation device also has a Device for sequentially connecting the coating station comprising several pump stages, to achieve a quick evacuation. The pump stages can do so for example, each work in a certain pressure range. In particular can so several coating stations are pumped out at the same time, each of these coating stations being connected to a pump stage becomes. In particular, in this regard the device according to the invention particularly advantageously have a vacuum system, as in the German application with the application number 102 53 512.4 whose disclosure in this regard in full too is made the subject of the present invention.

Farther Is it possible, to use similar pumps and successive coating stations in the direction of movement alternately connected to the respective pumps.

A preferred embodiment The invention provides for the coating of hollow-shaped substrates, such as, for example of bottles, calottes or ampoules. The coating stations can be used for this Recordings for such hollow body-shaped substrates exhibit. These shots can also preferably be designed so that they seal the interior provide the substrates from the environment of the substrates. In order to it is then possible, for example, the interior of the hollow-shaped substrates to be evacuated separately using suitable equipment. This is Among other things, it is an advantage if only an inner or outer coating the substrates are to be made. For example, if Inside coating made, it is then sufficient, the outside area only pump down to the extent that the substrate resists the pressure difference between inside and outside.

For many Applications are in particular an inner coating of hollow-shaped substrates appropriate. So is it for example for the barrier effect is significantly better if a barrier coating is present on the inside of the substrates. To apply an inner coating, is a separate feeder of process gas into the interior of the substrates by means of a suitable device advantageous. This device can for example be a gas lance include which is inserted into the interior and there for good and ensures rapid distribution of the process gas. Is the interior with process gas filled, so can then by introducing electromagnetic waves into the coating station a plasma is ignited in the interior of the substrates, so that an inner coating of the substrates.

According to one a further advantageous development of the device according to the invention the at least one coating station has a plurality of coating stations Reactor with a movable sleeve part and a substrate support, being in joined together Position at least one sealed coating chamber between the sleeve part and substrate support is defined. Due to the movable design of the sleeve part is the coating station in the open Position of the coating station particularly accessible, since the substrates are not in the sleeve part introduced Need to become, but this when closing the coating station the substrates turned over becomes. A coating station designed in this way is also used described in the German application with the application number 102 53 512.2, their disclosure content in this regard full is also made the subject of the present invention.

In advantageous development of the invention can be opened and Conclude the coating station by a suitable hydraulic, pneumatic or electrical equipment. An easy way is also opening and closing by passing the coating station on at least one mechanical control curve convey.

Next The preferred plasma coating can also use other coating methods, such as for example PVD coating by means of a corresponding device in the device according to the invention be implemented. PVD coating is advantageous, among other things, if electrically conductive layers to be separated.

The invention is explained in more detail below on the basis of special embodiments and under Be access to the accompanying drawings explained. The same reference numerals refer to the same or similar parts.

It demonstrate:

1 a schematic plan view of an embodiment of a device according to the invention

2 a section through an embodiment of a coating station, and

3 a cross-sectional view through an embodiment of a coating station with control of the opening and closing process by mechanical control curves.

In 1 is a first embodiment of a device according to the invention for vacuum coating of substrates is shown, which as a whole with the reference numeral 1 is designated.

The device 1 comprises a transport device with a transport carousel 3 which is about an axis of rotation 5 rotates.

On the transport carousel 3 are a variety of coating stations 71 . 72 . 73 . 74 , ..., 7N arranged, which are transported by the transport device.

The coating stations 71 . 72 . 73 . 74 , ..., 7N also each have several coating stations, with the in 1 In the embodiment shown, each coating station has four coating stations 91 . 92 . 93 . 94 having. The coating locations of a coating station can be rotated with a device for rotating the coating locations relative to the transport device, as shown by the arrows in 1 is indicated. In this embodiment of the invention, the axis of rotation of the coating stations of the coating stations is also parallel to the axis of rotation 5 of the transport carousel.

The coating process is carried out during the transport carousel 3 circulates. The various process steps can thus be assigned to certain circle sectors, that of the coating stations 91 . 92 . 93 . 94 the one with the carousel 3 transported coating stations 71 . 72 , ..., 7N be run through when rotating the carousel. First, the coating stations of the coating stations in a first sector of the circle 12 loaded. This is done by means of a loading device with two metering wheels 24 and 26 , For loading the coating stations 91 - 94 these are brought one after the other by rotation on the transport device into a loading position in which the coating locations to be loaded point outwards. In this embodiment of the invention, the coating stations in particular are brought into a loading position in two groups, each with two coating stations, and together with an allocation wheel 24 , respectively 26 loaded.

The coating stations are then, after the loading of the coating places is completed, by an evacuation sector 14 transported where the coating stations are preferably evacuated in several stages. For this purpose, several pump stages, which work in different pressure ranges, are successively with the coating stations 71 . 72 , ..., 7N connected.

The coating stations then pass through a coating sector 16 , The vacuum coating is carried out as it passes through this sector. A plasma coating is preferably carried out, with a process gas being supplied and electromagnetic waves for generating a plasma being irradiated in the areas filled with the process gas. The coating is particularly preferably carried out using a pulsed plasma or gel-pulsed electromagnetic waves in order to reduce the thermal load on the substrates and to improve the exchange of process gas in the pulse pauses.

After coating has taken place, the coating stations are run through a ventilation sector 18 ventilated and opened. The coated substrates are then removed 11 during the passage of a removal sector 20 by means of a removal device with metering wheels 28 . 30 , The removal of the substrates 11 from the coating stations 91 to 94 takes place in an analogous manner to the loading process. Here, too, two groups of coating stations are brought one after the other into a removal position pointing outwards on the transport carousel and by means of an allocation wheel 28 , respectively 30 two substrates each taken from a group of two coating stations. The entrainment position is also brought about by rotating the coating stations relative to the transport device or the transport carousel 3 ,

In this embodiment of the invention, a continuous circulation of the coating stations can easily 71 - 7N can be realized on the transport device, since loading and unloading are carried out via several feed wheels, to which the coating stations are guided. Of course, there is also a dis continuous operation possible, with the circulation of the transport carousel 3 done gradually.

2 shows a section through an embodiment of a coating station, the whole with 7 is designated. The coating station 7 comprises a reactor with a movable sleeve part 34 and a base plate or carrier plate 32 , The coating station also has a device for rotating the coating stations on the transport device with a substrate carrier 38 , and a device for generating electromagnetic waves 36 on.

In a joined position as in 2 is shown between the sleeve part 34 and base plate 32 two sealed coating chambers 40 . 41 formed with one coating station each 91 , respectively 92 represent for a substrate to be coated and into which electromagnetic energy is introduced for the coating to ignite the plasma.

Accordingly, in the 2 shown embodiment two substrates 11 be treated at the same time. The separation of the chambers prevents the plasma from influencing one another during the coating.

The sealing of the coating chambers 40 . 41 the coating station 7 to the environment through seals 45 made which between the sleeve part 34 and substrate support 38 are arranged.

To substrates 11 , to coat them on the substrate carrier 38 arranged, the sleeve part 34 then with the substrate carrier 38 by moving the sleeve part 34 brought together so that in the assembled position of both parts sealed coating chambers 40 . 41 between the sleeve part 34 and substrate support 38 be defined in which the substrates 11 the coating chambers 40 . 41 evacuated, process gas introduced, and finally a plasma is generated by introducing electromagnetic energy, so that a CVD coating is formed on the surfaces of the workpieces adjacent to the plasma.

The facility 36 for generating electromagnetic waves in this embodiment comprises two microwave heads 361 and 362 , a rectangular waveguide 363 and two feed lines branching from it 364 and 365 on that at the in 2 embodiment shown are formed as a coaxial conductor. The microwave heads preferably generate microwaves with the frequency permitted by telecommunications technology 2.45 GHz.

The sleeve part 34 is at the in 2 illustrated embodiment for opening and closing the coating chambers 40 . 41 essentially perpendicular to the base plate 32 moved along the direction A. The direction A runs along the supply ladder 364 and 365 so the sleeve part 34 is movable along the supply ladder. The conductors also serve as a guide for the sleeve part 34 , For opening and closing the coating chambers 40 . 41 accordingly the sleeve part 34 moves while the substrate carrier 38 is held.

The sleeve part 34 also has openings 341 and 342 into which the supply ladder 364 and 365 intervene in the device for generating electromagnetic waves. The feeder 364 . 365 are also with dielectric windows 366 . 367 for coupling the microwaves into the low pressure or vacuum area of the reactor 18 Mistake.

The coaxial conductors or supply conductors 364 . 365 are also provided with sealing collars so that when the coating chambers are closed 40 . 41 by moving the sleeve part seals 46 . 48 between the sealing collar and the sleeve part 34 are pressed together and thus a vacuum-tight seal of the openings 341 . 342 create.

In the 2 shown embodiment of a coating station 7 is especially for the coating of hollow body-shaped substrates 11 like the one in 2 plastic bottles shown by way of example.

The substrate carrier 38 For this purpose, has receptacles for the bottle necks with seals which cover the inside of the hollow-body-shaped substrates 11 seal vacuum-tight against the environment. Different pressures can thus be set inside and outside the substrate, for example around a pure inner coating or also a pure outer coating or different coatings in the interior and on the outer surface of the substrates 11 to be able to manufacture.

For evacuation and for the supply of process gas are in the substrate carrier 38 Through channels 50 . 51 . 52 and 53 available which the the coating places 91 . 92 facing side of the substrate carrier with the opposite side of the substrate carrier 38 connect. The base plate 32 is used to supply process gas and to establish a connection to the evacuation device with the substrate carrier 38 merged. For this purpose, the base plate 32 also has supply channels 54 . 55 . 56 . 57 on. The through channels 50 to 54 and the supply channels 54 to 57 are arranged so that the supply channels and through channels assigned to each other are brought to cover and connected to each other when the base plate 32 with the substrate carrier 38 is merged. Among other things, this creates a connection to the evacuation device so that the coating chambers can be evacuated and process gas can be supplied. Here are the through channels 50 to 53 one supply channel each 54 to 57 assigned. The supply channels serve in detail 54 and 56 the vacuum supply around the substrates 11 in the coating chambers 40 . 41 and the supply channels 55 and 57 the evacuation of the interior of the substrates, which is sealed off from the surroundings 11 , The supply channels also serve 55 . 57 and the through channels assigned to them 51 . 53 also as through channels through which gas lances 58 . 60 for supplying process gas into the interior of the substrates 11 can be introduced. The gas lances 58 . 60 are on another support plate 62 with seals 63 attached, which after closing the coating chambers with the base plate 32 is brought together so that the gas lances protrude into the interior of the substrates and the seals 63 Seal the passage channels for the gas lances to the outside.

To the pressure required for coating in the coating chamber 40 . 41 Being able to reach quickly is a multi-stage device for evacuation with several pump stages 65 . 67 . 69 intended. Furthermore, the device for evacuation comprises a device for sequentially connecting the at least one coating station to the plurality of pump stages 65 . 67 . 69 , Valves serve as a device for sequential connection 80 with which the intended pump stage can be connected in succession. The valves 82 . 83 serve to ventilate the coating chambers. With the valve 81 a bypass line can be switched on or off, which connects the supply channels 54 . 56 for evacuating the surroundings of the substrates with the supply channels 55 . 57 for evacuating the interior of the substrates 11 combines. By closing the valve 81 so can the interior of the substrates 11 separately connected to the pump stages so that the valve 81 as a device for separate evacuation of the interior of the hollow-shaped substrates 11 serves.

In 3 is a cross-sectional view through an embodiment of a coating station with control of the opening and closing process by mechanical control cams. The coating station 7 otherwise corresponds essentially to that based on 2 illustrated embodiment. The coating station 7 is also shown in the open state to illustrate the loading or unloading process.

The substrate carrier 38 is about an axis of rotation 39 by means of a device for rotating the coating stations 91 to 94 , of which in 3 the coating places 91 and 92 are visible, rotatable. During the loading process, the substrate carrier becomes 38 with the coating stations 91 to 94 rotates so that the coating locations are accessible from a loading position and the substrates 11 are in the recordings of the substrate carrier 38 used. After the insertion of the substrates is completed, the substrate carrier becomes 38 positioned in such a way that its through channels come to cover the supply channels of the base plate and the sleeve part 34 is with the substrate carrier 38 merged so that sealed coating chambers are defined, which are via the supply channels in the base plate 32 can be pumped out. Then the gas lances 58 . 60 into the interior of the substrates 11 introduced. In this embodiment of the coating station, both the movement of the sleeve part and the introduction of the gas lances are accomplished by mechanical control cams fixedly attached to the device 85 , respectively 86 taught. This is on the sleeve part 34 and on the support plate 62 guide arms 90 , respectively 92 with leadership roles 88 attached which the control curves 85 . 86 embrace. Will the coating station 7 moved on the transport device, so the guide arms follow 90 . 92 the course of the mechanical control curves, whose cross-sectional position is along the in 3 shown arrows A, B changes, so that a movement of the sleeve part 34 in the direction of arrow A, and a movement of the support plate 62 is conveyed in the direction of arrow B.

1

contraption for vacuum coating of

substrates

3

transport carousel

5

Axis of rotation of 3

7, 71, 72, 73,

coating stations

74, ..., 7N

91 92, 93, 94,

coating places

...

11

substratum

12

Beladesektor

14

evacuation sector

16

coating sector

18

ventilation sector

20

extraction sector

24 26, 28, 30

bestowed wheels

32

baseplate

34

portable sleeve part

341 342

Openings in 34

36

Facility for generation

electromagnetic waves

361, 362

Microwave head from 36

363

Rectangular waveguide from 36

364, 365

Feed lines from 36

366 367

dielectric window

38

substrate carrier

39

Axis of rotation of 38

40 41

coating chambers

45, 46, 48

seals

50, 51, 52, 53

Through channels in 38

54 55, 56, 57

Supply channels in 32

62

support plate

63

Seals from 62

65, 67, 69

 pump stages

80 81, 83

valves

85 86

mechanical cam

88

guide rollers

90, 92

guide

Claims (39)

Contraption ( 1 ) for vacuum coating of substrates, which - a transport device, - at least one coating station ( 7 . 71 . 72 , ..., 7N ) with several coating stations ( 91 - 94 ), which is transported on the transport device, and - comprises a device for evacuation, characterized by a device for rotating the coating stations ( 91 - 94 ) on the transport device. Device according to claim 1, characterized in that the transport device comprises a transport carousel ( 3 ) or a linear transport device. Device according to Claim 2, in which the transport device comprises a transport carousel ( 3 ), characterized in that the axis of rotation ( 39 ) the coating stations parallel to the axis of rotation ( 5 ) of the transport carousel ( 3 ) lies. Device according to one of the preceding claims, characterized in that the at least one coating station ( 7 . 71 . 72 , ..., 7N ) a rotatable substrate carrier ( 38 ) includes. Device according to claim 4, characterized in that the substrate carrier ( 38 ) Through channels ( 50 - 53 ) which one of the coating places ( 91 - 94 ) facing side of the substrate carrier ( 38 ) with an opposite side of the substrate carrier ( 38 ) connect. Device according to claim 4 or 5, characterized in that the coating station ( 7 . 71 . 72 , ..., 7N ) a base plate ( 32 ) with supply channels ( 54 - 57 ), which is used to establish a connection to the evacuation device or to supply process gas to the substrate carrier ( 38 ) can be merged. Device according to one of the preceding claims, characterized by a loading device with at least one metering wheel ( 24 . 26 ). Device according to one of the preceding claims, characterized by a removal device with at least one metering wheel ( 28 . 30 ). Device according to one of the preceding claims, characterized in that the device for rotating the coating stations ( 91 - 94 ) is set up on the transport device for loading the coating stations with substrates by rotating the coating station ( 7 . 71 . 72 , ..., 7N ) bring the coating stations into a loading position one after the other. Device according to one of the preceding claims, characterized in that the device for rotating the coating station ( 71 . 72 , ..., 7N ) is set up on the transport device for removing substrates from the coating stations ( 91 - 94 ) by rotating the coating station ( 71 . 72 , ..., 7N ) the coating stations ( 91 - 94 ) one after the other in a removal position. Device according to one of the preceding claims, characterized by a device for plasma coating the substrates ( 11 ). Apparatus according to claim 11, characterized in that the device for plasma coating a device ( 36 ) for generating electromagnetic waves, in particular for generating microwaves. Device according to claim 11 or 12, characterized in that the device for plasma coating includes a facility for introducing process gas. Device according to one of the preceding claims, characterized in that the device for evacuating a plurality of pump stages ( 65 . 67 . 69 ) includes. Device according to one of the preceding claims, characterized in that the means for evacuating means for sequentially connecting the at least one coating station ( 7 . 71 . 72 , ..., 7N ) with several pump stages ( 65 . 67 . 69 ) includes. Device according to one of the preceding claims, characterized in that the loading stratification places ( 91 - 94 ) a holder for hollow-shaped substrates ( 11 ), especially for bottles or ampoules. Device according to claim 16, characterized in that the means for evacuating means for separately evacuating the interior of the hollow-shaped substrates ( 11 ) includes. Apparatus according to claim 16 or 17, characterized by a device for the separate supply of process gas into the interior of the hollow body-shaped substrates ( 11 ). Device according to one of the preceding claims, characterized in that the at least one coating station ( 7 . 71 . 72 , ..., 7N ) with several coating stations ( 91 - 94 ) a reactor with a movable sleeve part ( 34 ) and a substrate support ( 38 ), with at least one sealed coating chamber between the sleeve part and the substrate carrier (in the joined position) 38 ) is defined. Device according to one of the preceding claims, characterized by at least one lifting device for opening and closing the coating station ( 7 . 71 . 72 , ..., 7N ), in particular a pneumatic, hydraulic or electrical lifting device. Device according to one of the preceding claims, characterized by at least one mechanical control cam ( 85 ) to open and close the coating station ( 7 . 71 . 72 , ..., 7N ). Device according to one of the preceding claims, characterized by a device for PVD coating of the substrates ( 11 ). Process for vacuum coating of substrates ( 11 ), by means of a device ( 1 ) in particular according to one of the preceding claims, with the steps - loading a coating station ( 7 . 71 . 72 , ..., 7N ) with several substrates to be coated ( 11 ), - evacuation of the coating station ( 7 . 71 . 72 , ..., 7N), - Transporting the coating station ( 7 . 71 . 72 , ..., 7N ) on a transport device, - vacuum coating of the substrates ( 11 ), - ventilation of the coating station ( 7 . 71 . 72 , ..., 7N ) and - removing the coated substrates ( 11 ), characterized in that the coating places ( 91 - 94 ) are rotated on the transport device. A method according to claim 23, characterized in that the coating station ( 7 . 71 . 72 , ..., 7N ) on a transport carousel ( 3 ) or a linear transport device is transported. The method of claim 23 or 24, wherein the coating station ( 7 . 71 . 72 , ..., 7N ) on a transport carousel ( 3 ) is transported, characterized in that the coating stations ( 91 - 94 ) around an axis of rotation ( 39 ) which are parallel to the axis of rotation ( 5 ) of the transport carousel ( 3 ) lies. Method according to one of claims 23 to 25, characterized in that the loading of a coating station ( 7 . 71 . 72 , ..., 7N ) with several substrates to be coated ( 11 ) and / or removing the coated substrates ( 11 ) by metering wheels ( 24 . 26 . 28 . 30 ) he follows. Method according to one of claims 23 to 26, characterized in that the coating stations ( 91 - 94 ) for loading with substrates ( 11 ) are rotated so that the coating locations ( 91 - 94 ) are brought into loading positions one after the other. Method according to one of claims 23 to 27, characterized in that the coating stations ( 91 - 94 ) for removing substrates ( 11 ) are rotated so that the coating locations ( 91 - 94 ) are brought into removal positions one after the other. Method according to one of claims 23 to 28, characterized in that the rotation of the coating stations ( 91 - 94 ) rotating a substrate carrier ( 38 ) includes. A method according to claim 29, characterized in that a base plate (to establish a connection to the evacuation device or to supply process gas ( 32 ) with supply channels ( 53 - 57 ) with the substrate carrier ( 38 ) is merged. The method of claim 30, wherein the substrate support through channels ( 50 - 53 ) which one of the coating places ( 91 - 94 ) facing side of the substrate carrier ( 38 ) with an opposite side of the substrate carrier ( 38 ) connect, and that when merging the base plate ( 32 ) with the substrate carrier ( 38 ) with supply channels ( 53 - 57 ) the base plate ( 32 ) get connected. Method according to one of claims 23 to 31, characterized in that the vacuum coating of the substrates ( 11 ) which includes plasma coating. Method according to claim 32, characterized in that to generate a plasma, the coating stations electromagnetic Waves, in particular microwaves are supplied. Method according to claim 33, characterized in that the electromagnetic waves are pulsed become. Procedure according to a of claims 23 to 34, characterized in that the evacuation in several Stages. Method according to one of claims 23 to 35, for coating hollow-shaped substrates ( 11 ), characterized in that the interior of the hollow-shaped substrates is evacuated separately. Method according to one of claims 23 to 36, for coating hollow-shaped substrates ( 11 ), characterized in that in the interior of the hollow body-shaped substrates ( 11 ) process gas is supplied separately. A method according to claim 37, characterized in that by introducing electromagnetic waves into the coating station in the interior of the substrates ( 11 ) a plasma is ignited and an inner coating of the substrates ( 11 ) he follows. Method according to one of claims 23 to 38, characterized in that the vacuum coating the PVD coating of the substrates ( 11 ) includes.