DE102022203433A1 - CONNECTING COMPONENTS OF AN OPTICAL DEVICE - Google Patents

Abstract

The present invention relates to an optical arrangement for microlithography, in particular for the use of light in the extreme UV range (EUV), with an optical element (108.1), in particular a facet element, a passive support device (108.2) and an adjusting device (108.3) . The optical element (108.1) has an optical surface (108.4). The support device (108.2) is designed to support the optical element (108.1) on a support structure (109), the support device (108.2) comprising a tilting joint device (108.7) which is designed to provide at least one tilting axis (108.8) of the optical element (108.1) to be defined with respect to the support structure (109). The adjusting device (108.3) acts at least in sections kinematically parallel to the supporting device (108.2) between the optical element (108.1) and the supporting structure (109), wherein the adjusting device (108.3) comprises at least one adjusting element (108.9) which runs along a longitudinal axis of the adjusting element (108.10 ) is elongated. The actuating element (108.9) has a first end that is distant from the optical element (108.1) and a second end that is adjacent to the optical element (108.1) and is connected to the optical element (108.1). The adjusting element (108.9) is arranged and designed in such a way that a displacement that is introduced into the first end of the adjusting element (108.9) in a degree of freedom causes a tilting of the optical surface (108.4) about the at least one tilting axis (108.8) of the optical element (108.1), whereby the degree of freedom of adjustment is a translational degree of freedom that runs along the longitudinal axis of the actuator (108.10).

Description

BACKGROUND OF THE INVENTION

The present invention relates to an optical arrangement for microlithography which is suitable for the use of useful UV light, in particular light in the extreme ultraviolet (EUV) range. The invention further relates to an optical module, in particular a facet mirror, and an optical imaging device with such an optical module. The invention can be used in connection with any optical imaging method. It can be used particularly advantageously in the production or inspection of microelectronic circuits and the optical components used for this purpose (for example optical masks).

Typically, the optical systems used in connection with the fabrication of such microelectronic circuits include a variety of optical element modules, which include optical elements such as lenses, mirrors, gratings, etc., arranged in the path of the light. These optical elements typically cooperate in an exposure process to illuminate a pattern formed on a mask, reticle, or the like and to transfer an image of that pattern to a substrate such as a wafer. The optical elements are usually combined in one or more functionally different optical element groups, which can be held within different optical element units. Facet mirror devices such as those mentioned above can serve, among other things, to homogenize the exposure light beam, i.e. H. in order to achieve the most even possible power distribution within the exposure light beam. They can also be used to provide any desired specific power distribution within the exposure light beam.

Due to the ongoing miniaturization of semiconductor devices, there is not only a constant need for improved resolution, but also a need for improved accuracy of the optical systems used to produce these semiconductor devices. Of course, this accuracy does not only have to be present initially, but must be maintained throughout the entire operation of the optical system. A problem in this context is the most precise possible power distribution or intensity distribution within the exposure light beam, which corresponds as closely as possible to a desired power distribution in order to ultimately avoid or at least reduce undesirable imaging errors. In order to enable the most sensitive power distribution possible, it is therefore desirable to reduce the optical area of the individual facet elements and to increase the number of facet elements, ultimately increasing the “resolution” of the facet mirror.

In order to achieve a desired power distribution, facet mirror devices were developed, such as those in DE 102 05 425 A1 (Holderer et al.), the entire disclosure of which is incorporated herein by reference. The DE 102 05 425 A1 (Holderer et al.) shows, among other things, facet mirror devices in which facet elements with a spherical rear surface sit in an assigned recess within a carrier element. The spherical rear surface rests on a corresponding spherical wall or several contact points of the support element delimiting this recess. The spherical back surface has a comparatively small radius of curvature so that it defines a center of rotation of the facet element that is far away from a center of curvature of the optical surface of the facet element. An operating lever is centrally connected to the back of the facet element and corresponding manipulators tilt the operating lever, ie produce lateral deflections of the free end of the operating lever in order to adjust both the position and the orientation of the optical surface of the facet.

A similar adjustment principle is also from the WO 2012/175116 A1 (Vogt et al.), the entire disclosure of which is incorporated herein by reference. Here too, an elongated operating lever is attached to the back of the facet element. The tilting of the optical surface of the facet element is also achieved here by a lateral deflection of an actuating lever transversely to its longitudinal axis.

These designs have the disadvantage that adjusting the orientation of the optical surface of the facet element by tilting the actuating lever typically leads to a comparatively large lateral deflection of the actuating lever. In order to avoid collisions with the operating levers of adjacent facet elements, the tilting of the facet elements can therefore only be adjusted within comparatively narrow limits. The adjustment options continue to decrease the smaller the facet elements become and the more densely they are packed (hence the higher the “resolution” of the facet mirror becomes). The desired sensitive adjustment of the power distribution or intensity distribution within the exposure light beam is therefore becoming increasingly difficult to achieve with the known systems.

BRIEF SUMMARY OF THE INVENTION

The invention is therefore based on the object of providing an optical arrangement of an imaging device for microlithography, a corresponding optical module and a corresponding optical imaging device with such an arrangement, a method for supporting an optical element and an optical imaging method, which or which does not have the aforementioned disadvantages or at least to a lesser extent and, in particular, enables the largest possible adjustment range for tilting the optical surface of the optical element in a simple manner with little space requirement.

The invention solves this problem with the features of the independent claims.

The invention is based on the technical teaching that the largest possible adjustment range for the tilting of the optical surface of the optical element is made possible in a simple manner if the tilting of the optical element is generated via a translational movement of an elongated adjusting element along its longitudinal axis. The translation is introduced into the actuating element at a first end facing away from the optical element and is only converted into a tilting of the optical surface of the optical element at its second end connected to the optical element in the area of the connection of the actuating element. This conversion of the translation into a rotation about the tilt axis can in principle be done in any suitable way. It is particularly easy to implement if the connection point of the actuating element is offset transversely to the tilting axis of the optical surface in order to generate a tilting moment about the tilting axis by the longitudinal force introduced at a distance from the tilting axis, which tilts the optical element and its optical surface conditional.

In this way, a design can be achieved that is very compact, particularly transverse to the longitudinal axis of the actuating element (which is also referred to below as the actuating element's longitudinal axis), while (starting from a starting position) comparatively large tilting angles can also be realized without causing problems with adjacent ones Units (e.g. lateral collisions at the first end of the control element with adjacent control elements).

According to one aspect, the invention therefore relates to an optical arrangement for microlithography, in particular for the use of light in the extreme UV range (EUV), with an optical element, in particular a facet element, a passive support device and an adjusting device. The optical element has an optical surface. The support device is designed to support the optical element on a support structure, the support device comprising a tilting joint device which is designed to define at least one tilt axis of the optical element with respect to the support structure. The adjusting device acts at least in sections kinematically parallel to the support device between the optical element and the support structure, the adjusting device comprising at least one adjusting element which is designed to be elongated along a longitudinal axis of the adjusting element. The actuating element has a first end that is remote from the optical element. The actuating element further has a second end which is adjacent to the optical element and is connected to the optical element. The adjusting element is arranged and designed in such a way that a displacement, which is introduced into the first end of the adjusting element in a degree of freedom, adjusts a tilting of the optical surface about the at least one tilting axis of the optical element. The degree of freedom of adjustment is a translational degree of freedom that runs along the longitudinal axis of the actuator.

The translational movement of the actuating element can be converted into the rotational movement (i.e. the tilting movement) of the optical element in any suitable manner. For this purpose, for example, any suitable gear unit can be provided which implements this movement conversion. In preferred variants, the adjusting device comprises a decoupling joint device in the region of the second end of the actuating element, the actuating element being connected to the optical element via the decoupling joint device. Using the decoupling joint device, a decoupling between the actuating element and the optical element can then be achieved in a simple manner in the required degrees of freedom, which enables a simple movement implementation that is as free of constraints as possible.

The decoupling joint device preferably provides at least one decoupling between the actuating element and the optical element about a decoupling axis which runs at least substantially parallel to the at least one tilting axis of the optical element. This makes it possible to implement a particularly simple movement implementation that is as free from constraints as possible.

The actuating element can basically be connected to the optical element in any way. The control element is preferred on the The side of the decoupling joint device facing the optical element is connected to the optical element at a connection point or connected to an interface section of the support device, via which the optical element is connected to the support device. In both cases, the connection point is then arranged offset transversely to the at least one tilting axis in order to ensure that the longitudinal force acting on the actuating element causes a tilting moment about the tilting axis.

The decoupling joint device can basically be designed in any way in order to realize the decoupling in the required degrees of freedom. In certain simple and robust variants, the decoupling joint device comprises at least one solid-state joint, which in particular restricts at least one rotational degree of freedom. In this way, a reliable and precise conversion of the longitudinal force into a tilting moment can be ensured. In certain particularly simply designed variants, the decoupling joint device comprises at least one leaf spring element and/or at least one bar spring element.

Particularly favorable designs result when the decoupling joint device comprises a spring element that is curved and/or angled at least in sections, since reliable decoupling about the corresponding axis of curvature or bending axis can be achieved in a particularly simple manner with such curved or angled sections.

It can be advantageous if the spring element is curved in a substantially U-shaped or S-shaped manner, at least in sections. It can also be advantageous if an axis of curvature of the spring element runs at least substantially parallel to the at least one tilt axis of the optical element. In both cases, a good decoupling that is as free from constraints as possible is achieved in a simple manner.

The decoupling joint device can in principle be located at any suitable distance or other spatial arrangement from the tilting joint device. The decoupling joint device is preferably arranged adjacent to the tilting joint device, since this makes it possible to realize particularly favorable configurations in which particularly low parasitic stresses arise in the arrangement.

In certain variants, the decoupling joint device can comprise an at least partially curved and/or angled decoupling section, in particular a bar spring section or a leaf spring section, which is directly adjacent to the tilting joint device and which at least essentially follows an outer contour of the tilting joint device. This makes it possible to achieve particularly simple and compact configurations in which the decoupling axis moves particularly close to the tilting axis. This is preferred and generally also implemented in variants in which the decoupling joint device is designed and arranged in such a way that the decoupling axis is arranged adjacent, in particular immediately adjacent, to the at least one tilt axis of the optical element.

The actuating element can in principle be designed in any suitable manner, as long as a compact design is implemented which enables a reliable conversion of the translational movement of the actuating element into the rotational movement (i.e. the tilting movement) of the optical element. The adjusting element preferably has an adjusting section which extends between the first end and the second end of the adjusting element. The adjusting section can form the first end of the adjusting element. Likewise, the adjusting section can be designed to be straight, at least in the west. Likewise, the adjusting section can be designed to be rod-shaped, at least in the west, in particular in the manner of an elongated, slender rod. In all of these cases (individually or in any combination) particularly compact and simple designs result.

In certain variants, the adjusting section is designed to be elongated along the longitudinal axis of the adjusting element, with the adjusting section in particular extending over at least 50% of its length, preferably at least over 80% of its length, more preferably at least over essentially 100% of its length, in a recess in the support device. In particular, it can be provided that the adjusting section runs at least essentially recessed in the recess of the support device. In this way, not only a particularly compact design can be achieved. Rather, the recess can also optionally be used to guide the adjusting section.

The adjusting section can basically extend as far as desired. The adjusting section preferably extends from the first end of the adjusting element to a decoupling joint device of the adjusting device, via which the adjusting element is connected to the optical element. This allows particularly simple and compact configurations to be achieved.

In certain advantageous variants because they are designed to be particularly compact, the adjusting section is designed as a slender section which is elongated along a longitudinal axis of the adjusting section and has at least one spring section which is designed to be resilient along the longitudinal axis of the adjusting section. This makes it possible to achieve particularly advantageous designs with a sensitive and precise adjustment of the tilting of the optical surface, since the spring section applies a defined longitudinal force to the optical element or the interface section of the support device when the first end of the adjusting element is deflected (along the translational degree of freedom). initiates, which leads to the desired tilting of the optical element about the assigned tilt axis. The longitudinal force corresponds to the elastic change in length of the spring section, with a comparatively large displacement of the first end of the adjusting element producing only a comparatively small variation in the longitudinal force when the spring section is low. This makes particularly sensitive and precise adjustment possible in a particularly simple manner thanks to comparatively large adjustment movements.

It goes without saying that one or more separate spring sections can be provided along a longitudinal axis of the adjusting section, which can basically be designed in any way as long as they provide a corresponding spring effect along the longitudinal axis of the adjusting section. In particularly simple variants, the at least one spring section can be designed in the manner of a spiral spring, the spring axis of which runs along the longitudinal axis of the adjusting section.

In certain advantageous variants, the adjusting section has at least one rod section, the at least one spring section having a first stiffness along the longitudinal axis of the adjusting section and the at least one rod section having a second stiffness along the longitudinal axis of the adjusting section, the first stiffness being less than the second stiffness. The ratio between the first and second stiffness can in principle be chosen arbitrarily, as long as a correspondingly small variation in the longitudinal force is achieved with a comparatively large displacement of the first end of the adjusting element. Preferably, the first stiffness can be 0.001% to 0.1%, preferably 0.008% to 0.08%, more preferably 0.01% to 0.03%, of the second stiffness.

In certain variants, the adjusting device can comprise a decoupling joint device in the area of the second end of the adjusting element, as already described above. In further variants, the decoupling function of this decoupling joint device can simply be taken over by the at least one spring section. Preferably, the at least one spring section therefore forms a decoupling joint device which provides at least decoupling between the actuating element and the optical element about a decoupling axis, wherein the decoupling axis runs at least substantially parallel to the at least one tilting axis of the optical element.

The actuating element can in principle be connected to the optical element in any suitable manner. Preferably, the actuating element is connected at a connection point directly to the optical element or to an interface section of the support device, via which the optical element is connected to the support device, the connection point being arranged offset transversely to the at least one tilt axis, as already described above. The connection point can be formed directly on the optical element or on the interface section. In variants that are particularly easy to manufacture, the connection point is formed on a connection element, which can then be easily connected (in any suitable manner by means of positive locking and/or frictional locking and/or material locking) to the optical element or the interface section.

The connection element can be designed such that the connection point is arranged along a longitudinal axis of the actuating element on a side of the at least one tilt axis facing away from the optical element. In this way, designs can be realized in particular in which the at least one tilting axis can be realized in a particularly simple manner.

In certain variants, the connecting element has a substantially T-shaped or L-shaped cross section in a sectional plane which contains the actuating element longitudinal axis and the connecting point, which means that the transverse offset already described above between the connecting point and the at least one tilting axis can be achieved in a particularly simple manner can be realized. The same applies in particular to variants in which the connection element has a pin-shaped first connection element section and a, in particular plate-shaped, second connection element section, the first connection element section being connected to the optical element or the interface section of the support device at a first end of the connection element and the second connection element section to is arranged at a second end of the connection element and forms the connection point. The second connecting element section can be in a main Extension plane extend, which in particular can run at least substantially perpendicular to a longitudinal axis of the first connecting element section.

The support device can in principle be connected to the support structure in any suitable manner. For example, the support device can be placed on the support structure. In preferred variants because they are particularly compact, the support device is designed to be inserted into a recess in the support structure, the optical element being arranged in a mounted state on a first side of the support structure and the recess extending to a second side of the support structure , which faces away from the optical element. The adjusting element can be designed to extend in the assembled state through the recess in the support structure to the second side of the support structure, with the first end in particular protruding from the recess. This allows a design to be realized in which the adjusting element is particularly easy to access for adjusting the tilt angle.

Likewise, the adjusting element can be designed to be connected to the support device and/or the support structure in the region of the first end in order to fix a tilting of the optical surface about the at least one tilting axis of the optical element, which was set in an adjustment state. This makes it possible to achieve a particularly simple and permanent fixation of a tilt angle once it has been set.

In particularly simple and compact designs, the support device is designed to extend in the assembled state through the recess in the support structure to the second side of the support structure. This makes it possible, in particular, to realize a particularly simple connection of the support device to the support structure. In the assembled state, the support device can be connected to the support structure in the area of the second side of the support structure, in particular it can be detachably connected to the support structure. Likewise, in the assembled state, the support device can be connected to the support structure in the area of the second side of the support structure via at least one connecting element, since a reliable connection can be achieved particularly easily due to the comparatively good accessibility. The connection is particularly simple and inexpensive in variants in which the support device protrudes from the recess in the assembled state and is connected to the support structure in this area.

Particularly flexibly adjustable variants result when the support device and the recess are designed such that the support device can be rotated about a longitudinal axis of the recess with respect to the support structure in an adjustment state preceding the assembled state, in which the support device is inserted into the recess. In this way, a further rotational degree of freedom of adjustment can be realized in a simple and compact manner, whereby a particularly variable or precise adjustment of the optical surface can be achieved.

The tilting joint device can be implemented in any suitable manner in order to provide the tilting axis for the optical element. The tilting joint device preferably restricts at least one rotational degree of freedom in order to achieve a clearly defined and robust adjustment of the tilting. In particularly simple, robust variants, the tilting joint device is designed in the manner of a hinge joint.

In variants with two tilting axes, the tilting joint device can be designed in the manner of a cardan joint. Furthermore, the tilting joint device can define a first tilting axis of the optical element with respect to the support structure and define a second tilting axis of the optical element with respect to the support structure, wherein the second tilting axis runs transversely to the first tilting axis. The first tilt axis can define a first normal plane and the second tilt axis can define a second normal plane, which in particular runs perpendicular to the first normal plane.

Provision can also be made for the tilting joint device to include at least one solid joint. The tilting joint device is preferably arranged adjacent to the optical element, since this results in a particularly small lateral deflection of the optical element during tilting, whereby the distance to adjacent optical elements can be kept small.

In certain, simple variants, the tilting joint device connects a first interface section of the support device in an articulated manner to a second interface section of the support device, the first interface section being designed to connect the support device to the support structure, while the second interface section is designed to connect the optical element to the support device.

In certain variants, a particularly compact configuration is achieved if the adjusting device, in particular the adjusting element, and possibly also the supporting device, at best protrude slightly laterally beyond a (virtual) prismatic space, which is defined by a displacement of the optical element along the degree of freedom of movement. In certain variants, a virtual projection of the optical element, which takes place in the direction of the degree of freedom of adjustment onto a projection plane that runs perpendicular to the degree of freedom of adjustment, defines a first projection contour, while a virtual projection of the adjustment element, which takes place in the direction of the degree of freedom of adjustment onto the projection plane, defines a second projection contour defined. The second projection contour then preferably projects at most slightly beyond the first projection contour. The second projection contour preferably projects beyond the first projection contour by a maximum of 20%, preferably a maximum of 5% to 10%, more preferably a maximum of 1% to 3%, of the area of the second projection contour. In certain variants, the second projection contour lies at least essentially completely within the first projection contour. In certain variants, the second projection contour lies within the first projection contour at a distance from the first projection contour. In all of these cases, a preferably compact configuration results, which enables a particularly densely packed arrangement of several optical elements (with little light loss through the gaps between the optical elements).

It goes without saying that, in principle, a single adjusting element can be sufficient to set the desired tilting of the optical surface about the assigned at least one tilting axis. In certain variants, the actuating element is a first actuating element and the degree of freedom of adjustment is a first degree of freedom of adjustment. The adjusting device then comprises at least one further, second adjusting element, which is designed to be elongated along a second adjusting element longitudinal axis. The second actuator element has a first end that is remote from the optical element and has a second end that is adjacent to the optical element and is connected to the optical element. The second adjusting element is arranged and designed in such a way that a displacement, which is introduced into the first end of the second adjusting element in a second degree of freedom, adjusts a tilting of the optical surface about at least one tilting axis of the optical element. This tilt axis can be different from the tilt axis around which the first actuating element adjusts the tilt, but it can also be identical to the latter.

The second degree of freedom of adjustment can also be a translational degree of freedom that runs along the longitudinal axis of the second adjustment element. The first degree of freedom of adjustment and the second degree of freedom of adjustment can be inclined to one another by a maximum of 20°, preferably by a maximum of 10°, preferably by a maximum of 5°, in particular the first degree of freedom of adjustment and the second degree of freedom of adjustment can run at least substantially parallel to one another. This enables particularly compact configurations to be achieved.

In certain variants, a displacement that is introduced into the first end of the first actuating element in the first degree of freedom of adjustment, and a displacement that is introduced into the first end of the second actuating element in the second degree of freedom of adjustment, each adjusts a tilt of the optical surface about the same tilting axis of the optical element.

The first control element and the second control element can be arranged and designed to act in the manner of antagonists. In particular, the first actuating element and the second actuating element can be connected to the optical element on different sides of the tilt axis in such a way that a displacement of the first actuating element in the first degree of freedom of adjustment causes an opposite displacement of the second actuating element in the second degree of freedom of adjustment. In both cases, a particularly favorable design can be achieved, which in particular counteracts migration of the optical element about the tilt axis from the adjusted position in the event of thermally caused expansion.

In certain variants with particularly extensive adjustment options, it can be provided that the tilting joint device, as described, defines a first and a second tilting axis of the optical element with respect to the support structure, the second tilting axis running transversely to the first tilting axis. The first tilt axis can define a first normal plane and the second tilt axis can define a second normal plane, which in particular runs perpendicular to the first normal plane. The first actuating element and the second actuating element are arranged and designed to act in the manner of antagonists about the first tilt axis, forming a first pair of actuating elements. Furthermore, a second pair of actuating elements is provided, which is designed in the manner of the first pair of actuating elements and acts about the second tilt axis.

The second pair of actuating elements is preferably designed at least in the same way as the first pair of actuating elements, and therefore has at least similarly designed components which cause a tilting about the second tilting axis through corresponding translational adjusting movements along the longitudinal axis of the respective actuating element. Preferably, the second pair of actuating elements is at least essentially identical to the first actuating element pair, as this allows particularly simple configurations to be implemented. Particularly simple designs result from variants in which the second pair of actuating elements is arranged rotated relative to the first pair of actuating elements by 45° to 90°, preferably 60° to 90°, more preferably 80° to 90°, with respect to a longitudinal axis of the support device.

Particularly compact and therefore favorable designs result when the optical surface has an area of 0.1 mm ² to 200 mm ² , preferably 0.5 mm ² to 100 mm ² , more preferably 1.0 mm ² to 50 mm ² . The same applies if the optical surface has a maximum dimension of 2 mm to 50 mm, preferably 3 mm to 25 mm, more preferably 4 mm to 10 mm. The optical surface can basically be designed in any way, in particular can be curved in any way. In designs that are particularly easy to adjust, the optical surface is an at least essentially flat surface. The optical surface is preferably a reflective surface. However, refractive or diffractive optical surfaces can also be used.

The present invention further relates to an optical module, in particular a facet mirror, with at least two, in particular a plurality N, optical arrangements according to the invention. The optical arrangements can be connected to a common support structure. Furthermore, the plurality N can be 100 to 100,000, preferably 100 to 10,000, more preferably 1,000 to 10,000. Likewise, in certain variants, 50 to 10,000, preferably 100 to 7,500, more preferably 500 to 5,000, facet elements can be provided. Particularly compact designs with favorable power distribution and low light loss (due to gaps between the optical elements) result when the optical elements of at least two optical arrangements are arranged relative to one another to form a narrow gap, the gap having a gap width and the gap width in one mounted Condition is 0.01 mm to 0.2 mm, preferably 0.02 mm to 0.1 mm, more preferably 0.04 mm to 0.08 mm.

The present invention further relates to an optical imaging device, in particular for microlithography, with an illumination device with a first optical element group, an object device for recording an object, a projection device with a second optical element group and an image device, wherein the illumination device is designed to illuminate the object and the projection device is designed to project an image of the object onto the image device. The lighting device and/or the projection device comprises at least one optical module according to the invention. This also allows the variants and advantages described above in connection with the optical arrangement to be realized to the same extent, so that reference is made to the above statements in order to avoid repetition.

The present invention further relates to a method for supporting an optical element, in particular a facet element, of an imaging device for microlithography, in particular for the use of light in the extreme UV range (EUV), in which the optical element, which has an optical surface, is supported on a support structure by means of a passive support device. At least one tilt axis of the optical element with respect to the support structure is defined by a tilt joint device of the support device. An adjusting device acts at least in sections kinematically parallel to the support device between the optical element and the support structure, the adjusting device comprising at least one adjusting element which is designed to be elongated along a longitudinal axis of the adjusting element. The actuating element has a first end that is remote from the optical element and a second end that is adjacent to the optical element and is connected to the optical element. The actuating element is arranged and designed in such a way that a tilting of the optical surface about the at least one tilting axis of the optical element is adjusted by a displacement which is introduced into the first end of the actuating element in a degree of freedom, the degree of freedom being a translational degree of freedom, which runs along the longitudinal axis of the actuator. This also allows the variants and advantages described above in connection with the optical arrangement to be realized to the same extent, so that reference is made to the above statements in order to avoid repetition.

Finally, the present invention relates to an optical imaging method, in particular for microlithography, in which an illumination device, which has a first optical element group, illuminates an object and a projection device, which has a second optical element group, projects an image of the object onto an image device. At least one optical element of the lighting device and/or the projection device is supported using a method according to the invention. This also allows the variants and advantages described above in connection with the optical arrangement to be realized to the same extent, so that repetitions can be avoided insofar as reference is made to the above statements.

Further aspects and exemplary embodiments of the invention result from the dependent claims and the following description of preferred exemplary embodiments, which refers to the attached figures. All combinations of the disclosed features, regardless of whether they are the subject of a claim or not, are within the scope of the invention.

BRIEF DESCRIPTION OF THE DRAWINGS

• 1 is a schematic representation of a preferred embodiment of a projection exposure system according to the invention, which includes a preferred embodiment of an optical arrangement according to the invention, in which a preferred embodiment of a connection arrangement according to the invention is used.
• 2 is a schematic sectional view of part of the arrangement 1 .
• 3 is a schematic perspective view of a further variant of the optical arrangement according to the invention.
• 4 is a schematic view of part of the arrangement 3 (Detail IV).
• 5 is a schematic sectional view (along line VV 7 ) a further variant of the optical arrangement according to the invention.
• 6 is a schematic view of an actuating element of the arrangement 5 .
• 7 is a schematic perspective view of part of the assembly 5 .
• 8th is a schematic perspective view of another part of the arrangement 5 .

DETAILED DESCRIPTION OF THE INVENTION

First embodiment

The following is with reference to the 1 and 2 a preferred embodiment of a projection exposure system 101 according to the invention for microlithography is described, which includes a preferred embodiment of an optical arrangement according to the invention. To simplify the following explanations, an x,y,z coordinate system is given in the drawings, with the z direction running parallel to the direction of the gravitational force. The x-direction and the y-direction are therefore horizontal, with the x-direction in the representation 1 runs vertically into the drawing plane. Of course, in further embodiments it is possible to choose any orientation that deviates from that of an x,y,z coordinate system.

Below we will initially refer to the 1 The essential components of a projection exposure system 101 are described as an example. The description of the basic structure of the projection exposure system 101 and its components is not intended to be restrictive.

A lighting device or a lighting system 102 of the projection exposure system 101 includes, in addition to a radiation source 102.1, an optical element group in the form of lighting optics 102.2 for illuminating an object field 103.1 (shown schematically). The object field 103.1 lies in an object plane 103.2 of an object device 103. A reticle 103.3 (also referred to as a mask) arranged in the object field 103.1 is illuminated. The reticle 103.3 is held by a reticle holder 103.4. The reticle holder 103.4 can be displaced in particular in one or more scanning directions via a reticle displacement drive 103.5. In the present example, such a scanning direction runs parallel to the y-axis.

The projection exposure system 101 further comprises a projection device 104 with a further optical element group in the form of projection optics 104.1. The projection optics 104.1 is used to image the object field 103.1 into a (schematized) image field 105.1, which lies in an image plane 105.2 of an image device 105. The image plane 105.2 runs parallel to the object plane 103.2. Alternatively, an angle other than 0° between the object plane 103.2 and the image plane 105.2 is also possible.

During exposure, a structure of the reticle 103.3 is imaged onto a light-sensitive layer of a substrate in the form of a wafer 105.3, the light-sensitive layer being arranged in the image plane 105.2 in the area of the image field 105.1. The wafer 105.3 is held by a substrate holder or wafer holder 105.4. The wafer holder 105.4 can be displaced in particular along the y direction via a wafer displacement drive 105.5. The displacement on the one hand of the reticle 103.3 via the reticle displacement drive 103.5 and on the other hand of the wafer 105.3 via the wafer displacement drive 105.5 can take place synchronized with one another. This synchronization can be done, for example, via a shared (in 1 Control device 106 (shown only very schematically and without control paths).

The radiation source 102.1 is an EUV radiation source (extreme ultraviolet radiation). The radiation source 102.1 emits in particular EUV radiation 107, which is also referred to below as useful radiation or illumination radiation. The useful radiation in particular has a wavelength in the range between 5 nm and 30 nm, in particular a wavelength of approximately 13 nm. The radiation source 102.1 can be a plasma source, for example an LPP source (Laser Produced Plasma, i.e. using a Laser generated plasma) or a DPP source (Gas Discharged Produced Plasma, i.e. plasma generated by gas discharge). It can also be a synchrotron-based radiation source. The radiation source 102.1 can also be a free electron laser (free electron laser, FEL).

Since the projection exposure system 101 works with useful light in the EUV range, the optical elements used are exclusively reflective optical elements. In further embodiments of the invention, it is of course also possible (particularly depending on the wavelength of the illuminating light) to use any type of optical element (refractive, reflective, diffractive) alone or in any combination for the optical elements.

The illumination radiation 107, which emanates from the radiation source 102.1, is focused by a collector 102.3. The collector 102.3 can be a collector with one or more ellipsoidal and/or hyperboloid reflection surfaces. The at least one reflection surface of the collector 102.3 can be exposed to the illumination radiation 107 in grazing incidence (Grazing Incidence, Gl), i.e. with angles of incidence greater than 45°, or in normal incidence (Normal Incidence, NI), i.e. with angles of incidence smaller than 45° become. The collector 11 can be structured and/or coated on the one hand to optimize its reflectivity for the useful radiation and on the other hand to suppress false light.

After the collector 102.3, the illumination radiation 107 propagates through an intermediate focus in an intermediate focus plane 107.1. In certain variants, the intermediate focus plane 107.1 can represent a separation between the illumination optics 102.2 and a radiation source module 102.4, which includes the radiation source 102.1 and the collector 102.3.

The illumination optics 102.2 includes a deflection mirror 102.5 along the beam path and a downstream first facet mirror 102.6. The deflection mirror 102.5 can be a flat deflection mirror or, alternatively, a mirror with an effect that influences the bundle beyond the pure deflection effect. Alternatively or additionally, the deflection mirror 102.5 can be designed as a spectral filter, which at least partially separates out so-called false light from the illumination radiation 107, the wavelength of which deviates from the useful light wavelength. If the optically effective surfaces of the first facet mirror 102.6 are arranged in the area of a plane of the illumination optics 102.2, which is optically conjugate to the object plane 103.2 as a field plane, the first facet mirror 102.6 is also referred to as a field facet mirror. The first facet mirror 102.6 comprises a large number of individual first facets 102.7, which are also referred to below as field facets. These first facets and their optical surfaces are in the 1 only strongly indicated schematically by the dashed contour 102.7.

The first facets 102.7 can be designed as macroscopic facets, in particular as rectangular facets or as facets with an arcuate or part-circular edge contour. The first facets 102.7 can be designed as facets with a planar or alternatively with a convex or concave curved optical surface.

Like, for example, from the DE 10 2008 009 600 A1 (the entire disclosure of which is incorporated herein by reference), the first facets 102.7 themselves can also each be composed of a plurality of individual mirrors, in particular a plurality of micromirrors. The first facet mirror 102.6 can in particular be designed as a microelectromechanical system (MEMS system), as is the case, for example, in FIG DE 10 2008 009 600 A1 is described in detail.

In the present example, the illumination radiation 107 runs horizontally between the collector 102.3 and the deflection mirror 102.5, i.e. along the y-direction. However, it is understood that a different orientation can also be selected for other variants.

A second facet mirror 102.8 is arranged downstream of the first facet mirror 102.6 in the beam path of the illumination optics 102.2. If the optically effective surfaces of the second facet mirror 102.8 are arranged in the area of a pupil plane of the illumination optics 102.2, the second facet mirror 102.8 is also referred to as a pupil facet mirror. The second facet mirror 102.8 can also be arranged at a distance from a pupil plane of the illumination optics 102.2. In this case, the combination of the first facet mirror 102.6 and the second facet mirror 102.8 also acts as a specular reflector designated. Such specular reflectors are known, for example, from US 2006/0132747 A1 , the EP 1 614 008 B1 or the US 6,573,978 (the entire disclosure of which is incorporated herein by reference).

The second facet mirror 102.8 in turn comprises a plurality of second facets, which are in the 1 are only strongly indicated schematically by the dashed contour 102.9. The second facets 102.9 are also referred to as pupil facets in the case of a pupil facet mirror. The second facets 102.9 can basically be designed like the first facets 102.7. In particular, the second facets 102.9 can also be macroscopic facets, which can have, for example, round, rectangular or even hexagonal or any polygonal borders. Alternatively, the second facets 102.9 can be facets composed of micromirrors. The second facets 102.9 can in turn have planar or alternatively convex or concave curved reflection surfaces. In this regard, we refer again to the DE 10 2008 009 600 A1 referred.

In the present example, the lighting optics 102.2 thus forms a double-faceted system. This basic principle is also known as the fly's eye integrator. In certain variants, it can also be advantageous not to arrange the optical surfaces of the second facet mirror 102.8 exactly in a plane that is optically conjugate to a pupil plane of the projection optics 104.1.

In a further, not shown, embodiment of the illumination optics 102.2, a transmission optics 102.10 (shown only in a highly schematic manner) can be arranged in the beam path between the second facet mirror 102.8 and the object field 103.1, which contributes in particular to the imaging of the first facets 102.7 into the object field 103.1. The transmission optics 102.10 can have exactly one mirror, but alternatively also two or more mirrors, which are arranged one behind the other in the beam path of the illumination optics 102.2. The transmission optics 102.10 can in particular include one or two mirrors for vertical incidence (NI mirror, normal incidence mirror) and/or one or two mirrors for grazing incidence (GL mirror, grazing incidence mirror).

The lighting optics 102.2 has the design as shown in the 1 is shown, after the collector 102.3 exactly three mirrors, namely the deflection mirror 102.5, the first facet mirror 102.6 (e.g. a field facet mirror) and the second facet mirror 102.8 (e.g. a pupil facet mirror). In a further embodiment of the lighting optics 102.2, the deflection mirror 102.5 can also be omitted, so that the lighting optics 102.2 can then have exactly two mirrors after the collector 102.3, namely the first facet mirror 102.6 and the second facet mirror 102.8.

With the help of the second facet mirror 102.8, the individual first facets 102.7 are imaged into the object field 103.1. The second facet mirror 102.8 is the last beam-forming mirror or actually the last mirror for the illumination radiation 107 in the beam path in front of the object field 103.1. The image of the first facets 102.7 by means of the second facets 102.9 or with the second facets 102.9 and a transmission optics 102.10 into the object plane 103.2 is generally only an approximate image.

The projection optics 104.1 comprises a plurality of mirrors Mi, which are numbered according to their arrangement along the beam path of the projection exposure system 101. At the one in the 1 In the example shown, the projection optics 104.1 includes six mirrors M1 to M6. Alternatives with four, eight, ten, twelve or another number of mirrors Mi are also possible. The penultimate mirror M5 and the last mirror M6 can each have a passage opening (not shown) for the illumination radiation 107. In the present example, the projection optics 104.1 is a double-obscured optic. The projection optics 104.1 has an image-side numerical aperture NA that is greater than 0.5. In particular, the image-side numerical aperture NA can also be larger than 0.6. For example, the image-side numerical aperture NA can be 0.7 or 0.75.

The reflection surfaces of the mirrors Mi can be designed as free-form surfaces without an axis of rotational symmetry. Alternatively, the reflection surfaces of the mirrors Mi can be designed as aspherical surfaces with exactly one axis of rotational symmetry of the reflection surface shape. The mirrors Mi, just like the mirrors of the lighting optics 102.2, can have highly reflective coatings for the lighting radiation 107. These coatings can be made up of several layers (multilayer coatings), in particular they can be designed with alternating layers of molybdenum and silicon.

In the present example, the projection optics 104.1 has a large object image offset in the y-direction between a y-coordinate of a center of the object field 103.1 and a y-coordinate of the center of the image field 105.1. This object-image offset in the y-direction can be approximately as large be like a distance between the object plane 103.2 and the image plane 105.2 in the z-direction.

The projection optics 104.1 can in particular be anamorphic. In particular, it has different imaging scales βx, βy in the x and y directions. The two imaging scales βx, βy of the projection optics 104.1 are preferably (βx; βy) = (+/- 0.25; +/- 0.125). A positive image scale β means an image without image reversal. A negative sign for the image scale β means an image with image reversal. In the present example, the projection optics 104.1 thus leads to a reduction in the x-direction, i.e. in the direction perpendicular to the scanning direction, in a ratio of 4:1. In contrast, the projection optics 104.1 in the y direction, i.e. in the scanning direction, leads to a reduction in size in a ratio of 8:1. Other image scales are also possible. Image scales of the same sign and absolutely the same in the x and y directions are also possible, for example with absolute values of 0.125 or 0.25.

The number of intermediate image planes in the x and y directions in the beam path between the object field 103.1 and the image field 105.1 can be the same. Likewise, the number of intermediate image planes can be different depending on the design of the projection optics 104.1. Examples of projection optics with different numbers of such intermediate images in the x and y directions are, for example, from US 2018/0074303 A1 known (the entire disclosure of which is incorporated herein by reference).

In the present example, one of the pupil facets 102.9 is assigned to exactly one of the field facets 102.7 to form an illumination channel for illuminating the object field 103.1. This can in particular result in lighting based on Köhler's principle. The far field is broken down into a large number of object fields 103.1 using the field facets 102.7. The field facets 102.7 generate a plurality of images of the intermediate focus on the pupil facets 102.9 assigned to them.

The field facets 102.7 are each imaged onto the reticle 103.3 by an assigned pupil facet 102.9, with the images superimposing one another, so that there is an overlapping illumination of the object field 103.1. The illumination of the object field 103.1 is preferably as homogeneous as possible. It preferably has a uniformity error of less than 2%. Field uniformity can be achieved by overlaying different lighting channels.

By arranging the pupil facets 102.9, the illumination of the entrance pupil of the projection optics 104.1 can be geometrically defined. By selecting the illumination channels, in particular the subset of the pupil facets 102.9 that carry light, the intensity distribution in the entrance pupil of the projection optics 104.1 can be adjusted. This intensity distribution is also referred to as the lighting setting of the lighting system 102. A likewise preferred pupil uniformity in the area of defined illuminated sections of an illumination pupil of the illumination optics 102.2 can be achieved by redistributing the illumination channels. The aforementioned settings can be made for actively adjustable facets by appropriate control via the control device 106.

Further aspects and details of the illumination of the object field 103.1 and in particular the entrance pupil of the projection optics 104.1 are described below.

The projection optics 104.1 can in particular have a homocentric entrance pupil. This can be accessible or inaccessible. The entrance pupil of the projection optics 104.1 often cannot be illuminated precisely with the pupil facet mirror 102.8. When imaging the projection optics 104.1, which images the center of the pupil facet mirror 102.8 telecentrically onto the wafer 105.3, the aperture rays often do not intersect at a single point. However, an area can be found in which the pairwise distance of the aperture beams becomes minimal. This surface represents the entrance pupil or a surface conjugate to it in local space. In particular, this surface shows a finite curvature.

In certain variants, it may be that the projection optics 104.1 has different positions of the entrance pupil for the tangential and sagittal beam paths. In this case, it is preferred if an imaging optical element, in particular an optical component of the transmission optics 102.10, is provided between the second facet mirror 102.8 and the reticle 103.3. With the help of this imaging optical element, the different positions of the tangential entrance pupil and the sagittal entrance pupil can be taken into account.

When arranging the components of the lighting optics 102.2, as shown in the 1 is shown, the optical surfaces of the pupil facet mirror 102.8 are arranged in a surface conjugate to the entrance pupil of the projection optics 104.1. The first facet mirror 102.6 (field facets mirror) defines a first main extension plane of its optical surfaces, which in the present example is arranged tilted relative to the object plane 5. In the present example, this first main extension plane of the first facet mirror 102.6 is arranged tilted to a second main extension plane, which is defined by the optical surface of the deflection mirror 102.5. In the present example, the first main extension plane of the first facet mirror 102.6 is further arranged tilted to a third main extension plane, which is defined by the optical surfaces of the second facet mirror 102.8.

As shown below using the second facet mirror 102.8 and the 2 is explained, in the present example the facet mirrors 102.6 and 102.8 are constructed as optical modules according to the invention, which include a plurality of N optical arrangements in the form of facet units 108, of which in 2 two facet units 108 are shown. The facet units 108 are designed identically in this example. In other variants, they can also be designed differently (individually or in groups).

The respective facet unit 108 comprises an optical element in the form of a facet element 108.1, a passive support device 108.2 and an adjusting device 108.3. The optical element 108.1 has a reflective optical surface 108.4, which is formed on a facet body 108.5. The facet body 108.5 can sit on an interface unit of the support device 108.2, which supports the facet body 108.5 over a large area, as shown in 2 is indicated by the dashed contour 108.6.

The support device 108.2 supports the optical element 108.1 on a support structure in the form of a carrier 109 of the facet mirror 102.8. The support device 108.2 includes a tilting joint device 108.7, which in the present example is (perpendicular to the plane of the drawing). 2 or parallel to the x-axis) tilt axis 108.8 of the optical element 108.1 is defined with respect to the support structure 109.

In the present example, the adjusting device 108.3 comprises two adjusting elements 108.9, each of which is elongated along an adjusting element longitudinal axis 108.10. It goes without saying that in other variants, any other number of actuating elements 108.9 can be provided, with a single actuating element 108.9 in particular being sufficient. If several control elements 108.9 are provided, they can be designed identically (as in the present example) or have a different design.

The respective actuating element 108.9 has a first end 108.11, which is distant from the optical element 108.1, and a second end 108.12, which is adjacent to the optical element 108.1 and is connected to the optical element 108.1. In the present example, the control element 108.9 is connected directly to the optical element 108.1. In the case of a large-area support of the facet body 108.5 by a corresponding interface section of the support device 108.2 (see dashed contour 108.6 in 2 ), the connection can also be made to this interface unit.

The actuating element 108.9 is arranged such that its actuating element longitudinal axis 108.10 runs (at least essentially) parallel to the longitudinal axis 108.14 of the support device 108.2. The actuating element 108.9 is arranged and designed in such a way that a displacement, which is introduced into the first end 108.11 of the actuating element 108.9 in a translational degree of freedom of freedom TSF along the actuating element longitudinal axis 108.10 in an adjustment state, causes a tilting of the optical surface 108.4 about the tilting axis 108.8 of the optical Elements 108.1 adjusted (as shown in 2 for the right facet unit 108 is shown). If the tilting is set to the correct value and the optical surface 108.4 is thus adjusted, the adjusting element 108.9 (possibly releasable) is fixed relative to the carrier 109 of the facet mirror 102.8 (and thus the set tilting is also fixed). In the present example, this is done by connecting the actuating element 108.9 to the support device 108.2, as shown in 2 is indicated by the contour 110. In other variants, however, a direct connection to the carrier 109 of the facet mirror 102.8 can also be provided. The adjusting device 108.3 thus acts in sections kinematically parallel to the supporting device 108.2 between the optical element 108.1 and the supporting structure 109.

The translation of the translational movement of the actuating element 108.9 into the rotational movement (i.e. the tilting movement) of the optical element 108.1 can be done in any suitable manner. For this purpose, for example, any suitable gear unit can be provided which implements this movement conversion. In the present example, the adjusting device 108.3 comprises a decoupling joint device 108.15 in the area of the second end 108.12 of the adjusting element, via which the adjusting element 108.9 is connected to the optical element 108.1. Via the decoupling joint device 108.15, a decoupling between the actuating element 108.9 and the optical element 108.1 can be achieved in a simple manner in the required degrees of freedom, which is a simple che, movement implementation that is as free as possible.

In the present example, the decoupling joint device 108.15 provides at least one decoupling between the actuating element 108.9 and the optical element 108.1 about a decoupling axis which runs at least substantially parallel to the tilting axis 108.8 of the optical element 108.1. This makes it possible to implement a particularly simple movement implementation that is as free from constraints as possible.

The actuating element 108.9 can basically be connected to the optical element 108.1 in any way. In the present example, the actuating element on the side of the decoupling joint device 108.15 facing the optical element 108.1 is connected to the optical element 108.1 at a connection point 108.13 (or to an interface section 108.6 of the support device 108.2, via which the optical element is connected to the support device 108.2). . In both cases, the connection point 108.13 is then arranged offset transversely to the tilt axis 108.8 in such a way that it is ensured that the longitudinal force acting on the actuating element 108.9 causes a tilting moment about the tilt axis 108.8, which in turn causes a desired tilting of the optical surface 108.4.

The decoupling joint device 108.15 can basically be designed in any way in order to realize the decoupling in the required degrees of freedom. In the present example, the decoupling joint device 108.15 comprises at least one solid joint that restricts a rotational degree of freedom, namely the rotational degree of freedom about the actuator longitudinal axis 108.10. This can ensure a reliable and precise conversion of the longitudinal force on the actuating element 108.9 into a tilting moment on the optical element 108.1. In the present example, this is achieved by the decoupling joint device 108.15 comprising a leaf spring element. Additionally or alternatively, a bar spring element can also be provided.

Particularly favorable designs result when the decoupling joint device 108.15 comprises a spring element that is curved at least in sections or (as in the present example) angled, since with such curved or angled sections a reliable decoupling about the corresponding axis of curvature or bending axis can be achieved in a particularly simple manner .

It is advantageous that the spring element of the decoupling joint device 108.15 is curved or angled essentially in a U-shape (or in other cases S-shape). It is also advantageous that an axis of curvature or bending axis of the spring element of the decoupling joint device 108.15 runs at least substantially parallel to the tilt axis 108.8 of the optical element 108.1. In this way, a good decoupling that is as free from constraints as possible is achieved in a simple manner.

The decoupling joint device 108.15 can in principle be located at any suitable distance or other spatial arrangement from the tilting joint device 108.7. However, as in the present example, the decoupling joint device is preferably arranged adjacent to the tilting joint device 108.7, since this makes it possible to realize particularly favorable configurations in which particularly low parasitic stresses result in the arrangement 108.

In the present example, the angled decoupling section of the decoupling joint device 108.15 is directly adjacent to the tilting joint device 108.7 and at least essentially follows the outer contour of the tilting joint device 108.7. This achieves a particularly simple and compact configuration in which the decoupling axis moves particularly close to the tilt axis 108.8. This is preferred and generally also implemented in variants in which the decoupling joint device 108.15 is designed and arranged such that its decoupling axis is arranged adjacent, in particular immediately adjacent, to the tilting axis 108.8 of the optical element 108.1.

The actuating element 108.9 can in principle be designed in any suitable manner, as long as a compact design is implemented which enables a reliable implementation of the translational movement of the actuating element 108.9 (in the degree of freedom of adjustment SF) into the rotational movement (i.e. the tilting movement) of the optical element 108.1. As in the present example, the adjusting element 108.9 preferably has an adjusting section 108.16 which extends between the first end 108.11 and the second end 108.12 of the adjusting element 108.9. The adjusting section 108.16 can form the first end of the adjusting element 108.9, as in the present example. In the present example, the adjusting section 108.16 is straight, at least in the west, and designed in the manner of an elongated, slender rod, resulting in a particularly compact and simple design.

The adjusting section 108.16 can basically extend as far as you want. The adjusting section 108.16 preferably extends as in the present one Example from the first end 108.11 of the actuating element 108.9 to the decoupling joint device 108.15, via which the actuating element 108.9 is connected to the optical element 108.1. This makes it possible to achieve a particularly simple and compact configuration. The adjusting section 108.16 extends through recesses 108.17 in the support device 108.2 to the side of the support structure 109 facing away from the optical element 108.1 and possibly (as in the present example) significantly beyond the support structure 109. There the adjusting section 108.16 is then easily accessible to manipulators (not shown) with which the (in 2 (illustrated by the right facet unit 108) displacement of the actuating element 108.9 in the degree of freedom of adjustment TSF and thus the tilting of the optical element 108.1 can be achieved. The recesses 108.17 can optionally also be designed in such a way that the adjusting section is guided during the adjustment.

The support device 108.2 can in principle be connected to the support structure 109 in any suitable manner. For example, the support device 108.2 can simply be placed on the support structure 109. In preferred variants because they are particularly compact, the respective support device 108.2 is inserted into a recess 109.1 in the support structure 109, as in the present example, with the optical element 108.1 in the (in 2 shown) mounted state is arranged on a first side of the support structure 109 and the recess 109.1 extends to a second side of the support structure 109, which faces away from the optical element 108.1.

In particularly simple and compact designs, the support device, as in the present example, extends in the assembled state through the recess 109.1 to the second side of the support structure 109. This makes it possible to realize a particularly simple connection of the support device 108.2 to the support structure 109. In this case, as in the present example, the support device can be connected to the support structure 109 in the area of the second side of the support structure 109 in the assembled state. The connection can be designed in any suitable way, in particular the support device 108.2 can be detachably connected to the support structure 109.

In the present example, the support device 108.2 is connected to the support structure 109 in the assembled state in the area of the second side of the support structure 109 via a connecting element 108.19, since a reliable connection can be achieved particularly easily due to the comparatively good accessibility. The connection is particularly simple and inexpensive in variants in which the support device 108.2 protrudes from the recess 109.1 in the assembled state, as in the present example, and is connected to the support structure 109 in this area.

Particularly flexibly adjustable variants result if the support device 108.2 and the recess 109.1 are designed, as in the present example, in such a way that the support device 108.2 in an adjustment state preceding the assembled state, in which the support device 108.2 is inserted into the recess 109.1, about a longitudinal axis 108.20 of the recess is rotatable with respect to the support structure 109. In this way, a further, rotational degree of freedom of adjustment RSF can be realized in a simple and compact manner, whereby a particularly variable or precise adjustment of the optical surface 108.4 can be achieved.

The tilting joint device 108.7 can be implemented in any suitable manner in order to provide the tilting axis 108.8 for the optical element 108.1. The tilting joint device 108.7 preferably restricts at least one degree of rotational freedom in order to achieve a clearly defined and robust adjustment of the tilting. In particularly simple, robust variants, the tilting joint device 108.7 (as in the present example) is designed in the manner of a hinge joint. It can also be provided for the tilting joint device 108.7 to include at least one solid-state joint. The tilting joint device 108.7 (as in the present example) is preferably arranged adjacent to the optical element 108.1, since this results in a particularly small lateral deflection of the optical element 108.1 during tilting, whereby the distance to adjacent optical elements 108.1 can be advantageously kept small.

In the present example, the tilting joint device 108.7 connects a first interface section 108.21 of the support device 108.2 in an articulated manner with a second interface section 108.6 of the support device 108.2, the first interface section 108.21 being designed to connect the support device 108.2 to the support structure 109, while the second interface section 108.6 is designed to connect the optical Element 108.1 is formed on the support device 108.2.

In the present example, a particularly compact configuration is achieved in that the respective adjusting device 108.3, in particular the respective adjusting element 108.9, and the supporting device 108.2 do not protrude beyond a (virtual) prismatic space, which is created by a displacement of the optical element 108.1 along the adjusting space TSF is defined as described in 2 is indicated by the dash-two-dotted contour 111. However, it can also be provided that the adjusting device 108.3 protrudes slightly beyond this prismatic space 111, as will be explained in more detail below.

It goes without saying that, in principle, a single adjusting element 108.9 per facet unit 108 can be sufficient to set the desired tilting of the optical surface 108.4. In certain variants (as in the present example) a first adjusting element 108.9 and at least one further, second adjusting element 108.9 are provided, which is designed to be elongated along a second adjusting element longitudinal axis 108.10. The second actuating element 108.9 is arranged and designed in such a way that a displacement, which is introduced into the first end 108.11 of the second actuating element 108.9 in a second degree of freedom of adjustment TSF2, adjusts a tilting of the optical surface 108.4 about a tilting axis of the optical element 108.1.

This tilting axis assigned to the second actuating element 108.9 can be different from the tilting axis 108.8, about which the first actuating element 108.9 adjusts the tilting. This can be achieved particularly easily if the first and second adjusting elements 108.9 are moved in a circumferential direction of the optical element 108.1 by less than 180° (for example by approximately 60° to 120°, preferably by 80° to 100°, in particular by approximately 90°). are offset from one another. In these cases, the tilting joint device 108.7 is designed so that it also provides tilting about this second tilting axis. For this purpose, the tilting joint device 108.7 can be designed, for example, in the manner of a ball joint or a cardan joint. An appropriately designed solid-state joint is still preferred.

In other variants, the tilt axis assigned to the second actuating element 108.9 (as in the present example) can also coincide with the tilt axis 108.8, around which the first actuating element 108.9 adjusts the tilting.

The second degree of freedom of adjustment TSF2 can also be a translational degree of freedom that runs along the longitudinal axis 108.10 of the second adjustment element 108.9. The first degree of freedom of adjustment TSF1=TSF and the second degree of freedom of adjustment TSF2 can be inclined to one another by a maximum of 20°, preferably by a maximum of 10°, preferably by a maximum of 5°, in particular the first degree of freedom of adjustment TSF1 and the second degree of freedom of adjustment TSF2 can be at least substantially parallel to one another run or coincide with each other as in the present example (TSF1 = TSF2 = TSF). This enables particularly compact configurations to be achieved.

In the present example, a displacement that is introduced into the first end of the first actuating element 108.9 in the first degree of freedom of adjustment TSF1 = TSF and a displacement that is introduced into the first end of the second actuating element 108.9 in the second degree of freedom of adjustment TSF2 = TSF are respectively adjusted a tilting of the optical surface about the same tilting axis 108.8 of the optical element 108.1.

The first control element 108.9 and the second control element 108.9 can, as in the present example, be arranged and designed to act in the manner of antagonists. The first and second actuating elements 108.9 are connected to the optical element 108.1 on different sides of the tilting axis 108.8 in such a way that a displacement of the first actuating element 108.9 in the first degree of freedom of adjustment TSF1 = TSF causes an opposite displacement of the second actuating element 108.9 in the second degree of freedom of adjustment TSF2 = TSF effects. This results in a particularly favorable design, which in particular counteracts migration of the optical element 108.9 about the tilting axis from the adjusted position in the event of a thermally caused expansion of the facet unit 108, in particular of the two adjusting elements 108.9.

Particularly compact and therefore favorable designs result when the optical surface 108.4 has an area of 0.1 mm ² to 200 mm ² , preferably 0.5 mm ² to 100 mm ² , more preferably 1.0 mm ² to 50 mm ² . having. The same applies if the optical surface 108.4 has a maximum dimension of 2 mm to 50 mm, preferably 3 mm to 25 mm, more preferably 4 mm to 10 mm. The optical surface 108.4 can basically be designed in any way, in particular can be curved in any way. In designs that are particularly easy to adjust, the optical surface 108.4 is an at least essentially flat surface.

It is understood that the methods according to the invention can be carried out with the facet mirror 102.8 described above, so that reference is made to the above statements in this respect.

Second embodiment

The following is with reference to the 1 , 3 and 4 A further preferred embodiment of the arrangement according to the invention is described in the form of a facet unit 208, which instead of the facet unit 108 in the imaging device 101 of 1 be used can. The facet unit 208 corresponds to the facet unit 108 in its basic design and functionality 2 , so only the differences will be discussed here. In particular, identical components are provided with identical reference numbers, while similar components are provided with reference numbers increased by the value 100. Unless otherwise stated below, reference is made to the above statements in connection with the first exemplary embodiment with regard to the features, functions and advantages of these components.

A difference from the first exemplary embodiment is that the adjusting section 208.16 of the respective adjusting element 208.9 of the adjusting device 208.3, which is in turn designed to be elongated rod-shaped along the longitudinal axis of the adjusting element 208.10, at least over 50% of its length, here approximately over 80% of its length, in a longitudinal slot-shaped Recess 208.22 of the support device 208.2 runs while the first end 208.11 protrudes from the support device 208.2. The adjusting section 208.16 is completely sunk into the recess 208.22 of the support device 208.2. In this way, not only a particularly compact design can be achieved. Rather, the recess 208.22 can optionally also be used to guide the adjusting section 208.16 or the adjusting element 208.9.

A further advantage of the arrangement of the adjusting section 208.16 recessed in the recess 208.22 is that the connecting element 208.19, via which the support device 108.2 is connected to the support structure 109 in the assembled state, can be designed as a simple screw nut. The connecting element 208.19 can then simply be screwed onto the part of the support device 208.2 protruding from the support structure 109 without causing a collision with the adjusting elements 208.9.

This is also particularly advantageous since the rotation of the optical surface 208.4 (around the longitudinal axis 208.14 of the support device 208.2) can initially be easily adjusted (with the connecting element 208.19 loosened or only slightly tightened) in the rotational degree of freedom of adjustment RSF. This setting can then be fixed by tightening the connecting element 208.19. The tilting of the optical surface 208.4 about the tilting axis 208.8 can then be adjusted by means of the adjusting elements 208.9 and fixed by a suitable connection 210 (for example a soldering point or the like) between the respective adjusting element 208.9 and the connecting element 208.19.

In the present example, too, a particularly compact configuration is achieved in that the respective adjusting device 208.3, in particular the respective adjusting element 208.9, and the supporting device 208.2 do not protrude beyond a (virtual) prismatic space, which is defined by a displacement of the optical element 208.1 along the degree of freedom of adjustment TSF will, like this in 4 is indicated by the dash-two-dotted contour 211. However, it can also be provided that the adjustment device 108.3 protrudes slightly beyond this prismatic space 111, as is the case with the present example (see section AA in 4 ) is explained in more detail below.

How 4 (Section AA), a virtual projection of the optical element 208.1, which takes place in the direction of the translational degree of freedom of adjustment TSF onto a projection plane that runs perpendicular to the degree of freedom of adjustment TSF, defines a first projection contour 212.1, while a virtual projection of the respective adjustment element 208.9 , which takes place in the direction of the degree of freedom TSF on the projection plane, defines a second projection contour 212.2. In the present example, the second projection contour 212.2 lies completely within the first projection contour 212.1, at a distance from the first projection contour 212.1. In other variants, however, a somewhat less compact design can also be provided, in which the second projection contour 212.2 preferably protrudes at most slightly beyond the first projection contour. The second projection contour 212.2 preferably projects beyond the first projection contour 212.1 by a maximum of 20%, preferably a maximum of 5% to 10%, more preferably a maximum of 1% to 3%, of the area of the second projection contour 212.2. In all of these cases, compact configurations are preferred, each of which enables a particularly densely packed arrangement of several optical elements 208.1 (with little light loss through the gaps between the optical elements 208.1).

In the present example, the tilting joint device 208.7 in turn connects the first interface section 208.21 of the support device 208.2 in an articulated manner with the second interface section 208.6 of the support device 208.2. The first interface section 208.21 is in turn designed to connect the support device 208.2 to the support structure 209 by forming a shoulder that rests on the support structure 109. The second interface section 208.6 in turn serves to connect the optical element 208.1 to the support device 208.2.

Another minor difference to the design 2 is that the spring Element of the decoupling joint device 208.15 is curved in a substantially S-shape. It is advantageous that an axis of curvature of the spring element of the decoupling joint device 208.15 runs at least essentially parallel to the tilt axis 208.8 of the optical element 208.1. In this way, a good decoupling that is as free from constraints as possible is achieved in a simple manner.

In the present example, the decoupling joint device 208.15 is again arranged at the second end 208.12 of the actuating element 208.9 adjacent to the tilting joint device 208.7, which in turn is designed as a solid-state hinge joint. This in turn creates a particularly favorable configuration in which particularly low parasitic voltages result in the arrangement 208.

In the present example, the curved decoupling section of the decoupling joint device 208.15 is directly adjacent to the tilting joint device 208.7 and at least essentially follows the outer contour of the tilting joint device 208.7 with one of its S-arms. This achieves a particularly simple and compact configuration, in which the decoupling axis of the decoupling joint device 208.15 moves particularly close to the tilt axis 208.8.

Third embodiment

The following is with reference to the 1 , 2 and 5 until 8th A further preferred embodiment of the arrangement according to the invention is described in the form of a facet unit 308, which instead of the facet unit 108 in the imaging device 101 of 1 can be used. The facet unit 308 corresponds to the facet unit 108 in its basic design and functionality 2 , so only the differences will be discussed here. In particular, identical components are provided with identical reference numbers, while similar components are provided with reference numbers increased by the value 200. Unless otherwise stated below, reference is made to the above statements in connection with the first exemplary embodiment with regard to the features, functions and advantages of these components.

The respective facet unit 308 in turn comprises an optical element in the form of a facet element 308.1, a passive support device 308.2 and an adjusting device 308.3. The optical element 308.1 has a reflective optical surface 308.4, which is formed on a facet body 308.5. The facet body 308.5 sits on an interface unit 308.6 of the support device 308.2, which supports the facet body 308.5 over a large area. In other variants, the facet body 308.5 can also be formed in one piece with the support device 308.2.

The support device 308.2 supports the optical element 308.1 on a support structure in the form of the carrier 309 of the facet mirror 302.8. The carrier 309 can be the carrier 109 1 are equivalent to. The support device 308.2 includes a tilting joint device 308.7, which in the present example is designed in the manner of a universal joint and a (perpendicular to the plane of the drawing). 5 or parallel to the x-axis) first tilt axis 308.8 of the optical element 308.1 with respect to the support structure 309 defined as well as a (parallel to the plane of the drawing). 5 as well as a second tilt axis 308.23 running parallel to the y-axis (see also 7 ).

In the present example, the adjusting device 308.3 comprises four adjusting elements 308.9, each of which is elongated along a longitudinal axis of the adjusting element 308.10. The actuating elements 308.9 are assigned to one another in pairs, so that a first pair of actuating elements 208.24 and a second pair of actuating elements 208.24 are formed. The first pair of actuating elements 208.24 serves to adjust the tilting about the first tilt axis 308.8, while the second pair of actuating elements 208.25 serves to adjust the tilting about the second tilting axis 308.23. It goes without saying that in other variants, any other number of actuating elements 308.9 can be provided, with a single actuating element 308.9 per tilt axis 308.8 or 308.23 in particular being sufficient. If several control elements 308.9 are provided, they can be designed identically (as in the present example) or have a different design.

The respective actuating element 308.9 has a first end 308.11, which is distant from the optical element 308.1, and a second end 308.12, which is adjacent to the optical element 308.1 and is connected to the optical element 308.1. In the present example, the control element 308.9 is connected directly to the optical element 308.1 via a connection element 308.26. Additionally or alternatively, the connection element 308.24 can also be connected to the interface section 308.6 of the support device 308.2.

The actuating element 308.9 is arranged such that its actuating element longitudinal axis 308.10 runs (at least essentially) parallel to the longitudinal axis 308.14 of the support device 308.2, at least in a non-deflected initial state. The actuating element 308.9 is arranged in this way and designed so that a displacement, which is introduced in an adjustment state in a translational degree of freedom of freedom TSF along the actuator longitudinal axis 308.10 into the first end 308.11 of the actuator 308.9, adjusts a tilting of the optical surface 308.4 about the tilt axis 308.8 of the optical element 308.1 (similar to this in 2 for the right facet unit 108 is shown). If the tilting is set to the correct value and the optical surface 308.4 is thus adjusted, the adjusting element 308.9 (possibly releasable) is fixed relative to the carrier 309 of the facet mirror 302.8 (and thus the set tilting is also fixed). In the present example, this is done by connecting the actuating element 308.9 to the support device 308.2, similar to that in 2 is indicated by the contour 110. In other variants, however, a direct connection to the carrier 309 of the facet mirror 302.8 can also be provided. The adjusting device 308.3 thus acts in sections kinematically parallel to the support device 308.2 between the optical element 308.1 and the support structure 309.

In the present example, the respective actuating element 308.9 also ensures a compact design, which reliably converts the translational movement of the actuating element 308.9 (in the degree of freedom of adjustment TSF) into the rotational movement (i.e. the tilting movement) of the optical element 308.1 about the respective tilting axis 308.8 or 308.23 possible.

As in the present example, the adjusting element 308.9 preferably has an adjusting section 308.16 which extends between the first end 308.11 and the second end 308.12 of the adjusting element 308.9. The adjusting section 308.16 can form the first and second ends of the adjusting element 308.9, as in the present example. In the present example, the adjusting section 308.16 (in the undeflected initial state - see 5 and 6 ) at least in the West, straight and shaped like an elongated, slender rod, resulting in a particularly compact and simple design.

The adjusting section 308.16 is therefore designed as an elongated, slim section which has an adjusting section longitudinal axis which coincides with the adjusting element longitudinal axis 308.10. The adjusting section 308.16 has a spring section 308.27, which is designed to be resilient along the longitudinal axis of the adjusting section 308.10.

As shown below using the control element pair 208.24 5 As explained, particularly advantageous designs can be achieved with a sensitive and precise adjustment of the tilting of the optical surface 308.4. Thus, at a certain deflection of the first end 308.11 of the adjusting element 308.9 (along the translational degree of freedom TSF), the spring section 308.27 introduces a defined longitudinal force F1 or F2 into the optical element 308.1 or the interface section 308.6 of the support device 308.2, which leads to the desired tilting of the optical element 308.1 leads around the assigned tilt axis 308.8. The longitudinal force F1 or F2 corresponds to the elastic change in length of the relevant spring section 308.27, with a relatively large displacement of the first end 308.1 of the adjusting element 308.9 producing only a comparatively small variation in the longitudinal force F1 or F2 if the stiffness of the spring section 308.27 is low. This makes particularly sensitive and precise adjustment possible in a particularly simple manner thanks to comparatively large adjustment movements.

It is understood that one or more separate spring sections 308.27 can be provided along an adjusting section longitudinal axis 308.10, which can basically be designed in any way as long as they provide a corresponding spring effect along the adjusting section longitudinal axis 308.10. In particularly simple variants, as in the present example, the spring section 308.27 in question can be designed in the manner of a spiral spring, the spring axis of which runs along the longitudinal axis of the adjusting section 308.10.

In certain advantageous variants, the adjusting section, as in the present example, has at least one rod section 308.28, which in particular forms the first end 308.11 of the adjusting element 308.9. The spring section 308.27 has a first stiffness S1 along the longitudinal axis of the adjusting section 308.10, while the rod section 308.28 has a second stiffness S2 along the longitudinal axis of the adjusting section 308.10, the first stiffness S1 being less than the second stiffness S2. The ratio between the first and second stiffness (S1/S2) can in principle be chosen arbitrarily, as long as a correspondingly small variation in the longitudinal force F1 or F2 is achieved with a comparatively large displacement of the first end 308.11 of the adjusting element 308.9. Preferably, the first stiffness S1 can be 0.001% to 0.1%, preferably 0.008% to 0.08%, more preferably 0.01% to 0.03%, of the second stiffness S2.

In certain variants, the adjusting device can comprise a decoupling joint device in the area of the second end of the adjusting element, as has already been described above in connection with the first and second exemplary embodiments. In the present example, however, this decoupling function is simply carried out by the spring section 308.27 can be adopted. Here, the spring section 308.27 therefore forms a decoupling joint device which provides at least decoupling between the actuating element 308.9 and the optical element 308.1 about a decoupling axis, the decoupling axis running at least substantially parallel to the associated tilt axis 308.8 or 308.23 of the optical element 308.1.

It goes without saying that the respective actuating element 308.9 can fundamentally be connected to the optical element 308.1 in any suitable manner. The actuating element 308.9 can be connected at a connection point 308.13 directly to the optical element 308.1 or to the interface section 308.6 of the support device 308.2, via which the optical element is connected to the support device. As already described above, the connection point 308.16 is in turn arranged offset transversely to the assigned tilt axis 308.8 or 308.23 in order to achieve a corresponding tilting moment about the assigned tilt axis 308.8 or 308.23, which achieves the desired tilting.

The connection point 308.13 can in principle be formed directly on the optical element 308.1 or on the interface section 308.6. In variants that are particularly easy to manufacture, the connection point is on the connection element 308.26 (see also 8th ) is formed, which can then be easily connected (in any suitable manner by means of positive connection and/or frictional connection and/or material connection) to the optical element 308.1 and/or the interface section 308.6.

It is understood that the connection of the respective actuating element 308.9, as in the present example, typically takes place via a connection area with a certain spatial extent, so that the connection point 308.13 is typically a virtual point in which the resulting longitudinal force F1 or F2 acts. This is how the respective actuating element 308.9 is connected to the connecting element 308.26 in the present example (see 5 and 8th ) via a recess 308.29 at the second end 308.13 of the adjusting element 308.9, into which an associated projection 308.30 of the connecting element 308.26 is inserted. A firm (but possibly detachable) connection between the respective actuating element 308.9 and the connecting element 308.26 can easily be established in any suitable manner (by means of positive locking and/or frictional locking and/or material locking).

In the present example, the connection element is designed such that the respective connection point 308.13 is arranged along the actuating element longitudinal axis 308.10 on a side of the respective tilt axis 308.8 or 308.23 facing away from the optical element 308.1. In this way, a design can be realized in which the respective tilting axis 308.8 or 308.23 can be realized in a particularly simple manner, namely here by simple solid-state joints 308.31 or 308.32 of the support device 308.2 (see 5 and 7 ).

In the present example, the connecting element 308.26 has a substantially T-shaped cross section in a sectional plane which contains the actuating element longitudinal axis 308.10 and the connecting point 308.13 (see 5 ), whereby the transverse offset already described above between the respective connection point 308.13 and the associated tilting axis 308.8 or 308.23 can be implemented in a particularly simple manner.

For this purpose, the connecting element 308.26 in the present example has a pin-shaped first connecting element section 308.33 and a plate-shaped second connecting element section 308.34. The first connection element section 308.33 is connected to the optical element 308.1 (and/or the interface section 308.6) at a first end of the connection element 308.26, while the second connection element section 308.34 is arranged at a second end of the connection element 308.26. The second connection element section 308.34 carries the four projections 308.30, which each form the connection area for the associated control element 308.9. The second connecting element section 308.34 extends in a main extension plane which runs at least substantially perpendicular to a longitudinal axis of the first connecting element section 308.33 (coinciding with the longitudinal axis 308.14 of the support device 308.2).

In the present example, two projections 308.30 that are diametrically opposite each other (with respect to the longitudinal axis 308.14 of the support device 308.2) are assigned to the first pair of actuating elements 308.24 and the second pair of actuating elements 308.25. Accordingly, the first and second actuating elements 308.9 of the respective actuating element pair 308.24, 308.25 are arranged and designed to act in the manner of antagonists about the associated tilting axis 308.8 and 308.23, respectively, in that the forces F1 and F2 produce opposing tilting moments about the associated tilting axis 308.8 and 308.23 generate.

In preferred variants, the second pair of actuating elements 308.25 is designed at least similarly to the first pair of actuating elements 308.24, therefore has at least similarly designed components which cause a tilting about the second tilting axis 308.23 through corresponding translational adjustment movements along the longitudinal axis 308.10 of the respective adjustment element 308.9. However, as in the present example, the second pair of actuating elements 308.25 is preferably designed to be at least essentially identical to the first pair of actuating elements 308.24, since particularly simple configurations can be implemented in this way.

Particularly simple designs result from variants in which the second pair of actuating elements 308.25 is arranged rotated relative to the longitudinal axis 308.14 of the support device 308.2 by 45° to 90°, preferably 60° to 90°, more preferably 80° to 90°, relative to the first pair of actuating elements 308.24 is. In the present example, the angle of rotation between the first pair of actuating elements 308.24 and the second pair of actuating elements 308.25 is 90°.

In the present example, the adjusting section 308.16 of the respective adjusting element 308.9 extends through a central (here cylindrical) recess 308.17 of the support device 308.2 to the side of the support structure 309 facing away from the optical element 308.1 and, if necessary (as in the present example) clearly over the support structure 309 out. There, the adjusting section 308.16 is then easily accessible to manipulators (not shown), with which the displacement of the adjusting element 308.9 in the degree of freedom of adjustment TSF and thus the tilting of the optical element 308.1 can be achieved (similar to this in 2 is shown using the right facet unit 308). The recess 308.17 can optionally also be designed in such a way that the rod section 308.28 is guided during the adjustment.

The support device 308.2 can in principle be connected to the support structure 309 in any suitable manner. For example, the support device 308.2 can simply be placed on the support structure 309. In preferred variants because they are particularly compact, the respective support device 308.2 is inserted into a recess 309.1 of the support structure 309, as in the present example, with the optical element 308.1 in the (in 2 shown) mounted state is arranged on a first side of the support structure 309 and the recess 309.1 extends to a second side of the support structure 309, which faces away from the optical element 308.1.

In particularly simple and compact designs, the support device, as in the present example, extends in the assembled state through the recess 309.1 to the second side of the support structure 309. This makes it possible to realize a particularly simple connection of the support device 308.2 to the support structure 309. In this case, as in the present example, the support device can be connected to the support structure 309 in the area of the second side of the support structure 309 in the assembled state. The connection can be designed in any suitable way, in particular the support device 308.2 can be detachably connected to the support structure 309.

In the present example, the support device 308.2 is connected to the support structure 309 in the assembled state in the area of the second side of the support structure 309 via a connecting element 308.19, since a reliable connection can be achieved particularly easily due to the comparatively good accessibility. The connection is particularly simple and inexpensive in variants in which the support device 308.2 protrudes from the recess 309.1 in the assembled state, as in the present example, and is connected to the support structure 309 in this area.

Particularly flexibly adjustable variants result if the support device 308.2 and the recess 309.1 are designed, as in the present example, such that the support device 308.2 is in an adjustment state preceding the assembled state, in which the support device 308.2 is inserted into the recess 309.1, about a longitudinal axis 308.20 of the recess 309.1 can be rotated with respect to the support structure 309. In this way, a further, rotational degree of freedom of adjustment RSF can be realized in a simple and compact manner, whereby a particularly variable or precise adjustment of the optical surface 308.4 can be achieved.

The tilting joint device 308.7 can be implemented in any suitable manner in order to provide the first tilting axis 308.8 and the second tilting axis 308.23 for the optical element 308.1. The tilting joint device 308.7 is preferably designed as a gimbal and restricts at least one degree of rotational freedom in order to achieve a clearly defined and robust adjustment of the tilting.

In particularly simple, robust variants, one or both tilt axes 308.8 or 308.23 of the tilt joint device 308.7 can be designed in the manner of a hinge joint (similar to the hinge joint 108.7 of the first exemplary embodiment). In the present example, the tilting joint device 308 each comprises a leaf spring-like solid joint 308.31 or 308.32, which defines the first tilting axis 308.8 or the second tilting axis 308.23. The tilting joint device is preferred Device 308.7 (as in the present example) is arranged adjacent to the optical element 308.1, since this results in a particularly small lateral deflection of the optical element 308.1 during tilting, whereby the distance to adjacent optical elements 308.1 can be advantageously kept small.

In the present example, the tilting joint device 308.7 connects a first interface section 308.21 of the support device 308.2 in an articulated manner to the second interface section 308.6 of the support device 308.2, the first interface section 308.21 being designed to connect the support device 308.2 to the support structure 309, while the second interface section 308.6 is designed to connect the optical Element 308.1 is formed on the support device 308.2.

In the present example, a particularly compact configuration is achieved in that the respective adjustment device 308.3 and the support device 308.2 do not protrude beyond a (virtual) prismatic space, which is defined by a displacement of the optical element 308.1 along the degree of freedom of adjustment TSF (similar to this in 2 indicated by the dash-two-dotted contour 111). However, it can also be provided that the adjusting device 308.3 protrudes slightly beyond this prismatic space, as was already explained above for the first exemplary embodiment.

It goes without saying that, in principle, a single actuating element 308.9 per tilt axis 308.8 or 308.23 of the facet unit 308 can be sufficient to set the desired tilting of the optical surface 308.4. In certain variants (as in the present example) a first adjusting element 308.9 and at least one further, second adjusting element 308.9 are provided, which is designed to be elongated along a second adjusting element longitudinal axis 308.10. The second actuating element 308.9 is arranged and designed in such a way that a displacement, which is introduced into the first end 308.11 of the second actuating element 308.9 in a second degree of freedom of adjustment TSF2, adjusts a tilting of the optical surface 308.4 about a tilting axis of the optical element 308.1.

The tilting axis 308.23 assigned to the second actuating element 308.9 can be different from the tilting axis 308.8, about which the first actuating element 308.9 adjusts the tilting. This can be achieved particularly easily if the first and second adjusting elements 308.9 are moved in a circumferential direction of the optical element 308.1 by less than 180° (for example by approximately 60° to 120°, preferably by 80° to 300°, in particular by approximately 90°). are offset from one another. In these cases (as in the present example), the tilting joint device 308.7 is designed so that it also provides tilting about this second tilting axis. For this purpose, the tilting joint device 308.7 can be designed, for example, in the manner of a ball joint or (as in the present example) in the manner of a universal joint. An appropriately designed solid-state joint is still preferred.

In other variants, the tilting axis assigned to the second actuating element 308.9 (as in the present example) can also coincide with the tilting axis 308.8, around which the first actuating element 308.9 adjusts the tilting.

The second degree of freedom of adjustment TSF2 can also be a translational degree of freedom that runs along the longitudinal axis 308.10 of the second adjustment element 308.9. The first degree of freedom of adjustment TSF1=TSF and the second degree of freedom of adjustment TSF2 can be inclined to one another by a maximum of 20°, preferably by a maximum of 30°, preferably by a maximum of 5°, in particular the first degree of freedom of adjustment TSF1 and the second degree of freedom of adjustment TSF2 can be at least substantially parallel to one another run or coincide with each other as in the present example (TSF1 = TSF2 = TSF). This enables particularly compact configurations to be achieved.

In the present example, a displacement that is introduced in the first degree of freedom of adjustment TSF1 = TSF in the first end of the first actuating element 308.9 of the respective pair of actuating elements 308.24 or 308.25, and a displacement that is introduced in the second degree of freedom of adjustment TSF2 = TSF in the first end of the second actuating element 308.9 of the respective actuating element pair 308.24 or 308.25 is introduced, a tilting of the optical surface about the same tilting axis 308.8 or 308.23 of the optical element 308.1.

The first control element 308.9 and the second control element 308.9 of the respective control element pair 308.24 and 308.25 can act like antagonists, as in the present example. The first and second actuating elements 308.9 are connected to the optical element 308.1 on different sides of the respective tilt axis 308.8 and 308.23 in such a way that a displacement of the first actuating element 308.9 in the first degree of freedom of adjustment TSF1 = TSF results in an opposite displacement of the second actuating element 308.9 in the second Degree of freedom TSF2 = TSF. This results in a particularly favorable design, which in particular prevents the optical element 308.9 from migrating around the tilting axis from the adjusted position in the event of thermally caused expansion the facet unit 308, in particular the two adjusting elements 308.9, counteracts.

The present invention has been described above exclusively using examples from the field of microlithography. However, it is understood that the invention can also be used in connection with any other optical applications, in particular imaging methods at other wavelengths, in which similar problems arise with regard to the tilting adjustment of components in a small installation space.

Furthermore, the invention can be used in connection with the inspection of objects, such as so-called mask inspection, in which the masks used for microlithography are examined for their integrity, etc. Wafer 105.1 is then replaced by 1 for example, a sensor unit that captures the image of the projection pattern of the reticle 104.1 (for further processing). This mask inspection can then take place at essentially the same wavelength that is used in the later microlithography process. However, any wavelengths that deviate from this can also be used for the inspection.

The present invention was finally described above using concrete exemplary embodiments, which show concrete combinations of the features defined in the following patent claims. It should be expressly pointed out at this point that the subject matter of the present invention is not limited to these combinations of features, but all other combinations of features, as resulting from the following patent claims, also belong to the subject matter of the present invention.

QUOTES INCLUDED IN THE DESCRIPTION

This list of documents listed by the applicant was generated automatically and is included solely for the better information of the reader. The list is not part of the German patent or utility model application. The DPMA assumes no liability for any errors or omissions.

Cited patent literature

• DE 10205425 A1 [0004]
• WO 2012175116 A1 [0005]
• DE 102008009600 A1 [0062, 0065]
• US 20060132747 A1 [0064]
• EP 1614008 B1 [0064]
• US 6573978 [0064]
• US 20180074303 A1 [0074]

Claims (19)

Optical arrangement for microlithography, in particular for the use of light in the extreme UV range (EUV), with - an optical element (108.1; 208.1; 308.1), in particular a facet element, - a passive support device (108.2; 208.2; 308.2) and - an adjusting device (108.3; 208.3; 308.3), wherein - the optical element (108.1; 208.1; 308.1) has an optical surface (108.4; 208.4; 308.4), - the support device (108.2; 208.2; 308.2) is designed to: to support the optical element (108.1; 208.1; 308.1) on a support structure (109; 309), - the support device (108.2; 208.2; 308.2) comprises a tilting joint device (108.7; 208.7; 308.7) which is designed to have at least one tilting axis (108.8 ; 208.8; 308.8, 308.23) of the optical element (108.1; 208.1; 308.1) with respect to the support structure (109; 309), - the adjusting device (108.3; 208.3; 308.3) at least in sections kinematically parallel to the support device (108.2; 208.2; 308.2) between the optical element (108.1; 208.1; 308.1) and the support structure (109; 309), - the adjusting device (108.3; 208.3; 308.3) comprises at least one adjusting element (108.9; 208.9; 308.9), which is elongated along a longitudinal axis of the adjusting element (108.10; 208.10; 308.10), - the actuating element (108.9; 208.9; 308.9) has a first end which is distant from the optical element (108.1; 208.1; 308.1) and has a second end which is adjacent to the optical element (108.1; 208.1; 308.1) and on the optical element (108.1; 208.1; 308.1) is connected, - the actuating element (108.9; 208.9; 308.9) is arranged and designed in such a way that a displacement that occurs in a degree of freedom in the first end of the actuating element (108.9; 208.9; 308.9) is introduced, a tilting of the optical surface (108.4; 208.4; 308.4) about the at least one tilting axis (108.8; 208.8; 308.8, 308.23) of the optical element (108.1; 208.1; 308.1) is adjusted, characterized in that - the degree of freedom of adjustment is a translational one Degree of freedom is along the longitudinal axis of the actuator (108.10; 208.10; 308.10). Optical arrangement according to Claim 1 , wherein - the adjusting device (108.3; 208.3; 308.3) in the area of the second end of the adjusting element (108.9; 208.9; 308.9) comprises a decoupling joint device (108.15; 208.15; 308.27) and - the adjusting element (108.9; 208.9; 308.9) via the decoupling plunger joint device (108.15; 208.15; 308.27) is connected to the optical element (108.1; 208.1; 308.1), in particular at least one of the following applies: - the decoupling joint device (108.15; 208.15; 308.27) provides at least one decoupling between the actuating element (108.9; 208.9 ; 308.9) and the optical element (108.1; 208.1; 308.1) about a decoupling axis which is at least substantially parallel to the at least one tilt axis (108.8; 208.8; 308.8, 308.23) of the optical element (108.1; 208.1; 308.1). ; - The actuating element (108.9; 208.9; 308.9) is on the side of the decoupling joint device (108.15; 208.15; 308.27) facing the optical element (108.1; 208.1; 308.1) at a connection point (108.13; 208.13; 308.13) to the optical Element (108.1 ; 208.1; 308.1) or connected to an interface section of the support device (108.2; 208.2; 308.2), via which the optical element (108.1; 208.1; 308.1) is connected to the support device (108.2; 208.2; 308.2), the connection point ( 108.13; 208.13; 308.13) is arranged offset transversely to the at least one tilt axis (108.8; 208.8; 308.8, 308.23). Optical arrangement according to Claim 2 , wherein at least one of the following applies: - the decoupling joint device (108.15; 208.15) comprises at least one solid-state joint, which in particular restricts at least one rotational degree of freedom; - the decoupling joint device (108.15; 208.15) comprises at least one leaf spring element; - The decoupling joint device (108.15; 208.15) comprises at least one bar spring element. Optical arrangement according to Claim 2 or 3 , wherein - the decoupling joint device (108.15; 208.15; 308.27) comprises an at least partially curved and / or angled spring element, in particular at least one of the following applies: - the spring element is at least partially curved in a substantially U-shaped or S-shaped manner, - a The axis of curvature of the spring element runs at least substantially parallel to the at least one tilt axis (108.8; 208.8) of the optical element (108.1; 208.1). Optical arrangement according to one of the Claims 2 until 4 , wherein - the decoupling joint device (108.15; 208.15; 308.27) is arranged adjacent to the tilting joint device (108.7; 208.7; 308.7), in particular at least one of the following applies: - the decoupling joint device (108.15; 208.15) comprises one at least in sections curved and/or angled decoupling section, in particular a bar spring section or a leaf spring section, which is immediately adjacent to the tilting joint device (108.7; 208.7) and which at least essentially follows an outer contour of the tilting joint device (108.7; 208.7); - the decoupling joint device (108.15; 208.15) is designed and arranged such that the decoupling axis is arranged adjacent, in particular immediately adjacent, to the at least one tilt axis (108.8; 208.8) of the optical element (108.1; 208.1). Optical arrangement according to one of the Claims 1 until 5 , wherein - the adjusting element (108.9; 208.9; 308.9) has an adjusting section (108.16; 208.16; 308.16) which extends between the first end and the second end of the adjusting element (108.9; 208.9; 308.9), in particular at least one of the following applies: - the adjusting section (108.16; 208.16; 308.16) forms the first end of the adjusting element (108.9; 208.9; 308.9); - the adjusting section (108.16; 208.16; 308.16) is straight, at least in the west; - the adjusting section (108.16; 208.16; 308.16) is rod-shaped, at least in the west, in particular designed in the manner of an elongated, slender rod; - the adjusting section (108.16; 208.16; 308.16) is designed to be elongated along the longitudinal axis of the adjusting element (108.10; 208.10; 308.10), the adjusting section (108.16; 208.16; 308.10) being in particular at least over 50% of its length, preferably at least over 80% of its length, further preferably at least over essentially 100% of its length, in a recess (108.17; 208.22; 308.17) of the support device (108.2; 208.2; 308.2), in particular at least essentially in the recess (208.22; 308.17) of the support device (208.2; 308.2 ) runs sunk; - The adjusting section (108.16; 208.16) extends, in particular from the first end of the adjusting element (108.9; 208.9), to a decoupling joint device (108.15; 208.15) of the adjusting device (108.3; 208.3), via which the adjusting element (108.9; 208.9) is connected to the optical element (108.1; 208.1). Optical arrangement according to Claim 6 , wherein - the adjusting section (308.16) is designed as a slender section elongated along a longitudinal axis of the adjusting section (308.10), which has at least one spring section (308.27) which is designed to be resilient along the longitudinal axis of the adjusting section (308.10), in particular at least one of the following applies : - the at least one spring section (308.27) is designed in the manner of a spiral spring, the spring axis of which runs along the longitudinal axis of the adjusting section (308.10); - The adjusting section (308.16) has at least one rod section (308.28), the at least one spring section (308.27) having a first rigidity along the longitudinal axis of the adjusting section (308.10) and the at least one rod section (308.28) having a second rigidity along the longitudinal axis of the adjusting section (308.10). has, wherein the first stiffness is less than the second stiffness, the first stiffness in particular 0.001% to 0.1%, preferably 0.008% to 0.08%, more preferably 0.01% to 0.03%, of the second stiffness amounts; - the at least one spring section (308.27) forms a decoupling joint device which provides at least decoupling between the actuating element (308.9) and the optical element (308.1) about a decoupling axis, the decoupling axis being at least substantially parallel to the at least one tilting axis (308.8 ; 308.23) of the optical element (308.1). Optical arrangement according to Claim 7 , wherein - the actuating element (308.9) is connected to the optical element (308.1) at a connection point (308.13) or to an interface section (308.6) of the support device (308.2), via which the optical element (308.1) is connected to the support device (308.2). is connected, the connection point (308.13) being arranged offset transversely to the at least one tilt axis (308.8), in particular at least one of the following applies: - the connection point (308.13) is formed on a connection element (308.26) which is connected to the optical element (308.1) or the interface section of the support device (308.2); - The connection point (308.13) is formed on a connection element (308.26), which is designed such that the connection point (308.13) lies along a longitudinal axis of the actuating element (108.10; 208.10) on a side of the at least one tilt axis (308.8) facing away from the optical element (308.1). ) is arranged; - the connection point (308.13) is formed on a connection element (308.26) which has a substantially T-shaped or L-shaped cross section in a sectional plane which contains the actuating element longitudinal axis (108.10; 208.10) and the connection point (308.13); - The connection point (308.13) is formed on a connection element (308.26) which has a pin-shaped first connection element section (308.33) and a, in particular plate-shaped, second connection element section (308.34), the first connection element section (308.33) being at a first end of the connection element ment (308.26) is connected to the optical element (308.1) or the interface section (308.6) of the support device (308.2) and the second connection element section (308.34) is arranged at a second end of the connection element (308.26) and forms the connection point (308.13), wherein the second connecting element section (308.34) extends in particular in a main extension plane, which in particular runs at least substantially perpendicular to a longitudinal axis of the first connecting element section (308.33). Optical arrangement according to one of the Claims 1 until 8th , wherein - the support device (108.2; 208.2; 308.2) is designed to be inserted into a recess (109.1; 309.1) of the support structure (109; 309), - the optical element (108.1; 208.1; 308.1) in an assembled state is arranged on a first side of the support structure (109; 309) and the recess (109.1; 309.1) extends to a second side of the support structure (109; 309.1), which faces away from the optical element (108.1; 208.1; 308.1), wherein in particular at least one of the following applies: - the adjusting element (108.9; 208.9; 308.9) is designed to extend in the assembled state through the recess (109.1; 309.1) of the support structure (109; 309) to the second side of the support structure (109; 309), the first end protruding in particular from the recess (109.1; 309.1); - The adjusting element (108.9; 208.9; 308.9) is designed, in the area of the first end, to fix a tilt of the optical surface (108.4; 208.4; 308.4) about the at least one tilt axis (108.8; 208.8; 308.8, 308.23) of the optical element (108.1; 208.1; 308.1), which was set in an adjustment state, to be connected to the support device (108.2; 208.2; 308.2) and / or the support structure (109; 309). Optical arrangement according to Claim 9 , wherein - the support device (108.2; 208.2; 308.2) is designed to extend in the assembled state through the recess in the support structure (109; 309) to the second side of the support structure (109; 309), in particular at least One of the following applies: - the support device (108.2; 208.2; 308.2) is connected, in particular releasably connected, to the support structure (109; 309) in the assembled state in the area of the second side of the support structure (109; 309); - the support device (108.2; 208.2; 308.2) is in the assembled state in the area of the second side of the support structure (109; 309) connected to the support structure (109; 309) via at least one connecting element (108.19; 208.19; 308.19); - the support device (108.2; 208.2; 308.2) protrudes from the recess (109.1; 309.1) in the assembled state and is connected to the support structure (109; 309) in this area; - the support device (108.2; 208.2; 308.2) and the recess (109.1; 309.1) are designed such that the support device (108.2; 208.2; 308.2) is in an adjustment state preceding the assembled state, in which the support device (108.2; 208.2; 308.2 ) is inserted into the recess (109.1; 309.1) and can be rotated about a longitudinal axis of the recess (109.1; 309.1) with respect to the support structure (109; 309). Optical arrangement according to one of the Claims 1 until 10 , where at least one of the following applies: - the tilting joint device (108.7; 208.7; 308.7) restricts at least one rotational degree of freedom; - the tilting joint device (108.7; 208.7) is designed in the manner of a hinge joint; - the tilting joint device (308.7) is designed in the manner of a cardan joint; - Tilt joint device (308.7) defines a first tilt axis (308.8) of the optical element (308.1) with respect to the support structure (309) and a second tilt axis (308.23) of the optical element (308.1) with respect to the support structure (309), the second tilt axis (308.23 ) runs transversely to the first tilt axis (308.8), the first tilt axis (308.8) defining a first normal plane and the second tilt axis (308.23) defining a second normal plane, which in particular runs perpendicular to the first normal plane; - the tilting joint device (108.7; 208.7; 308.7) comprises at least one solid-state joint; - the tilting joint device (108.7; 208.7; 308.7) is arranged adjacent to the optical element (108.1; 208.1); - The tilting joint device (108.7; 208.7; 308.7) connects a first interface section (108.21; 308.21) of the support device (108.2; 308.2) lane with a second interface section (108.6; 308.6) of the support device (108.2; 308.2) first interface section (108.21; 308.21) is designed to connect the support device (108.2; 208.2; 308.2) to the support structure (109; 309) and the second interface section (108.6; 308.6) is designed to connect the optical element (108.1; 208.1; 308.1). the support device (108.2; 208.2; 308.2) is formed. Optical arrangement according to one of the Claims 1 until 11 , whereby - a virtual projection of the optical element (108.1; 208.1; 308.1), which takes place in the direction of the degree of freedom of movement onto a projection plane, which runs perpendicular to the degree of freedom of adjustment, defines a first projection contour (212.1), - a virtual projection of the actuating element (108.9; 208.9; 308.9), which takes place in the direction of the degree of freedom of adjustment onto the projection plane, defines a second projection contour (212.2), wherein at least one of The following applies: - the second projection contour (212.2) projects beyond the first projection contour (212.1) by a maximum of 20%, preferably a maximum of 5% to 10%, more preferably a maximum of 1% to 3%, of the area (108.4; 208.4; 308.4). second projection contour (212.2); - the second projection contour (212.2) lies at least essentially completely within the first projection contour (212.1); - The second projection contour (212.2) lies at a distance from the first projection contour (212.1) within the first projection contour (212.1). Optical arrangement according to one of the Claims 1 until 12 , whereby - the adjusting element (108.9; 208.9; 308.9) is a first adjusting element (108.9; 208.9; 308.9) and the degree of freedom of adjustment is a first degree of freedom of adjustment, - the adjusting device (108.3; 208.3; 308.3) is at least one further, second adjusting element (108.9; 208.9; 308.9), which is elongated along a second actuating element longitudinal axis (108.10; 208.10; 308.10), - the second actuating element (108.9; 208.9; 308.9) has a first end which is separated from the optical element (108.1; 208.1; 308.1) is removed, and has a second end which is adjacent to the optical element (108.1; 208.1; 308.1) and is connected to the optical element (108.1; 208.1; 308.1), - the second control element (108.9; 208.9; 308.9) is arranged in this way and it is designed that a displacement that is introduced into the first end of the second actuating element (108.9; 208.9; 308.9) in a second degree of freedom of adjustment results in a tilting of the optical surface (108.4; 208.4; 308.4) about at least one tilting axis (108.8; 208.8; 308.8, 308.23) of the optical element (108.1; 208.1; 308.1), in particular at least one of the following applies: - the second degree of freedom of adjustment is a translational degree of freedom which runs along the longitudinal axis of the second adjustment element (108.9; 208.9; 308.9), - the first degree of freedom of adjustment and the second degree of freedom of adjustment are inclined to one another by a maximum of 20°, preferably by a maximum of 10°, preferably by a maximum of 5°, in particular run at least substantially parallel to one another, - a displacement which in the first degree of freedom of adjustment extends into the first end of the first adjusting element (108.9; 208.9; 308.9), and a displacement that is introduced into the first end of the second adjusting element (108.9; 208.9; 308.9) in the second degree of freedom adjusts a tilting of the optical surface (108.4; 208.4; 308.4) about the same tilt axis (108.8; 208.8; 308.8, 308.23) of the optical element (108.1; 208.1; 308.1), - the first control element (108.9; 208.9; 308.9) and the second control element (108.9; 208.9; 308.9) are arranged and designed to act in the manner of antagonists - the first control element (108.9; 208.9; 308.9) and the second control element (108.9; 208.9; 308.) are connected to the optical element (108.1; 208.1; 308.1) on different sides of the at least one tilt axis (108.8; 208.8) such that a displacement of the first actuating element (108.9; 208.9; 308.9) in the first degree of freedom of adjustment results in an opposite displacement of the second actuating element ( 108.9; 208.9; 308.9) in the second degree of freedom. Optical arrangement according to Claim 13 , wherein - tilting joint device (308.7) defines a first tilting axis (308.8) of the optical element (308.1) with respect to the support structure (309) and a second tilting axis (308.23) of the optical element (308.1) with respect to the support structure (309), the second tilting axis runs transversely to the first tilt axis (308.8), the first tilt axis (308.8) defining a first normal plane and the second tilt axis (308.23) defining a second normal plane, which in particular runs perpendicular to the first normal plane; - the first control element (308.9) and the second control element (308.9) are arranged and designed to act in the manner of antagonists about the first tilt axis (308.8), - the first control element (308.9) and the second control element (308.9) are a first form a pair of actuating elements (308.24), - a second pair of actuating elements (308.25) is provided, which is designed in the manner of the first pair of actuating elements (308.24) and acts about the second tilting axis (308.23), in particular at least one of the following applies: - the second pair of actuating elements ( 308.25) is at least essentially identical to the first pair of actuating elements (308.24); - The second pair of actuating elements (308.25) is arranged rotated relative to a longitudinal axis (308.14) of the support device (308.2) by 45° to 90°, preferably 60° to 90°, more preferably 80° to 90°, relative to the first pair of actuating elements (308.24). . Optical arrangement according to one of the Claims 1 until 14 , whereby at least one of the following applies: - the optical surface (108.4; 208.4; 308.4) has an area of 0.1 mm ² to 200 mm ² , preferably 0.5 mm ² to 100 mm ² , more preferably have 1.0 mm ² to 50 mm ² ; - the optical surface (108.4; 208.4; 308.4) has a maximum dimension of 2 mm to 50 mm, preferably 3 mm to 25 mm, more preferably 4 mm to 10 mm; - the optical surface (108.4; 208.4; 308.4) is an at least essentially flat surface; - The optical surface (108.4; 208.4; 308.4) is a reflective surface. Optical module, in particular facet mirror, with at least two, in particular a plurality N, of optical arrangements (108; 208; 308) according to one of Claims 1 until 12 , wherein in particular at least one of the following applies: - the optical arrangements (108; 208; 308) are connected to a common support structure (109; 309); - the majority N is 100 to 100,000, preferably 100 to 10,000, more preferably 1,000 to 10,000; - The optical elements (108.1; 208.1; 308.1) of at least two optical arrangements (108; 208; 308) are arranged relative to one another to form a narrow gap, the gap having a gap width and the gap width in an assembled state 0.01 mm to 0 .2 mm, preferably 0.02 mm to 0.1 mm, more preferably 0.04 mm to 0.08 mm. Optical imaging device, in particular for microlithography, with - an illumination device (102) with a first optical element group (102.2), - an object device (103) for recording an object (103.3), - a projection device (104) with a second optical element group ( 104.1) and - an image device (105), wherein - the illumination device (102) is designed to illuminate the object (103.3) and - the projection device (104) is designed to project an image of the object (103.3) onto the image device (105). , characterized in that - the lighting device (102) and/or the projection device (104) has at least one optical module (102.8). Claim 16 includes. Method for supporting an optical element (108.1; 208.1), in particular a facet element, of an imaging device for microlithography, in particular for the use of light in the extreme UV range (EUV), in which - the optical element (108.1; 208.1; 308.1) , which has an optical surface (108.4; 208.4; 308.4), is supported on a support structure (109; 309) by means of a passive support device (108.2; 208.2; 308.4), wherein - at least one tilt axis (108.8; 208.8; 308.8) of the optical Element (108.1; 208.1; 308.1) is defined with respect to the support structure (109; 309) by a tilting joint device (108.7; 208.7; 308.7) of the support device (108.2; 208.2; 308.2), - an adjusting device (108.3; 208.3; 308.3) at least in sections kinematically parallel to the support device (108.2; 208.2; 308.2) between the optical element (108.1; 208.1; 308.1) and the support structure (109; 309), - the adjusting device (108.3; 208.3; 308.3) has at least one adjusting element (108.9; 208.9; 308.9), which is elongated along an actuating element longitudinal axis (108.10; 208.10; 308.10), - the actuating element (108.9; 208.9; 308.9) has a first end which is distant from the optical element (108.1; 208.1; 308.1), and has a second end which is adjacent to the optical element (108.1; 208.1; 308.1) and is connected to the optical element (108.1; 208.1; 308.1), - the control element (108.9; 208.9; 308.9) is arranged and designed in such a way that through a displacement that is introduced into the first end of the actuating element (108.9; 208.9; 308.9) in a degree of freedom, a tilting of the optical surface (108.4; 208.4; 308.4) about the at least one tilt axis (108.8; 208.8; 308.4) of the optical Element (108.1; 208.1; 308.4) is adjusted, characterized in that - the degree of freedom of adjustment is a translational degree of freedom which runs along the longitudinal axis of the actuator element (108.10; 208.10; 308.10). Optical imaging method, in particular for microlithography, in which - an illumination device (102), which has a first optical element group (102.2), illuminates an object (103.3) and - a projection device (104), which has a second optical element group (104.1). , an image of the object (103.3) is projected onto an image device (105), characterized in that - at least one optical element (108.1; 208.1; 308.1) of the lighting device (102) and / or the projection device (104) by means of a method Claim 18 is supported,

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