DE102020200371A1 - Facet mirror for an illumination optics for projection lithography - Google Patents

Abstract

A facet mirror for illumination optics for projection lithography has a multiplicity of facets (11) which are assigned to a multiplicity of facet groups (7). A plurality of actuators (26) is also provided, one of the actuators (26) being assigned to exactly one of the facet groups (7). The respective actuator (26) has a transmission means (27) which is mechanically connected to all facets (11) of the assigned facet group (7). The actuator (26) is designed such that a displacement of all facets (11) of the assigned facet group (7) can be controlled via the transmission means (27). The result is a facet mirror in which an actuation effort for a given facet subdivision of the facet mirror can be handled.

Description

The invention relates to a facet mirror for an illumination optics for projection lithography. The invention also relates to the illumination optics with such a facet mirror, a method for positioning the facets of a facet mirror of such an illumination optics, an optical system with such an illumination optics, such an illumination optics or such an optical system with a light source, a projection exposure system with such an optical system , a method for producing a micro- or nano-structured component or such a projection exposure system and a structured component produced in this way.

Illumination optics for EUV projection lithography are known from DE 10 2015 200 531 A1 , US 2011/0001947 A1 as well as from the US 8,817,233 B2 .

It is an object of the present invention to develop a facet mirror in such a way that an actuation effort for a given facet subdivision of the facet mirror can be handled.

According to the invention, this object is achieved by a facet mirror with the features specified in claim 1.

According to the invention, it was recognized that an assignment of exactly one actuator to all facets of a facet group greatly reduces the number of actuators required to control the facets of a facet mirror, the facet groups of which are divided into individual facets, for specifying different lighting settings. In particular, it was recognized that it is sufficient to predefine well-defined relative displacement positions of all facets of the respective facet group for the displacement of all facets of a respective facet group. However, complete independence of the displacement of all facets of a respective facet group is not necessary, so that a displacement of all facets of the respective facet group via a plurality of independent actuators assigned to precisely one facet group is not necessary. The displacement of the facets that can be controlled via the transmission means can be a displacement by at least one of the degrees of freedom of translation and / or a displacement by at least one of the degrees of freedom of rotation. An operating state of the transmission means can correspond to exactly one set of predetermined displacement positions of the facets of the facet groups assigned to the actuator. Such an operating state can be, for example, a curvature operating state in which the facets of the respective facet group are displaced in such a way that the facet group as a whole approximately has a predetermined curvature of a reflection surface. In this way, a focal length of the facet group can be predefined in an adjustable manner for optimizing the imaging conditions of the facet mirror. Relatively or additionally, the operating state can be a tilting operating state in which all facets of the facet groups are displaced and / or tilted in order to specify an overall tilting of the facet group. The respective facet group can have the function of a field facet of a field facet mirror, which is often monolithic in the prior art. Such field facets are known, for example, from US 8,817,233 B2 .

An embodiment of the transmission means according to claims 2 or 3 has been found to be particularly suitable for specifying certain operating states. Alternatively or in addition, stops can be provided for specifying corresponding facet displacement positions. The transmission elements can have levers, deflection elements and transmission elements. The spring elements can be designed as compression and / or tension springs.

A control unit according to claim 4 leads to the reproducible specification of the transmission medium operating states. In particular, it can be a programmable control unit.

In a control unit according to claim 5, a simple change between different operating states of the transmission means is possible.

Position parameters according to claim 6, via which a transmission medium operating state can be parameterized, can be spatial coordinates of the translation and / or angular coordinates of the rotation, for example at least one displacement path in at least one of the three spatial directions and / or a tilt angle by at least one of the three possible, one to another vertical tilting axes.

Position parameters from claims 7 and 8 have proven to be particularly suitable for causing curvatures or tilting of the facet groups, which are particularly suitable for use of the facet mirror for specifying a specific lighting setting. Different further position information of the facets of the respective facet group can be assigned to the individual tilt angle or the global tilt angle, for example translation coordinates, in particular in a direction perpendicular to a reflection arrangement plane of the facet mirror.

The advantages of an illumination optics according to claim 9 correspond to those which have already been explained above with reference to the facet mirror. Each of the facet groups then corresponds to a field facet of an illumination optics known from the prior art with monolithic field facets, for example disclosed in US Pat US 8,817,233 B2 .

A positioning method according to claim 10 makes it possible to store the respective operating states of the respective transmission means of each facet group for a specific lighting setting in the form of a table, for example, so that when selecting the lighting setting to be specified, all facet groups are placed in the displacement positions of the assigned facets assigned to these operating states. In particular, illumination settings with advantageously small degrees of pupil filling can be realized in this way, that is to say with good imaging of light source spots in a pupil plane of the illumination optics.

The advantages of an optical system according to claim 11, an illumination optics or an optical system according to claim 12, a projection exposure system according to claim 13, a manufacturing method according to claim 14 and a micro- or nanostructured component according to claim 15 correspond to those mentioned above with reference to Illumination optics according to the invention and the facet mirror according to the invention have already been explained.

The light source can be an EUV light source.

In particular, a semiconductor component, for example a memory chip or a chip for data processing, can be produced with the projection exposure system.

• 1 schematisch und in Bezug auf eine Beleuchtungsoptik im Meridionalschnitt eine Projektionsbelichtungsanlage für die Mikrolithografie;
• 2 perspektivisch und etwas weniger schematisch eine Führung von Beleuchtungslicht in der Beleuchtungsoptik nach 1 zwischen einem Zwischenfokus und einem Pupillenfacettenspiegel, wobei Randstrahlen zweier Ausleuchtungskanäle zwischen einem Feldfacettenspiegel und dem Pupillenfacettenspiegel hervorgehoben sind.
• 3 eine Aufsicht auf eine Facettenanordnung einer weiteren Ausführung eines Feldfacettenspiegels der Beleuchtungsoptik der Projektionsbelichtungsanlage nach 1;
• 4 zwei Facettengruppen, unterteilt in jeweils fünf Facetten des Facettenspiegels nach 3 mit jeweils einem dieser beiden Facettengruppen zugeordneten Aktor, der über ein Übertragungsmittel zur Verlagerung aller Facetten der jeweils zugeordneten Facettengruppe ansteuerbar ist;
• 5 eine der Facettengruppen nach 4 mit dem dieser Facettengruppe zugeordneten Aktor in einer Neutralstellung der Facetten der Facettengruppe (Neutral-Betriebszustand);
• 6 die Baugruppe nach 5 in einem Betriebszustand des Übertragungsmittels des Aktors, der einem Satz vorgegebener Verlagerungspositionen der Facetten der Facettengruppe entspricht und durch den eine vorgegebene Krümmung der gesamten Facettengruppe in der Zeichenebene der 6 erzielt ist (Krümmungs-Betriebszustand);
• 7 in einer zu den 5 und 6 ähnlichen Darstellung die Baugruppe nach 5 in einem weiteren Betriebszustand des Übertragungsmittels des Aktors, bei der die Facetten der Facettengruppe so verlagert sind, dass zum einen eine Krümmung der Facettengruppe und zum anderen eine Gesamtverkippung der Facettengruppe resultiert (Verkippungs-/Krümmungs-Betriebszustand).

Embodiments of the invention are explained in more detail below with reference to the drawing. In this show:

• 1 a projection exposure system for microlithography schematically and in relation to an illumination optics in meridional section;
• 2 in perspective and somewhat less schematically a guidance of illuminating light in the illuminating optics according to 1 between an intermediate focus and a pupil facet mirror, with marginal rays of two illumination channels between a field facet mirror and the pupil facet mirror being emphasized.
• 3 a plan view of a facet arrangement according to a further embodiment of a field facet mirror of the illumination optics of the projection exposure system 1 ;
• 4th two facet groups, each subdivided into five facets of the facet mirror 3 each with an actuator assigned to these two facet groups, which can be controlled via a transmission means to move all facets of the respectively assigned facet group;
• 5 one of the facet groups 4th with the actuator assigned to this facet group in a neutral position of the facets of the facet group (neutral operating state);
• 6th the assembly according to 5 in an operating state of the transmission means of the actuator which corresponds to a set of predetermined displacement positions of the facets of the facet group and by means of which a predetermined curvature of the entire facet group in the plane of the drawing 6th is achieved (curvature mode);
• 7th in one to the 5 and 6th similar representation the assembly according to 5 in a further operating state of the transmission means of the actuator, in which the facets of the facet group are displaced such that on the one hand a curvature of the facet group and on the other hand a total tilting of the facet group results (tilting / curvature operating state).

A projection exposure machine 1 for microlithography is used to manufacture a micro- or nano-structured electronic semiconductor component. A source of light 2 emits EUV radiation used for lighting in the wavelength range, for example, between 5 nm and 30 nm. At the light source 2 it can be a GDPP source (plasma generation by gas discharge, gas discharge produced plasma) or an LPP source (plasma generation by wafer, wafer produced plasma). A radiation source based on a synchrotron is also for the light source 2 applicable. The person skilled in the art can find information on such a light source in, for example US 6,859,515 B2 . For lighting and imaging within the projection exposure system 1 becomes EUV illuminating light or illuminating radiation 3 utilized. The EUV illumination light 3 passes through after the light source 2 first a collector 4th , which can be, for example, a nested collector with a multi-shell structure known from the prior art or, alternatively, an ellipsoidally shaped collector. A corresponding collector is from the EP 1 225 481 A2 known. After this collector 4th the EUV illuminating light passes through 3 first an intermediate focus IF in an intermediate focus plane 5 what to separate the EUV illumination light 3 can be used by unwanted radiation or particles. After passing through the intermediate focus plane 5 hits the EUV illuminating light 3 first on a field facet mirror 6th . In the intermediate focus plane 5 has a total bundle of illuminating light 3 a numerical aperture NA _IF .

Basically it can be used as the illuminating light 3 Light with a longer wavelength can also be used, for example DUV light with a wavelength of 193 nm.

To facilitate the description of positional relationships, a Cartesian global xyz coordinate system is shown in the drawing. The x-axis runs in the 1 perpendicular to the plane of the drawing and out of it. The y-axis runs in the 1 to the right. The z-axis runs in the 1 up.

To facilitate the description of positional relationships in individual optical components of the projection exposure system 1 a Cartesian local xyz or xy coordinate system is also used in each of the following figures. Unless otherwise described, the respective local xy coordinates span a respective main arrangement plane of the optical component, for example a reflection plane. The x-axes of the global xyz coordinate system and the local xyz or xy coordinate systems run parallel to one another. The respective y-axes of the local xyz or xy coordinate systems have an angle to the y-axis of the global xyz coordinate system, which corresponds to a tilt angle of the respective optical component about the x-axis.

2 shows a guide of the illumination light 3 between the intermediate focus IF via reflective facet groups 7th of the field facet mirror 6th towards pupil facets 8th one in the beam path of the illuminating light 3 downstream pupil facet mirror 9 . Lighting channels 10 this beam guidance are each through one of the facet groups 7th of the field facet mirror 6th and through one pupil facet each 8th of the pupil facet mirror 9 given. In the 2 are two examples of these illumination channels 10 highlighted.

At the field facet mirror 6th it is a facet group facet mirror.

At the pupil facet mirror 9 it is a further facet mirror.

3 shows an example of a facet arrangement of facets or individual mirrors 11 of the field facet mirror 6th . Five of the facets lying next to each other in the x-dimension 11 are exactly one of the facet groups 7th assigned. This is in the 3 indicated only for one of the facet groups, namely the facet group arranged at the top right 7th . In fact, all are facet groups 7th of the field facet mirror 6th in the same way in the x-dimension in five facets 11 divided. So it is compared to the number of facet groups 7th five times the number of facets 11 in front. With alternative versions of the field facet mirror 6th can per facet group 7th also fewer facets, for example 2, 3 or 4 facets 11 or it can be per facet group 7th also more facets 11 , for example 6, 7, 8, 10, 12, 15, 20, 25 or even more facets 11 to be available. Also a y-subdivision of the respective facet group 7th in facets 11 is possible what is in the 3 for the facet group 7th is indicated at the bottom right, in two facets 11 is divided along a dashed boundary line. Also a combination according to the subdivisions on the one hand in the x and on the other hand in the y dimension per facet group 7th is possible. With the facets 11 it can be a flat mirror. Alternatively it is possible that the facets 11 are executed concave or convexly curved.

The facet groups 7th are rectangular and each have the same x / y aspect ratio. The x / y aspect ratio can, for example, be 12/5, can be 25/4 or can be 104/8.

The facet groups 7th give a reflective surface of the field facet mirror 6th in front and are arranged in four columns. The facet group arrangement of the field facet mirror points between the two middle facet columns and halfway up the facet arrangement in the y dimension 6th Gaps 12th in which the field facet mirror 6th by holding spokes of the collector 4th can be shadowed.

The facets 11 represent individual mirrors from which one of the facet groups 7th is constructed by a plurality of such individual mirrors.

After reflection on the field facet mirror 6th this is achieved in bundles of rays or partial bundles that form the individual illumination channels 10 are assigned, split EUV illumination light 3 on a pupil facet mirror 9 . The facet groups 7th of the field facet mirror 6th can be tilted between several illumination tilt positions, so that a beam path of the respective facet group 7th reflected illumination light 3 changed in its direction and thus the Point of impact of the reflected illuminating light 3 on the pupil facet mirror 9 can be changed.

The pupil facets 8th of the pupil facet mirror 9 can be arranged side by side in rows and columns, or hexagonally or in some other way. Each from one of the facet groups 7th reflected partial bundle of the EUV illuminating light 3 , i.e. every illumination channel 10 , is at least one of the pupil facets 8th assigned, so that in each case an acted upon pair with one of the facet groups 7th and one of the pupil facets 8th the illumination channel 10 for the associated partial bundle of the EUV illuminating light 3 pretends. The channel-wise assignment of the pupil facets 8th to the facet groups 7th takes place as a function of a desired illumination by the projection exposure system 1 , which is also known as a lighting setting.

The field facet mirror 6th has several hundred of the facet groups 7th , for example 300 facet groups 7th . The pupil facet mirror 9 can have a number of pupil facets which is at least as large as the sum of the tilt positions of all facet groups 7th of the field facet mirror 6th .

In a variant not shown, the pupil facet mirror is 9 constructed as a MEMS mirror array with a large number of tiltable individual mirrors, with each of the pupil facets 8th is formed by a plurality of such individual mirrors. Such a structure of the pupil facet mirror 9 is known from US 2011/0001947 A1 .

Via the pupil facet mirror 9 (see. 1 ) and a subsequent one from three EUV mirrors 14th , 15th , 16 existing transmission optics 17th become the facet groups 7th superimposed on one another in an object plane 18th the projection exposure system 1 pictured. The EUV mirror 16 is designed as a mirror for grazing incidence (grazing incident mirror). In the object level 18th is an object in the form of a reticle 19th arranged, of which with the EUV illumination light 3 an illumination area is illuminated in the form of an illumination field, which is illuminated with an object field 20th a downstream projection optics 21st the projection exposure system 1 coincides. The object field illumination channels are in the object field 20th superimposed. The EUV illumination light 3 is from the reticle 19th reflected.

The facet groups 7th can each have a rectangular outer contour, as in the 3 is shown, or a curved, arched outer contour which can be adapted to a corresponding curvature of an outer contour of the object field 20th .

A total bundle of illuminating light 3 at the object field 20th has an object-side numerical aperture NA, which can for example be in the range between 0.04 and 0.15.

The projection optics 21st forms the object field 20th in the object level 18th in an image field 22nd in one image plane 23 from. In this picture plane 23 is a wafer 24 arranged, which carries a photosensitive layer, which during the projection exposure with the projection exposure system 1 is exposed. During the projection exposure, both the reticle 19th as well as the wafer 24 that are carried by the respective holders are scanned in a synchronized manner in the y-direction. The projection exposure system 1 is designed as a scanner. The scanning direction y is also referred to below as the object displacement direction.

The field facet mirror 6th , the pupil facet mirror 9 and the mirrors 14th to 16 the transmission optics 17th are components of a lighting optics 25th the projection exposure system 1 . With a variant of the lighting optics 25th that are in the 1 is not shown, the transmission optics 17th also partially or completely omitted, so that between the pupil facet mirror 9 and the object field 20th no further EUV mirror, exactly one further EUV mirror or exactly two further EUV mirrors can be arranged. The pupil facet mirror 9 can be in an entrance pupil plane of the projection optics 21st be arranged.

Together with the projection optics 21st forms the lighting optics 25th an optical system of the projection exposure system 1 .

4th shows two facet groups lying next to each other 7th of the field facet mirror 6th each with five facets or individual mirrors 11 . X-distances between neighbors of these facets 11 are in the 4th shown exaggerated.

One actuator each 26th , the one in the z-direction behind a plane of arrangement of the reflection surfaces of the facet groups 7th is arranged, is exactly one of the facet groups 7th assigned. At the actuator 26th it can be a piezoelectric actuator.

Each of the actuators 26th has a means of transmission 27 , that with the facets 11 the assigned facet group 7th mechanically connected is what is in the 4th ff. is indicated by arrows. The respective actuator 26th is designed so that via the transmission medium 27 a shift in all facets 11 the assigned facet group 7th is controllable. This displacement can be a displacement of at least one of the degrees of freedom of translation and / or rotation. In which Means of transmission 27 it can be a purely mechanical coupling element. With exactly one driven element, namely the respective actuator 26th , can be accessed via the transmission medium 27 then the various relocation positions of the individual facets 11 depending on the operating status of the transmission medium 27 pretend.

An operating state of the transmission medium 27 of the respective actuator 26th corresponds exactly to a set of predetermined displacement positions of the facets 11 of the actuator 26th assigned facet group 7th .

The means of transmission 27 can be used as a mechanical transmission medium with gear elements 29 be executed, which are not shown in detail in the drawing and each of the facets 11 the assigned facet group 7th according to the mechanical connections indicated 28 assigned. Alternatively or additionally, the mechanical connection 28 of the transmission medium 27 with the facets 11 Spring elements 30th have, which are also only schematically shown in the drawing for one of the mechanical connections 28 are indicated and in turn each of the facets 11 the assigned facet group 7th assigned.

With the actuators 26th there is a control unit 31 the projection exposure system 1 in a manner not shown in signal connection. Via the control unit 31 can have several operating states of the transmission medium 27 of the respective actuator 26th are controlled, which are in the shifting positions of the facets 11 of the actuator 26th assigned facet group 7th distinguish.

5 to 7th show by way of example three such operating states of the transmission medium 27 .

5 shows a neutral operating state of the transmission means 27 where the actuator 26th via the control unit 31 is controlled so that the respective shift positions of the facets 11 an overall flat group of facets 7th surrender. All facets 11 have the same z position in this neutral operating state and are, for example, in comparison to a neutral plane, parallel to the xy plane of the 5 lies, not tilted. Another neutral tilt position can also be present in the neutral operating state.

$${\mathrm{\phi }}_2={\text{n}}_2\cdot \mathrm{\alpha }$$

$${\mathrm{\phi }}_3={\text{n}}_3\cdot \mathrm{\alpha }$$

$${\mathrm{\phi }}_4={\text{n}}_4\cdot \mathrm{\alpha }$$

$${\mathrm{\phi }}_5={\text{n}}_5\cdot \mathrm{\alpha }$$

6th shows the assembly 5 in a curvature operating state of the transmission means 27 of the actuator 26th . The five facets 11 ₁ , 11 ₂ , 11 ₃ , 11 ₄ and 11 ₅ the associated facet group 7th are each at different angles φ _i tilted about a tilt axis parallel to the y-axis. For this angle φ _i the following relationship applies: $${\mathrm{\phi }}_1={\text{n}}_1\cdot \mathrm{\alpha }$$

$${\mathrm{<figure-callout\; id="2"\; label="\phi "\; filenames="DE102020200371A1\_0006.png"\; state="\{\{state\}\}">\phi </figure-callout>}}_2={\text{<figure-callout id="2" label="n" filenames="DE102020200371A1\_0006.png" state="{{state}}">n</figure-callout>}}_2\cdot \mathrm{\alpha }$$

$${\mathrm{<figure-callout\; id="3"\; label="\phi "\; filenames="DE102020200371A1\_0006.png,DE102020200371A1\_0007.png"\; state="\{\{state\}\}">\phi </figure-callout>}}_3={\text{<figure-callout id="3" label="n" filenames="DE102020200371A1\_0006.png,DE102020200371A1\_0007.png" state="{{state}}">n</figure-callout>}}_3\cdot \mathrm{\alpha }$$

$${\mathrm{\phi }}_{\mathrm{4th}}={\text{n}}_{\mathrm{4th}}\cdot \mathrm{\alpha }$$

$${\mathrm{<figure-callout\; id="5"\; label="\phi "\; filenames="DE102020200371A1\_0006.png"\; state="\{\{state\}\}">\phi </figure-callout>}}_5={\text{<figure-callout id="5" label="n" filenames="DE102020200371A1\_0006.png" state="{{state}}">n</figure-callout>}}_5\cdot \mathrm{\alpha }$$

Here is φ _i (i = 1 to 5) the tilt angle of the respective facet 11 _i (i = 1 to 5). n _i is a tilt factor that is determined by the respective transmission medium 27 is specified. α is a basic tilt angle that is controlled by the actuator 26th is specified.

In the curvature operating state of the transmission means 27 after 6th φ ₁ = φ ₅ and φ ₂ = φ ₄ as well as φ ₃ = 0. So n ₄ = -n ₂ , n ₅ = -n ₁ and n ₃ = 0 applies.

7th Fig. 13 shows a tilt / curvature operating state of the transmission means 27 . In addition to the tilt angles φ _i , which, now starting from a basic tilting plane 32 , the tilt angles φ _i the curvature operating state according to 6th correspond, lies behind in the tilt / curvature operating state 7th a basic tilt δ of the basic tilt plane 32 to the xy plane, again around a tilt axis parallel to the y axis.

In each case one of the operating states according to the 5 to 7th is therefore about at least one of the facets 11 assigned position parameters can be parameterized. In the case of the position parameters that are transmitted via the transmission medium 27 are specified depending on the operating state, it is the spatial coordinates xo, yo, zo of the translation and / or the angle coordinates α (= ε), β (= φ), γ of the rotation or tilting around the respective coordinate axis x, y , e.g. The position parameter can thus be, for example, at least one tilt angle and / or a z displacement coordinate z ₀ .

The z-coordinates are according to the curvature operating state 6th so to the tilt angle φ _i adapted so that there is a concave curvature of the facet group 7th with a given radius of curvature. About the size of the respective tilt angle φ _i and the z coordinates of the facets 11 _i adapted to this can be the size of this total radius of curvature of the facet group 7th be adjusted. Overall, depending on the operating state of curvature of the transmission means 27 an overall curvature of the facet group 7th and thus a focal length of the facet group 7th set. This can be used to optimize an image of the intermediate focus IF on the respective pupil facet 8th of the pupil facet mirror 9 be used.

The tilting of the entire group of facets can be performed simultaneously by means of the tilt angle δ and a further tilt angle ε (tilt about an axis parallel to the x-axis) 7th about the respective operating status of the transmission medium 27 can be specified, so that a facet group tilting corresponding to a facet tilting results, which is used to specify a respective pupil facet 8th a plurality of possible maneuverable pupil facets 8th can be used to set an illumination setting from a plurality of possible illumination settings. Corresponding field facets that can be displaced between different illumination tilt positions are known from US Pat US 8,817,233 B2 , the US 6,658,084 B2 and the US 7,196,841 B2 . This allows the specification of an illumination setting, that is to say a distribution of illumination angles for illuminating the object field. Examples of lighting settings are known from, among others DE 10 2008 021 833 A1 .

• Zunächst wird der Feldfacettenspiegel 6 mit den Facettengruppen 7 und der Pupillenfacettenspiegel 9 mit den Pupillenfacetten 8 bereitgestellt. Anschließend wird ein Beleuchtungssetting, beispielsweise ein konventionelles Beleuchtungssetting mit Ausleuchtung aller Pupillenfacetten 8 eines zentralen Bereiches des Pupillenfacettenspiegels 9, ein annulares Beleuchtungssetting mit Beleuchtung einer ringförmigen Pupillenfacetten-Anordnung auf dem Pupillenfacettenspiegel 9 oder ein Dipol-, Quadrupol- oder sonstiges Multipol-Setting, wobei eine entsprechende Anzahl von Bereichen von Pupillenfacetten 8 auf dem Pupillenfacettenspiegel 9 beleuchtet werden. Weiterhin wird mit diesem Beleuchtungssetting die verknüpfte Zuordnung der Facettengruppen 7 des Feldfacettenspiegels 6 und der Pupillenfacetten 8 des Pupillenfacettenspiegels 9 zu den Ausleuchtungskanälen 10 entsprechend dem Beleuchtungssetting vorgegeben. Anschließend werden die Übertragungsmittel 27 der Aktoren 26 des Feldfacettenspiegels 6 zur Vorgabe von Verlagerungspositionen aller Facetten 11 der den Aktoren jeweils zugeordneten Facettengruppen 7 des Feldfacettenspiegels 6 über die Steuereinheit 31 angesteuert.

For positioning the facets 11 of the field facet mirror 6th the lighting optics 25th proceed as follows:

• First is the field facet mirror 6th with the facet groups 7th and the pupil facet mirror 9 with the pupil facets 8th provided. This is followed by an illumination setting, for example a conventional illumination setting with illumination of all pupil facets 8th of a central area of the pupil facet mirror 9 , an annular illumination setting with illumination of an annular pupil facet arrangement on the pupil facet mirror 9 or a dipole, quadrupole or other multipole setting, with a corresponding number of areas of pupil facets 8th on the pupil facet mirror 9 be illuminated. Furthermore, the linked assignment of the facet groups is made with this lighting setting 7th of the field facet mirror 6th and the pupillary facets 8th of the pupil facet mirror 9 to the illumination channels 10 specified according to the lighting setting. Then the transmission means 27 of the actuators 26th of the field facet mirror 6th for specifying relocation positions of all facets 11 of the facet groups assigned to the actuators 7th of the field facet mirror 6th via the control unit 31 controlled.

The control units only control the respective operating state. The means of transmission 27 then sets the shift of the respective facets depending on the activated operating state 11 the associated facet group 7th around.

The projection exposure system is used to produce a micro- or nano-structured component 1 used as follows: First, the reflection mask 19th or the reticle and the substrate or the wafer 24 provided. A structure is then created on the reticle 19th onto a photosensitive layer of the wafer 24 using the projection exposure system 1 projected. A micro- or nanostructure is then created on the wafer by developing the light-sensitive layer 24 and thus the microstructured component is generated.

QUOTES INCLUDED IN THE DESCRIPTION

This list of the documents listed by the applicant was generated automatically and is included solely for the better information of the reader. The list is not part of the German patent or utility model application. The DPMA assumes no liability for any errors or omissions.

Patent literature cited

• DE 102015200531 A1 [0002]
• US 2011/0001947 A1 [0002, 0031]
• US 8817233 B2 [0002, 0005, 0011, 0052]
• US 6859515 B2 [0017]
• EP 1225481 A2 [0017]
• US 6658084 B2 [0052]
• US 7196841 B2 [0052]
• DE 102008021833 A1 [0052]

Claims (15)

Facet mirror (6) for an illumination optics (25) for projection lithography, - With a plurality of facets (11) which are assigned to a plurality of facet groups (7) - With a plurality of actuators (26), - One of the actuators (26) being assigned to exactly one of the facet groups (7), - wherein the respective actuator (26) has a transmission means (27) which is mechanically connected to all facets (11) of the assigned facet group (7), - The actuator (26) being designed in such a way that a displacement of all facets (11) of the assigned facet group (7) can be controlled via the transmission means (27). Facet mirror after Claim 1 , characterized in that the transmission means (27) is designed as a mechanical transmission means with gear elements (29) which are each assigned to the facets (11) of the assigned facet group (7). Facet mirror after Claim 1 or 2 , characterized in that the transmission means (27) has spring elements (30) which are each assigned to the facets (11) of the assigned facet group (7). Facet mirror after one of the Claims 1 to 3 , characterized by a control unit (31) which is in signal connection with the actuators (26). Facet mirror after Claim 4 , characterized in that several operating states of the transmission means (27) of an actuator (26) can be controlled via the control unit (31) which differ in the displacement positions of the facets (11) of the facet group (7) assigned to the actuator (26). Facet mirror after Claim 5 , characterized in that in each case an operating state can be parameterized via at least one position parameter (φ, δ, ε, x, y, z) assigned to the respective facet (11). Facet mirror after Claim 6 , characterized in that the position parameters (φ, δ, ε, x, y, z) include at least one individual tilt angle on φ _i , via which one of the facets (11) of the associated facet group (7) is tilted in the respective operating state . Facet mirror after Claim 6 or 7th , characterized in that the position parameters (φ, δ, ε, x, y, z) include at least one global tilt angle (δ) via which facets (11) of the associated facet group (7) are tilted in the respective operating state. Illumination optics with a facet mirror according to one of the Claims 1 to 8th for guiding illuminating light partial bundles along an illuminating light beam path into an object field (20) in which a lithography mask (19) can be arranged, and with an overlaying image of the facet groups (7) of the facet mirror (6) into the Object field (20). Method for positioning the facets (11) of a facet mirror (6) of an illumination optics for projection lithography with the following steps: - Providing a facet group facet mirror (6) according to one of the Claims 1 to 8th - Provision of a further facet mirror (9), with illumination channels (10) through which the illumination light (3) is guided through the illumination optics (25), through one facet group (7) of the facet group facet mirror (6) and through one facet (8) of the further facet mirror (9) are specified, - specification of an illumination setting and an assignment of the facet groups (7) of the facet group facet mirror (6) and the facets (8) of the further facet mirror (9) to the illumination channels, which is linked to this lighting setting (10), - controlling the transmission means (27) of the actuators (26) of the facet group facet mirror (6) for specifying displacement positions of all facets (11) of the facet groups (7) assigned to the actuators (26), depending on the specified lighting setting. Optical system with lighting optics according to Claim 9 and with projection optics (21) for imaging the object field (20) in an image field (22) in which a substrate (24) can be arranged, onto which a section of the object (10) to be imaged is to be imaged. Lighting optics according to Claim 9 or optical system Claim 11 with a light source (2) for the illuminating light (3). Projection exposure system (1) with an optical system Claim 12 and with a light source (2) for the illuminating light (3). Method for producing a structured component with the following method steps: - providing a reticle (19) and a wafer (24), - projecting a structure on the reticle (19) onto a light-sensitive layer of the wafer (24) using the projection exposure system Claim 13 - Generating a micro- and / or nanostructure on the wafer (24). Structured component, manufactured using a process according to Claim 14 .

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