DE102016101019A1 - Coating arrangement and method for coating a tape substrate - Google Patents

Abstract

According to various embodiments, a coating assembly (100) may include: a transport device (106) for transporting a tape substrate (120) within a coating chamber (802), the tape substrate (120) having a first surface (120a) and a second surface (120b). with the two surfaces (120a, 120b) facing each other; a coating device (102) for coating the tape substrate (120) in a coating space (104) of the coating chamber (802), wherein the transport device (106) is arranged and arranged relative to the coating device (102) such that the tape substrate (120) Coating the first surface (120a) along a first transport direction (111a) through a first region (104a) of the coating space (104), and that the ribbon substrate (120) coating the second surface (120a) along a second transport direction (111b). wherein the first transport direction (111a) is different from the second transport direction (111b), the coating device (102) having an electron source and an electron sink associated with the electron source between which for coating the tape substrate (120), an electric current in the coating the electron source contributes to the coating in both the first region (104a) and the second region (104b).

Description

The invention relates to a coating arrangement and a method for coating a tape substrate.

Generally, tape substrates (e.g., metal tapes, films, or other flexible substrates) can be coated (and / or otherwise treated) in a coating line (e.g., in a continuous coating line or in a batch coater). In this case, for example, a belt substrate can be transported through a coating area of a coating chamber by means of a transport system. For example, the transport system may be configured to process the tape substrate roll-to-roll, wherein the tape substrate is unwound from a first substrate winding roll, transported through the coating region, and rewound after coating on a second substrate winding roll. In this case, the coating chamber may be configured as a vacuum chamber so that the tape substrate can be vacuum coated, for example, the tape substrate may be vapor deposited, e.g. chemical vapor deposition (CVD) or physical vapor deposition (PVD). For example, in a so-called air-to-air (air-to-air) configuration, the tape substrate may be brought into and / or out of the vacuum chamber by means of a plurality of sluices (e.g., sluice gates or roller sluices). Alternatively, the two rolls for winding and unwinding the tape substrate may be introduced into the vacuum chamber, so that the vacuum chamber must be cyclically ventilated to replace the tape substrate.

For example, various embodiments are based on coating a tape substrate (alternately or additionally irradiated, cleaned, eg, etched, mechanically treated, etc.) within a processing chamber, with the substrate being transported (eg, deflected and guided within the process chamber) both opposing surfaces of the tape substrate are coated in the same coating space, wherein the coating material is provided substantially only from one direction. Illustratively, the coating material may be provided by only one processing source (e.g., only one magnetron or only one electron beam source, etc.) and propagate in the coating space toward the tape substrate. By means of a suitably arranged transport device, the tape substrate may be passed through at least part of the coating space a first time, so that a first side of the tape substrate is coated, and then the tape substrate may be passed a second time through at least one other part of the coating space, so that a second side of the tape substrate is coated. Overall, therefore, the tape substrate can be processed by means of, for example, only one processing device, e.g. be coated by means of only one coating device. This allows fewer coating devices to be used, which saves costs and space.

Various embodiments are based, for example, on providing a transport device for transporting a tape substrate, wherein the transport device is set up in such a way that two different sections of the tape substrate are transported simultaneously in a processing area (eg coating area) along different directions, wherein one Processed portion of a first side of the tape substrate and the other portion of the first side opposite the second side of the tape substrate is processed.

A tape substrate (tape-shaped substrate) may have a first surface on a first side and may have a second surface on a second side.

According to various embodiments, a processing assembly (eg, a coating apparatus and / or a substrate pretreatment apparatus) may include: a transport apparatus for transporting a tape substrate within a processing chamber, the tape substrate having a first surface (s) and a second surface (s) a second side), the two surfaces (or both sides) facing each other; a processing device for processing the tape substrate in a processing chamber of the processing chamber, wherein the transport device is arranged and arranged relative to the processing device, that transports the tape substrate for processing the first surface (or first side) along a first transport direction through a first region of the processing space is transported, and that the tape substrate for processing the second surface (or second side) along a second transport direction through a second region of the processing space, wherein the first transport direction is different from the second transport direction, wherein the processing device exactly one electron source (with eg a power supply).

According to various embodiments, the electron source may provide electrons which supply the electrical current (electrical Current flow) effect. The electrical current may comprise a flow of charge carriers, for example of electrons (negative charge carriers) and / or of ions (positive charge carriers). For example, the electron source may emit electrons into free space (eg, a vacuum region), eg, in the case of an electron beam gun. Alternatively, the electron source can neutralize the ions by means of the electrons. In either case, a flow of negative electrical charge is formed away from the electron source (eg, negative charge carrier negative charge transport away from the electron source and / or positive charge carrier electrical charge transport toward the electron source).

According to various embodiments, the electron source and / or the electron sink may adjoin the coating space (may also be referred to as coating area).

According to various embodiments, a coating arrangement may include: a transport device for transporting a tape substrate within a coating chamber, the tape substrate having a first surface and a second surface, the two surfaces facing each other; a coating apparatus for coating the tape substrate in a coating space of the coating chamber, the transport apparatus being arranged and arranged relative to the coating apparatus such that the tape substrate for coating the first surface along a first transport direction is transported through a first region of the coating space and the tape substrate is for Coating the second surface is transported along a second transport direction through a second region of the coating chamber, wherein the first transport direction is different from the second transport direction, wherein the coating device exactly one electron source (may also be referred to as a current source) and an electron sink associated with the electron source also referred to as current sink), between which for the coating of the tape substrate, an electric current flows in the coating space, wherein the Elek tronenquelle contributes to the coating in both the first region and in the second region.

According to various embodiments, the electron source may contribute substantially equal to the coating in the first region as well as in the second region. In essence, it can be understood that a relative deviation is less than about 50%, e.g. less than about 30%, e.g. less than about 10%, e.g. less than about 5%, e.g. less than about 2%, e.g. less than about 1%.

According to various embodiments, the contribution may be understood as the coating device emitting a coating material into the first region and into the second region. In other words, the coating device may generate a flow of coating material in the direction of the first region and the second region. For example, a main propagation direction of the coating material emitted from the coating apparatus may be directed between the first area and the second area, or may be directed to one of the areas (e.g., the first area or the second area), e.g. when they are contiguous. The first region and the second region may have a substantially equal distance from the coating device (or its coating material).

According to various embodiments, a substrate roll may also be referred to as a substrate winding roll (i.e., configured to wind and / or unwind a substrate). The substrate winding roll may be configured to support a tubular carrier from which the substrate is to be unwound and / or onto which the substrate is to be wound.

According to various embodiments, the electron source may comprise a sputtering electrode (may also be referred to as a magnetron target) and the electron sink may comprise a further sputtering electrode or an anode. The sputter electrode may be a magnetron cathode. The anode may be a fixed spatial anode, e.g. a pipe or a sheet. Between the anode and the sputter electrode, a direct electrical current can flow.

According to various embodiments, the electron sink may include or be formed from a coating material.

If the electron sink has a sputtering electrode, the two sputtering electrodes may be part of a double tube magnetron or a double planar magnetron. The two sputter electrodes may be configured for AC operation. In other words, the electric current between the two sputtering electrodes can change direction. Then, each of the sputtering electrodes can be alternately operated as a sputtering cathode and sputtering anode.

In either case, the sputter electrode may also be referred to as a magnetron cathode, regardless of its mode of operation.

According to various embodiments, the electron source may comprise an electron beam gun and the electron sink may comprise at least one crucible for receiving a coating material.

According to various embodiments, the electron sink may comprise a coating material with which the tape substrate is to be coated. If the electron source has a sputtering electrode, the electron source may comprise a coating material.

According to various embodiments, the coating arrangement may further comprise: a further coating device which has exactly one further electron source and further electron sinks associated with the electron source, between which another electric current flows in the coating space for coating the tape substrate, the further electron source for coating both contributes in the first region and in the second region and wherein the further electron sink and the electron sink are arranged transversely to the first transport direction and / or second transport direction side by side. Illustratively, several coating devices can be used, e.g. to coat the substrate over its entire width. The further coating device can be configured analogously to the coating device.

In the following, a magnetron or electron beam source is often referred to simply, wherein the magnetron and the electron beam source represent the electron source. According to various embodiments, the expression "exactly one magnetron" and / or "exactly one electron beam gun" can also be understood as "exactly one electron source". The coating device may comprise the electron sinks associated with the electron source (between which the current flow is formed).

According to various embodiments, a coating arrangement may include: a transport device for transporting a tape substrate within a coating chamber, the tape substrate having a first surface and a second surface, the two surfaces facing each other; a coating apparatus for coating the tape substrate in a coating space of the coating chamber, the transport apparatus being arranged and arranged relative to the coating apparatus such that the tape substrate for coating the first surface along a first transport direction is transported through a first region of the coating space and the tape substrate is for Coating the second surface is transported along a second transport direction through a second region of the coating chamber, wherein the first transport direction is different from the second transport direction, wherein the coating device has exactly one magnetron or exactly one electron beam gun, which for coating both in the first region and contributes in the second area.

According to various embodiments, a processing device may be configured as a coating device. The coating device may have exactly one coating source, e.g. exactly one electron beam gun, one magnetron, one thermal evaporator, etc. The number of vapor sources generated by the exact one coating source may vary, e.g. For example, one or more vapor sources may be generated by only one coating source. By way of example, (gaseous) coating material can be emitted into a coating space by means of the one or more vapor sources. For example, the multiple vapor sources can be sequentially irradiated (by means of the same energy supply).

For example, if a magnetron is used, for example, a single planar magnetron or a single tube magnetron with only one magnetron cathode (also referred to as a target) can be used, i. vividly only a plasma source. Alternatively, a double planar magnetron or a double tube magnetron with exactly two magnetron cathodes can be used, clearly with exactly two plasma sources, the two plasma sources forming a functionally coherent unit. It is essential that the magnetron is set up as only a functional unit, for example coupled to me exactly one power supply or controlled or regulated with exactly one control-regulating device. In other words, the coating space can be assigned to exactly one control-regulating device, by means of which a vapor characteristic in the coating space is controlled and / or regulated.

If, for example, an electron beam gun (eg comprising an electron emitter, a beam generator and a beam deflector) is used, at least one vapor source can be generated by means of the electron beam gun on a target material which is received in a crucible, for example. The vapor source used is locally melted target material by means of the electron beam, which is emitted substantially perpendicularly away from the surface of the target material (eg in a main propagation direction). In the so-called Springstrahlverfahren, whereby the electron beam is directed to different areas of the target material by means of at least one beam deflector, a plurality of vapor sources and / or a vapor source with a predefined geometric pattern (irradiation figure) can be generated. Overall, exactly one electron beam evaporator can be used, which is set up as only one functional unit, for example coupled to exactly one power supply or controlled or controlled by exactly one control-regulating device. In this case, the number of irradiated by means of exactly one electron gun can be suitably chosen, for example, a crucible or more crucibles can be used, for example two to ten crucibles. Thus, for example, by means of the electron beam gun also several mutually different materials are evaporated, for example, one material per pot.

According to various embodiments, a coating arrangement may include: a transport device for transporting a tape substrate within a coating chamber, the tape substrate having a first surface and a second surface, the two surfaces facing each other; a coating device for coating the tape substrate in a coating chamber of the coating chamber, wherein the transport device is arranged and arranged relative to the coating device such that the tape substrate for coating (eg during coating, eg during the entire coating) of the first surface (or first side) along a first transport direction through a first area (first coating portion) of the coating space and that the tape substrate for coating (eg during coating, eg during the entire coating) of the second surface (or second side) along a second transport direction through a second area (second coating portion) of the coating space is transported, wherein the first transport direction is different from the second transport direction, wherein the coating device has exactly one magnetron or exactly one electron beam gun ,

The coating apparatus may include one or more vapor sources, wherein at least one vapor source of the one or more vapor sources emits material vapor into both the first region and the second region.

According to various embodiments, the coating space may define an amount of energy needed to provide material vapor in at least the first region and the second region. The coating apparatus may accurately comprise a power supply (e.g., a plasma source or a radiation source such as an electron beam source) which provides the amount of energy. The energy supply may be arranged to sequentially energize the plurality of vapor sources (e.g., sequentially irradiate or alternately excite a plasma, as in a double magnetron) by means of the same energy supply.

According to various embodiments, a tape substrate may be transported from roll to roll, wherein the tape substrate may have a width in a range of about 50 cm to about 500 cm, or a width of more than about 500 cm. Furthermore, the tape substrate may be flexible, and e.g. a material thickness (also referred to as substrate thickness) in a range of about 0.01 mm to about 3 mm, depending on the elasticity of the material used. In this case, the tape substrate may comprise at least one material from the following group of materials: a metal (eg, aluminum, copper, iron, steel, platinum, gold, etc.), a plastic (eg, a polymer), a composite material (eg, carbon fiber reinforced Carbon, or carbon fiber reinforced plastic). The tape substrate may also be provided in the form of a fibrous material (comprising, for example, glass fibers, carbon fibers, metal fibers and / or plastic fibers), e.g. in the form of a woven fabric, a net, a knitted fabric, a knitted fabric, or as a felt or fleece.

In this case, the surface of the tape substrate may have a complex structure. Illustratively, the tape substrate, when in the form of a fibrous material, may define two surfaces between which the tape substrate extends, which surfaces may be referred to as surfaces.

According to various embodiments, the two regions of the coating space may be arranged adjacent to one another and / or adjoin one another.

According to various embodiments, the two transport directions may be directed opposite to each other (eg, to run towards each other or away from each other). Alternatively, the two transport directions may include an angle in a range of about 10 ° to about 170 °, ie, the two transport directions are aligned at a predefined angle to each other. Alternatively or additionally, the transport path, along which the substrate is guided, may extend in a curved manner in the first region and / or in the second region. The transport direction of a curved transport path corresponds in each case to a spatially averaged transport direction.

According to various embodiments, the electron source and the electron sinks may be coupled to precisely one electrical generator for providing the electrical current. Clearly, the generator for supplying the electron source and he electron sink can be set up with electrical energy.

According to various embodiments, the magnetron or the electron beam gun may be coupled to or be used to supply exactly one electrical generator to the magnetron or the electron beam gun. Clearly, the generator can be configured as a generator arrangement with a plurality of generators, which are then set up as a functional unit, e.g. be controlled or regulated with exactly one control-regulating device.

The generator may be configured to provide the coater with the required electrical energy. The generator may have an electrical supply input, with which this electrical energy (eg, having exactly one electrical voltage) receives (eg from an electrical supply network), and have an electrical supply output, at which this required by the coating device electrical energy (eg having one or more electrical voltages and / or one or more electrical currents) and / or supplying them. For example, the generator may include at least one transducer configured to convert electrical energy having a first energy characteristic (e.g., electrical voltage, electrical power, and / or electrical current) into electrical energy having a second energy characteristic (other than the first energy characteristic).

According to various embodiments, the transport device may comprise a plurality of deflection rollers for deflecting the belt substrate in the respective transport direction.

For example, the transport device may comprise two rollers (may also be referred to as substrate winding rollers) for providing and / or transporting the belt substrate by means of the plurality of deflection rollers from one of the two rollers to the other of the two rollers. Illustratively, one roll may be an unwind roll from which the tape substrate is unwound, and the other roll may be a take-up roll on which the tape substrate is rewound.

The transport device, e.g. the plurality of diverting pulleys may define the transport path along which the substrate is transported through the coating chamber. A first portion of the transport path (first part path) may pass through the first area of the coating space, and a second portion of the transport path (second part path) may pass through the second area of the coating space. Along the first part-path, the coating device (or its at least one vapor source) may face the first surface (or first side). For example, the first partial path or area of the coating space may be defined by (e.g., total) coating the first surface (or first side), e.g. while the coating device (or its at least one vapor source) faces the first surface (or first side). Along the second partial path, the coating device (or its at least one vapor source) may face the second surface (or second side). For example, the second subpath or second region of the coating space may be defined by (e.g., total) coating the second surface (or second side), e.g. while the coating device (or its at least one vapor source) faces the second surface (or second side).

A first length of the first part-path and / or a second length of the second part-path may be greater than a distance of the first part-path (e.g., a first pulley) from the second part-path (e.g., a second pulley). Alternatively or additionally, the distance of the first part-path from the second part-path may be greater than at least one of the following: a distance of the first part-path from the coating device; a distance of the second part-path from the coating device; a diameter of a transport roller (e.g., a pulley) defining respectively the first part path and the second part path; an extension of the coating space; a distance of a take-up roll from an unwinding roll; a diameter of the take-up roll and / or the take-off roll.

According to various embodiments, the plurality of deflection rollers may be arranged relative to at least one of the two rollers, in that one band section of the band substrate to be coated after passing through the first region and before passing through the second region around the at least one of the two rollers in one Distance is guided around (eg with opposite directions of rotation).

According to various embodiments, a coating arrangement may include comprising: a transport device for transporting a tape substrate within a coating chamber, the tape substrate having a first surface and a second surface, respectively, the two surfaces facing each other; a coating apparatus for coating the tape substrate in a coating space within the coating chamber, the transport apparatus being arranged and arranged relative to the coating apparatus such that the tape substrate is transported through the coating space along a first transport direction to coat the first surface (or first side) in that the tape substrate for coating the second surface (or second side) along a second transport direction is transported through the coating space, wherein the two transport directions are opposite or relative to each other at an angle in a range of about 10 ° to about 170 °.

The angle may have a value in a range of about 10 ° to about 170 °, e.g. in a range of about 20 ° to about 160 °, e.g. in a range of about 30 ° to about 150 °, e.g. in a range of about 40 ° to about 140 °, e.g. in a range of about 50 ° to about 130 °, e.g. in a range of about 60 ° to about 120 °, e.g. in a range of about 70 ° to about 110 °, e.g. in a range of about 80 ° to about 100 °, e.g. in a range of about 85 ° to about 95 °, e.g. about 90 °.

According to various embodiments, a coating arrangement may comprise: a transport device for transporting a tape substrate within a coating chamber, wherein the tape substrate has a first surface and a second surface, the two surfaces; two sides) face each other; a coating apparatus for coating the tape substrate in a coating room, wherein the transport apparatus is arranged and arranged relative to the coating apparatus such that the tape substrate for coating the first surface along a first transport direction is transported through the coating space and the tape substrate for coating the second surface (or second side) along a second transport direction is transported through the coating space, wherein the two transport directions are directed opposite to each other.

According to various embodiments, a coating arrangement may include: a coating device defining a coating space (e.g., into which material vapor generated by the coating device propagates); a transport device defining a transport path (eg, a transport surface) within a coating chamber for transporting a tape substrate along the transport path (s), the tape substrate having a first surface (eg along a normal vector of the transport surface) and a transport surface second surface or second side (eg, opposite to the normal vector of the transport surface), the two surfaces (or two sides) facing each other; wherein the transport device is arranged and arranged relative to the coating device such that a first section of the transport path for coating the first surface (ie, when the normal vector points to the coating device) along a first transport direction through the coating space and that a second portion of the transport path for coating the second surface or second side (ie when the normal vector points away from the coating device) along a second transport direction through the coating space, wherein the two transport directions are different from each other, eg directed away from one another and / or towards each other, e.g. at an angle to each other. The two transport directions can e.g. be directed away from, or toward, a common point in the coating space.

According to various embodiments, a coating arrangement may include: a coating device defining a coating space (eg, into which material vapor generated by the coating device propagates); a transport device defining a transport path within a coating chamber for transporting a tape substrate along the transport path, the tape substrate having a first surface (eg, along a normal vector of the transport surface) and a second surface, the two Surfaces or both sides facing each other; the transport path having a first portion for coating the first surface and the first side, respectively, the first portion and the coating device being adjacent to each other (ie, passing the coating device a minimum distance); and wherein the transport path has a second portion for coating the second surface and the second side, respectively, the second portion and the coating apparatus being adjacent to each other (ie, passing the coating apparatus at a minimum distance); wherein the two sections are different in at least their transport directions. The transport directions of the two sections may, for example, be directed away from, or toward, a common point in the coating space.

According to various embodiments, a coating arrangement may include: a coating apparatus for generating a material vapor in a coating space, the coating apparatus having an electron source and an electron sink associated with the electron source, between which an electric current flows in the coating space to generate the material vapor; a transporting device for transporting a tape substrate along a transport path which passes through the coating space, a first part of the transporting path and a second part of the transporting path in the coating space having opposite transporting directions; wherein the transporting device is arranged such that the electron source, when transporting the tape substrate along the first part and the second part, contributes to coating opposing sides of the tape substrate.

The first transport direction may comprise a first directional component, and the second transport direction may be a second directional component, wherein the first directional component and the second directional component are opposite. The first transport direction may comprise a further directional component, and the second transport direction may comprise a further directional component, wherein the further directional components may vary spatially, e.g. if the transport path is curved, e.g. along a circular path.

According to various embodiments, a method for coating a tape substrate may include: generating a material vapor in a coating region by means of an electric current flow between an electron source and at least one electron sink associated with the electron source within a coating chamber (e.g., within the coating space); Transporting a respective band portion of the band substrate to be coated through the coating area such that a first surface of the band portion is coated; and deflecting the band portion and then transporting the band portion through the coating area such that a second surface of the band portion opposite the first surface is coated.

According to various embodiments, the method may further comprise: operating the electron source and the electron sink (e.g., the electron beam source or the magnetron) by means of exactly one electric generator. The electrical current flow can take place through the coating space.

According to various embodiments, a method for coating a tape substrate may include: generating a material vapor in a coating space by means of precisely one coating device within a coating chamber; Transporting a respective band portion of the band substrate to be coated through the coating space such that a first surface or first side of the band portion is coated; and deflecting the band portion and then transporting the band portion through the coating space such that a second surface or second side of the band portion facing the first surface or first side is coated.

According to various embodiments, a method of coating a tape substrate may include: generating a material vapor in a coating space by means of an electron beam source or by means of a magnetron within a coating chamber; Transporting a respective band portion of the band substrate to be coated through the coating space such that a first surface or first side of the band portion is coated; and deflecting the band portion and then transporting the band portion through the coating space such that a second surface or second side of the band portion facing the first surface or first side is coated.

According to various embodiments, a method for coating a tape substrate may include: generating a material vapor in a coating space by means of exactly one electron beam source or by means of exactly one magnetron (the magnetron has, for example, exactly one magnetron target or exactly two juxtaposed magnetron targets) inside a coating chamber; Transporting a respective band portion of the band substrate to be coated through the coating space such that a first surface or first side of the band portion is coated; and deflecting the band portion and then transporting the band portion through the coating space such that a second surface or second side of the band portion facing the first surface or first side is coated.

In this case, the method may further comprise: operating the electron beam source or the magnetron by means of exactly one electrical generator (having exactly one power supply and / or exactly one control-regulating device).

According to various embodiments, the tape substrate may be coated in the coating space only from one direction. The double-sided coating of the tape substrate is realized, for example, by turning the tape substrate after passing through the coating chamber for the first time and then passing through the coating chamber a second time.

According to various embodiments, the coating space may have two regions (e.g., a first coating region and a second coating region), the tape substrate being coated in both regions by the same coating device. The tape substrate is guided by means of the transport device such that in the first coating region the first surface (or first side) of the substrate is coated. In this case, for example, the first surface (or first side) of the substrate faces the coating device (for example the at least one material vapor source). The tape substrate is further guided by means of the transport device such that in the second coating region, the second surface (or second side) of the substrate is coated. In this case, for example, the second surface (or second side) of the substrate faces the coating device (for example the at least one material vapor source).

As used herein, a metal (also referred to as a metallic material) may comprise (or be formed of) at least one metallic element (i.e., one or more metallic elements), e.g. at least one element from the following group of elements: copper (Cu), iron (Fe), titanium (Ti), nickel (Ni), chromium (Cr), platinum (Pt), gold (Au), magnesium (Mg), Aluminum (Al), zirconium (Zr), tantalum (Ta), molybdenum (Mo), tungsten (W), vanadium (V), barium (Ba), indium (In), calcium (Ca), hafnium (Hf), Samarium (Sm), silver (Ag), and / or lithium (Li). Alternatively or additionally, a metal may also include or be formed from a metallic compound, e.g. an alloy and / or an intermetallic compound.

Embodiments of the invention are illustrated in the figures and are explained in more detail below.

Show it

1A and 1B a coating arrangement according to various embodiments in a schematic side view or cross-sectional view in a method according to various embodiments;

2A and 2 B a coating arrangement according to various embodiments in a schematic side view or cross-sectional view in a method according to various embodiments;

3A and 3B a coating arrangement according to various embodiments in a schematic side view or cross-sectional view in a method according to various embodiments;

4 a coating arrangement according to various embodiments in a schematic side view or cross-sectional view in a method according to various embodiments;

5 a coating arrangement according to various embodiments in a schematic side view or cross-sectional view in a method according to various embodiments;

6 a coating arrangement according to various embodiments in a schematic side view or cross-sectional view in a method according to various embodiments;

7A and 7B a coating arrangement according to various embodiments in a schematic side view or cross-sectional view in a method according to various embodiments;

8A and 8B a coating arrangement according to various embodiments in a schematic side view or cross-sectional view in a method according to various embodiments;

9 a procedure 900 according to various embodiments in a schematic flow diagram; and

10 a coating arrangement according to various embodiments in a schematic cross-sectional view in a method according to various embodiments.

In the following detailed description, reference is made to the accompanying drawings, which form a part hereof, and in which is shown by way of illustration specific embodiments in which the invention is practiced can be. In this regard, directional terminology such as "top", "bottom", "front", "back", "front", "rear", etc. is used with reference to the orientation of the described figure (s). Because components of embodiments can be positioned in a number of different orientations, the directional terminology is illustrative and is in no way limiting. It should be understood that other embodiments may be utilized and structural or logical changes may be made without departing from the scope of the present invention. It should be understood that the features of the various exemplary embodiments described herein may be combined with each other unless specifically stated otherwise. The following detailed description is therefore not to be taken in a limiting sense, and the scope of the present invention is defined by the appended claims.

As used herein, the terms "connected," "connected," and "coupled" are used to describe both direct and indirect connection, direct or indirect connection, and direct or indirect coupling. In the figures, identical or similar elements are provided with identical reference numerals, as appropriate.

According to various embodiments, a transport arrangement and a processing arrangement are provided for processing (treating) a belt substrate, for example for coating a belt substrate by means of a plasma enhanced chemical vapor deposition (also referred to as PECVD coating process). In this case, the tape substrate (also referred to as a substrate) are subject to a low thermal load, so that the tape substrate in the processing area does not have to be cooled by means of an additional cooling roller (also referred to as a cooling roller). Alternatively, for example, additional cooling rolls may be provided for cooling the tape substrate.

In this case, the transport arrangement and the processing arrangement can be arranged such that the tape substrate in the processing area by means of rollers (rollers) along a substrate transport path (or along an at least partially planar and / or at least partially curved substrate transport surface) is transported the length of the transport path provided within the processing area is not limited by the diameter of the rolls. Clearly, the tape substrate can be transported and / or tensioned freely at the coating positions in the processing area.

A tape substrate may be, for example, a metal tape or a metal foil, or a plastic tape (polymer tape) or a plastic film (polymer film). According to various embodiments, the tape substrate may comprise any material, e.g. a metal, a semi-metal, a polymer, a glass, or any other material that can be processed with a correspondingly small material thickness (thickness) by means of rollers or rollers. Illustratively, a tape substrate can be any substrate that can be wound onto a roll and / or processed, for example, roll-to-roll. Depending on the material, a tape substrate may have a thickness in a range of about a few micrometers (e.g., from about 1 μm) to about a few millimeters (e.g., to about 10 mm).

According to various embodiments, the transport device described herein may be configured, e.g. having one or more concave rollers (or rollers), that the tape substrate is transported smoothly (flat) and the tape substrate does not undulate or warp illustratively, e.g. by means of so-called spreader rollers. Further, the transport device described herein may be configured to apply a predefined tension to the tape substrate, e.g. in the processing area. For example, a role of the transport assembly due to the predefined mass of the role produce a predefined tension.

According to various embodiments, treating or processing a tape substrate may include at least one of: cleaning the tape substrate, coating the tape substrate, irradiating (eg, by light, UV light, particles, electrons, ions, etc.) the tape substrate, modifying the surface of the tape substrate Tape substrate, heating the tape substrate, etching the tape substrate, and flashing the tape substrate.

According to various embodiments, bilateral treatment (e.g., coating) is provided which comprises passing through a common treatment space (e.g., coating room) twice, which can be unilaterally treated (e.g., coated) as it passes through the treatment space. This saves time and / or costs.

According to various embodiments, exactly one coating device may suffice to provide double-sided coating. Conventional coating arrangements are limited in their applicability, for example, when a substrate is transported between two coating devices (eg, once downwards and once upwards), because not everyone Coating device type (eg in liquid evaporation) is suitable for coating from different directions. According to various embodiments, a double-sided coating may or may not be provided, even if the coating apparatus type is not suitable for coating from different directions. Thus, according to various embodiments, bilateral coating may or may not be provided by means of a coating apparatus type which is conventionally unsuitable for double-sided coating.

According to various embodiments, at least one of the coating devices of a conventional coating arrangement can be saved. This saves time and / or costs.

According to various embodiments, a material vapor having a substantially uniform chemical composition may or may not be provided in the coating space. This allows a more homogeneous coating can be achieved. Clearly, it has been recognized that, when conventionally double-sided coating with two unidirectional but spatially separated coating devices, an inhomogeneous layer may result, unnecessary costs are caused by the multiple coating devices, and that each side of the substrate is only coated with a single layer can be. If e.g. striving for a multi-layer coating, take on a two-sided coating with spatially separated coating devices on the one hand, the required space and on the other hand, the complexity of the coating sequence strongly, so that coating in predetermined boundary conditions can be difficult.

When perforated substrates (e.g., a mesh and / or fabric) are coated, gaseous coating material (material vapor) passes through the perforations. The material vapor passing through the perforations may cause parasitic coating (partial coating) of the back side of the substrate. Clearly, it has been recognized that when coated on both sides with spatially separated coating devices, parasitic coating occurs in each of the coating devices, resulting in deviations from the predefined layer sequence on both sides of the substrate. According to various embodiments, a multi-layer coating may be or may be provided (e.g., both sides) with multiple layers applied to a substrate in a predefined layer sequence (e.g., A / B / ...) and chemical composition.

According to various embodiments, a flexible substrate is passed from an unwind roll initially past a first partial path (eg, predominantly positive curvature) through a first region (a first coating window) of a coating space to a coater, then around the unwind roll , and then passed on a second partial path (eg with predominantly negative curvature) past the same coating device through a second region (a second coating window) of the same coating space.

Alternatively, the transport path may be passed around the exposure device, e.g. around its crucible or its magnetron cathode around.

The coating space may have an extent along the main transport direction (from the unwind roll to the take-up roll) of less than about 2 meters, e.g. less than about 1.5 m, e.g. less than about 1 m, e.g. in a range of about 0.5 m to about 2 m. Alternatively or additionally, the coating space may have an extent along the first transport direction and / or the second transport direction of less than about 2 m, e.g. less than about 1.5 m, e.g. less than about 1 m, e.g. in a range of about 0.5 m to about 2 m.

The coating space may have an extension transverse to the main transport direction (from the take-off roll to the take-up roll) of less than about 2 meters, e.g. less than about 1.5 m, e.g. less than about 1 m, e.g. less than about 0.5 m, e.g. in a range of about 0.25 m to about 1 m. Alternatively or additionally, the coating space may have an extent along the first transport direction and / or the second transport direction of less than about 2 m, e.g. less than about 1.5 m, e.g. less than about 1 m, e.g. less than about 0.5 m, e.g. in a range of about 0.25 m to about 1 m.

The coating space may be a contiguous coating space, ie the coating device emits a coherent material vapor cloud into the coating space, eg by means of one or more vapor sources. The material vapor (material vapor cloud) provided in the coating space can have a uniform chemical composition. For example, a first chemical composition of the material vapor in the first region and a second chemical composition of the material vapor in the second region may be approximately equal. For example, the coating device can have several Each having a coating material, wherein a chemical composition of the coating materials of the plurality of vapor sources is the same.

According to various embodiments, in the first region the first side (illustratively front side) of the substrate may face the coating device, wherein in the second region the second side (illustratively rear side) of the substrate faces the coating device.

Optionally, a further coating device may be or may be provided which defines another coating space. Then the substrate along a third path (eg predominantly negative curvature) in a third area of the further coating space can be guided past a second coating device and then along a fourth path (eg with predominantly positive curvature) in a fourth area on the same further coating device ( also referred to as a second coating device) to be passed. In this case, in the third region, the second side of the substrate may face the further coating device, wherein in the fourth region the first side of the substrate faces the further coating device.

The coating apparatus may be a coating apparatus type of the following coating apparatus types: physical vapor deposition (PVD) coating apparatus type; chemical vapor deposition (CVD) coating apparatus type; or atomic layer deposition coater type. In other words, a coating technology for coating the substrate may include at least one of: PVD, CVD, or ALD.

According to various embodiments, the physical vapor deposition (PVD) coating apparatus type may include an electron beam source. Thus, a high coating rate can be achieved with low thermal substrate load. In other words, the coating may include evaporation of the coating material by means of an electron beam (electron beam evaporation).

The substrate may be guided freely between two transport rollers (e.g., pulleys) through a portion of the coating space. This can be achieved that the transport rollers of the transport device are coated as little as possible.

Optionally, a direction of the transport path in an area of the coating space may be at an angle to a main propagation direction (vapor direction) of the material vapor.

For coating, according to various embodiments, a material vapor stream (flowing material vapor) may or may not be provided. The material vapor stream may have a propagation characteristic defined by a major propagation direction and an average deviation from the main propagation direction (e.g., at an angle and / or a solid angle). The first transport direction and / or the second transport direction may be at an angle to the main propagation direction, e.g. in a range of about 10 ° to about 170 °, e.g. in a range of about 20 ° to about 160 °, e.g. in a range of about 30 ° to about 150 °, e.g. in a range of about 40 ° to about 140 °, e.g. in a range of about 50 ° to about 130 °, e.g. in a range of about 60 ° to about 120 °, e.g. in a range of about 70 ° to about 110 °, e.g. in a range of about 80 ° to about 100 °, e.g. in a range of about 85 ° to about 95 °, e.g. about 90 °.

The main propagation direction may indicate a direction in which the constituents (e.g., vapor particles) of the material vapor stream move on average (i.e., the center of gravity of the material vapor stream) with time. The center of gravity of the material vapor stream (e.g., a plurality of vapor particles or a spatial distribution of vapor particles) may be described as a weighted average of the vapor particle positions of the vapor particles. The mean deviation from the main propagation direction may be understood as a standard deviation (the directions of movement of the individual vapor particles) about the main propagation direction, weighted by the mass of the vapor particles.

In other words, the main propagation direction may be at an angle to a substrate normal (surface normal of the substrate). The substrate normal may indicate a direction perpendicular to a surface of the substrate, e.g. perpendicular to a substrate surface along which the substrate extends. It can thus be achieved that a layer thickness within perforations and / or at flank surfaces of filament substrates (for example when coating a fabric and / or a mesh) can be increased.

By setting the angle between the transport path (or the first and / or second transport direction) and the main propagation direction, a layer thickness distribution (ie a spatial distribution of the thickness of a layer deposited on the substrate) can be set ( vividly to be varied). For example, a change in the angle between the main propagation direction and the substrate surface normal along the transport path may or may not be provided. eg along the first subpath and / or the second subpath.

According to various embodiments, a coating device (i.e., its coating material), e.g. the first coating device, comprising or being formed from a metal, e.g. Cr, Cu, Ti, Au, Ag, or Pt, or be formed therefrom. Alternatively or additionally, a coating device (i.e., its coating material), e.g. the second coating device, a corrosion-resistant and / or electrically conductive material or be formed therefrom, e.g. a nitride, a carbide and / or carbon. Thereby, a layer may be formed on the substrate which has or is formed from the coating material, e.g. the nitride, the carbide and / or carbon in a carbon modification.

As an alternative or in addition to the second coating device and / or to the first coating device, a substrate pretreatment device may also be used.

According to various embodiments, a coating material and / or a layer deposited by means of the coating material (eg a protective layer) may comprise an oxide (eg a metal oxide), a ceramic, a glass, a nitride (eg a metal nitride), a carbide (eg a metal carbide) and or carbon in a carbon modification (eg, graphite, amorphous carbon, tetrahedral carbon, diamond-like carbon, diamond, amorphous tetrahedral carbon, and / or nanocrystalline carbon) or be formed therefrom.

According to various embodiments, a coating material and / or a layer deposited by means of the coating material (for example an adhesion-promoting layer) may comprise or be formed from a metal, which may be e.g. is set to enter into a chemical compound with a material of the substrate and / or with a material of a layer applied thereto (or sub-layer).

Optionally, a layer (e.g., the primer layer) or sub-layer may have a gradient in their chemical composition, e.g. along a direction away from the substrate. For example, a first chemical composition of the layer or the sub-layer near the substrate may differ from a second chemical composition of the layer or the sub-layer farther away from the substrate. The layer (e.g., the primer layer) may, for example, be or become multilayered (i.e., have multiple sublayers). For example, the second chemical composition may be similar to or similar to a chemical composition of the layer (or sub-layer) applied thereon.

According to various embodiments, a coating material and / or a layer deposited by means of the coating material (eg a current collector layer) may have an electrical conductivity of greater than approximately 10 ⁶ S / m, eg greater than approximately 2 · 10 ⁶ S / m, eg greater than approximately 5 x 10 ⁶ S / m, eg greater than about 10 ⁷ S / m, eg greater than about 2 x 10 ⁷ S / m, eg greater than about 5 x 10 ⁷ S / m, eg in a range of about 10 ⁷ S / m to about 10 × 10 ⁷ S / m. A current collector layer may include or be formed from a metal. In other words, coating the substrate on both sides may be provided by means of an electrically conductive coating material which, for example, provides a low surface contact resistance and / or a high corrosion resistance.

According to various embodiments, the surface contact resistance (ICR value, Interfacial Contact Resistance) can be measured by the substrate between two planar measuring electrodes (eg gold contact plates) is clamped, which press against each other with a predefined contact pressure (eg 150 N / cm ² ). The measuring electrodes may have with the substrate a contact surface A _C , which represents the extension of the substrate. The electrical resistance is then measured between the two measuring electrodes, ie, clearly through the substrate. In other words, the interfacial resistance between opposite sides of the substrate can be measured.

According to various embodiments, the substrate may be coated such that the coated substrate (or the layer deposited thereon) may have an interfacial resistance (eg, at a contact pressure of 150 N / cm ² ) less than about 100 mΩ · cm ² , eg less than about 50 mΩ · cm ² , eg less than about 25 mΩ · cm ² , eg less than about 10 mΩ · cm ² , eg less than about 5 mΩ · cm ² , eg less than about 1 mΩ · cm ² .

If the substrate has a perforated structure (eg a network structure and / or tissue structure) or is formed therefrom, by means of coating in accordance with various embodiments it is possible to manufacture a gas-permeable, electrically conductive structure with low cost Surface contact resistance may be provided. Such perforated structures are used by way of example as a gas diffusion layer in fuel cells. In other words, according to various embodiments, the substrate may include or be formed from a gas diffusion layer of a fuel cell.

If the substrate has a planar structure, e.g. A sheet or foil (e.g., stainless steel sheet), or formed therefrom, may be or may be provided by low cost surface-resistive fabrication of a laminar structure by various embodiments according to various embodiments. Such planar structures are used by way of example as bipolar plates in fuel cells or as electrodes in batteries. In other words, according to various embodiments, the substrate may include or be formed from a bipolar plate or an electrode of a fuel cell. Alternatively or additionally, according to various embodiments, the substrate may include or be formed from an electrode of a battery

1A illustrates a coating arrangement 100 according to various embodiments in a schematic side view or cross-sectional view (eg transversely to a rotation axis of at least one transport roller 106a . 106b . 108a . 108b cut).

The coating arrangement 100 may according to various embodiments, a transport device 106 for transporting a tape substrate 120 within a coating chamber 802 (see 7A ) exhibit.

The tape substrate 120 can be a first surface 120a (or first page 120a ) and a second surface 120b (or second page 120b ) which face each other.

Furthermore, the coating arrangement 100 a coating device 102 for coating the tape substrate 120 in a coating room 104. the coating chamber 802 exhibit. The transport device 106 can be set up and relative to the coating device 102 be arranged that the tape substrate 120 for coating the first surface 120a (or first page 120a ) along a first transport direction 111 through a first area 104a of the coating room 104. is transported and that the tape substrate 120 for coating the second surface 120b along a second transport direction 111b through a second area 104b of the coating room 104. is transported, wherein the first transport direction 111 different from the second transport direction 111b is. According to various embodiments, the two transport directions 111 . 111b be directed opposite to each other, ie at least have an opposing directional component.

The coating device 102 can be used to generate material vapor 104d from a coating material 102m be set up (ie for evaporation 104d of the coating material 102m ) and for generating a current 104d of the material vapor in the coating room 104. into it. According to various embodiments, the coating device 102 be set up in the first area 104a and the second area 104b material vapor 104d with a similar, eg same, chemical composition. In other words, the coating material 102m which is the first area 104a with material vapor 104d supplied, and the coating material 102m which is the second area 104b with material vapor 104d supplied, have a similar, for example the same, chemical composition.

Optionally, the coating device 102 exactly one electron gun 604a . 604b have (compare 7B ). The one electron gun 604a . 604b may be so controlled or be, for example by means of a control-regulating device 116 (see 7A ) that these are the coating material 102m (evaporating material 102m ) is irradiated (and thereby heated) in such a way that in the first region 104a and in the second area 104b from the coating material 102m formed material vapor 104d be or can be provided. The material vapor 104d may according to various embodiments in one or more crucibles of the coating device 102 be arranged or become.

According to various embodiments, the two regions 104a . 104b of the coating room 104. be arranged next to each other, for example, adjacent.

The transport device 106 can be a first transport role 106a (Eg a first pulley 106a ), which the first transport direction 111 defined, for example, which the transport path in the first direction of transport 111 leads, eg deflects. Furthermore, the transport device 106 a second transport role 106b (For example, a second pulley 106b ), which the second transport direction 111b defines, for example, which the transport path in the second transport direction 111b leads, eg deflects. The transport path is based on the course of the substrate 120 illustrates (for example, the transport path corresponds to the course of the substrate 120 ).

According to various embodiments, the first transport roller 106a and the second transport roller 106b a distance 126 have from each other (which the distance 126 of the first subpath and the second subpath) which is smaller than at least one of: a length of the transport path according to the first transport direction 111 (ie, a length of the first subpath); a length of the transport path according to the second transport direction 111b (ie, a length of the second subpath); a distance to the coating device 102 (eg their coating material 102m that of a vapor source); or a distance between two vapor sources of the coating device 102 from each other (eg, two magnetron cathodes from each other).

The transport path according to the first transport direction 111 can be between two first transport wheels 106a . 108a the transport device 106 run, which are adjacent to each other and / or which in the first area 104a are arranged. The transport path according to the second transport direction 111b can be between two second transport rollers 106b . 108b the transport device 106 run, which are adjacent to each other and / or which in the second area 104b are arranged. Between the first two transport wheels 106a . 108a and between the two second transport rollers 106b . 108b can the substrate 120 be curious or become. In other words, the transport path between the two first transport rollers 106a . 108a and / or between the two second transport rollers 106b . 108b linear (straight line). The distance between the two first transport rollers 106a . 108a and / or between the two second transport rollers 106b . 108b can each define a length of the subpath.

The coating room 104. can be an extension 104l along the first transport direction 111 and / or the second transport direction 111b , eg along direction 101 , less than about 2 meters, eg less than about 1.5 meters, eg less than about 1 meter.

1B illustrates a coating arrangement 100 According to various embodiments in a schematic side view or cross-sectional view (eg transverse to a rotational axis of a transport roller 106a . 106b . 108a . 108b cut), similar to the coating arrangement 100 , what a 1A is illustrated.

According to various embodiments, the two transport directions 111 . 111b an angle in a range of about 10 ° to about 170 °. In that case, the two transport directions 111 . 111b have opposite one another directional components.

The coating room 104. can be an extension 104l along the respective oppositely extending direction components (in each case the first transport direction 111 and second transport direction 111b ), eg along direction 101 , less than about 2 meters, eg less than about 1.5 meters, eg less than about 1 meter.

2A illustrates a coating arrangement 100 according to various embodiments in a schematic side view or cross-sectional view (eg, cut transversely to an axis of rotation of a transport roller), similar to the coating arrangement 100 , what a 1A is illustrated, wherein the coating device 102 a magnetron 102 or may be formed therefrom.

The magnetron 102 can at least one magnetron cathode 102k have, ie a magnetron cathode 102k or two magnetron cathodes 102k (shown in dashed lines). The magnetron cathodes 102k can of the coating material 102m have, for example in the form of a target tube. To form the material vapor 104d can the at least one magnetron cathode 102k be atomized using a plasma. The plasma can be excited by means of an electric field. In the case of the two magnetron cathodes 102k These may be used to generate an alternating electric field between them for sputtering the two magnetron cathodes 102k be set up or become. Due to the alternating electric field, the plasma of the two magnetron cathodes 102k be functionally linked together, ie form a functional plasma source.

2 B illustrates a coating arrangement 100 according to various embodiments in a schematic side view or cross-sectional view (eg, cut transversely to an axis of rotation of a transport roller), similar to the coating arrangement 100 , what a 1B is illustrated, wherein the coating device 102 a magnetron 102 or may be formed therefrom, eg similar to the magnetron 102 which is in 2A is illustrated.

The first transport role 106a may be further away from the coating device 102 be arranged as another transport role 108a the first two transport wheels 106a . 108a , The second transport role 106b may be further away from the coating device 102 be arranged as another transport role 108b the two second transport rollers 106b . 108b , This allows the material vapor 104d flatter on the substrate 120 incident.

3A illustrates a coating arrangement 100 according to different Embodiments in a schematic side view or cross-sectional view (eg, cut transversely to a rotation axis of a transport roller), similar to the coating arrangement 100 , what a 1A and or 2A and are illustrated.

The transport device 106 can be an unwinding role 206a from which the tape substrate 120 is unwound (before passing through the coating room 104. or before coating in the coating space 104. ), and a take-up roll 206b to which the tape substrate 120 is rewound (after passing through the coating room 104. , or after coating in the coating room 104. ).

According to various embodiments, the (eg, flexible) substrate may be 120 from the unwinding roll 206a starting initially along a first part path 211 (first section 211 of the transport path) through the first area 104a of the coating room 104. through, then around the unwinding roll 206a around, and then along a second subpath 211b (second part 211b of the transport path) through the second area 104b of the coating room 104. be guided through.

The first part path 211 may have a first direction of curvature, eg with a positive curvature. The second partial path 211b may have a second direction of curvature which is different from the first direction of curvature, eg with a positive curvature.

3B illustrates a coating arrangement 100 according to various embodiments in a schematic side view or cross-sectional view (eg, cut transversely to an axis of rotation of a transport roller), similar to the coating arrangement 100 , what a 2 B is illustrated, wherein the first transport roller 106a and the second transport roller 106b closer to the coating device 102 are arranged, as the other transport rollers 108a . 108b , This allows the material vapor 104d flatter on the substrate 120 incident.

4 illustrates a coating arrangement 100 according to various embodiments in a schematic side view or cross-sectional view (eg, cut transversely to an axis of rotation of a transport roller), similar to the coating arrangement 100 , what a 1A is illustrated.

According to various embodiments, the (eg, flexible) substrate may be 120 from the unwinding roll 206a starting initially along a first part path 211 are guided, which on a first coating device 102 passes by and around the unwinding roll 206a runs around. Subsequently, the substrate 120 along a third subpath 211c , which on a second coating device 402 over and around the take-up roll 206b runs around, be guided.

The first coating device 102 can be a first coating room 104. define in which the first partial path 211 runs, for example, through the first area 104a of the first coating room 104. therethrough. The second coating device 102 can be a second coating room 404 define in which the third partial path 211b runs, for example through a second area 404b of the second coating room 404 therethrough. Between the first part path 211 and the third part path 211c can the substrate 120 along the second subpath 211b which are in the first coating room 104. , eg through its second area 104b through, and in the second coating room 404 , eg through its first area 404a through, runs.

According to various embodiments, the first transport roller 106a and the second transport roller 106b (which in the first coating room 104. adjacent to each other) and / or a third transport roller 606a and a fourth transport role 606b (which in the second coating room 404 adjacent to each other) have a distance from each other which is smaller than at least one of the following: a distance of the first coating device 102 and the second coating device 402 from each other; a distance of the first subpath 211 and the third subpath 211c from each other.

Alternatively or in addition to the first coating device 102 can the coating arrangement 100 at least one substrate pretreatment device 806 exhibit. The at least one substrate pretreatment device 806 can be used to pretreat the substrate 120 be furnished. For example, the at least one substrate pretreatment device 806 be set up the substrate 120 to heat up its surface 120a . 120b chemically activate the substrate 120 to clean and / or the substrate 120 to etch, eg on both sides. For example, the at least one substrate pretreatment device 806 have an etching device or be formed therefrom for etching the substrate 120 , Alternatively or additionally, the at least one substrate pretreatment device 806 comprise or be formed from a substrate heater for heating the substrate 120 , Alternatively or additionally, the at least one substrate pretreatment device 806 at least one ion beam source, at least one sputter etching source, at least one plasma source, at least one glow device and / or at least one Ätzgasquelle have or be formed from it. For example, the at least one substrate pretreatment device 806 for reducing and / or removing a water film from the substrate 120 be furnished. Alternatively or additionally, the at least one substrate pretreatment device 806 be configured for chemical activation (ie for generating open chemical bonds), which, for example, the adhesion and the formation of a layer on the substrate 120 can improve.

5 illustrates a coating arrangement 100 according to various embodiments in a schematic side view or cross-sectional view (eg, cut transversely to an axis of rotation of a transport roller), similar to the coating arrangement 100 , what a 4 is illustrated.

According to various embodiments, the two transport directions 111 . 111b both in the first coating room 104. as well as in the second coating room 404 an angle in a range of about 10 ° to about 170 °.

6 illustrates a coating arrangement 100 according to various embodiments in a schematic side view or cross-sectional view (eg, cut transversely to an axis of rotation of a transport roller), similar to the coating arrangement 100 , what a 1A is illustrated.

According to various embodiments, the course of the transport path in the first area 104a of the first coating room 104. from the first transport role 106a be defined or become. The course of the transport path in the first area 104a of the first coating room 104. may depend on the scope of the first transport roller 106a be defined or become. For example, the substrate 120 during the (eg complete) traversal of the first area 104a of the first coating room 104. at the first transport roller 106a abutment (eg a first cooling roller 106a ).

According to various embodiments, the course of the transport path may be in the second area 104b of the first coating room 104. from the second transport roller 106b be defined or become. The course of the transport path in the second area 104b of the first coating room 104. can from the scope of the second transport roller 106b be defined or become. For example, the substrate 120 during (eg complete) traversal of the second area 104b of the first coating room 104. on the second transport roller 106b abutment (eg on a second cooling roller 106b ).

According to various embodiments, a distance of the first transport roller 106a from the second transport roller 106b smaller than a diameter of the first transport roller 106a and / or the second transport roller 106b ,

Optionally, the coating arrangement 100 the second coating device 402 comprising the second coating space 404 Are defined. Then the course of the transport path in the first area 404a of the second coating room 404 from a third transport role 606a be defined or become. The course of the transport path in the first area 404a of the second coating room 404 can from the scope of the third transport role 606a be defined or become. For example, the substrate 120 during the (eg complete) traversal of the first area 404a of the second coating room 404 at the third transport roller 606a issue. The course of the transport path in the second area 404b of the second coating room 404 from a fourth transport roller 606b be defined or become. The course of the transport path in the second area 404b of the second coating room 404 can from the scope of the fourth transport role 106b be defined or become. For example, the substrate 120 during (eg complete) traversal of the second area 404b of the second coating room 404 on the fourth transport roller 606b issue. A distance of the third transport roller 606a from the fourth transport role 606b may be smaller than a diameter of the third transport roller 606a and / or the fourth transport roller 606b ,

The first part path 211 may have a first direction of curvature, eg with a positive curvature. The second partial path 211b may have a second direction of curvature which is different from the first direction of curvature, eg with a positive curvature. Analogously, the partial paths in the second coating space 404 be set up (if available)

7A illustrates a coating arrangement 100 according to various embodiments in a schematic side view or cross-sectional view (eg, cut transversely to a rotation axis of a transport roller), which is a coating chamber 802 has, similar to the coating arrangement 100 , what a 1A is illustrated.

According to various embodiments, the coating arrangement 100 a coating chamber 802 which may be configured to generate a vacuum therein and to obtain. In other words, the coating chamber 802 be set up as a vacuum chamber. The coating chamber 802 can be, for example, airtight, dustproof and / or vacuum-tight set up or become.

Furthermore, the coating chamber 802 with a pump system 804 (comprising at least one high vacuum pump) to be coupled. The pump system 804 can be set up, the coating chamber 802 a gas (eg the process gas) to withdraw (clearly pump these), so that within the coating chamber 802 a vacuum (ie a pressure less than 0.3 bar) and / or a pressure in a range of about 10 ^-3 mbar to about 10 ^-7 mbar (in other words high vacuum) or a pressure of less than high vacuum, eg less than about 10 ^-7 mbar (in other words ultrahigh vacuum) may or may not be provided.

Furthermore, the coating chamber 802 be set up so that the vacuum conditions (the process conditions) within the coating chamber 802 (Eg process pressure, process temperature, chemical process gas composition, etc.) can be made or regulated, for example during coating, for example by means of a control-regulating device 116 ,

According to various embodiments, a controller may include a forward control path, and thus illustratively implement a flow control that converts an input into an output. The control path can also be part of a control loop, so that a control is implemented. The control has, in contrast to the pure forward control on a continuous influence of the output variable on the input variable, which is effected by the control loop (feedback). According to various embodiments, the control device may be 116 have a control and / or a control or be formed from it.

According to various embodiments, the coating arrangement 100 a gas supply 716 exhibit. By means of the gas supply 716 can the coating chamber 802 a process gas is supplied to form a process atmosphere in the coating chamber 802 , The process gas may, for example, comprise or be formed from an inert gas and / or a reactive gas. The process pressure can be formed from a balance of process gas, which by means of the gas supply 716 supplied and by means of the pump system 804 is withdrawn.

According to various embodiments, the control device may be 116 for controlling and / or regulating the gas supply 716 and / or the pump system 804 be set so that a process pressure and / or a process gas composition can be controlled and / or regulated. For example, the control rule device 116 be arranged for controlling and / or regulating a standard volume flow of process gas, which by means of the gas supply 716 supplied and / or by means of the pump system 804 is withdrawn.

In the coating chamber 802 can (eg exactly) a coating room 104. be arranged. Furthermore, in the coating chamber 802 (Exactly) a coating device 102 be arranged to generate a material flow (eg mass flow or volume flow) of gaseous coating material (material vapor stream) in the coating chamber 104. into it. The coating device 102 may optionally comprise or be formed from a thermal evaporation device, ie for thermal evaporation of the coating material 104m be set up, for example by means of an electron beam. The coating device 102 can generate the material vapor stream such that this in the coating chamber 104. can spread into it. In other words, that of the coating device 102 provided material vapor 104d in the coating room 104. stream.

According to various embodiments, the control device may be 116 for controlling and / or regulating the coating device 102 be set up, for example, by controlling a quantity of material and / or regulates which is evaporated, and / or for example by this a chemical composition of the material vapor 104d in the coating room 104. controls and / or regulates.

Furthermore, the coating arrangement 100 an unwinding roll 206a for unwinding a substrate 120 have, so that the substrate 120 in the coating room 104. is brought in. Furthermore, the coating arrangement 100 a take-up roll 206b for winding up the substrate 120 which, from the coating room 104. is brought out.

Furthermore, the coating arrangement 100 a variety of transport wheels 508 which define a transport path along which the substrate 120 (For example, a band-shaped substrate 120 ) between the unwinding roll 206a and the take-up roll 206b through the coating room 104. is transported through. Furthermore, the coating arrangement 100 a drive system 518 comprising at least part of the plurality of transport rollers 508 , with the Unwinding roll 206a and / or with the take-up roll 206b , is coupled. For example, the drive system 518 using chains, belts or gears with the rollers 508 . 206a . 206b be coupled. The transport wheels 508 and the drive system 518 can be part of the transport device 106 be.

The control rule device 116 can be used to control and / or regulate the transport device 106 be set up, for example, for controlling and / or regulating a transport speed and / or a position of the substrate 120 during coating, eg on the basis of a coating progress and / or a vapor property.

Optionally, in the coating chamber 802 can be another coating room 404 (also as a second coating room 404 be arranged), which of a further coating device 402 (Also as a second coating device 402 referred to) with material vapor 104d is supplied (see 4 ). Alternatively or in addition to the further coating space 404 can the coating arrangement 100 a substrate pretreatment room 404 which is defined by a substrate pretreatment device (ie, one or more substrate pretreatment devices). The control rule device 116 may be configured to control and / or regulate the substrate pretreatment device. In other words, it is possible to control and / or regulate the substrate pretreatment.

7B illustrates a coating arrangement 100 according to various embodiments in a schematic side view or cross-sectional view (eg, cut transversely to an axis of rotation of a transport roller), similar to the coating arrangement 100 , what a 4 is illustrated.

The coating can be carried out by means of a first coating device 102 (eg a first thermal evaporation device 102 ) and a second coating device 402 (eg a first thermal evaporation device 402 ) respectively. Each coating device may (eg, exactly) a coating material 102m . 402m be assigned and / or a layer which by means of the associated coating device 102 . 402 on the substrate 120 is formed and the associated coating material 102m . 402m having. According to various embodiments, the two coating devices may 102 . 402 (or their coating materials 102m . 402m ) in at least one chemical composition.

According to various embodiments, a first electron beam 114a by means of a first electron gun 604a (comprising a first electron beam source 704a and a first beam deflector 706a ) be generated. By means of the first electron beam 114a may be the first coating material 102m in a first container 732 be irradiated. As a result, the first coating material 102m be converted into a gaseous state (ie can be evaporated and / or sublimated). For example, the first coating material 102m by means of the first electron beam 114a be heated (and thereby melt and / or sublime). The converted into the gaseous state first coating material 102m can be a first material vapor 104d form, which is in a first coating room 104. can spread into it.

The first material vapor 104d can become a substrate 120 be brought (eg in the first area 104a and in the second area 104b of the first coating room 104. ), at which the first material vapor 104d attach and a first layer (or first sub-layer) on the substrate 120 can form, for example, a current collector layer and / or an adhesive layer.

According to various embodiments, a second electron beam 114b by means of a second electron beam gun 604b (Having a second electron beam source 704b and a second beam deflector 706b ) be generated. By means of the second electron beam 114b may be the second coating material 402m in a second container 734 are irradiated, creating the second coating material 402m can be converted into a gaseous state (ie can be evaporated and / or sublimated). For example, the second coating material 402m by means of the second electron beam 114b are heated (and melt). The converted into the gaseous state second coating material 402m can make a second material vapor 404d form, which is in the second coating room 404 can spread into it.

The second material vapor 404d can (eg in the first area 404a and in the second area 404b of the second coating room 404 ) to the substrate 120 be brought, at which the second material vapor 404d attach and a second layer (eg a protective layer) on the substrate 120 can form, for example on the first layer.

According to various embodiments, the first material vapor may be 104d and the second material vapor 404d differ in at least one vapor property, for example in at least a chemical composition, a vapor pressure and / or a propagation characteristic.

According to various embodiments, the first electron beam 114a by means of a first deflector 706a be deflected, for example, according to one or more deflection parameters. Thus, the first electron beam 114a over the first coating material 102m be guided. For example, the first coating material 102m by means of the first electron beam 114a be scanned, for example, according to a first irradiation figure. The first irradiation figure may be or may be provided in such a way (eg by means of a first control rule device 116 ) that the first coating material 102m can be heated and evaporated evenly. The first irradiation figure can, for example, multiple irradiation sites on the first coating material 102m (first evaporation material 102m ) and an irradiation period for each irradiation location of the multiple irradiation sites.

Similarly, the second electron beam 114b over the second coating material 402m (second evaporation material 402m ). For example, the second coating material may be 402m by means of the second electron beam 114b be scanned, for example, according to a second irradiation figure. The second irradiation figure may be or may be provided (eg by means of a second control device) 416 ) that the second coating material 402m can be heated and evaporated evenly. The second irradiation figure may, for example, multiple irradiation sites on the second coating material 402m define and an irradiation period for each irradiation location of the multiple irradiation sites.

The first irradiation figure can by means of a first control rule device 116 and the second irradiation figure can by means of a second control-rule device 416 be provided or, for example, each irradiation location (the first irradiation figure and / or the second irradiation figure) each be assigned at least one deflection parameter, which by means of the respective control-regulating device 116 . 416 is provided and for controlling the electron beam 114a . 114b a beam deflector 706a . 706b is supplied. The deflection parameter may optionally include a time component that defines the duration of irradiation for the associated radiation site. The first control rule device 116 and the second control rule device 416 can be decoupled from each other, for example, be set up for independent rules and / or taxes from each other, for example, for independent operation of each other.

The substrate 120 can during the irradiation of the coating materials 102m . 402m ie during first material vapor 104d and / or second material vapor 404d is formed, transported (eg continuously), for example through the appropriate coating room 104. . 404 through, for example, through each of the coating spaces 104. . 404 along mutually different transport directions 111 . 111b ,

Optionally, the first coating device 102 and / or the second coating device 402 each several containers 732 . 734 in which the coating material 102m the respective coating device 102 . 402 is arranged, for example, two, three or four, or more than four containers 732 . 734 , Alternatively or additionally, the container 732 the first coating device 102 and / or the container 732 the second coating device 402 be segmented, ie in each case a plurality of receiving areas for receiving the respective coating material 102m . 402m exhibit.

Alternative to an electron beam gun 604a . 604b can the substrate 120 also by means of another coating device 102 . 402 which are, for example, a light source (eg a laser source), an arc source, a heat radiation source, a power source (eg resistive or inductive), a sputtering source (a so-called magnetron) and / or a molecular beam epitaxy source or be formed therefrom can.

In other words, for coating the substrate 120 at least one of the following types of coating apparatus (physical vapor deposition coater types) may be used: an electron beam evaporation coater; a light evaporation coating apparatus; a sputtering-type coating apparatus; a thermal radiation evaporation coating device; an electric evaporation coating apparatus; and / or a molecular beam epitaxy evaporative coating apparatus.

Become the first coating material 102m and the second coating material 402m formed with a temporal and / or spatial distance from each other and / or deposited, a layer on the substrate 120 (For example, both sides) are formed, which has at least two sub-layers that differ in at least one layer property, such as their chemical composition.

8A illustrates a coating arrangement 100 according to different Embodiments in a schematic side view or cross-sectional view (eg, cut transversely to an axis of rotation of a transport roller), similar to the coating arrangements 100 , what a 1A to 5 are illustrated.

According to various embodiments, a coating device 102 . 402 (eg the first coating device 102 or the second coating device 402 ) a vapor source 812 which material vapor 104d . 404d (eg the first material vapor 104d or the second material vapor 404d ) in a coating room 104. . 404 (eg the first coating room 104. or the second coating room 404 ) is emitted into it.

Illustratively, the steam source 812 the place of origin of the material vapor 104d . 404d describe. The steam source 812 For example, it may be associated with an irradiation site and / or a magnetron cathode 102k , The steam source 812 may be shaped according to an irradiation figure, for example. If another energy supply to evaporate the coating material 102m . 402m used, the steam source can 812 be shaped according to a pattern of power supply. If, for example, the coating material 102m completely melted in a container (eg by means of a Knudsen cell or by irradiation), the vapor source can 812 extend over the surface of the molten material. Analogously, the vapor source 812 be shaped when the coating material 102m . 404m is sublimated.

The steam source 812 may have a propagation characteristic comprising a main propagation direction 806a and an average angle deviation from the main propagation direction 806a (first direction 806a ), along which the coating takes place. In other words, the coating can be from different directions 806a . 806b . 806c respectively. The transport of the substrate 102 (or the substrate guide) can take place, for example, in the form of a roll-to-roll transporting (also referred to as web coating or in the roll-to-roll process) (ie by means of a plurality of transport rolls 108a . 106a ).

According to various embodiments, the vapor source 812 material vapor 104d in an area 803 of the coating room 104. . 404 emit into, for example in the first area 104a . 404a of the coating room 104. . 404 and / or in the second area 104b . 404b of the coating room 104. . 404 , Clearly, the largest possible coating window (expansion of the range 803 along the main transport direction, eg along direction 101 ) or be provided so that the angle 1006 , which shows the variation of the coating direction (evaporation direction) during the transporting of the substrate 120 (clearly illustrated during the substrate crossing) is as large as possible.

According to various embodiments, a portion of the substrate 120 (also referred to as substrate portion or band portion) at a first time 102 (or for a first period of time) and / or at a first position 102 with material vapor 104d . 404d along a second direction 806b be coated (ie from one direction, which is antiparallel to the second direction 806b runs) and / or the same portion of the substrate 120 can at a second time 102b (or for a second period of time) and / or at a second position 102b with material vapor 104d . 404d along the third direction 806c be coated. The section of the substrate 120 can along a transport direction 111 . 111b be transported to from the first position 102 in the second position 102b to be brought.

Alternatively or additionally, a first portion of the substrate 120 at a time (or for a period of time) and at a first position 102 with material vapor 104d . 404d along the second direction 806b be coated and / or a second portion of the substrate 120 can be at the same time (or for the same time period) and at a second position 102b with material vapor 104d . 404d along the third direction 806c be coated. Optionally, the substrate 120 along the transport direction 111 . 111b be transported, leaving more areas of the substrate 102 each in the first position 102 and / or to the second position 102 can be brought.

Optionally, the first coating device 102 additional steam sources (to supply the first area 104a and the second area 104b of the first coating room 104. ) having, for example, overlapping propagation characteristics. Alternatively or additionally, the second coating device 402 additional steam sources (to supply the first area 404a and the second area 404b of the second coating room 404 ) having, for example, overlapping propagation characteristics.

Transporting the substrate 120 may be continuous according to various embodiments. During transport (or during coating), the direction of rotation of the two first transport rollers 106a . 108a and the two second transport rollers 106b . 108b ; or the unwinding roll and the take-up reel remain unchanged.

Alternatively, transporting the substrate 120 take place sequentially, for example with pauses in accordance with the length of time for which a substrate portion is coated from a corresponding direction. During transport (or during coating), the direction of rotation of the two first transport rollers 106a . 108a and the two second transport rollers 106b . 108b ; or the unwinding roll and the take-up reel remain unchanged. For example, the first transport direction 111 and / or the second transport direction 111b a temporal (eg during coating, eg the entire coating) averaged transport direction.

The coating device 102 . 402 , eg their at least one vapor source 812 (ie a vapor source 812 or multiple vapor sources 812 ), may be arranged and arranged such that these material vapor 104d . 404d with at least one homogeneous vapor property, eg a homogeneous chemical composition and / or a homogeneous vapor pressure, in the range 803 of the coating room 104. . 404 provides.

8B illustrates a coating arrangement 100 according to various embodiments in a schematic side view or cross-sectional view (eg, cut transversely to a rotation axis of a transport roller), which is a coating chamber 802 has, similar to the coating arrangements 100 , what a 6 is illustrated.

According to various embodiments, the transport path may be curved (eg, convexly curved). This can be achieved that an angle in which the material vapor 104d . 404d on the substrate 120 meets, can be further increased. Thus, a larger variations of the evaporation direction, and thus a more homogeneous layer thickness can be achieved.

According to various embodiments, the transport path (eg, its radius of curvature) may be from the circumference of a transport roller 106a . 106b . 606a . 606b be defined or are, over which the transport path is guided (eg a deflection roller and / or a cooling roller). Then in a first position 102 and / or at a first time 102 (or a first period of time) a transport direction 111 . 111b and the second direction 806b , along which material vapor 104d . 404d spreads, a first angle 1012 less than about 60 °, eg less than about 50 °, eg less than about 40 °, eg less than about 30 °, eg less than about 20 °, eg less than about 10 °, eg less than about 5 °, eg less than about 1 °, about 0 °. Alternatively or additionally, the transport path (eg its radius of curvature) can be set up in such a way that in a second position 102b and / or at a second time 102b (or a second time period) the transport direction 111 . 111b and the third direction 806c , along which material vapor 104d . 404d spreads, a second angle 1012b less than about 60 °, eg less than about 50 °, eg less than about 40 °, eg less than about 30 °, eg less than about 20 °, eg less than about 10 °, eg less than about 5 °, eg less than about 1 °, about 0 °.

The transport direction 111 can, for example, run along a circular path, which, for example, from the transport roller 106a . 106b . 606a . 606b is defined. The first transport direction can be clear 111 and the second transport direction 111b be different in at least one direction of rotation.

A circulation direction (eg during coating) of at least the first transport roller 106a may be opposite to a direction of rotation (eg during coating) of at least the second transport roller 106b be.

A circulation direction (eg during coating) of at least the third transport roller 606a may be opposite to a direction of rotation (eg during coating) of at least the fourth transport roller 606b be (if they exist).

9 illustrates a method 900 according to various embodiments in a schematic flow diagram.

The procedure 900 points in 902 on: generating a material vapor in a coating area by means of (for example exactly) an electron beam source or by means of (for example exactly) a magnetron (for example, where the magnetron has exactly one or exactly two magnetron targets arranged next to one another) within a coating chamber.

Further, the method has 900 in 904 transporting a band section of the band substrate to be coated in each case through the coating area such that (eg only) a first surface of the band section is coated.

Further, the method has 900 in 906 on: deflecting the band portion and then transporting the band portion through the coating area such that (eg only) one of the first surface opposite second surface of the band portion is coated.

Optionally, the procedure indicates 900 in: operating the electron beam source or the magnetron by means of exactly one electric generator.

According to various embodiments, the coating device may comprise a coating component, for example a magnetron, an electron beam gun, a vapor source and / or a crucible.

10 illustrates a coating arrangement 1000 according to various embodiments in a schematic cross-sectional view (eg along a rotation axis of a transport roller cut, similar to the previously illustrated coating arrangements 100 ,

The coating arrangement 1000 may be a first coating device 102 and a second coating device 1002 exhibit. The first coating device 102 can be exactly one electron source 1012 (first electron source 1012 ) and one of the electron source 1012 assigned electron sink 1002 (first electron sink 1002 ) or be formed therefrom. The second coating device 1002 can be exactly one electron source 1012 (second electron source 1012 ) and one of the electron source 1012 assigned electron sink 1002 (second electron sink 1002 ) exhibit. During the coating of the tape substrate 120 can be between the electron source and the electron sink 1002 an electric current in the coating room 104. . 404 flow. The electron source may be coated both in the first region 104a as well as in the second area 104b contribute.

The electron source 1012 can be arranged to evaporate the coating material of exactly their associated electron sink 1002 to effect.

Optionally, the second electron source 1012 be omitted, for example, when the electric power of the first electron source 1012 sufficient to supply the first and second electron sink 1002 (eg two crucibles 1002 ) with electrical energy.

Optionally, the second coating device 1002 (ie the first electron source and the second electron sink 1002 ) are omitted, for example, if an expansion of the coating material of the first coating device 102 along a rotation axis of the roller 106a . 106b . 606a . 606b larger than that of the substrate 120 ,

Optionally, the coating arrangement 1000 at least one more electron sink 1022 or at least one further coating device 1022 exhibit. For example, the further electron sink 1022 be associated with a further electron source (not shown).

The wider the substrate, the more electron sinks can be needed.

Claims (15)

Coating arrangement ( 100 ) having; A transport device ( 106 ) for transporting a tape substrate ( 120 ) within a coating chamber ( 802 ), wherein the tape substrate ( 120 ) a first surface ( 120a ) and a second surface ( 120b ), wherein the two surfaces ( 120a . 120b ) face each other; A coating device ( 102 ) for coating the tape substrate ( 120 ) in a coating room ( 104. ) of the coating chamber ( 802 ), wherein the transport device ( 106 ) and arranged relative to the coating device ( 102 ) is arranged such that the tape substrate ( 120 ) for coating the first surface ( 120a ) along a first transport direction ( 111 ) through a first area ( 104a ) of the coating room ( 104. ) and that the tape substrate ( 120 ) for coating the second surface ( 120a ) along a second transport direction ( 111b ) through a second area ( 104b ) of the coating room ( 104. ), wherein the first transport direction ( 111 ) different from the second transport direction ( 111b ), wherein the coating device ( 102 ) has exactly one electron source and an electron sink associated with the electron source, between which for coating the tape substrate ( 120 ) an electric current flows in the coating space, the electron source for coating both in the first region ( 104a ) as well as in the second area ( 104b ) contributes. Coating arrangement ( 100 ) according to claim 1, wherein the electron source has a sputtering electrode and the electron sink has another sputtering electrode or an anode. Coating arrangement ( 100 ) according to claim 1 or 2, wherein the electron source comprises an electron beam gun and the electron sink comprises at least one crucible for receiving a coating material. Coating arrangement ( 100 ) according to one of claims 1 to 3, wherein the electron sink comprises a coating material with which the tape substrate ( 120 ) should be coated. Coating arrangement ( 100 ) according to one of claims 1 to 4, further comprising: a further coating device which has exactly one further electron source and a further electron sink associated with the electron source, between which for coating the tape substrate ( 120 ) another electric current flows in the coating space, wherein the further electron source for coating both in the first area ( 104a ) as well as in the second area ( 104b ) and wherein the further electron sink and the electron sink transverse to the first transport direction ( 111 ) and / or second transport direction ( 111b ) are arranged side by side. Coating arrangement ( 100 ) according to one of claims 1 to 5, wherein the two areas ( 104a . 104b ) of the coating room ( 104. ) are arranged side by side and / or border each other. Coating arrangement ( 100 ) according to one of claims 1 to 6, wherein the two transport directions ( 111 . 111b ) are opposite to each other or enclose an angle in a range of about 10 ° to about 170 °. Coating arrangement ( 100 ) according to one of claims 1 to 7, wherein the electron source and the electron sink are coupled to exactly one electric generator for providing the electric current. Coating arrangement ( 100 ) according to one of claims 1 to 8, wherein the transport device ( 106 ) has a plurality of deflection rollers for deflecting the tape substrate ( 120 ) in the respective transport direction ( 111 . 111b ). Coating arrangement ( 100 ) according to claim 9, wherein the transport device ( 106 ) has two rollers for providing and / or transporting the tape substrate ( 120 ) by means of the plurality of pulleys from one of the two rollers to the other of the two rollers. Coating arrangement ( 100 ) according to claim 10, wherein the plurality of deflection rollers are arranged relative to at least one of the two rollers, that in each case to be coated band portion of the tape substrate ( 120 ) after passing through the first area ( 104a ) and before passing through the second area ( 104b ) is guided around the at least one of the two rollers at a distance around. Coating arrangement ( 100 ) having; A transport device ( 106 ) for transporting a tape substrate ( 120 ) within a coating chamber ( 802 ), wherein the tape substrate ( 120 ) a first surface ( 120a ) and a second surface ( 120a ), wherein the two surfaces ( 120a . 120b ) face each other; A coating device ( 102 ) for coating the tape substrate ( 120 ) in a coating area, wherein the transport device ( 106 ) and arranged relative to the coating device ( 102 ) is arranged such that the tape substrate ( 120 ) for coating the first surface ( 120a ) along a first transport direction ( 111 ) is transported through the coating area and that the tape substrate ( 120 ) for coating the second surface ( 120a ) along a second transport direction ( 111 ) is transported through the coating area, wherein the two transport directions ( 111 . 111b ) are directed opposite or at an angle in a range of about 10 ° to about 170 ° relative to each other. Procedure ( 900 ) for coating a tape substrate ( 120 ), having the method; • Produce ( 902 ) of a material vapor ( 104d ) in a coating area ( 104. ) by means of an electrical current flow between an electron source and at least one electron sink associated with the electron source within a coating chamber ( 802 ); • Transport ( 904 ) of a respective band portion of the tape substrate to be coated ( 120 ) through the coating area such that a first surface ( 120a ) of the band portion is coated; and • redirecting ( 906 ) of the band section and then transporting the band section through the coating area ( 104. ) such that one of the first surfaces ( 120a ) opposite second surface ( 120b ) of the band section is coated. Procedure ( 900 ) according to claim 13; • Operating the electron source and the at least one electron sink by means of exactly one electrical generator. Coating arrangement ( 100 ) having; A transport device ( 106 ) for transporting a tape substrate ( 120 ) within a coating chamber ( 802 ), wherein the tape substrate ( 120 ) a first surface ( 120a ) and a second surface ( 120b ), wherein the two surfaces ( 120a . 120b ) face each other; A coating device ( 102 ) for coating the tape substrate ( 120 ) in a coating room ( 104. ) of the coating chamber ( 802 ), wherein the transport device ( 106 ) and arranged relative to the coating device ( 102 ) is arranged such that the tape substrate ( 120 ) for coating the first surface ( 120a ) along a first transport direction ( 111 ) through a first area ( 104a ) of the coating room ( 104. ) and that the tape substrate ( 120 ) for coating the second surface ( 120a ) along a second transport direction ( 111b ) through a second area ( 104b ) of the coating room ( 104. ), the first transport direction ( 111 ) different from the second transport direction ( 111b ), wherein the coating device ( 102 ) has exactly one magnetron or exactly one electron beam gun which is used for coating both in the first region ( 104a ) as well as in the second area ( 104b ) contributes.

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