DE102015120723A1 - Coating arrangement, substrate carrier and method - Google Patents

Abstract

According to various embodiments, a coating arrangement (100a, 100b, 900) may include: a coating chamber (102) in which a coating area (104) is provided; a coating material source (106) for coating a substrate (410) in the coating area (104) with a coating material; a collecting structure (108, 108a, 108b) for capturing coating material which shields a shielding area (110) from the coating material source (106); which is adjacent to the coating area (104) and has a distance (110d) from the coating material source (106); wherein an extent (110q) of the shielding area (110) is greater than the distance (110d); and a transport device (114, 1204) arranged in the coating chamber (102), by means of which the collecting structure (108, 108a, 108b) can be transported into the coating chamber (102) and / or out of the coating chamber (102).

Description

In general, a substrate, for example a glass substrate, a metal tape and / or a semiconductor substrate, treated (processed), for. B., so that the chemical and / or physical properties of the substrate can be changed. For coating a substrate, various coating methods can be performed. For example, a vacuum deposition system can be used to deposit one or more layers on a substrate or on multiple substrates by means of chemical and / or physical vapor deposition. In order to realize a large-scale deposition on correspondingly large-area substrates efficiently, a so-called in-line system can be used in which a substrate is transported, for example by means of rollers and / or by means of a substrate carrier through the entire system, wherein during the transport of the substrate through the in-line system in one or more areas of the in-line system, a coating process can be performed.

Conventionally, for coating substrates in a coating area, a coating material source which is considerably larger than the coating area is used. In this case, considerably more coating material is emitted into the coating environment than is needed for coating itself, in order to provide an illustratively homogeneous coating characteristic in the coating region. The excess coating material settles in the coating environment and remains in this (parasitic coating).

The coating material accumulating in the coating installation can form layers which detach with time and increasing layer thickness and thereby form particles of interference (eg flakes) or contaminate other elements of the coating installation. For example, the interfering particles can accumulate on the substrates and impair their coating. Therefore, conventionally, regular cleaning of the coating environment is required in order to obtain a consistent process quality. For the duration of the cleaning, the coating system is opened and the coating is suspended, so that production breaks occur, which cause costs and reduce the efficiency of the coating system.

For ease of cleaning, the spread of the coating material into the coating environment is conventionally limited by means of diaphragms. The diaphragms capture a portion of the excess coating material and thus slow down the deposition of coating material in the coating system. For cleaning, the panels can be replaced, which can be done relatively quickly and easily, so that the production breaks are minimized. By means of the diaphragms, for example, a large part of the coating environment can be screened in the manner of a housing, so that the coating material can clearly spread only into the coating area.

According to various embodiments, it has been clearly recognized that the areas of the coating environment most exposed to the coating material determine the minimum frequency of cleaning required. In other words, the panels that are directly exposed to the emission of coating material are coated most rapidly and must be cleaned or replaced most frequently. This frequency of cleaning can not be easily reduced by means of conventional diaphragms.

According to various embodiments, a coating arrangement, a method, and a substrate carrier are provided which enable cleaning of the coating equipment without having to open the coating equipment and / or without interrupting coating (i.e., during operation of the coating assembly). Illustratively, the surfaces of the coating environment which are coated most rapidly by the coating material are exchanged by these surfaces being or being transported in a transportable manner by means of a transport device. Clearly, a collecting structure for collecting coating material is provided, which can be transported into and out of the coating chamber (for example, through a transfer opening in the coating chamber) without having to open the coating chamber. As a result, a portion of the coating material can be continuously transported out of the coating chamber, which significantly reduces the frequency of production breaks significantly.

According to various embodiments, a substrate carrier is provided, which has a collecting structure, by means of which the coating material can be collected and transported out of the coating chamber together with the substrate carrier, for. B. by a (eg., Closable) transfer opening in the coating chamber. This is illustratively a continuous removal of coating material from the coating chamber causes, so that a parasitic coating can be reduced, which significantly reduces the frequency of cleaning pauses. Illustratively, the substrate carrier has a relation to a conventional substrate carrier enlarged edge, z. B. on both sides of the substrate insertion areas, on which provides the collecting structure, so that the surface, which causes the collection of coating material, is clearly as large as possible. This makes it possible, for example, to dispense with a large part of conventional screens.

According to various embodiments, a coating arrangement is provided which clearly requires less fixed shutters. As a result, the coating material can be efficiently collected by means of the collecting structure and transported out of the coating arrangement. For example, more coating material enters the emission space and can be transported out of the coating chamber by means of a collecting structure transported in the emission space.

According to various embodiments, a coating arrangement may include: a coating chamber in which a coating area is provided; a coating material source for coating a substrate in the coating area with a coating material, a collecting structure for collecting coating material, which shields a shielding area from the coating material source which is adjacent to the coating area and has a distance (shielding distance) from the coating material source; wherein an extent of the shielding area is greater than the distance; and a transport device arranged in the coating chamber, by means of which the collecting structure can be transported (stored) into the coating chamber and / or out of the coating chamber (eg in the substrate transport direction). For example, the collecting structure may be movably mounted by means of the transport device.

According to various embodiments, the shield region transverse extent may be greater than or equal to about 8 cm, e.g. B. greater than or equal to about 12 cm, z. B. greater than or equal to about 16 cm, z. B. greater than or equal to about 20 cm, z. B. greater than or equal to about 24 cm.

The extent of the shielding region may be greater than about 125% of the distance (i.e., at least about 25% greater than the distance), e.g. Greater than about 150% of the distance (i.e., one and a half times the distance), e.g. B. greater than about 175% of the distance, z. Greater than about 200% of the distance (i.e., twice the distance).

According to various embodiments, a coating arrangement may further comprise: an aperture structure having a passage opening (also referred to as emission opening) between the coating material source and the coating area, the passage opening having an extent transverse to the distance which is at least greater than a distance parallel thereto Extension of the coating area, z. B. by at least about 150% of the distance, z. B. by at least about 175% of the distance, z. B. at least about 200% of the distance. For example, the emission aperture may expose the capture structure to the coating material source at least partially (i.e., partially or completely). The diaphragm structure can be set up to limit the emission space.

According to various embodiments, the catching structure and / or the diaphragm structure may at least partially shield the transport device from the coating material source. According to various embodiments, the collecting structure and / or the diaphragm structure may at least partially intermesh with one another (eg, at least partially overlap with respect to the coating material source).

According to various embodiments, the source of coating material may comprise a magnetron (eg, a tube magnetron or a double tube magnetron, a planar magnetron, or a double planar magnetron).

According to various embodiments, the coating arrangement may further comprise a further coating material source, wherein the coating area is arranged between the coating material source and the further coating material source.

According to various embodiments, the catching structure may be provided by means of a substrate carrier adapted to hold a plurality of substrates.

According to various embodiments, a method for coating in a coating chamber in which a coating region and a transport device are arranged may include: emitting a coating material (eg, in an emission direction) to and / or into the coating region by means of a coating material source; Coating a substrate with the coating material in a coating area; Coating a collecting structure with coating material, so that by means of the collecting structure opposite to the coating area a shielding area the shielding region has a spacing (shielding distance) from the coating material source, and wherein the shielding region has an expansion (eg, a shielding region transverse extent) transverse to the distance greater than the distance (e.g. greater than about 125% of the distance, eg, greater than about 150% of the distance, eg, greater than about 175% of the distance, eg, greater than about 200% of the distance); and bringing the collecting structure out of the coating chamber and / or bringing the collecting structure into the coating chamber by means of the transporting device, e.g. B. through a substrate transfer opening of the coating arrangement.

According to various embodiments, a substrate carrier may comprise: two collecting structures running parallel to each other along a transport direction; a plurality of substrate insertion regions disposed between the two collection structures, each substrate insertion region having a recess and a support surface for holding a substrate in the recess; wherein each collecting structure of the two collecting structures transverse to the transport direction has an extension which is greater than a perpendicular distance (edge distance), for. At least one substrate insertion area comprising a plurality of substrate insertion areas from an edge of the substrate substrate, e.g. B. greater than about 125% of the edge distance, z. B. greater than about 150% of the edge distance, z. B. greater than about 175% of the edge distance, z. B. greater than about 200% of the edge distance, z. B. greater than about 300% of the edge distance, z. B. greater than about 400% of the edge distance, z. B. greater than about 500% of the edge distance.

According to various embodiments, a substrate carrier may comprise: two collecting structures running parallel to each other along a transport direction; a plurality of substrate insertion regions disposed between the two collection structures, each substrate insertion region having a recess and a support surface for holding a substrate in the recess; wherein each collecting structure of the two collecting structures has an extension transverse to the transporting direction which is at least approximately five times greater than a parallel distance (substrate inserting area spacing) of adjacent substrate inserting regions of the plurality of substrate inserting regions from each other.

According to various embodiments, a coating arrangement may comprise: a coating chamber; a coating material source having a source region in which it is arranged to emit a coating material into an emission space in the coating chamber; a transport device for transporting a substrate (or a plurality of substrates, eg simultaneously) through the emission space along a transport surface in a transport direction; and an aperture structure which (eg, limits the emission space and) between the transport surface and the coating material source has a passage opening through which the emission space extends; in which. the passage opening along a transverse direction which extends along the transport surface and transverse to the transport direction, one (eg at least about 25%, eg at least about 50%, eg at least about 75%, eg at least approximately 100%) has greater extent than the source area (eg, its source area transverse extent), e.g. B. so that emitted from an edge of the source region coating material passes through the through hole, for. B. along a direction transverse to the transport surface.

According to various embodiments, the source of coating material may include a source region from which it emits the coating material, wherein the source region has an extent (eg, a source region transverse extent) transverse to the distance (along a transverse direction) which (eg, at least about 25%, eg at least about 50%, eg at least about 75%, eg at least about 100%) is greater than a parallel extent of the coating area, e.g. B. by at least one coating distance. Alternatively or additionally, the source region may have a distance (coating distance) from the transport surface.

According to various embodiments, the transport surface may extend through and / or be aligned with a substrate transfer opening of the coating arrangement. The substrate transfer opening can by means of a passage opening in the coating chamber, for. B. whose chamber housing, be or be provided. The substrate transfer opening can be closed by means of a movably mounted valve flap.

According to various embodiments, a coating arrangement may include: a coating chamber in which a coating area is provided; a coating material source for emitting a coating material into the coating area, a collecting structure which can be moved into and / or out of the coating chamber by means of a transport device.

According to various embodiments, the transport device may be configured to transport the catching structure. Alternatively or additionally, the transport device may be arranged for transporting a substrate carrier, for. B. when the collecting structure is or is provided by means of the substrate carrier.

According to various embodiments, a transport device may define a transport surface, e.g. B. for transporting the collecting structure and / or the substrate carrier (or a substrate inserted therein) along the transport surface, for. B. in a transport direction. For example, the substrate can be transported by means of the transport device through a coating area and / or in the coating area.

According to various embodiments, a transport device may have a plurality of transport rollers defining the transport surface, of which two transport rollers are arranged transversely to the transport direction at a distance (transport roller transverse distance) from each other on opposite sides of the coating region.

According to various embodiments, the transport device may comprise a first transport roller arrangement with a plurality of transport rollers and a second transport roller arrangement with a plurality of transport rollers, wherein the first transport roller arrangement and the second transport roller arrangement are arranged at a distance (transport roller transverse distance) transversely to the transport direction, z. On opposite sides of the coating area. The transport roller transverse distance can extend transversely to the transport direction, z. B. along the transverse direction.

According to various embodiments, the coating material source in the source region may be configured to convert the coating material to a gaseous state and to emit it, e.g. B. in the direction of the transport surface or in the direction of the coating area. The coating material can be converted into the gaseous state by means of thermal evaporation, by thermal sublimation and / or by atomization.

According to various embodiments, the emission space may be provided in the coating chamber. The emission space may include or be formed from the coating area and / or the edge area. The coating area can adjoin the edge area. The edge region may extend with an opening angle of at least 45 ° from an edge of the source region to the transport surface.

According to various embodiments, a stream of coating material (coating material stream) may substantially disappear at an edge of the emission space.

According to various embodiments, at least two transport rollers (each transport roller being part of a transport roller arrangement) of the coating material source, which are arranged on opposite sides of the coating region, may be arranged outside the edge region.

In the edge region, the material vapor stream may have a larger gradient (eg, at least about 25%, eg, at least about 50%, eg, at least about 75%, eg, at least about 100%) than in that coating area. For example, a material vapor stream in the edge region may be less than half of a material vapor stream in the coating region, e.g. B. less than about 25%, z. B. none than about 10%, z. Less than about 5% of the material vapor stream in the coating area, e.g. For example, the material vapor stream in the edge region can essentially disappear (eg, at the edge of the edge region).

According to various embodiments, the transport surface may be extended through the coating area, the shielding area and / or the edge area.

According to various embodiments, a coating arrangement may include: a coating chamber in which an emission space is provided; a plurality of transport rollers for transporting a substrate through a coating area in the emission space along a transport surface; a source of coating material for emitting a coating material into the emission space; a movably mounted collecting structure, which is arranged in the emission space outside the coating area, so that coating material emitted in addition to the coating area in the direction of the transport area (emission direction) can be collected or transported out of the processing space by means of the collecting structure.

According to various embodiments, a coating arrangement may comprise: a coating chamber; a transport device for transporting a substrate carrier through the coating chamber along a transport surface in a transport direction; a coating material source having a swelling area in which it is arranged to convert a coating material (eg into a gaseous state in one and) to emit towards the transport surface; the substrate carrier, which has two collecting structures running parallel to each other along the transporting direction and a plurality of substrate insertion regions between them, wherein each of the two collecting structures has a dimension along a transverse direction which runs along the transporting surface and transversely to the transporting direction, which (for example at least approximately 25%, eg, at least about 50%, eg, at least about 75%, eg, at least about 100%) is greater than a distance of the transport surface from the source region.

According to various embodiments, a collecting structure, e.g. For example, each of the two collection structures of a substrate support may be free of a substrate insertion area.

According to various embodiments, the substrate carrier may have one (eg at least about 5%, eg at least about 10%, eg at least about 15%, eg at least about 20% along the transverse direction, e.g. At least about 30%) have greater extent than the source area, as the emission space and / or as the coating area.

According to various embodiments, the coating material source may comprise the coating material to be coated (which is to be at least converted to a gaseous state). The coating material may have one (eg, at least about 5%, eg, at least about 10%, eg, at least about 15%, eg, at least about 20%, eg, at least about, along the transverse direction 30%) have greater extent (coating material transverse extent) than the source area (eg, the source area transverse extent) and / or as the coating area (z the coating area transverse extent). Alternatively or additionally, the coating material transverse extent may be smaller than the emission opening transverse extent and / or as the transport roll pitch. The coating material of the coating material source may be in solid and / or liquid form.

According to various embodiments, a substrate carrier may include: a plurality of substrate insertion areas, each substrate insertion area having a recess and a bearing surface for holding a substrate in the recess; two capture structures sandwiching the plurality of substrate insertion regions, each of the two capture structures having an extent along the direction (eg, at least about 25%, eg, at least about 50%, eg, at least about 75% %, eg at least about 100%) is greater than a distance of the transport surface from the coating material source. An extension of at least 25% may be understood as at least 125% of the extent.

According to various embodiments, each of the two collecting structures may have a storage area, which is set up to encompass transport rollers of the transporting device.

According to various embodiments, each of the two trap structures along the direction (eg, the transverse direction) may have an extension greater than or equal to about 8 cm, e.g. B. greater than or equal to about 12 cm, z. B. greater than or equal to about 16 cm, z. B. greater than or equal to about 20 cm, z. B. greater than or equal to about 24 cm.

According to various embodiments, a coating arrangement may include: a coating chamber in which an emission space is provided; a source of coating material for emitting a coating material into the emission space; a collecting structure which extends from the coating area through an edge region of the emission space, and a transport device by means of which the collecting structure is movably mounted in such a way that it can be moved out of the coating chamber.

According to various embodiments, an expansion (eg, along the transverse direction) of the edge region may be at a distance from the coating material source across the gap (eg, at least about 25%, eg, at least about 50%, eg. at least about 75%, eg at least about 100%) greater than the distance. In other words, the expansion of the edge region in one direction (eg, in the emission direction) may increase from the coating material source, e.g. B. at least the distance to the coating material source.

According to various embodiments, the source of coating material may be elongated (eg, in the transverse direction).

According to various embodiments, the coating material source may be configured to provide a coating characteristic according to a specification in the coating region, e.g. For coating a substrate in the coating area with the coating material. Adjacent to the coating region, the edge region in which a coating characteristic deviates from the specification, for. B. at least half.

According to various embodiments, a coating characteristic may comprise at least one of: a chemical composition of the coating material (per time and / or per area, alternatively or additionally averaged, eg, spatially and / or temporally, and / or their distribution, e.g. spatially and / or temporally); an amount of emitted coating material (per time and / or per area, alternatively or additionally averaged, eg spatially and / or temporally, and / or its distribution, eg spatially and / or temporally).

An amount of coating material emitted per time (e.g., per area, eg, spatially and / or temporally distributed) may define a rate to be coated (coating rate), i. H. the speed with which it is coated.

According to various embodiments, the edge region may have a cross-sectional area transverse to the emission direction (which may be, for example, transverse to the transport surface), the extent of which increases along the transverse direction as the cross-sectional area of the coating material source increases, e.g. B. at least the distance to the coating material source.

According to various embodiments, the collection structure may extend through the edge region.

According to various embodiments, a method may include: emitting a coating material from a source region through a passage opening of an aperture structure toward a substrate support holding a substrate; Coating the substrate with coating material emitted from the source region (eg, a central region of the source region) (eg, in the emission direction); Coating the substrate support with coating material emitted from an edge of the source area (eg in the emission direction).

According to various embodiments, the method may further comprise transferring a coating material in the source region to a gaseous state.

According to various embodiments, the substrate carrier may have a catching structure which is coated with the coating material emitted from the edge of the source area, the catching structure being free of a substrate and / or having an extension transverse to a transport direction which (e.g. At least about 25%, eg at least about 50%, eg at least about 75%, eg at least about 100%) is greater than a distance of the capture structure from the source region.

According to various embodiments, the diaphragm structure may at least partially shield the transport device and / or the coating chamber from the coating material source.

The coating material source may be configured to coat at least one substrate (i.e., one or more substrates) according to various embodiments, e.g. B. is transported through the coating area. For example, the coating material source for providing a gaseous coating material (material vapor) and / or liquid coating material may be arranged, which z. B. on the at least one substrate for forming a layer can be deposited. A source of coating material may include at least one of a sputtering apparatus, a thermal evaporation apparatus (eg, a laser beam evaporator, an arc evaporator, an electron beam evaporator, and / or a thermal evaporator), a precursor gas source, a liquid phase sprayer. A sputtering apparatus may be arranged to atomize the coating material by means of a plasma. A thermal evaporation device may be configured to evaporate the coating material by means of thermal energy. Depending on the nature of the coating material, alternatively or in addition to the thermal evaporation, i. H. thermally converting a liquid state (liquid phase) to a gaseous state (gaseous phase), also sublimating, d. H. thermally converting a solid state (solid phase) to a gaseous state. In other words, the thermal evaporation device can also sublimate the coating material. A liquid phase sprayer may be adapted to apply a coating material from the liquid phase, e.g. B. a dye.

According to various embodiments, the substrate may comprise or be formed of at least one of a ceramic, a glass, a semiconductor (eg, amorphous, polycrystalline or single-crystal semiconductor such as silicon), a metal, and / or a polymer (e.g. B. plastic). For example, the substrate may be a plastic film, a wafer (a semiconductor substrate), a metal foil, a metal sheet or a glass plate, and optionally coated.

The substrate may be plate-shaped. For example, two can each other opposite sides of the substrate be planar (planar), z. B. plane parallel to each other.

According to various embodiments, the coating material may comprise or be formed from a metal, e.g. As aluminum, silver, copper, indium, tin. Alternatively or additionally, the coating material may comprise or be formed from a semimetal and / or a semiconductor.

According to various embodiments, a layer may be formed on the substrate. The layer may comprise the coating material and / or a chemical compound (eg, a nitride, an oxide, and / or a carbide of the coating material) of the coating material, e.g. B. with a non-metal, for. As with oxygen, nitrogen, carbon and / or hydrogen. The chemical compound of the coating material may be formed by means of a chemical reaction of the coating material in the emission space, e.g. B. with a reactive gas as a reactant. The reactive gas may include or be formed from hydrogen, oxygen, nitrogen and / or carbon.

The diaphragm structure, the collecting structure and / or the substrate carrier may comprise or be formed from a metal. The metal may, for example, comprise or be formed from aluminum. Alternatively or additionally, the metal may for example comprise iron or be formed therefrom, for. In the form of an iron alloy, such as steel (eg, structural steel and / or stainless steel). Alternatively or additionally, the diaphragm structure may comprise or be formed from another material, eg. A ceramic (such as a carbide and / or a nitride), a glass or a composite material (eg, carbon fiber reinforced carbon). For example, the diaphragm structure, the collecting structure and / or the substrate carrier may have a ceramic coating. A material of the diaphragm structure, the trapping structure and / or the substrate carrier (i.e., which each comprise or each of which is formed) may have a temperature stability (i.e., without structurally changing), e.g. Example, a melting temperature of at least about 200 ° C, z. B. at least about 300 ° C, z. B. at least about 400 ° C, z. B. at least about 500 ° C, z. B. at least about 600 ° C, z. At least about 700 ° C.

According to various embodiments, the coating material transverse extent, the transport roller transverse distance, the coating area and / or the emission space may have an extension (eg along the transverse direction) of at least approximately 1 m, e.g. B. of at least about 2 m, z. B. of at least about 3 m, z. B. of at least about 4 m, z. In a range of about 3 m to about 5 m.

Embodiments of the invention are illustrated in the figures and are explained in more detail below.

Show it

1A and 1B in each case a coating arrangement according to various embodiments in a schematic cross-sectional view or side view;

2A and 2 B in each case a coating arrangement according to various embodiments in a schematic cross-sectional view or side view;

3A and 3B in each case a coating arrangement according to various embodiments in a schematic cross-sectional view or side view;

4A and 4B in each case a collecting structure according to various embodiments in a schematic cross-sectional view or side view;

5 a substrate carrier according to various embodiments in a schematic perspective view;

6 a coating arrangement according to various embodiments in a schematic perspective view;

7A and 7B in each case a coating arrangement according to various embodiments in a schematic perspective view;

8th a coating arrangement according to various embodiments in a schematic perspective view;

9 a coating arrangement according to various embodiments in a schematic cross-sectional view or side view;

10A and 10B in each case a coating arrangement according to various embodiments in a schematic cross-sectional view or side view;

11 a coating material source according to various embodiments in a schematic cross-sectional view or side view;

12 a coating material source according to various embodiments in a schematic cross-sectional view or side view;

13 a method according to various embodiments in a schematic flow diagram;

14 a method according to various embodiments in a schematic flow diagram;

15A and 15B in each case a coating arrangement according to various embodiments in a schematic cross-sectional view or side view; and

16A and 16B in each case a coating arrangement according to various embodiments in a schematic cross-sectional view or side view.

In the following detailed description, reference is made to the accompanying drawings, which form a part hereof, and in which is shown by way of illustration specific embodiments in which the invention may be practiced. In this regard, directional terminology such as "top", "bottom", "front", "back", "front", "rear", etc. is used with reference to the orientation of the described figure (s). Because components of embodiments can be positioned in a number of different orientations, the directional terminology is illustrative and is in no way limiting. It should be understood that other embodiments may be utilized and structural or logical changes may be made without departing from the scope of the present invention. It should be understood that the features of the various exemplary embodiments described herein may be combined with each other unless specifically stated otherwise. The following detailed description is therefore not to be taken in a limiting sense, and the scope of the present invention is defined by the appended claims.

As used herein, the terms "connected," "connected," and "coupled" are used to describe both direct and indirect connection, direct or indirect connection, and direct or indirect coupling. In the figures, identical or similar elements are provided with identical reference numerals, as appropriate.

According to various embodiments, one or more substrates to be coated are positioned on a substrate support (also referred to as a carrier), e.g. B. inserted therein. The one or more substrates pass one or more coating material sources (also referred to as coating sources) at a defined distance (target-substrate distance) and at a defined speed (substrate transport speed). Optionally, the substrates can be coated on the front and back.

In order to deposit a homogeneous layer with uniform layer thickness distribution (transverse distribution) on a substrate, a lateral projection of the coating material source is provided. In other words, the coating material source may project transversely beyond the coating area.

The overhang area (i.e., the area of the coating environment in which the coating material source protrudes) is parasitically coated. Such coatings can adversely affect technological parameters. If, for example, components of the transport device (transport components) are coated, transport parameters may change. According to various embodiments, as few components of the coating environment as possible which remain in the system during the production operation are coated.

According to various embodiments, the substrate carrier can be widened so far that a large part of the deposited layers in the overhang areas is captured by the substrate carrier and transported out of the system with it.

According to various embodiments, the substrate carrier can have a storage area (eg a transport rail) which surrounds the transport rollers of the transport device (eg C-shaped). As a result, the transport rollers can be shielded from parasitic coating.

According to various embodiments, the bearing areas and / or the catch structures may be formed and / or arranged symmetrically on opposite sides of the transport surface. This ensures symmetrical process environments on both sides of the transport surface (clearly below / above), which in turn can have a positive effect on the coating results.

1A illustrates a coating arrangement 100a according to various embodiments in a schematic Cross-sectional view or side view (eg transversely to a transport direction 101 cut).

The coating arrangement 100a may according to various embodiments, a coating chamber 102 exhibit.

According to various embodiments, the coating chamber 102 be provided by means of a chamber housing in which one or more chambers can be provided. The chamber housing may, for example, provide a negative pressure or a vacuum (vacuum chamber housing) with a pump arrangement 804 (compare for example 16A or 16B ), z. B. a vacuum pump assembly, (eg., Gas-conducting) be coupled and be so stable that it withstands the action of the air pressure in the pumped state. The pump arrangement 804 (Having at least one vacuum pump, eg a high vacuum pump, eg a turbomolecular pump) may allow some of the gas from inside the processing chamber, e.g. B. from the processing room to pump. Accordingly, one or more vacuum chambers may be provided in a chamber housing. In other words, the chamber housing can be configured as a vacuum chamber housing or can be a coating chamber 102 be set up as a vacuum chamber.

According to various embodiments, a chamber housing, for. A vacuum chamber provided therein, such that a pressure in a range of about 10 mbar to about 1 mbar (in other words, rough vacuum) can be provided therein, and / or a pressure in a range of about 1 mbar to about 10 ^-3 mbar (in other words fine vacuum), and / or a pressure in a range of about 10 ^-3 mbar to about 10 ^-7 mbar (in other words high vacuum) and / or a pressure of less than high vacuum, z. B. less than about 10 ^-7 mbar. Alternatively, a coating chamber 102 be set up as an atmospheric pressure chamber.

In the coating chamber 102 may according to various embodiments, a coating area 104 be or be provided.

The coating arrangement 100a may further comprise a source of coating material according to various embodiments 106 which are suitable for coating a substrate 410 (compare for example 16A or 16B ) in the coating area 104 is furnished with a coating material. The coating material source 106 may be configured to emit the coating material into the coating area 106e , z. B. along a coating direction 105 ,

The coating arrangement 100a Further, according to various embodiments, a collection structure 108 exhibit. The collection structure 108 can contact the coating area 104 adjoin. For example, the collection structure 108 the coating area 104 limit.

The collection structure 108 can have a shielding area 110 define which by means of the collecting structure 108 opposite the coating material source 106 is shielded or will. In other words, the catching structure 108 between the shielding area 110 and the source of coating material 106 be arranged.

The shielding area 110 can contact the coating area 104 adjoin and a distance 110d (Abschirmabstand 110d ) from the coating material source 106 exhibit. The shielding distance 110d can be less than an extension 110q (Shielding-transverse extension 110q ) of the shielding area transverse to the shielding distance 110d , z. B. along a transverse direction 103 , In general, a transverse dimension may be an extension transverse to the transport direction 101 and / or across a direction from the coating material source 106 away (eg within the transport area).

The transverse direction 103 can be perpendicular to the coating direction 105 run. The transverse direction 103 and / or the coating direction 105 can be perpendicular to the transport direction 101 run. The coating direction 105 may correspond to a direction in which the coating material is emitted (also clearly referred to emission direction).

The collection structure 108 may be a catchment structure transverse extent 108q which is at least as large as the shielding area transverse extent 110q ie equal to or (eg at least about 5%, eg at least about 10%, eg at least about 15%, eg at least about 20%, eg at least about 30%) greater the shielding area transverse extent 110q ,

1B illustrates a coating arrangement 100b According to various embodiments in a schematic cross-sectional view or side view (eg., Transverse to a transport direction 101 cut).

The coating arrangement 100b may according to various embodiments, a diaphragm structure 112 exhibit.

The aperture structure 112 For example, on the coating chamber 102 be attached or become.

The aperture structure 112 can be between the coating material source 106 and the coating area 104 a passage opening 112o (Emitting aperture 112o ) exhibit. The emission opening 112o can be an extension 112q (Emitting aperture-transverse extension 112q ) across the shielding distance 110d which have at least the shielding distance 110d and / or at least (eg, about 125%, eg, about 150%, eg, about 175%, eg, about 200%) of the shield area transverse extent 110q is greater than a parallel extension 104q of the coating area 104 (Coating area cross expansion 104q ).

The coating arrangement 100b may according to various embodiments, one in the coating chamber 102 arranged transport device 114 exhibit. The collection structure 108 can by means of the transport device 114 be movably mounted. The transport device 114 can be set up, the collection structure 108 in the coating chamber 102 into and / or out of the coating chamber 102 out (eg along the transport direction 101 ).

For example, the coating chamber 102 at least one transfer opening (eg a substrate transfer opening), through which the collecting structure 108 through into the coating chamber 102 into and / or out of the coating chamber 102 can be transported out. The transfer opening can be closed by means of a flap (flap valve), with respect to vacuum-tight. Optionally, the transfer opening to another chamber, for. B. adjoin another vacuum chamber.

The in-transporting and / or out-feeding may be done according to various embodiments while the coating material source 106 the coating material in the coating area 104 emitted and / or a substrate with the coating material in the coating area 104 is coated. For example, the collection structure 108 continuously through the coating chamber 102 be transported through.

According to various embodiments, the transport device 114 Have multiple transport rollers, by means of which the collecting structure 108 , z. B. resting on the transport rollers, is movably mounted.

2A illustrates a coating arrangement 200a According to various embodiments in a schematic cross-sectional view or side view (eg., Transverse to a transport direction 101 cut).

According to various embodiments, the coating arrangement 200a another source of coating material 206 (second coating material source 206 ) exhibit. The coating area 104 can be between the coating material source 106 (first coating material source 106 ) and the second coating material source 206 be arranged.

According to various embodiments, a double-sided coating can take place. For this purpose, by means of the first coating material source 106 and the second coating material source 206 from opposite directions coating material in the coating area 104 be emitted (eg along the coating direction 105 ).

2 B illustrates a coating arrangement 200b According to various embodiments in a schematic cross-sectional view or side view (eg., Transverse to a transport direction 101 cut).

According to various embodiments, the coating arrangement 200b two collection structures 108 , z. B. a first collection structure 108a and a second collection structure 108b , between which the coating area 104 can be arranged. It can be clear on both sides of the coating area 104 a shielding area 110 be or be provided. For example, the shielding area 110 from the coating area 104 to the transport device 114 extends its. For example, the transport roll pitch (eg, at least about 5%, eg, at least about 10%, eg, at least about 15%, eg, at least about 20%, eg, at least about 30%). greater than the coating area transverse extent 104q , z. B. at least twice the shielding area transverse extent 110q and / or at least twice the catchment structure transverse extent 108q ,

3A illustrates a coating arrangement 300a According to various embodiments in a schematic cross-sectional view or side view (eg., Transverse to a transport direction 101 cut).

According to various embodiments, at least one collecting structure 108a . 108b (eg a first collection structure 108a and / or a second collection structure 108b ) to one Substrate transport structure 302 adjoin. The substrate transport structure 302 can by means of at least one collecting structure 108a . 108b be or be held. For example, the substrate transport structure 302 between the two collection structures 108a . 108b be arranged and / or and / or be attached to this or be.

The substrate transport structure 302 can have several loading areas 302e (Substrate insertion areas 302e ), each of which insertion area 302e may be configured to hold a substrate. The substrate transport structure 302 may be arranged such that the substrates along a transport surface 111f be transported, z. B. in the transport direction 101 ,

According to various embodiments (compare, for example 1A ) can the shielding distance 110d greater than or equal to the distance 111d the transport area 111f from the source of coating material 106 (Coating gap 111d ). For example, the shielding distance 110d greater than or equal to the distance of a transported substrate from the coating material source 106 (Target-substrate spacing).

The target-to-substrate distance may be substantially the coating distance 111d (corresponding to Target Transport Area Distance 111d ), z. B. less than a substrate thickness (eg., A few millimeters) may be smaller than the coating distance 111d ,

The collection structure 108 can be a storage area 108l have, on which this by means of the transport device 114 can be stored. The storage area 1081 may comprise at least a portion with which this on at least one transport roller of the transport device 114 can rest. The storage area 108l can the transport device 114 at least partially opposite the coating material source 106 shield.

According to various embodiments, a transport roller pitch 114d ie a distance 114d from on opposite sides of the coating area 104 arranged transport rollers 114r , which is (are for example at least about 5%, for example at least about 10%, for example at least about 20%) greater than a longitudinal extent of the coating material source 106 , the source area cross extent 116q (see 10A ), the emission opening transverse extent 112q and / or the coating material transverse extent 606q (see 6 ).

3B illustrates a coating arrangement 300b According to various embodiments in a schematic cross-sectional view or side view (eg., Transverse to a transport direction 101 cut).

According to various embodiments, the storage area 108l a catching structure 108a . 108b at least one transport role 114r the transport device 114 at least partially encompass. The storage area 108l For example, may have a recess into which the transport device 114 or at least one transport roller 114r can reach into it.

The at least one transport role 114r can be an extension across the transport surface 111f have, which is smaller from a parallel expansion of the recess of the storage area 108l to a range of about 1 mm to about 10 mm, z. B. about 4 mm. For example, the at least one transport roller 114r have an extension in a range of about 50 mm to about 100 mm, z. B. about 76 mm.

The shielding area 110 can to the storage area 108l adjoin. For example, the shielding area 110 between the coating area 104 and the storage area 108l extend.

4A illustrates a trap structure 108a . 108b According to various embodiments in a schematic cross-sectional view or side view (eg., Transverse to a transport direction 101 cut).

According to various embodiments, the collection structure 108 (eg a first collection structure 108a and / or a second collection structure 108b ) a shielding surface element 108p (eg a plate 108p ) which extends from the storage area 108l away, z. B. in the direction of the coating area 104 , The shielding surface element 108p can contact the coating area 104 adjoin (compare 1 ).

The shielding area 110 and / or the collection structure 108 For example, an extension 108q . 110q transverse to the transport direction 101 (eg along the transverse direction 103 ) which are the same or (eg at least about 25%, eg at least about 50%, eg at least about 75%, eg at least about 100%, eg at least about 150 %) is greater than the shielding distance 110d (see 1 ).

4B illustrates a trap structure 108 according to various embodiments in a schematic cross-sectional view or side view (eg., Transverse to a transport direction 101 cut).

According to various embodiments, the collection structure 108 two storage areas 108l between which the shielding surface element 108p can be extended. The shielding surface element 108p can by means of the storage areas 1081 be held or be, for. B. on the transport device 114 ,

5 illustrates a substrate carrier 500 according to various embodiments in a schematic perspective view.

According to various embodiments, at least one collecting structure 108a . 108b by means of the substrate carrier 500 be or be provided. The substrate carrier 500 may be configured to hold multiple substrates. The substrate carrier 500 can two along a transport direction 101 parallel collecting structures 108a . 108b exhibit. Between the two collection structures 108a . 108b can the substrate transport structure 302 be arranged.

The substrate transport structure 302 can have several substrate insertion areas 302e exhibit. Each substrate insertion area 302e the plurality of substrate insertion areas 302e may have a recess and a support surface for holding a substrate in the recess.

The recess can be z. By the substrate transport structure 302 extend therethrough (ie form a passage opening). Then, a in the substrate insertion area 302e Inlaid substrate exposed on both sides, z. B. for two-sided coating of the substrate with the coating material.

Each collecting structure of the two collecting structures 108a . 108b can be transverse to the transport direction 101 (eg along the transverse direction 103 ) an extension 108q (Hived-transverse extension 108q ), which is at least about five times as large as a distance parallel thereto 302d (each other) of adjacent Substrateinlegebereiche 302e the plurality of substrate insertion areas 302e from each other, z. B. at least about six times, for. B. at least about seven times, z. B. at least about eight times, z. B. at least about nine times, for. B. at least about ten times, as large as the parallel distance 302d (Each other) adjacent substrate insertion areas of the plurality of substrate insertion areas 302e from each other. The distance 302d (Each other) adjacent substrate insertion areas of the plurality of substrate insertion areas 302e one another can also be used as a substrate insertion area distance 302d be designated.

The substrate transport structure 302 can be a framework structure 502 have, which a plurality of webs 502s has, each of which jetty 502s between two adjacent substrate insertion areas 302e is arranged. In other words, the plurality of substrate insertion areas 302e by means of the framework structure 502 (or the more webs 502s ) be separated from each other.

Clearly, the substrate insertion area distance 302d the area density (ie number per area) of the substrate insertion areas 302e define, or the number of substrates, which by means of the substrate support 500 can be transported simultaneously. The substrate insertion area distance 302d can be set up so large that the substrate transport structure 302 sufficiently stable to support the substrates and the net weight of the framework structure 502 is. In other words, the substrate insertion area distance 302d be arranged such that the substrate transport structure 302 or the framework structure 502 is self-supporting. Alternatively or additionally, the substrate insertion area distance 302d clearly be set up so small or that as many substrate insertion areas 302e (ie with the highest possible surface density) can be realized.

In contrast, the trapping structure transverse extent 108q be set according to the size of the shaded area, ie be at least as large (ie, equal to or greater) as the Abschirmbereich-transverse extent 110q ,

Alternatively or additionally, the collecting structure transverse extent 108q greater than about 50% of an extent 302q the loading areas 302e (eg along the transverse direction 103 ie an insertion area transverse extent 302q ), z. B. greater than about 60%, z. B. greater than about 70%, z. B. greater than about 80%, z. B. greater than about 90%, z. B. greater than about 100%, z. B. greater than about 120%, z. B. greater than about 150% of the insertion area transverse extent 302q ,

The substrate carrier 500 can have two end sections (in the transport direction 101 opposite each other), each end portion of which has an engaging portion 500a . 500b (first engagement section 500a and second engagement portion 500b ). The two engagement sections 500a . 500b can be designed to mesh with each other. For example, the first engagement portion 500a have a projection and the second engagement portion 500b can have a matching recess, ie in which the projection fits. This can be descriptive be achieved that two successively transported substrate carrier 500 with their engagement sections 500a . 500b mesh and opaque shielding means of the engaging portions 500a . 500b form. Illustratively, the first engagement section 500a a first substrate carrier 500 and a second engaging portion 500b a second substrate carrier 500 mesh. Thus, an opaque shield can be achieved, which is a passage of coating material through the transport surface 111f through and / or a gas exchange through the transport surface 111f difficult, which can improve process quality.

According to various embodiments, the plurality of substrate insertion areas 302e a distance 302d (Edge distance 302d ) from one edge 502R of the substrate carrier 500 have (for example in the transport direction 101 ), which may be smaller than the catchment structure transverse extent 108q , z. B. less than or equal to 80% of the collecting structure transverse extent 108q , z. B. less than or equal to 70% of the collecting structure transverse extent 108q , z. B. less than or equal to 50% of the collecting structure transverse extent 108q , z. B. less than or equal to 40% of the collecting structure transverse extent 108q , In other words, the catchment structure transverse extent 108q (eg, at least about 25%, eg, at least about 50%, eg, at least about 75%, eg, at least about 100%) greater than the edge distance 302d ,

According to various embodiments, the substrate carrier 500 a frame 504 which has the substrate transport structure 302 surrounds. The frame 504 can along the transport direction 101 an extension equal to the edge distance 302d and transverse to the transport direction 101 an extension equal to the catchment structure transverse extent 108q exhibit.

The frame 504 or the collection structure 108 may comprise or be formed from a plate. Alternatively or additionally, the substrate transport structure 302 have a plate or be formed from it. For example, the collection structure 108 and the substrate transport structure 302 be connected to each other, for. B. by these are formed in a plate. The plate may comprise or be formed from a metal, e.g. As iron or aluminum.

6 illustrates a coating arrangement 600 according to various embodiments in a schematic perspective view.

According to various embodiments, the transport device 114 several transport rollers 114r exhibit.

According to various embodiments, the source of coating material 106 the coating material 606 exhibit. An expansion 606q (Coating material transverse extension 606q ) of the coating material 606 may (eg at least about 5%, eg at least about 10%, eg at least about 15%, eg at least about 20%, eg at least about 25%, eg at least about 30%, eg, at least about 40%) greater than the coating area transverse extent 104q , z. B. a supernatant 602q (also referred to as target supernatant). The coating material 606 may also be referred to as a target material and be provided in a solid state by means of a target.

According to various embodiments, the supernatant 602q (eg, at least about 25%, eg, at least about 50%, eg, at least about 75%, eg, at least about 100%) greater than the shielding distance 110d and / or the coating distance 111d ,

According to various embodiments, the capture structure transverse extent (eg, at least about 25%, eg, at least about 50%, eg, at least about 75%, eg, at least about 100%) may be greater than the supernatant 602q ,

The storage areas 108l may include or be formed from a C-rail. In the C-rail can be a transport role 114r the transport device 114 hineingreifen.

7A and 7B each illustrate a coating arrangement 700 according to various embodiments in a schematic perspective view.

According to various embodiments, the diaphragm structure 112 several segments 112a . 112b (Aperture structure segments 112a . 112b ), of which two diaphragm structure segments 112a . 112b are arranged at a distance from each other. In other words, between the two diaphragm structure segments 112a . 112b A gap 512s be formed.

Between the two diaphragm structure segments 112a . 112b (ie in the gap 512s ) can change the transport area 111f and / or at least one transport roller 114r the transport device 114 be arranged. The two collection structures 108a . 108b , z. B. their respective storage area 108l , can between the two aperture structure segments 112a . 112b (ie, into the gap). Thus, the at least one transport roller 114r the transport device 114 by means of aperture structure 112 or the aperture structure segments 112a . 112b and / or by means of the storage areas 108l towards at least one source of coating material 106 . 206 be shielded.

The two panel structure segments 112a . 112b each may have a recess in which a source of coating material 106 . 206 can be arranged.

The two panel structure segments 112a . 112b can each from an emission opening 112o be penetrated, which the coating area 104 towards at least one source of coating material 106 . 206 exposes. The emission openings 112o the aperture structure segments 112a . 112b can overlap one another, e.g. B. on the transport surface 111f projected, z. B. completely overlap.

8th illustrates a coating arrangement 800 according to various embodiments in a schematic perspective view.

According to various embodiments, the source of coating material 106 several emission sources 106a . 106b have or be formed from it. For example, any emission source 106a . 106b having the coating material, for. B. in solid or liquid form (also referred to as target).

According to various embodiments, the emission opening 112o be configured such that a coating by means of the plurality of emission sources 106a . 106b can be done.

For example, any emission source 106a . 106b have a tube target, which can be rotatably mounted or can be and / or which can be atomized by means of a plasma. Alternatively or additionally, each emission source 106a . 106b have a crucible in which the coating material can be stored and heated, so that this can be converted to a gaseous state.

9 illustrates a coating arrangement 900 according to various embodiments in a schematic cross-sectional view or side view;

According to various embodiments, the emission opening-transverse extent 112q equal to or greater than the coating material transverse extent 606q , z. B. at least about 1 mm, z. B. by at least about 5 mm, z. B. at least about 10 mm, z. B. by at least about 20 mm. Alternatively, the emission opening-transverse extent 112q also be smaller than the coating material transverse extent 606q , z. B. at least about 1 mm, z. B. by at least about 5 mm, z. B. at least about 10 mm, z. B. by at least about 20 mm.

According to various embodiments, the coating area transverse extent 104q smaller than the emission opening-transverse extent 112q and / or the coating material transverse extent 606q , z. B. at least about the coating distance 111d , z. B. at least about twice the coating distance 111d , z. B. at least about three times the coating distance 111d , z. B. at least about four times the coating distance 111d , and / or at least a distance of the two coating material sources 106 . 206 from each other, z. B. by at least twice the distance of the two coating material sources 106 . 206 from each other.

For example, the coating area transverse extent 104q on at least one side (eg along the transverse direction 103 and / or against the transverse direction 103 ) be shorter than the emission opening-transverse extent 112q and / or the coating material transverse extent 606q , z. B. by at least (equal to or at least) the Abschirmbereich-transverse extent 110q , z. B. at least about the coating distance 111d and / or the shielding distance 110d , z. At least about 125% (eg, at least about 150%, eg, at least about 175%, eg, at least about 200%) of the coating pitch 111d and / or the shielding distance 110d and / or at least one distance of the two coating material sources 106 . 206 from each other.

The coating distance 111d can be half the distance of the two coating material sources 106 . 206 be from each other.

The coating distance 111d can essentially the shielding distance 110d correspond, z. B. can the shielding 110d be slightly smaller than the coating distance 111d , z. By a thickness (eg, an extent along the direction 105 ) of the collection structure 108 ,

According to various embodiments, the coating distance 111d greater than about 50 mm, e.g. B. greater than about 80 mm, z. B. greater than about 110 mm, z. B. greater than about 150 mm, z. In a range of about 40 mm to about 200 mm.

According to various embodiments, the coating area transverse extent 104q , the coating material transverse extent 606q and / or the emission opening transverse extent 112q greater than about 1 m, z. B. greater than about 2 m, z. B. greater than about 3 m, z. B. greater than about 4 m, z. In a range of about 3 m to about 5 m.

10A illustrates a coating arrangement 1000a According to various embodiments in a schematic cross-sectional view or side view (eg., Transverse to the transport direction 101 cut).

The catchment structure transverse extent 108q may be equal to or greater than the shield area transverse extent 110q ,

According to various embodiments, the source of coating material 106 a source area 116 exhibit. In the source area 116 may be the source of coating material 106 be set up to emit the coating material 106e , z. In the direction (emission direction, eg the coating direction 105 ) to the collecting structure 108 and / or the coating area 104 ,

The source area 116 can be an extension 116q (Source area-transverse extension 116q ) along the transverse direction 103 which (eg at least about 5%, eg at least about 10%, eg at least about 15%, eg at least about 20%, eg at least about 25%, e.g. B. at least about 30%, eg at least about 40%) is greater than the coating area transverse extent 104q , z. B. by at least the coating distance 111d and / or at least the shielding distance 110d , z. At least about 150% (eg, at least about 175%, eg, at least about 200%) of the coating pitch 111d and / or the shielding distance 110d ,

10B illustrates a coating arrangement 1000b according to various embodiments in a schematic cross-sectional view or side view.

According to various embodiments, the coating arrangement 100b one an issue room 1004 which are in the coating chamber 102 is provided. The coating material source 106 can be set up the coating material in the emission space 1004 to emit into it.

The issue room 1004 can be a border area 1004 exhibit. The border area 1004 can be an extension 1006 (Edge-portion transverse dimension 1006 ) (eg in the transport area 111f ), which (eg at least about 25%, eg at least about 50%, eg at least about 75%, eg at least about 100%, eg at least about 150%, e.g. B. at least about 200%) may be greater than the coating distance 111d ,

The boundary surfaces of the edge area 1004 can have an opening angle 1006w of the border area 1004 which is the edge area transverse extent 1006 Are defined. The opening angle 1006w may be greater than about 45 °, z. B. greater than about 60 °, z. B. greater than about 75 °, z. B. greater than about 90 °, z. B. greater than about 120. The bisector of the opening angle 1006w can be approximately along the coating direction 105 run.

The collection structure 108 can be through a border area 1004 of the issue room 1004 extend through.

Optionally, the aperture structure 112 the issue room 1004 limit (shown on one page only), eg. B. its edge region 1004 , Then the collecting structure transverse extent 108q greater than the edge area transverse extent 1006 , Alternatively, the aperture structure 112 outside the issue room 1004 , z. B. its edge region 1004 , can be arranged (eg, the emission opening-transverse extent 112q be larger than the emission space 1004 , ie its transverse extent).

The transport area 111f can be, for example, from the transverse direction 103 and the transport direction 101 be or be stretched.

The transport device 114 and / or the substrate carrier 500 may be arranged such that the substrates can be transported between the two edge regions.

11 and 12 each illustrate a source of coating material 106 . 206 according to various embodiments in a schematic cross-sectional view or side view.

According to various embodiments, a coating material source (coating source) may be used. 106 . 206 a sputtering device (comprising a magnetron, eg a tube magnetron or a double-tube magnetron, a planar magnetron or double planar magnetron) or formed therefrom, by means of which a sputtering of a coating material 606 (the so-called sputtering) can take place. By sputtering, for example, one or more layers can be deposited on a substrate. This can be done by means of a cathode 1102 a plasma-forming gas (the so-called working gas) ionizes (eg in a plasma forming area 1104 ), wherein by means of the plasma formed thereby 1104 a material to be deposited 606 (Coating material 606 , or also called target material) of the cathode 1102 can be atomized. The atomized coating material 606 can then be brought to a substrate where it can deposit and form a layer.

The coating material 606 can in solid state by means of a target 1102t be or be provided. The target 1102t can the coating material 606 have or be formed from it.

The target 1102t a tube magnetron may be tubular and rotate during operation (ie, during sputtering) 301 become. The target 1102t can by means of a carrier 1106 be rotatable or be. For example, the target 1102t have a base tube which holds the coating material. The target 1102t a planar magnetron, however, may be plate-shaped.

Modifications of cathode sputtering are, for example, sputtering by means of a magnetic field 204m , the so-called magnetron sputtering or the so-called reactive magnetron sputtering. In this case, the formation of the plasma by means of the magnetic field 204m can be supported, which may affect the ionization rate of the plasma-forming gas and / or its distribution. The magnetic field 204m can by means of a magnet system 204 (several magnets) are generated, wherein by means of the magnetic field 204m a plasma channel 1104 , ie a so-called race track, can be provided in which the plasma 1104 can form. For sputtering, the coating material 606 between the plasma channel and the magnet system 204 be arranged or so that the coating material 606 from the magnetic field 204m can be penetrated and the plasma channel 1104 on the coating material 606 can run. In reactive sputtering, the source of coating material may be 106 . 206 a gaseous reactive material 1108a (Reactive gas) are supplied, for. B. in the plasma 1104 into it, which can be incorporated into the layer. The reactive material 1108a can by means of a gas supply 1108 be supplied.

The plasma imaging area 1104 and / or the magnet system may be the source area 116 define. For example, the plasma formation area 1104 and / or the magnet system 204 source area 116 overlap (eg completely). For example, the source area 116 from the magnetic field 204m be or be penetrated.

13 illustrates a method 1300 according to various embodiments in a schematic flow diagram.

The procedure 1300 can in 1302 comprising: emitting a coating material into a coating region by means of a coating material source. The procedure 1300 can also be found in 1304 comprising: coating a substrate with the coating material in a coating area. The procedure 1300 can continue in 1306 comprising: coating a collection structure with coating material such that by means of the collection structure, a shielding area adjacent to the coating area is shielded from the coating material, the shielding area being spaced from the coating material source and having an extent transverse to the distance greater than the spacing. Furthermore, the method can 1300 in 1308 exhibit:
Removing the collecting structure from the coating chamber and / or bringing the collecting structure into the coating chamber by means of the transport device, for. While the substrate is being coated and / or in a continuous motion.

14 illustrates a method 1400 according to various embodiments in a schematic flow diagram.

The procedure 1400 can in 1402 comprising: emitting a coating material from a source region through a passage opening of an aperture structure in the direction of a substrate carrier which holds a substrate. The procedure 1400 can also be found in 1404 comprising: coating the substrate with coating material emitted from the source region. The procedure 1400 can continue in 1406 comprising: coating the substrate carrier with coating material which is from an edge of the source region, for. B. in the coating direction, is emitted.

15A and 15B each illustrate a coating arrangement 1500a . 1500b According to various embodiments in a schematic cross-sectional view (eg., Transverse to the transverse direction 103 cut) or side view.

According to various embodiments, the coating arrangement 1500a . 1500b at least one coating chamber 102 (One or more coating chambers 102 ), which can be provided by means of the chamber housing or can be. The at least one coating chamber 102 may be configured to create and / or maintain a vacuum therein.

For example, the coating arrangement 1500a . 1500b several of the 16A and 16B illustrated coating chambers 102 each of which, for example, two adjacent coating chambers 102 contiguous. The adjoining coating chambers 102 can be connected to each other by means of a substrate transfer opening, so that these z. B. form a common vacuum system. Alternatively or additionally, between two coating chambers 102 another chamber may be arranged, e.g. B. a gas separation chamber.

In every coating chamber 102 the coating arrangement 1500a . 1500b may be a source of coating material 106 be arranged or, which may optionally differ from each other in pairs. In at least one of the coating chambers 102 (ie in one or more than one coating chamber 102 ) may have a catching structure 108 be arranged according to various embodiments. For example, the collection structure 108 through all chambers (eg coating chambers 102 ) of the coating arrangement 1500a . 1500b be transportable through, z. B. by means of the transport device 114 ,

According to various embodiments, the coating arrangement 1500a . 1500b a pump arrangement 804 (comprising at least one high vacuum pump). The pump arrangement 804 can be arranged, the at least one coating chamber 102 (eg, the vacuum chamber) to withdraw a gas (eg, the process gas), so that within the at least one coating chamber 102 a vacuum (ie a pressure less than 0.3 bar) and / or a pressure in a range of about 10 ^-3 millibar (mbar) to about 10 ^-7 mbar (in other words high vacuum) or a pressure less than high vacuum, z. B. less than about 10 ^-7 mbar (in other words ultra-high vacuum) can be or can be provided.

According to various embodiments, the coating arrangement 1500a . 1500b a controller 518 having, which with several components of the coating arrangement 1500a . 1500b coupled (shown in phantom) can be.

Furthermore, the at least one coating chamber 102 be configured such that the vacuum conditions (the process conditions) within the at least one coating chamber 102 (eg, process pressure, process temperature, chemical process gas composition, etc.) can be set or regulated, e.g. B. during coating, for. B. by means of the controller 518 ,

According to various embodiments, the coating arrangement 1500a . 1500b a gas supply 716 exhibit. By means of the gas supply 716 the at least one coating chamber 102 a process gas is supplied to form a process atmosphere in the at least one coating chamber 102 , The process gas may for example comprise or be formed from a working gas and / or a reactive gas. The process pressure can be formed from a balance of process gas, which by means of the gas supply 716 supplied and by means of the pump assembly 804 is withdrawn.

According to various embodiments, the reactive gas may comprise at least one of oxygen, nitrogen, hydrogen sulfide, methane, gaseous hydrocarbons, fluorine, chlorine, or other gaseous material.

According to various embodiments, the controller may 518 be set up to control and / or regulate the vacuum conditions. For example, by means of the controller 518 the gas supply 716 and / or the pump assembly 804 be controlled and / or regulated, for. B. based on a specification. The default may be, for example, a coating characteristic in the coating area 104 and / or represent the vacuum conditions.

According to various embodiments, the controller may 518 for controlling and / or regulating the coating material source 106 be set up, for. B. based on a specification. The default may be, for example, a coating characteristic in the coating area 104 represent. For example, by means of the controller 518 the actual coating characteristics are controlled and / or regulated in the coating area, e.g. B. by setting or rules of operating parameters of the coating material source 106 , z. B. based on a desired coating characteristic. Alternatively or additionally, a coating of a substrate 410 controlled and / or regulated. Then the default can represent a layer characteristic. The layer characteristic may comprise at least one of: a layer thickness (eg spatially averaged and / or its spatial distribution), a chemical composition of the layer (eg spatially averaged and / or its spatial distribution).

According to various embodiments, the coating arrangement 1500a a substrate transport device 1204 exhibit. According to various embodiments, the substrate transport device 1204 the coating arrangement 1500a an unwinding roll 502a have for unwinding a band-shaped substrate 410 in the coating area 104 into it. Furthermore, the substrate transport device 1204 the coating arrangement 1500a a take-up roll 502b for winding up the band-shaped substrate 410 which, from the coating area 104 is brought out.

A band-shaped substrate 410 (Tape substrate) may be, for example, a metal tape or a metal foil, or a plastic tape (polymer tape) or a plastic film (polymer film). According to various embodiments, the tape substrate may comprise any material, e.g. Example, a metal, a semi-metal, a polymer, a glass, or any other material which with a correspondingly small thickness (thickness) and / or as fibers by means of rollers 114r or rolling 114r let process. Illustratively, a tape substrate may be any substrate 410 to be on a roll 502a . 502b can be wound up and / or, for example, from roll-to-roll can be processed. Depending on the material, a tape substrate may have a thickness in a range of about a few micrometers (eg, from about 1 μm) to about a few millimeters (eg, up to about 10 mm).

According to various embodiments, the substrate transport device 1204 the coating arrangement 1500a a variety of transport wheels 114r which define a transport path (eg single or multiple curved) along which the band-shaped substrate 410 between the unwinding roll 502a and the take-up roll 502b through the coating area 104 is transported through.

Alternatively, the substrate transport device 1204 the coating arrangement 1500b a variety of transport wheels 114r which is used to transport a plate-shaped substrate 410 are set up. The plate-shaped substrate 410 can, for. B. on the transport rollers 114r resting and / or in a substrate carrier 500 inserted, transported.

Furthermore, the coating arrangement 1500a . 1500b a transport drive 1602 comprising at least part of the plurality of transport rollers 114r and optionally with the unwind roll 502a and the take-up roll 502b , is coupled. For example, the transport drive 1602 using chains, belts or gears with the rollers 114r . 502a . 502b be coupled. The transport wheels 114r and the transport drive 1602 may be part of the substrate transport device 1204 be.

According to various embodiments, the controller may 518 for controlling and / or regulating the transport drive 1602 be furnished. For example, by means of the controller 518 a transport state (eg, a transport speed, a transport position, a substrate flow, etc.) are controlled and / or regulated, e.g. Based on a specification representing a layer characteristic, and / or based on a position of the at least one substrate 410 or the substrate support 500 ,

The collection structure 108 can by means of a collecting structure transport device 114 be movably mounted, wherein the collecting structure transport device 114 to transport the collecting structure 108 is set up. The control 518 may be arranged the collecting structure transport device 114 to control and / or to regulate. The collecting structure transport device 114 may be a movement of the catching structure 108 drive.

Optionally, the transport drive 1602 also with the collecting structure transport device 114 be coupled. Alternatively, to the collecting structure transport device 114 by means of the substrate transport device 1204 be provided or, for. B. if the collecting structure 108 by means of the substrate carrier 500 is or is provided.

According to various embodiments, the controller may 518 for controlling and / or regulating the collecting structure transport device 114 be furnished. For example, by means of the controller 518 a transport state (eg, a transport speed, a transport position, etc.) are controlled and / or regulated, e.g. B. based on a position of the collecting structure 108 ,

According to various embodiments, the coating arrangement 1500a . 1500b a diaphragm structure 112 exhibit. The aperture structure 112 may have a passage opening (emission opening) between the transport surface and the coating material source. The emission opening can be along the transverse direction 103 have a greater extent (emission opening-transverse extent) than the source region and / or as the coating material.

According to various embodiments, the coating arrangement 1500b a catching structure 108 (eg, a catcher) which extends from the substrate carrier 500 (Substrate holder) decoupled stored and / or arranged in a spatial order of this. The collection structure 108 can during operation of the coating material source 106 (ie when this coating material is emitted) to be moved or, for. B. at a greater or lesser speed than the substrate carrier 500 , In other words, the catching structure 108 during operation of the coating material source 106 not remain static, but may be on the coating area 104 past, move towards and / or away from it. As a result, the coating affecting influences are reduced. For example, the collection structure 108 be formed band-shaped and / or have a band (sacrificial band) or be formed from it. The belt can be transported, for example, by means of a belt conveyor (eg by means of a traction device) and / or by means of rollers.

16A and 16B each illustrate a coating arrangement 1600a . 1600b according to various embodiments in a schematic cross-sectional view or side view, wherein the transport device 114 , or at least one transport role 114r into the collection structure 108a . 108b reaching in. This can be a transport roller transverse distance 114d ie a distance 114d from on opposite sides of the coating area 104 arranged transport rollers 114r , which is (are for example at least about 5%, eg at least about 10%, eg at least about 20%) smaller than a longitudinal extent of the coating material source 106 , the source area cross extent 116q , the emission opening-transverse extent 112q and / or the coating material transverse extent 606q ,

Clearly, an already existing coating arrangement can be inexpensively converted in this way without the transport device 114 to adapt.

For example, an adapted substrate carrier can be used 500 used, which is the collection structure 108a . 108b provides as in 16B is illustrated, for. B. similar to 3A ,

Optionally, the coating arrangement 1600a . 1600b a second source of coating material 206 exhibit.

Claims (10)

Coating arrangement ( 100a . 100b . 900 ), comprising: a coating chamber ( 102 ) in which a coating area ( 104 ) is provided; A coating material source ( 106 ) for coating a substrate ( 410 ) in the coating area ( 104 ) with a coating material, • a collecting structure ( 108 . 108a . 108b ) for collecting coating material which has a shielding area ( 110 ) relative to the coating material source ( 106 ) shielding, which at the coating area ( 104 ) and a distance ( 110d ) from the coating material source ( 106 ) having; • where an extent ( 110q ) of the shielding area ( 110 ) across the distance ( 110d ) is greater than the distance ( 110d ); and • one in the coating chamber ( 102 ) arranged transport device ( 114 . 1204 ), by means of which the collecting structure ( 108 . 108a . 108b ) in the coating chamber ( 102 ) and / or from the coating chamber ( 102 ) is transportable out. Coating arrangement ( 100a . 100b . 900 ) according to claim 1, further comprising: a diaphragm structure ( 112 ), which between the coating material source ( 106 ) and the coating area ( 104 ) a passage opening ( 112o ), wherein the passage opening ( 112o ) an extension ( 112q ) across the distance ( 110d ), which by at least the distance ( 110d ) is greater than a parallel extent ( 104q ) of the coating area ( 104 ). Coating arrangement ( 100a . 100b . 900 ) according to claim 1 or 2, wherein the collecting structure ( 108 . 108a . 108b ) the transport device ( 114 . 1204 ) at least partially opposite the coating material source ( 106 ) shields. Coating arrangement ( 100a . 100b . 900 ) according to one of claims 1 to 3, wherein the coating material source ( 106 ) has a source region from which it emits the coating material, the source region having an extension ( 606q ) across the distance ( 110d ) which is greater than a parallel extent ( 104q ) of the coating area ( 104 ). Coating arrangement ( 100a . 100b . 900 ) according to one of claims 1 to 4, wherein the coating material source ( 106 ) has a magnetron. Coating arrangement ( 100a . 100b . 900 ) according to one of claims 1 to 5, further comprising: a further coating material source ( 106 ), wherein the coating area ( 104 ) between the coating material source ( 106 ) and the further coating material source ( 106 ) is arranged. Coating arrangement ( 100a . 100b . 900 ) according to one of claims 1 to 6, wherein the collecting structure ( 108 . 108a . 108b ) by means of a substrate carrier ( 500 ) which is used to hold a plurality of substrates ( 410 ) is set up. Procedure ( 1300 ) for coating in a coating chamber ( 102 ) in which a coating area ( 104 ) and a transport device ( 114 . 1204 ), the method ( 1300 ) comprising: emitting a coating material into a coating area ( 104 ) by means of a coating material source ( 106 ); Coating a substrate ( 410 ) with the coating material in a coating area ( 104 ); • coating a collecting structure ( 108 . 108a . 108b ) with coating material, so that by means of the collecting structure ( 108 . 108a . 108b ) to the coating area ( 104 ) adjacent shielding area ( 110 ) is shielded from the coating material, the shielding region ( 110 ) a distance ( 110d ) from the coating material source ( 106 ) and an extent ( 110q ) across the distance ( 110d ) which is greater than the distance ( 110d ); and • removing the collecting structure ( 108 . 108a . 108b ) from the coating chamber ( 102 ) and / or introducing the collecting structure ( 108 . 108a . 108b ) in the coating chamber ( 102 ) by means of the transport device ( 114 . 1204 ). Substrate carrier ( 500 ), comprising: • two along a transport direction ( 101 ) parallel collecting structures ( 108 . 108a . 108b ); • several between the two collection structures ( 108 . 108a . 108b ) substrate insertion areas ( 302e ), of which each substrate loading area ( 302e ) a recess and a support surface for holding a substrate ( 410 ) in the recess; Where each catchment structure ( 108 . 108a . 108b ) of the two collecting structures ( 108 . 108a . 108b ) transversely to the transport direction ( 101 ) an extension ( 108q ), which is greater than a perpendicular distance ( 110d ) of the plurality of substrate insertion areas from one edge ( 502R ) of the substrate carrier ( 500 ). Coating arrangement ( 100a . 100b . 900 ), comprising: a coating chamber ( 102 ); A coating material source ( 106 ) containing a source area ( 116 ), in which it is arranged, a coating material ( 606 ) into an issue room ( 1404 ) in the coating chamber ( 102 ) to emit; A transport device ( 114 . 1204 ) for transporting a substrate ( 410 ) through the emission space ( 1404 ) along a transport surface ( 111f ) in a transport direction ( 101 ); and a diaphragm structure ( 112 ), which between the transport surface ( 111f ) and the coating material source ( 106 ) a passage opening ( 112o ), through which the emission space ( 1404 extends); • whereby the passage opening ( 112o ) along a transverse direction ( 103 ), which along the transport surface ( 111f ) and transversely to the transport direction ( 101 ), a larger extent ( 112q ) than the source area ( 116 ), so that from one edge of the source area ( 116 ) emitted coating material through the passage openings ( 112o ) passes through.

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