DE102013204442A1 - Optischer Wellenleiter zur Führung von Beleuchtungslicht - Google Patents
Optischer Wellenleiter zur Führung von Beleuchtungslicht Download PDFInfo
- Publication number
- DE102013204442A1 DE102013204442A1 DE102013204442.9A DE102013204442A DE102013204442A1 DE 102013204442 A1 DE102013204442 A1 DE 102013204442A1 DE 102013204442 A DE102013204442 A DE 102013204442A DE 102013204442 A1 DE102013204442 A1 DE 102013204442A1
- Authority
- DE
- Germany
- Prior art keywords
- illumination light
- waveguide
- decoupling
- coupling
- illumination
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 238000005286 illumination Methods 0.000 title claims abstract description 253
- 230000003287 optical effect Effects 0.000 title claims abstract description 36
- 238000001514 detection method Methods 0.000 claims description 60
- 238000007689 inspection Methods 0.000 claims description 30
- 238000013459 approach Methods 0.000 claims description 15
- 239000007787 solid Substances 0.000 claims description 6
- 238000009304 pastoral farming Methods 0.000 claims description 3
- 238000009826 distribution Methods 0.000 description 28
- 238000004980 dosimetry Methods 0.000 description 22
- 230000000875 corresponding effect Effects 0.000 description 21
- 238000005259 measurement Methods 0.000 description 19
- 238000001228 spectrum Methods 0.000 description 15
- 238000006073 displacement reaction Methods 0.000 description 13
- 230000008878 coupling Effects 0.000 description 9
- 238000010168 coupling process Methods 0.000 description 9
- 238000005859 coupling reaction Methods 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- 238000003384 imaging method Methods 0.000 description 8
- 230000001105 regulatory effect Effects 0.000 description 7
- 238000000926 separation method Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 210000000554 iris Anatomy 0.000 description 3
- 238000001459 lithography Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000000605 extraction Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- BUHVIAUBTBOHAG-FOYDDCNASA-N (2r,3r,4s,5r)-2-[6-[[2-(3,5-dimethoxyphenyl)-2-(2-methylphenyl)ethyl]amino]purin-9-yl]-5-(hydroxymethyl)oxolane-3,4-diol Chemical compound COC1=CC(OC)=CC(C(CNC=2C=3N=CN(C=3N=CN=2)[C@H]2[C@@H]([C@H](O)[C@@H](CO)O2)O)C=2C(=CC=CC=2)C)=C1 BUHVIAUBTBOHAG-FOYDDCNASA-N 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001900 extreme ultraviolet lithography Methods 0.000 description 1
- 230000012447 hatching Effects 0.000 description 1
- 238000000265 homogenisation Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000010606 normalization Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 210000001747 pupil Anatomy 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
- G02B6/0011—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
- G02B6/0033—Means for improving the coupling-out of light from the light guide
- G02B6/005—Means for improving the coupling-out of light from the light guide provided by one optical element, or plurality thereof, placed on the light output side of the light guide
- G02B6/0055—Reflecting element, sheet or layer
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/0994—Fibers, light pipes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
- G02B6/0011—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
- G02B6/0033—Means for improving the coupling-out of light from the light guide
- G02B6/005—Means for improving the coupling-out of light from the light guide provided by one optical element, or plurality thereof, placed on the light output side of the light guide
- G02B6/0053—Prismatic sheet or layer; Brightness enhancement element, sheet or layer
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
- G02B6/0096—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the lights guides being of the hollow type
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/262—Optical details of coupling light into, or out of, or between fibre ends, e.g. special fibre end shapes or associated optical elements
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Couplings Of Light Guides (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Length Measuring Devices By Optical Means (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102013204442.9A DE102013204442A1 (de) | 2013-03-14 | 2013-03-14 | Optischer Wellenleiter zur Führung von Beleuchtungslicht |
| JP2015562039A JP6473700B2 (ja) | 2013-03-14 | 2014-03-07 | 照射光を案内するための光導波路 |
| PCT/EP2014/054436 WO2014139881A1 (en) | 2013-03-14 | 2014-03-07 | Optical waveguide for guiding illumination light |
| US14/833,954 US9671548B2 (en) | 2013-03-14 | 2015-08-24 | Optical waveguide for guiding illumination light |
| US15/608,390 US10254466B2 (en) | 2013-03-14 | 2017-05-30 | Optical waveguide for guiding illumination light |
| JP2019012078A JP2019095799A (ja) | 2013-03-14 | 2019-01-28 | 照射光を案内するための光導波路 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102013204442.9A DE102013204442A1 (de) | 2013-03-14 | 2013-03-14 | Optischer Wellenleiter zur Führung von Beleuchtungslicht |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102013204442A1 true DE102013204442A1 (de) | 2014-10-02 |
Family
ID=51519699
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102013204442.9A Ceased DE102013204442A1 (de) | 2013-03-14 | 2013-03-14 | Optischer Wellenleiter zur Führung von Beleuchtungslicht |
Country Status (4)
| Country | Link |
|---|---|
| US (2) | US9671548B2 (https=) |
| JP (2) | JP6473700B2 (https=) |
| DE (1) | DE102013204442A1 (https=) |
| WO (1) | WO2014139881A1 (https=) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102013204442A1 (de) | 2013-03-14 | 2014-10-02 | Carl Zeiss Smt Gmbh | Optischer Wellenleiter zur Führung von Beleuchtungslicht |
| CN104181648B (zh) * | 2014-07-07 | 2015-10-28 | 中国科学院上海光学精密机械研究所 | 空心光子晶体光纤气体吸收池及其制作方法 |
| DE102014219112A1 (de) * | 2014-09-23 | 2016-03-24 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die Projektionslithographie sowie Hohlwellenleiter-Komponente hierfür |
| WO2018017650A1 (en) * | 2016-07-22 | 2018-01-25 | Applied Materials, Inc. | Twisted kaleido |
| DE102016118471A1 (de) * | 2016-09-29 | 2018-03-29 | Valeo Schalter Und Sensoren Gmbh | Erfassungsvorrichtung für ein Kraftfahrzeug, Anbauteil sowie Kraftfahrzeug |
| DE102016225563A1 (de) | 2016-12-20 | 2018-06-21 | Carl Zeiss Smt Gmbh | Hohlwellenleiter zur Führung von EUV-Licht mit einer Nutzwellenlänge |
| DE102017205548A1 (de) | 2017-03-31 | 2018-10-04 | Carl Zeiss Smt Gmbh | Optische Baugruppe zum Führen eines Ausgabestrahls eines Freie-Elektronen-Lasers |
| CZ309726B6 (cs) | 2017-11-01 | 2023-08-23 | PO LIGHTING CZECH s.r.o | Světlovodivý optický systém |
| US11520044B2 (en) | 2018-09-25 | 2022-12-06 | Waymo Llc | Waveguide diffusers for LIDARs |
| US11499924B2 (en) | 2019-06-03 | 2022-11-15 | KLA Corp. | Determining one or more characteristics of light in an optical system |
| DE102019115146B4 (de) * | 2019-06-05 | 2021-01-14 | Schott Ag | Optisches Gerät, Verwendungen des optischen Gerätes, Fahrzeug oder Beobachtungsstation mit dem optischen Gerät sowie Verfahren zur hochauflösenden Bildübertragung |
| US11293880B2 (en) | 2020-02-20 | 2022-04-05 | Kla Corporation | Method and apparatus for beam stabilization and reference correction for EUV inspection |
| CN115280177B (zh) * | 2020-03-02 | 2025-04-22 | 佳能株式会社 | 光学装置、车载系统、以及移动装置 |
| DE102021206203A1 (de) * | 2021-06-17 | 2022-12-22 | Carl Zeiss Smt Gmbh | Heizanordnung und Verfahren zum Heizen eines optischen Elements |
| DE102024203350B4 (de) * | 2024-04-11 | 2025-12-24 | Carl Zeiss Smt Gmbh | Energie-Detektions-Baugruppe für ein Beleuchtungssystem eines Maskeninspektionssystems zum Einsatz mit EUV-Beleuchtungslicht |
Citations (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2929186A1 (de) * | 1979-07-19 | 1981-02-05 | Licentia Gmbh | Einrichtung zur auskopplung eines definierten anteils eines lichtbuendels einer lichtleitfaser |
| US4918583A (en) | 1988-04-25 | 1990-04-17 | Nikon Corporation | Illuminating optical device |
| US5059013A (en) | 1988-08-29 | 1991-10-22 | Kantilal Jain | Illumination system to produce self-luminous light beam of selected cross-section, uniform intensity and selected numerical aperture |
| DE4124311A1 (de) | 1991-07-23 | 1993-01-28 | Zeiss Carl Fa | Anordnung zur kohaerenzreduktion und strahlformung eines laserstrahls |
| US5224200A (en) | 1991-11-27 | 1993-06-29 | The United States Of America As Represented By The Department Of Energy | Coherence delay augmented laser beam homogenizer |
| US5473408A (en) | 1994-07-01 | 1995-12-05 | Anvik Corporation | High-efficiency, energy-recycling exposure system |
| EP0724498A1 (en) | 1993-09-30 | 1996-08-07 | Cymer, Inc. | Full field mask illumination enhancement methods and apparatus |
| EP0981936A1 (en) | 1997-05-12 | 2000-03-01 | Cymer, Inc. | Plasma focus high energy photon source |
| US20010012429A1 (en) * | 1995-11-20 | 2001-08-09 | Cirrex Corp. | Method and apparatus for improved fiber optic light management |
| US6536914B2 (en) | 2000-05-04 | 2003-03-25 | Koninklijke Philips Electronics N.V. | Illumination system, light mixing chamber and display device |
| US20030058383A1 (en) | 2001-09-26 | 2003-03-27 | Jagt Hendrik Johannes Boudewijn | Micro-structured illumination system for providing polarized light |
| US6552846B1 (en) | 1999-10-12 | 2003-04-22 | Nikon Corporation | Catoptric optical element, illumination optical system equipped therewith, projection exposure apparatus and method for manufacturing semiconductor device |
| DE10220815A1 (de) | 2002-05-10 | 2003-11-20 | Zeiss Carl Microelectronic Sys | Reflektives Röntgenmikroskop und Inspektionssystem zur Untersuchung von Objekten mit Wellenlängen 100 nm |
| US6870683B2 (en) | 2001-08-10 | 2005-03-22 | Lg Electronics Inc. | Optical illumination system of projector using optical device for homogenizing luminous energy and polarized light |
| US20060082888A1 (en) | 2004-10-19 | 2006-04-20 | Andrew Huibers | Optically reconfigurable light integrator in display systems using spatial light modulators |
| US7070280B2 (en) | 2001-07-04 | 2006-07-04 | Unaxis Balzers Aktiengesellschaft | Method for the generation of light of a given polarization state |
| US20080267245A1 (en) | 2004-10-04 | 2008-10-30 | Semiconductor Energy Laboratory Co., Ltd. | Beam homogenizer, laser irradiation apparatus, and method for manufacturing semiconductor device |
| US20090002833A1 (en) | 2005-12-23 | 2009-01-01 | Carl Zeiss Smt Ag | Optical System and Method for Shaping a Profile of a Laser Beam |
| EP2219078A1 (en) * | 2009-02-11 | 2010-08-18 | ASML Netherlands BV | Inspection apparatus for lithography |
| US20120163698A1 (en) | 2010-12-22 | 2012-06-28 | Kla-Tencor Mie Gmbh | Method for Inspection and Detection of Defects on Surfaces of Disc-Shaped Objects and Computer System with a Software Product for Carrying out the Method |
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| JPS5814108A (ja) * | 1981-07-17 | 1983-01-26 | Nippon Telegr & Teleph Corp <Ntt> | マルチコア光フアイバ用光結合器 |
| JPS5879240A (ja) * | 1981-11-06 | 1983-05-13 | Nippon Kogaku Kk <Nikon> | 異物検出装置 |
| US4834497A (en) * | 1987-02-27 | 1989-05-30 | The United States Of American As Represented By The United States Department Of Energy | Fiber optic fluid detector |
| JPH0210501U (https=) * | 1988-07-04 | 1990-01-23 | ||
| US5479543A (en) * | 1994-06-02 | 1995-12-26 | Reliant Technologies, Inc. | Precision light-guiding terminal for optical fibers |
| IL125986A (en) * | 1996-03-13 | 2004-05-12 | Visionex Inc | Device and method for improved operation of light in optical fiber |
| JP3517573B2 (ja) * | 1997-11-27 | 2004-04-12 | キヤノン株式会社 | 照明装置及びそれを用いた投影露光装置 |
| JP2001080308A (ja) | 1999-09-10 | 2001-03-27 | Ntn Corp | 車輪軸受装置 |
| JP2001091469A (ja) * | 1999-09-21 | 2001-04-06 | Olympus Optical Co Ltd | 表面欠陥検査装置 |
| JP2001174410A (ja) * | 1999-12-21 | 2001-06-29 | Nkk Corp | 照明装置 |
| JP2001307523A (ja) * | 2000-04-19 | 2001-11-02 | Mitsubishi Rayon Co Ltd | 照明装置 |
| WO2003060584A1 (en) * | 2002-01-15 | 2003-07-24 | Sumitomo Electric Industries, Ltd. | Optical waveguide module |
| WO2003079067A1 (en) * | 2002-03-18 | 2003-09-25 | Ntt Electronics Corporation | Method and device for manufacturing bare optical fiber |
| US6888988B2 (en) | 2003-03-14 | 2005-05-03 | Agilent Technologies, Inc. | Small form factor all-polymer optical device with integrated dual beam path based on total internal reflection optical turn |
| JP2005195348A (ja) * | 2003-12-26 | 2005-07-21 | Nikon Corp | 照明光学装置 |
| JP2005241290A (ja) * | 2004-02-24 | 2005-09-08 | Toshiba Corp | 画像入力装置及び検査装置 |
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| JP5108490B2 (ja) * | 2007-12-19 | 2012-12-26 | オリンパス株式会社 | 細胞解析装置用照明装置 |
| TWI337267B (en) * | 2008-12-10 | 2011-02-11 | Ind Tech Res Inst | Fiber laser device |
| JPWO2012137842A1 (ja) * | 2011-04-04 | 2014-07-28 | 株式会社ニコン | 照明装置、露光装置、デバイス製造方法、導光光学素子及び導光光学素子の製造方法 |
| DE102013204442A1 (de) | 2013-03-14 | 2014-10-02 | Carl Zeiss Smt Gmbh | Optischer Wellenleiter zur Führung von Beleuchtungslicht |
-
2013
- 2013-03-14 DE DE102013204442.9A patent/DE102013204442A1/de not_active Ceased
-
2014
- 2014-03-07 WO PCT/EP2014/054436 patent/WO2014139881A1/en not_active Ceased
- 2014-03-07 JP JP2015562039A patent/JP6473700B2/ja active Active
-
2015
- 2015-08-24 US US14/833,954 patent/US9671548B2/en active Active
-
2017
- 2017-05-30 US US15/608,390 patent/US10254466B2/en active Active
-
2019
- 2019-01-28 JP JP2019012078A patent/JP2019095799A/ja active Pending
Patent Citations (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2929186A1 (de) * | 1979-07-19 | 1981-02-05 | Licentia Gmbh | Einrichtung zur auskopplung eines definierten anteils eines lichtbuendels einer lichtleitfaser |
| US4918583A (en) | 1988-04-25 | 1990-04-17 | Nikon Corporation | Illuminating optical device |
| US5059013A (en) | 1988-08-29 | 1991-10-22 | Kantilal Jain | Illumination system to produce self-luminous light beam of selected cross-section, uniform intensity and selected numerical aperture |
| DE4124311A1 (de) | 1991-07-23 | 1993-01-28 | Zeiss Carl Fa | Anordnung zur kohaerenzreduktion und strahlformung eines laserstrahls |
| US5224200A (en) | 1991-11-27 | 1993-06-29 | The United States Of America As Represented By The Department Of Energy | Coherence delay augmented laser beam homogenizer |
| EP0724498A1 (en) | 1993-09-30 | 1996-08-07 | Cymer, Inc. | Full field mask illumination enhancement methods and apparatus |
| US5473408A (en) | 1994-07-01 | 1995-12-05 | Anvik Corporation | High-efficiency, energy-recycling exposure system |
| US20010012429A1 (en) * | 1995-11-20 | 2001-08-09 | Cirrex Corp. | Method and apparatus for improved fiber optic light management |
| EP0981936A1 (en) | 1997-05-12 | 2000-03-01 | Cymer, Inc. | Plasma focus high energy photon source |
| US6552846B1 (en) | 1999-10-12 | 2003-04-22 | Nikon Corporation | Catoptric optical element, illumination optical system equipped therewith, projection exposure apparatus and method for manufacturing semiconductor device |
| US6536914B2 (en) | 2000-05-04 | 2003-03-25 | Koninklijke Philips Electronics N.V. | Illumination system, light mixing chamber and display device |
| US7070280B2 (en) | 2001-07-04 | 2006-07-04 | Unaxis Balzers Aktiengesellschaft | Method for the generation of light of a given polarization state |
| US6870683B2 (en) | 2001-08-10 | 2005-03-22 | Lg Electronics Inc. | Optical illumination system of projector using optical device for homogenizing luminous energy and polarized light |
| US20030058383A1 (en) | 2001-09-26 | 2003-03-27 | Jagt Hendrik Johannes Boudewijn | Micro-structured illumination system for providing polarized light |
| DE10220815A1 (de) | 2002-05-10 | 2003-11-20 | Zeiss Carl Microelectronic Sys | Reflektives Röntgenmikroskop und Inspektionssystem zur Untersuchung von Objekten mit Wellenlängen 100 nm |
| US20080267245A1 (en) | 2004-10-04 | 2008-10-30 | Semiconductor Energy Laboratory Co., Ltd. | Beam homogenizer, laser irradiation apparatus, and method for manufacturing semiconductor device |
| US20060082888A1 (en) | 2004-10-19 | 2006-04-20 | Andrew Huibers | Optically reconfigurable light integrator in display systems using spatial light modulators |
| US20090002833A1 (en) | 2005-12-23 | 2009-01-01 | Carl Zeiss Smt Ag | Optical System and Method for Shaping a Profile of a Laser Beam |
| EP2219078A1 (en) * | 2009-02-11 | 2010-08-18 | ASML Netherlands BV | Inspection apparatus for lithography |
| US20120163698A1 (en) | 2010-12-22 | 2012-06-28 | Kla-Tencor Mie Gmbh | Method for Inspection and Detection of Defects on Surfaces of Disc-Shaped Objects and Computer System with a Software Product for Carrying out the Method |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2019095799A (ja) | 2019-06-20 |
| US9671548B2 (en) | 2017-06-06 |
| US20150362660A1 (en) | 2015-12-17 |
| US20170261680A1 (en) | 2017-09-14 |
| US10254466B2 (en) | 2019-04-09 |
| WO2014139881A1 (en) | 2014-09-18 |
| JP2016515222A (ja) | 2016-05-26 |
| JP6473700B2 (ja) | 2019-02-20 |
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